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公开(公告)号：US5750185A
公开(公告)日：1998-05-12
申请号：US638393
申请日：1996-04-29
IPC分类号： C23C14/30 , C23C14/54 , H01J37/304 , H01J37/305 , B05D3/06
CPC分类号： H01J37/3053 , C23C14/30 , C23C14/548 , H01J37/304 , H01J2237/3132
摘要： A method for the electron beam deposition of a multicomponent evaporant to ensure a consistent layer quality with constant composition and thickness in a defined manner. The X-radiation emitted from the evaporant on the point of electron beam impingement is measured in situ, using the obtained signal as reference input to control the parameters of the evaporation process and therefore to control the deposition rate and material composition of the deposited layer. The method is used for the production of corrosion resistant, high-temperature resistant, hard-wearing or optical layers on, for example, strip steel or plastic film.
摘要翻译： 一种用于多组分蒸发剂的电子束沉积的方法，以确定具有恒定组成和厚度的一致的层质量。 使用所获得的信号作为参考输入，原位测量从电子束冲击点处蒸发器发射的X射线，以控制蒸发过程的参数，从而控制沉积层的沉积速率和材料组成。 该方法用于在例如带钢或塑料膜上生产耐腐蚀，耐高温，耐磨或光学层。
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公开(公告)号：US5614248A
公开(公告)日：1997-03-25
申请号：US424418
申请日：1995-05-30
申请人： Siegfried Schiller , Manfred Neumann , Volker Kirchhoff , Gerhard Zeissig , Nicolas Schiller , Klaus Goedicke
发明人： Siegfried Schiller , Manfred Neumann , Volker Kirchhoff , Gerhard Zeissig , Nicolas Schiller , Klaus Goedicke
CPC分类号： C23C14/54 , C23C14/0021
摘要： Certain non-optical characteristics and, in particular, mechanical characteristics are not measurable in situ in the industrial production of layers using plasma-assisted reactive electron beam vaporization, particularly if high demands are made on the hardness, wear resistance and barrier action, so as to be able to reproducibly apply the layers. The values of the optical layer characteristics are to be used as a control signal. In this method, immediately after the substrate has passed through the vaporizing zone, the reflection and/or transmission and absorption capacity are measured in the wavelength range .DELTA..sub.k =150 to 800 nm and from this are determined the refractive index and optical absorption coefficient. These determined values are compared with an experimentally determined desired value. A control signal obtained therefrom, in the case of a constant reactive gas partial pressure, controls the plasma and maintains constant the optical characteristics of the layer. The method is used in the vapor-deposition of wear-resistance, hard layers or barrier layers, e.g. of metal oxide on glass, plastic and other materials, e.g. in the building industry for facade glass and in the packaging industry.
摘要翻译： PCT No.PCT / DE93 / 00748 Sec。 371日期：1995年5月30日 102（e）日期1995年5月30日PCT提交1993年8月18日PCT公布。 公开号WO94 / 10356 日期1994年5月11日具有非光学特性，特别是在使用等离子体辅助的反应电子束蒸发的工业生产中不能测量机械特性，特别是如果对硬度，耐磨性和阻挡层有高要求 动作，以便能够可重复地应用层。 光层特性的值被用作控制信号。 在该方法中，在基板通过蒸发区之后，在DELTA k = 150〜800nm的波长范围内测定反射和/或透射吸收能力，由此确定折射率和光吸收系数。 将这些确定的值与实验确定的期望值进行比较。 在恒定的反应气体分压的情况下，从其获得的控制信号控制等离子体并保持该层的光学特性恒定。 该方法用于耐磨性，硬质层或阻挡层的气相沉积，例如， 玻璃，塑料和其他材料上的金属氧化物，例如。 在建筑行业的立面玻璃和包装行业。
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公开(公告)号：US20100300731A1
公开(公告)日：2010-12-02
申请号：US12599651
申请日：2008-05-07
申请人： Steffen Guenther , Waldemar Schoenberger , Steffen Straach , Nicolas Schiller , Volker Kirchhoff
发明人： Steffen Guenther , Waldemar Schoenberger , Steffen Straach , Nicolas Schiller , Volker Kirchhoff
CPC分类号： C23C14/024 , C23C14/205 , H05K1/0393 , H05K3/388 , H05K2201/0179
摘要： A method for producing a flexible circuit board material having a polymer substrate and a copper layer. The method includes depositing a layer of titanium oxide to be between the polymer substrate and the copper layer. The layer of titanium oxide and the copper layer are deposited using vacuum methods.
摘要翻译： 一种用于制造具有聚合物基底和铜层的柔性电路板材料的方法。 该方法包括在聚合物基底和铜层之间沉积一层氧化钛。 使用真空方法沉积氧化钛层和铜层。
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公开(公告)号：US08470140B2
公开(公告)日：2013-06-25
申请号：US10597625
申请日：2004-11-23
IPC分类号： C23C14/35
CPC分类号： C23C14/10 , B05D1/62 , C23C14/081 , C23C16/401
摘要： The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.
摘要翻译： 本发明涉及一种制造超载体层系统的方法，该方法通过用层叠法真空涂覆衬底，该层堆叠被实施为平滑层和透明陶瓷层的交替层系统，但是包括两个透明陶瓷层之间的至少一个平滑层， 其通过溅射施加，其中在平滑层的沉积期间，将单体进入其中操作磁控管等离子体的抽真空涂层室。
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公开(公告)号：US20130302536A1
公开(公告)日：2013-11-14
申请号：US13980257
申请日：2012-02-15
申请人： Steffen Guenther , Bjoern Meyer , Steffen Straach , Thomas Kuehnel , Sebastian Bunk , Nicolas Schiller
发明人： Steffen Guenther , Bjoern Meyer , Steffen Straach , Thomas Kuehnel , Sebastian Bunk , Nicolas Schiller
IPC分类号： C23C16/30
CPC分类号： C23C16/30 , C23C14/0021 , C23C14/081 , C23C14/562
摘要： The invention relates to a method for producing a transparent bather layer system, wherein in a vacuum chamber at least two transparent barrier layers and a transparent intermediate layer disposed between the two barrier layers are deposited on a transparent plastic film, wherein for deposition of the barrier layers aluminium is vaporised and simultaneously at least one first reactive gas is introduced into the vacuum chamber and wherein for deposition of the intermediate layer aluminium is vaporised and simultaneously at least one second reactive gas and a gaseous or vaporous organic component are introduced into the vacuum chamber.
摘要翻译： 本发明涉及一种制造透明沐浴层系统的方法，其中在真空室中，至少两个透明阻挡层和设置在两个阻挡层之间的透明中间层沉积在透明塑料膜上，其中为了沉积屏障 层铝被蒸发并且同时至少一个第一反应气体被引入到真空室中，并且其中为了沉积中间层铝被蒸发并且同时将至少一个第二反应气体和气态或蒸气有机组分引入真空室 。
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公开(公告)号：US20110033680A1
公开(公告)日：2011-02-10
申请号：US12937655
申请日：2009-04-09
IPC分类号： B32B7/02
CPC分类号： C23C14/00 , C23C16/00 , C23C28/042 , C23C28/048 , C23C28/42 , C23C30/00 , Y10T428/24942
摘要： The invention relates to a transparent barrier layer system on a substrate, wherein the barrier layer system comprises a sequence of individual layers, wherein the individual layers are composed alternately of a layer A and a layer B and wherein a layer A differs from a layer B in terms of the activation energy in the permeation of water vapor with a difference of at least 1.5 kJ/mol.
摘要翻译： 本发明涉及一种在衬底上的透明阻挡层系统，其中该阻挡层系统包括单个层序列，其中各层由A层和B层交替组成，其中A层与B层不同 就水蒸气的渗透活化能而言，其差异至少为1.5kJ / mol。
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公开(公告)号：US20070170050A1
公开(公告)日：2007-07-26
申请号：US10597625
申请日：2004-11-23
IPC分类号： C23C14/00
CPC分类号： C23C14/10 , B05D1/62 , C23C14/081 , C23C16/401
摘要： The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.
摘要翻译： 本发明涉及一种制造超载体层系统的方法，该方法通过用层叠法真空涂覆衬底，该层堆叠被实施为平滑层和透明陶瓷层的交替层系统，但是包括两个透明陶瓷层之间的至少一个平滑层， 其通过溅射施加，其中在平滑层的沉积期间，将单体进入其中操作磁控管等离子体的抽真空涂层室。
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公开(公告)号：US20050003104A1
公开(公告)日：2005-01-06
申请号：US10493061
申请日：2002-10-19
申请人： Manfred Neumann , Mario Krug , Nicolas Schiller , Thomas Kuhnel
发明人： Manfred Neumann , Mario Krug , Nicolas Schiller , Thomas Kuhnel
摘要： The invention relates to a method for producing UV-absorbing transparent wear protection layers by vacuum coating in which at the same time or immediately one after the other at least one inorganic compound that forms layers with high wear resistance and an inorganic compound that forms layers with high UV-absorption are deposited on a substrate respectively by means of reactive or partially reactive plasma-aided high-rate deposition.
摘要翻译： 本发明涉及一种通过真空涂层生产紫外线吸收透明耐磨保护层的方法，其中同时或立即一个接一个地形成至少一种形成具有高耐磨性的层的无机化合物和形成层的无机化合物 通过反应性或部分反应性等离子体辅助高速沉积，分别将高的紫外线吸收沉积在基材上。
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公开(公告)号：US20100136331A1
公开(公告)日：2010-06-03
申请号：US12597696
申请日：2008-03-03
CPC分类号： C23C14/086 , C08J7/06 , C08J2367/02 , C23C14/0036 , Y10T428/265
摘要： The invention relates to a transparent barrier film, comprising a transparent thermoplastic film and at least one permeation barrier layer, wherein the permeation barrier layer comprises a chemical compound of the elements zinc, tin and oxygen, and the mass fraction of zinc is 5% to 70%. Furthermore, the invention relates to a method for the production of a barrier film of this type.
摘要翻译： 本发明涉及一种透明阻挡膜，包括透明热塑性膜和至少一个渗透阻挡层，其中渗透阻挡层包括元素锌，锡和氧的化合物，锌的质量分数为5％至 70％。 此外，本发明涉及这种类型的阻挡膜的制造方法。
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10.发明申请ANTIMICROBIAL MATERIAL, AND A METHOD FOR THE PRODUCTION OF AN ANTIMICROBIAL MATERIAL 审中-公开抗微生物材料和生产抗微生物材料的方法公开(公告)号：US20100040659A1
公开(公告)日：2010-02-18
申请号：US12519900
申请日：2007-11-30
摘要： The invention relates to an antimicrobial material and a method for producing an antimicrobial material, which is deposited on a substrate (2), comprising the steps: Providing the substrate (2) in a vacuum working chamber (3); atomizing a biocidal metal by means of a sputtering device inside the vacuum working chamber (3) in the presence of an inert gas; simultaneous introduction of a precursor, which contains silicon, carbon, hydrogen and oxygen, into the vacuum working chamber (3) so that the sputtered metal particles and the precursor are exposed to a plasma action; deposition of a material on the substrate (2) such that a matrix is formed through the plasma activation of the precursor, in which matrix clusters of sputtered metal particles are incorporated.
摘要翻译： 本发明涉及一种抗菌材料和一种沉积在基材（2）上的抗微生物材料的制备方法，包括以下步骤：将基材（2）提供在真空工作室（3）中; 在惰性气体存在下，通过真空工作室（3）内的溅射装置对生物杀伤金属进行雾化; 同时引入含有硅，碳，氢和氧的前体到真空工作室（3）中，使得溅射的金属颗粒和前体暴露于等离子体作用; 在衬底（2）上沉积材料，使得通过引入基质簇的溅射金属颗粒的前体的等离子体激活形成基质。
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