Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method
    1.
    发明申请
    Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method 审中-公开
    光学特性测量方法,光学特性调节方法,曝光装置,曝光方法和曝光装置制造方法

    公开(公告)号:US20100177290A1

    公开(公告)日:2010-07-15

    申请号:US12654589

    申请日:2009-12-23

    IPC分类号: G03B27/52 G01M11/02

    摘要: There is provided an optical characteristic measuring method for measuring an optical characteristic of an optical system which forms, on a second plane, an image of an object arranged on a first plane, the optical characteristic measuring method including: arranging at least one phase pattern on the first plane; illuminating the arranged phase pattern, with a light having a predetermined wavelength; extracting a partial image of a pattern image formed via the phase pattern and the optical system; and detecting information about the light in relation to the extracted partial image.

    摘要翻译: 提供一种光学特性测量方法,用于测量在第二平面上形成布置在第一平面上的物体的图像的光学系统的光学特性,所述光学特性测量方法包括:将至少一个相位图案布置在 第一架飞机; 用具有预定波长的光照亮布置的相位图案; 提取通过相位图案和光学系统形成的图案图像的部分图像; 并且检测关于所提取的部分图像的光的信息。

    Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method
    8.
    发明申请
    Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method 审中-公开
    光学特性测量方法,光学特性调节方法,曝光装置,曝光方法和曝光装置制造方法

    公开(公告)号:US20100195072A1

    公开(公告)日:2010-08-05

    申请号:US12654590

    申请日:2009-12-23

    IPC分类号: G03B27/54 G01B11/14

    摘要: There is provided an optical characteristic measuring method for measuring an optical characteristic of an optical system which forms, on a second plane, an image of an object arranged on a first plane, the optical characteristic measuring method including: arranging, on the first plane, a first area through which a measuring light passes or by which the measuring light is reflected; arranging a second area, through which the measuring light passes or by which the measuring light is reflected, on the second plane at a position corresponding to the first area; and detecting, via one of the first area and the second area, a light amount of the measuring light via the optical system and the other of the first area and the second area; wherein at least one of the first area and the second area has a shape such that a light amount, of the measuring light which passes or which is reflected via the optical system, is changed depending on the optical characteristic.

    摘要翻译: 提供一种光学特性测量方法,用于测量在第二平面上形成布置在第一平面上的物体的图像的光学系统的光学特性,该光学特性测量方法包括:在第一平面上, 测量光通过的第一区域或测量光通过该区域反射; 在对应于第一区域的位置处,在第二平面上布置测量光通过的第二区域或测量光被反射的第二区域; 并且经由所述第一区域和所述第二区域中的一个区域经由所述光学系统和所述第一区域和所述第二区域中的另一个检测所述测量光的光量; 其中,所述第一区域和所述第二区域中的至少一个具有使得通过所述测量光或经由所述光学系统反射的所述测量光的光量根据所述光学特性而改变的形状。

    Position detection apparatus and method
    10.
    发明授权
    Position detection apparatus and method 失效
    位置检测装置及方法

    公开(公告)号:US06668075B1

    公开(公告)日:2003-12-23

    申请号:US09344858

    申请日:1999-06-28

    IPC分类号: G06K900

    摘要: A position detection apparatus for and method of detection the position of a pattern formed on a substrate (e.g, a wafer). The apparatus (100) comprises an illumination system capable of illuminating the pattern, and an imaging optical system arranged to converge light from the substrate (126) to form an image of the pattern. The apparatus further includes a detector (170) that photoelectrically detects the pattern image and generates a first output signal containing a representation of the image, and position detection system (174), electrically connected to the detector, that detects a position of the pattern based on the first output signal, and determines a deviation of the position from an ideal position. The position detection system then generates a second output signal containing deviation information representing the deviation. The apparatus further comprises a memory unit (M), electrically connected to the position detection system, that stores the deviation information contained in the second output signal. Further included in apparatus 100 is a correction process unit (B), electrically connected to the memory unit, that generates a correction value for eliminating the deviation based on the deviation information.

    摘要翻译: 用于检测形成在基板(例如,晶片)上的图案的位置的位置检测装置和方法。 装置(100)包括能够照亮图案的照明系统和被配置成会聚来自基板(126)的光以形成图案的图像的成像光学系统。 该装置还包括一个检测器(170),其对光图案检测图形并产生包含图像表示的第一输出信号,以及电连接到检测器的位置检测系统(174),其检测基于图案的位置 在第一输出信号上,并且确定位置与理想位置的偏差。 位置检测系统然后产生包含表示偏差的偏差信息的第二输出信号。 该装置还包括与位置检测系统电连接的存储单元(M),其存储包含在第二输出信号中的偏差信息。 装置100还包括电连接到存储器单元的校正处理单元(B),该校正处理单元基于偏差信息产生用于消除偏差的校正值。