公开(公告)号：US5362597A

公开(公告)日：1994-11-08

申请号：US888635

申请日：1992-05-27

申请人： Kimiyasu Sano ,  Osahiko Tomomitsu ,  Masayuki Endoh ,  Yasuaki Yokoyama

发明人： Kimiyasu Sano ,  Osahiko Tomomitsu ,  Masayuki Endoh ,  Yasuaki Yokoyama

IPC分类号： C08G59/68 ,  C08K5/42 ,  G03F7/023 ,  G03F7/30

CPC分类号： G03F7/0233 ,  C08G59/687 ,  C08K5/42 ,  Y10S430/111

摘要： A radiation-sensitive resin composition comprising:(a) an epoxy group-containing alkali-soluble resin, or a combination of an alkali-soluble resin which may have an epoxy group and an epoxy compound,(b) 1,2-naphthoquinonediazide sulfonic acid ester, and(c) a solvent.The above radiation-sensitive resin composition is useful as a material for forming a lens.

摘要翻译： 一种辐射敏感性树脂组合物，其包含：（a）含环氧基的碱溶性树脂或可具有环氧基的碱溶性树脂与环氧化合物的组合，（b）1,2-萘醌二叠氮化物磺酸 酸酯，和（c）溶剂。 上述辐射敏感性树脂组合物可用作形成透镜的材料。

公开(公告)号：US4399266A

公开(公告)日：1983-08-16

申请号：US353811

申请日：1982-03-02

申请人： Yoshio Matsumura ,  Ikuo Nozue ,  Osahiko Tomomitsu ,  Takashi Ukachi ,  Taro Suminoe

发明人： Yoshio Matsumura ,  Ikuo Nozue ,  Osahiko Tomomitsu ,  Takashi Ukachi ,  Taro Suminoe

IPC分类号： C08G77/04 ,  C08G77/06 ,  C08G77/32 ,  C08G77/00

CPC分类号： C08G77/04 ,  C08G77/06 ,  C08G77/32

摘要： A laddery lower alkylpolysilsesquioxane represented by the formula: ##STR1## wherein R and R' represent same or different lower alkyl groups, and n represents an average degree of polymerization, said laddery lower alkylpolysilsesquioxane having a heat-resistant thin film-formability, characterized in that 15 to 30% by weight of the lower alkylpolysilsesquioxane is occupied by the portion having a standard polystyrene-reduced molecular weight of 20,000 or less as measured by gel permeation chromatography. Said silicone resin in which R and R' are methyl is prepared by dissolving CH.sub.3 SiCl.sub.3 in a ketone or an ether, adding water to this solution with stirring to hydrolyze CH.sub.3 SiCl.sub.3, condensing the hydrolyzate and, if necessary, subjecting the resulting condensate to a treatment for adjusting the proportion of the low molecular weight portion in the product.

摘要翻译： 由下式表示的梯状低级烷基聚硅倍半氧烷：其中R和R'表示相同或不同的低级烷基，n表示平均聚合度，所述梯状低级烷基聚硅倍半氧烷具有耐热薄膜可成形性，其特征在于 通过凝胶渗透色谱法测定，低分子量聚硅氧烷的15〜30重量％被标准聚苯乙烯缩小分子量为20,000以下的部分占据。 其中R和R'为甲基的所述有机硅树脂通过将CH 3 SiCl 3溶解在酮或醚中制备，在搅拌下向该溶液中加入水以水解CH 3 SiCl 3，冷凝水解产物，如果需要，将所得缩合物进行处理 调节产品中低分子量部分的比例。

公开(公告)号：US4626556A

公开(公告)日：1986-12-02

申请号：US779617

申请日：1985-09-25

申请人： Ikuo Nozue ,  Osahiko Tomomitsu ,  Yoshiji Yumoto ,  Yoshio Matsumura

发明人： Ikuo Nozue ,  Osahiko Tomomitsu ,  Yoshiji Yumoto ,  Yoshio Matsumura

IPC分类号： C08F2/46 ,  C08G77/06 ,  C08G77/20 ,  G03F7/075 ,  H01B3/46 ,  H01L21/312

CPC分类号： H01L21/02137 ,  C08G77/06 ,  C08G77/20 ,  C08K5/0025 ,  G03F7/0757 ,  H01B3/465 ,  H01L21/02282 ,  H01L21/02345 ,  H01L21/3122

摘要： A novel raddery organopolysilsesquioxane having lower alkyl groups and alkenyl groups as the side chains and, if necessary, having aryl groups and/or hydrogen atoms bonded as the side chains can be produced by adding water to a solution of a lower-alkyltrihalogenosilane, an alkenyltrihalogenosilane, and, if necessary, an aryltrihalogenosilane and/or a trihalogenosilane in an organic solvent, and heating the resulting mixture. The aforesaid organopolysilsesquioxane can be used for forming a patterned surface-protecting layer or insulating layer for a semiconductor device, in the form of a mixture with a compound which generates crosslinking-reaction-active species upon irradiation with light or an ionizing radiation.

摘要翻译： 具有低级烷基和烯基作为侧链的新型有机聚硅氧烷倍半硅氧烷，如果需要，可以通过将低级烷基三卤代硅烷，链烯基三卤代硅烷 ，如果需要，在有机溶剂中加入芳基三卤代硅烷和/或三卤代硅烷，并加热所得混合物。 上述有机聚倍半硅氧烷可以用于形成用于半导体器件的图案化表面保护层或绝缘层，其形式为与在光照射或电离辐射下产生交联反应活性物质的化合物的混合物。