公开(公告)号：US11320736B2

公开(公告)日：2022-05-03

申请号：US16123095

申请日：2018-09-06

Applicant: KIOXIA CORPORATION

Inventor： Ryosuke Yamamoto ,  Seiji Morita ,  Norikatsu Sasao ,  Koji Asakawa ,  Tomoaki Sawabe ,  Shinobu Sugimura

IPC: H01L21/308 ,  H01L21/311 ,  G03F7/09 ,  C08F220/08 ,  C08F212/08 ,  C08F120/08 ,  G03F7/00 ,  G03F7/004 ,  G03F7/20 ,  C08F120/28 ,  G03F7/40 ,  H01L21/033 ,  C08F220/28 ,  H01L27/11582

Abstract: A pattern forming material according to an embodiment is a pattern forming material comprising a polymer composed of a plurality of monomer units bonded to each other. Each of the monomer units includes an ester structure having a first carbonyl group and at least one second carbonyl group bonded to the ester structure. A second carbonyl group farthest from a main chain of the polymer constituting the pattern forming material among second carbonyl groups is in a linear chain state.

公开(公告)号：US12228860B2

公开(公告)日：2025-02-18

申请号：US18466668

申请日：2023-09-13

Applicant: Kioxia Corporation

Inventor： Norikatsu Sasao ,  Koji Asakawa ,  Shinobu Sugimura

IPC: C07C69/78 ,  C08F12/22 ,  G03F7/11 ,  H01L21/027 ,  H01L21/311 ,  H10B41/27 ,  H10B43/27

Abstract: A pattern forming material used for forming an organic film on a film to be processed of a substrate having the film to be processed, the organic film being patterned and then impregnated with a metallic compound to form a composite film which is used as a mask pattern when processing the film to be processed, the pattern forming material contains a polymer including a monomer unit represented by the following general formula (3), where, R1 is H or CH3, R2 is a C2-14 hydrocarbon group, Q is a C1-20 hydrocarbon group, or an organic group containing an oxygen atom, a nitrogen atom, or a sulfur atom between carbon-carbon atoms or at a bond terminal of a C1-20 hydrocarbon group, and X and Y are independently a hydrogen atom or a C1-4 hydrocarbon group, at least one of them being the C1-4 hydrocarbon group.

公开(公告)号：US12018107B2

公开(公告)日：2024-06-25

申请号：US17515253

申请日：2021-10-29

Applicant: KIOXIA CORPORATION

Inventor： Koji Asakawa ,  Norikatsu Sasao ,  Shinobu Sugimura

IPC: C08F220/14 ,  C08L33/10 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  H01L21/311 ,  G03F7/16 ,  G03F7/20 ,  H10B41/27 ,  H10B43/27

CPC classification number: C08F220/14 ,  C08L33/10 ,  G03F7/038 ,  G03F7/039 ,  H01L21/0273 ,  H01L21/31116 ,  H01L21/31144 ,  C08L2203/20 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  H10B41/27 ,  H10B43/27

Abstract: According to one embodiment, a polymer material is disclosed. The polymer material contains a polymer. The polymer contains a first monomer unit having a lone pair and an aromatic ring at a side chain, and a second monomer unit including a crosslinking group at a terminal of the side chain, with its molar ratio of 0.5 mol % to 10 mol % to all monomer units in the polymer. The polymer material can be used for manufacturing a composite film as a mask pattern for processing a target film on a substrate. The composite film can be formed by a process including, forming an organic film on the target film with the polymer material, patterning the organic film, and forming the composite film by impregnating a metal compound into the patterned organic film.

公开(公告)号：US11796915B2

公开(公告)日：2023-10-24

申请号：US17196988

申请日：2021-03-09

Applicant: Kioxia Corporation

Inventor： Norikatsu Sasao ,  Koji Asakawa ,  Shinobu Sugimura

IPC: G03F7/11 ,  C07C69/78 ,  C08F12/22 ,  H01L21/311 ,  H01L21/027 ,  H10B41/27 ,  H10B43/27

CPC classification number: G03F7/11 ,  C07C69/78 ,  C08F12/22 ,  H01L21/0271 ,  H01L21/31116 ,  H01L21/31144 ,  H10B41/27 ,  H10B43/27

Abstract: A pattern forming material used for forming an organic film on a film to be processed of a substrate having the film to be processed, the organic film being patterned and then impregnated with a metallic compound to form a composite film which is used as a mask pattern when processing the film to be processed, the pattern forming material contains a polymer including a monomer unit represented by the following general formula (3),






where, R1 is H or CH3, R2 is a C2-14 hydrocarbon group, Q is a C1-20 hydrocarbon group, or an organic group containing an oxygen atom, a nitrogen atom, or a sulfur atom between carbon-carbon atoms or at a bond terminal of a C1-20 hydrocarbon group, and X and Y are independently a hydrogen atom or a C1-4 hydrocarbon group, at least one of them being the C1-4 hydrocarbon group.

公开(公告)号：US11410848B2

公开(公告)日：2022-08-09

申请号：US16997115

申请日：2020-08-19

Applicant: Kioxia Corporation

Inventor： Koji Asakawa ,  Norikatsu Sasao ,  Shinobu Sugimura

IPC: H01L21/027 ,  H01L21/308 ,  H01L21/311

Abstract: A method of forming a pattern of an embodiment includes: forming an etch mask on a film to be processed by using a pattern-forming material containing an organic polymer; and patterning the etch mask. In the method of the embodiment, the organic polymer contains 70 atom % or more carbon atoms having an sp2 orbital and 5 atom % or more carbon atoms having an sp3 orbital among the carbon atoms constituting the organic polymer. The patterned etch mask is used for etching of the film to be processed with a gas containing a fluorine atom.

公开(公告)号：US11378885B2

公开(公告)日：2022-07-05

申请号：US15919443

申请日：2018-03-13

Applicant: KIOXIA CORPORATION

Inventor： Koji Asakawa ,  Naoko Kihara ,  Seekei Lee ,  Norikatsu Sasao ,  Tomoaki Sawabe ,  Shinobu Sugimura

IPC: G03F7/26 ,  G03F7/031 ,  G03F7/40 ,  G03F7/038 ,  G03F7/027 ,  G03F7/00

Abstract: According to one embodiment, a pattern formation material includes a first monomer. The first monomer includes a first molecular chain, a first group, and a second group. The first molecular chain includes a first end and a second end. The first group has an ester bond to the first end. The second group has an ester bond to the second end. The first group is one of acrylic acid or methacrylic acid. The second group is one of acrylic acid or methacrylic acid. The first molecular chain includes a plurality of first elements bonded in a straight chain configuration. The first elements are one of carbon or oxygen. The number of the first elements is 6 or more. A film including the first monomer is caused to absorb a metal compound including a metallic element.

公开(公告)号：US11639402B2

公开(公告)日：2023-05-02

申请号：US16814030

申请日：2020-03-10

Applicant: Kioxia Corporation

Inventor： Norikatsu Sasao ,  Koji Asakawa ,  Shinobu Sugimura

IPC: C08F20/30 ,  C07C69/56 ,  H01L21/02 ,  C09D125/18 ,  C09D133/14 ,  C08F12/22 ,  C07C69/76 ,  H01L21/027

Abstract: A pattern forming material is configured to use for forming an organic film on a film to be processed, patterning the organic film, and then forming a composite film by infiltrating a metallic compound into the patterned organic film. The pattern forming material contains a polymer including a monomer unit represented by a general formula (1) described below, wherein, R5 is a hydrogen atom or a methyl group, each R6 independently is an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, or an s-butyl group, and a monomer unit derived from a compound represented by a general formula (2) described below, wherein, R11 is a hydrogen atom or a methyl group, each R12 independently is a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, an s-butyl group, or a t-butyl group.

公开(公告)号：US11820840B2

公开(公告)日：2023-11-21

申请号：US18187584

申请日：2023-03-21

Applicant: Kioxia Corporation

Inventor： Norikatsu Sasao ,  Koji Asakawa ,  Shinobu Sugimura

IPC: C08F20/30 ,  C07C69/76 ,  H01L21/027 ,  C09D125/18 ,  C09D133/14 ,  C08F12/22

CPC classification number: C08F20/30 ,  C07C69/76 ,  C08F12/22 ,  C09D125/18 ,  C09D133/14 ,  H01L21/0271

Abstract: A pattern forming material is configured to use for forming an organic film on a film to be processed, patterning the organic film, and then forming a composite film by infiltrating a metallic compound into the patterned organic film. The pattern forming material contains a polymer including a monomer unit represented by a general formula (3) described below,




where R21 is H or CH3, each R22 is a hydrocarbon group of C2-14 where a carbon is primary carbon, secondary carbon or tertiary carbon, Q is a single bond or a hydrocarbon group of C1-20 carbon atoms which may include an oxygen atom, a nitrogen atom, or a sulfur atom between carbon-carbon atoms of or at a bond terminal, and a halogen atom may be substituted for the hydrogen atom.

公开(公告)号：US11548208B2

公开(公告)日：2023-01-10

申请号：US17494594

申请日：2021-10-05

Applicant: KIOXIA CORPORATION

Inventor： Koji Asakawa ,  Shinobu Sugimura

IPC: B29C59/00 ,  B29C59/02 ,  B29C33/38 ,  G03F7/00 ,  H05K3/00 ,  B29L31/34 ,  B29K105/00 ,  B29K105/24

Abstract: According to one embodiment, a template includes a base body, and a first film. The base body has a first surface and a second surface. The first surface includes silicon oxide and spreads along a first plane. The second surface crosses the first plane. The first film includes aluminum oxide. A direction from the second surface toward the first film is aligned with a direction perpendicular to the second surface. A thickness of the first film along the direction perpendicular to the second surface is not less than 0.3 nm and not more than 10 μm. The first surface includes an unevenness.