Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method
    9.
    发明申请
    Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method 审中-公开
    光学特性测量方法,光学特性调节方法,曝光装置,曝光方法和曝光装置制造方法

    公开(公告)号:US20100195072A1

    公开(公告)日:2010-08-05

    申请号:US12654590

    申请日:2009-12-23

    IPC分类号: G03B27/54 G01B11/14

    摘要: There is provided an optical characteristic measuring method for measuring an optical characteristic of an optical system which forms, on a second plane, an image of an object arranged on a first plane, the optical characteristic measuring method including: arranging, on the first plane, a first area through which a measuring light passes or by which the measuring light is reflected; arranging a second area, through which the measuring light passes or by which the measuring light is reflected, on the second plane at a position corresponding to the first area; and detecting, via one of the first area and the second area, a light amount of the measuring light via the optical system and the other of the first area and the second area; wherein at least one of the first area and the second area has a shape such that a light amount, of the measuring light which passes or which is reflected via the optical system, is changed depending on the optical characteristic.

    摘要翻译: 提供一种光学特性测量方法,用于测量在第二平面上形成布置在第一平面上的物体的图像的光学系统的光学特性,该光学特性测量方法包括:在第一平面上, 测量光通过的第一区域或测量光通过该区域反射; 在对应于第一区域的位置处,在第二平面上布置测量光通过的第二区域或测量光被反射的第二区域; 并且经由所述第一区域和所述第二区域中的一个区域经由所述光学系统和所述第一区域和所述第二区域中的另一个检测所述测量光的光量; 其中,所述第一区域和所述第二区域中的至少一个具有使得通过所述测量光或经由所述光学系统反射的所述测量光的光量根据所述光学特性而改变的形状。

    Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method
    10.
    发明申请
    Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method 审中-公开
    光学特性测量方法,光学特性调节方法,曝光装置,曝光方法和曝光装置制造方法

    公开(公告)号:US20100177290A1

    公开(公告)日:2010-07-15

    申请号:US12654589

    申请日:2009-12-23

    IPC分类号: G03B27/52 G01M11/02

    摘要: There is provided an optical characteristic measuring method for measuring an optical characteristic of an optical system which forms, on a second plane, an image of an object arranged on a first plane, the optical characteristic measuring method including: arranging at least one phase pattern on the first plane; illuminating the arranged phase pattern, with a light having a predetermined wavelength; extracting a partial image of a pattern image formed via the phase pattern and the optical system; and detecting information about the light in relation to the extracted partial image.

    摘要翻译: 提供一种光学特性测量方法,用于测量在第二平面上形成布置在第一平面上的物体的图像的光学系统的光学特性,所述光学特性测量方法包括:将至少一个相位图案布置在 第一架飞机; 用具有预定波长的光照亮布置的相位图案; 提取通过相位图案和光学系统形成的图案图像的部分图像; 并且检测关于所提取的部分图像的光的信息。