公开(公告)号：US5750185A

公开(公告)日：1998-05-12

申请号：US638393

申请日：1996-04-29

申请人： Klaus Goedicke ,  Christoph Metzner ,  Volker Kirchhoff ,  Wolfgang Hempel ,  Nicolas Schiller

发明人： Klaus Goedicke ,  Christoph Metzner ,  Volker Kirchhoff ,  Wolfgang Hempel ,  Nicolas Schiller

IPC分类号： C23C14/30 ,  C23C14/54 ,  H01J37/304 ,  H01J37/305 ,  B05D3/06

CPC分类号： H01J37/3053 ,  C23C14/30 ,  C23C14/548 ,  H01J37/304 ,  H01J2237/3132

摘要： A method for the electron beam deposition of a multicomponent evaporant to ensure a consistent layer quality with constant composition and thickness in a defined manner. The X-radiation emitted from the evaporant on the point of electron beam impingement is measured in situ, using the obtained signal as reference input to control the parameters of the evaporation process and therefore to control the deposition rate and material composition of the deposited layer. The method is used for the production of corrosion resistant, high-temperature resistant, hard-wearing or optical layers on, for example, strip steel or plastic film.

摘要翻译： 一种用于多组分蒸发剂的电子束沉积的方法，以确定具有恒定组成和厚度的一致的层质量。 使用所获得的信号作为参考输入，原位测量从电子束冲击点处蒸发器发射的X射线，以控制蒸发过程的参数，从而控制沉积层的沉积速率和材料组成。 该方法用于在例如带钢或塑料膜上生产耐腐蚀，耐高温，耐磨或光学层。

公开(公告)号：US6083356A

公开(公告)日：2000-07-04

申请号：US91099

申请日：1998-09-14

申请人： Klaus Goedicke ,  Fred Fietzke ,  Jonathan Reschke ,  Wolfgang Hempel ,  Bert Scheffel ,  Christoph Metzner ,  Siegfried Schiller

发明人： Klaus Goedicke ,  Fred Fietzke ,  Jonathan Reschke ,  Wolfgang Hempel ,  Bert Scheffel ,  Christoph Metzner ,  Siegfried Schiller

IPC分类号： C23C14/02 ,  H01J37/32 ,  B01J19/08

CPC分类号： H01J37/32018 ,  C23C14/022 ,  H01J37/34 ,  H01J2237/3322

摘要： Process and apparatus for pre-treatment of a substrate surface in a vacuum by a glow discharge for a subsequent coating process in a vacuum. The process includes maintaining a low pressure glow discharge between the substrate to be pre-treated and a counter-electrode, where the counter-electrode composed of at least a component of the coating to be deposited in the vacuum coating process. The process also includes periodically alternating a polarity of the substrate to act as a cathode or as an anode of the low pressure glow discharge, and individually controlling at least one of pulse length and discharge voltage in both polarities. A frequency of alternation of the polarity is set within a range of between 1 Hz and 1000 kHz. The apparatus includes an evacuatable vacuum chamber, a substrate holder positioned to hold a substrate to be pre-treated, at least one counter-electrode, and an alternating voltage generator coupled to the substrate to be pre-treated and the at least one counter-electrode. The substrate and the counter-electrode are mounted in a potential-free manner.

摘要翻译： PCT No.PCT / EP96 / 05032 Sec。 371日期：1998年9月14日 102（e）1998年9月14日PCT PCT 1996年11月15日PCT公布。 公开号WO97 / 22988 PCT 日期1997年6月26日用于在真空中通过辉光放电在真空中预处理衬底表面以用于在真空中进行随后的涂覆过程的工艺和设备。 该方法包括保持待预处理的基板和反电极之间的低压辉光放电，其中反电极由真空涂覆工艺中要沉积的涂层的至少一部分组成。 该方法还包括周期性地交替使衬底的极性作为阴极或作为低压辉光放电的阳极，以及分别控制两极性的脉冲长度和放电电压中的至少一个。 极性的交替频率设定在1Hz〜1000kHz的范围内。 该装置包括可抽空的真空室，定位成保持待预处理的基板的基板保持器，至少一个对电极和耦合到待预处理的基板的交流电压发生器， 电极。 基板和对电极以无电势的方式安装。

公开(公告)号：US5693417A

公开(公告)日：1997-12-02

申请号：US445523

申请日：1995-05-22

申请人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

发明人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

IPC分类号： C23C14/00 ,  C23C14/08 ,  C23C8/00

CPC分类号： C23C14/081 ,  C23C14/0036 ,  Y10T428/24975 ,  Y10T428/265

摘要： Vacuum coated compound body and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of a metal or of an alloy, a layer that is thermally, mechanically and chemically unstable, with their surface showing cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process wherein at least one layer of a material having an outer layer is of Al.sub.2 O.sub.3, is applied to the metal or alloy carrier at a maximum of 700.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 Gpa and a hardness of at least 20 Gpa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse powered, the pulse frequency lies between 20 and 100 Khz, and the deposition rate is at least 1 nm/s, with the compound bodies being utilized for cutting treatments, particularly as drills, milling cutters, reamers, broaches or saw blades.

摘要翻译： 真空涂层复合体及其生产工艺。 当以已知的方式涂覆时，这种复合体具有金属或合金的载体，即热，机械和化学不稳定的层，其表面显示出裂纹并且是部分多孔的。 通过改进的环保真空沉积工艺克服了这些缺点，其中至少一层具有外层的材料为Al 2 O 3，最多在700℃下施加到金属或合金载体上，该层为 完全结晶并且由αAl 2 O 3相和可能具有（440）织构的γAl 2 O 3相组成，具有至少1Gpa的压缩应力和至少20Gpa的硬度，其中Al 2 O 3层通过反应磁控管沉积 溅射，其中磁控管是脉冲供电的，脉冲频率在20和100KHz之间，并且沉积速率为至少1nm / s，复合体用于切割处理，特别是作为钻头，铣刀，铰刀， 拉刀或锯片。

公开(公告)号：US5698314A

公开(公告)日：1997-12-16

申请号：US445521

申请日：1995-05-22

申请人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

发明人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

IPC分类号： C04B35/622 ,  C04B41/50 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C23C14/00 ,  C23C14/08

CPC分类号： C04B41/87 ,  C04B35/62222 ,  C04B41/5031 ,  C04B41/52 ,  C04B41/89 ,  C23C14/0036 ,  C23C14/081 ,  Y10T428/2916

摘要： Compound body of a vacuum coated sintered material and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of sintered material coated with a layer that is thermally, mechanically and chemically unstable, with their surface showings cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process, wherein at least one layer of a material, having an outer layer of Al.sub.2 O.sub.3, is applied to the carrier of sintered material at a maximum of 800.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub..sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 GPa and a hardness of at least 20 GPa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse driven, the pulse frequency lies between 20 and 100 Khz and the deposition rate is at least 1 nm/s, with the resulting compound bodies being utilized for cutting treatments, particularly as cemented carbide inserts.

摘要翻译： 真空涂覆烧结材料的复合体及其制造方法。 这种复合体以已知的方式涂覆时，具有涂覆有热，机械和化学不稳定的层的烧结材料的载体，其表面显示出裂纹并且是部分多孔的。 通过改进的环保真空沉积工艺克服了这些缺点，其中至少一层具有Al 2 O 3外层的材料最多在800℃下施加到烧结材料的载体上，该层 是完全结晶的，并且由αAl 2 O 3相和可能具有（440）织构的γAl 2 O 3相组成，具有至少1GPa的压缩应力和至少20GPa的硬度，Al 2 O 3层通过反应性沉积 磁控管溅射，其中磁控管是脉冲驱动的，脉冲频率在20和100KHz之间，并且沉积速率为至少1nm / s，所得到的复合体用于切割处理，特别是作为硬质合金刀片。

公开(公告)号：US5514261A

公开(公告)日：1996-05-07

申请号：US380066

申请日：1995-01-30

申请人： Gunter Herklotz ,  Thomas Frey ,  Wolfgang Hempel

发明人： Gunter Herklotz ,  Thomas Frey ,  Wolfgang Hempel

IPC分类号： C25D3/56 ,  C25D3/60 ,  C25D3/64 ,  C09D5/00 ,  C23C16/00

CPC分类号： C25D3/64

摘要： Silver-tin alloys can be deposited by the galvanic method from a cyanide-free bath which is prepared using silver as the nitrate or diammine complex, tin as the soluble tin(II) or tin(IV) compound and mercaptoalkane-carboxylic acids and -sulfonic acids, Uniform and adhering coatings of silver-tin alloys with a silver content of approximately 20 to 99 weight % can be deposited from said bath. Silver-tin alloys are electrodeposited from said bath at a pH of 0 to 14 and a current density of 0.1 to 10 A/dm.sup.2.

摘要翻译： 银 - 锡合金可以通过电镀方法从不含氰化物的浴中沉积，其使用银作为硝酸盐或二胺络合物，锡作为可溶性锡（II）或锡（IV）化合物和巯基烷烃羧酸制备， 可以从所述浴中沉积银含量为约20至99重量％的银 - 锡合金的均匀且粘附的涂层。 银 - 锡合金在0至14的pH和0.1至10A / dm 2的电流密度下从所述浴电沉积。