摘要:
A cemented carbide body is 1-30% by mass of binder consisting of Co, Co/Ni, Co/Fe, Co/Ni/Fe or Ni/Fe and a hard material having a hexagonal WC phase and having a face-centered cubic phase of the form (M1, M2, M3)C or (M1, M2, M3)(C, N) or (M1, M2, M3)(O, C, N) where M1=Ti and/or Zr and M2=W and M3 optionally means none or one or a plurality of the elements Ta, Nb, Hf, Cr, Mo or V, wherein the proportion of the face-centered cubic phase based on the total mass is 2% to 97%, preferably 5 to 12% by mass, and the microstructure of the hexagonal phase and of the face-centered cubic phase has a mean grain size of between 0.2 μm and 1 μm, preferably ≦0.9 μm, and the mean grain sizes of the hexagonal phase and of the face-centered cubic phase differ at most by 30%.
摘要:
Disclosed are a composite body and the production and the use thereof. It consists of a substrate body with a single- or multilayer coating, containing either Ti, Zr, Hf, V, Nb carbides, nitrides, carbonitrides and/or Ta and/or Al2O3 or ZrO2. In order to improve the characteristics of wear from chip removal or another form of abrasion, the invention suggests that a layer of Zr, Hf, V, Nb, Ta or Cr carbonitride be precipitated either directly upon a layer of Al2O3— or ZrO2— or upon a thin intermediate layer of ZrC or ZrN up to 0,5 &mgr;m, or upon a TiN layer up to 0.1 &mgr;m, or indirectly upon a layer of Al2O3— or ZrO2—.
摘要翻译:公开了一种复合体及其生产和使用。 它包括具有单层或多层涂层的基体,其中包含Ti,Zr,Hf,V,Nb碳化物,氮化物,碳氮化物和/或Ta和/或Al2O3或ZrO2。 为了改善由芯片去除或其它形式的磨损引起的磨损特性,本发明提出,Zr,Hf,V,Nb,Ta或Cr碳氮化物层可以直接沉积在一层Al2O3或ZrO2-或 在ZrC或ZrN至0.5μm的中间层上,或在TiN层达到0.1μm以上,或间接地在Al 2 O 3或ZrO 2层上。
摘要:
The invention relates to a method for producing a coated substrate body by chemical vapor deposition at least on one layer made of a carbonitride of a metal of IVa-Vla-groups of the periodic table, wherein a monocyclic hydrocarbon is used in the gas atmosphere during the deposition, in addition to a nitrile. According to the invention, the thus produced coated substrate body has a high degree of hardness and is used, preferably, in cutting operations where the cutting speeds are ≧250 m/min.
摘要:
The invention relates to a composite material consisting of a base body with a multilayered coating, containing at least one mulitphase layer of aluminum oxide, zirconium and/or hafnium and titanium and a single-phase layer made of AI2O3, ZrO2 and/or HfO2.
摘要翻译:本发明涉及一种复合材料,其由具有多层涂层的基体和含有氧化铝,锆和/或铪和钛的至少一个多相层以及由AI 2制成的单相层组成。 > O 3,ZrO 2和/或HfO 2 2。
摘要:
A process for coating a basic metallic substrate with a non-metallic coating layer with a plasma-activated CVD deposition generated by applying a pulsed DC voltage between the substrate and another electrode and by maintaining a potential of residual DC voltage between pulses of the applied voltage.
摘要:
The invention relates to a body which is coated with hard material and has a plurality of layers applied by means of CVD, wherein the outer layer comprises Ti1-xAlxN, Ti1-xAlxC and/or Ti1-xAlxCN where 0.65≦x≦0.9, preferably 0.7≦x≦0.9, and this outer layer has compressive stresses in the range from 100 to 1100 MPa, preferably from 400 to 800 MPa, and a TiCN or Al2O3 layer is arranged under this outer layer.
摘要翻译:本发明涉及一种用硬质材料涂覆并具有通过CVD施加的多层的主体,其中外层包括Ti1-xAlxN,Ti1-xAlxC和/或Ti1-xAlxCN,其中0.65和n1E; x和nlE; 0.9, 优选为0.7< NlE; x≦̸ 0.9,该外层的压缩应力为100〜1100MPa,优选为400〜800MPa,TiCN或Al 2 O 3层配置在该外层下方。
摘要:
The invention relates to a body which is coated with hard material and has a plurality of layers applied by means of CVD, in which an Al2O3 layer is arranged as outer layer on a Ti1-xAlxN layer and/or Ti1-xAlxC layer and/or Ti1-xAlxCN layer.
摘要翻译:本发明涉及一种涂有硬质材料并具有通过CVD施加的多个层的主体,其中在Ti1-xAlxN层和/或Ti1-xAlxC层和/或Ti1-xAlxC层上排列有Al 2 O 3层作为外层 Ti1-xAlxCN层。
摘要:
Composite body consisting of a hard metal, steel, ceramic, particularly sintered ceramic or cermet substrate body or a substrate body made of diamond or a nickel or cobalt-based alloy and of one or more surface layers, of which at least one, preferably the outer layer, consists of Al.sub.2 O.sub.3 with a fine crystalline structure, which has been applied by means of a plasma CVD process at substrate temperatures of 400.degree. C. to 750.degree., preferably 450.degree. C. to 550.degree., with a substrate body connected as cathode and with a plasma activation produced with a pulsed direct voltage.
摘要:
The invention relates to a body which is coated with hard material and has a plurality of layers applied by means of CVD, wherein the outer layer comprises Ti1-xAlxN, Ti1-xAlxC and/or Ti1-xAlxCN where 0.65≦x≦0.9, preferably 0.7≦x≦0.9, and this outer layer has compressive stresses in the range from 100 to 1100 MPa, preferably from 400 to 800 MPa, and a TiCN or Al2O3 layer is arranged under this outer layer.
摘要翻译:本发明涉及一种用硬质材料涂覆并具有通过CVD施加的多层的主体,其中外层包括Ti1-xAlxN,Ti1-xAlxC和/或Ti1-xAlxCN,其中0.65和n1E; x和nlE; 0.9, 优选为0.7< NlE; x≦̸ 0.9,该外层的压缩应力为100〜1100MPa,优选为400〜800MPa,TiCN或Al 2 O 3层配置在该外层下方。
摘要:
The invention relates to a body which is coated with hard material and has a plurality of layers applied by means of CVD, in which an Al2O3 layer is arranged as outer layer on a Ti1-xAlxN layer and/or Ti1-xAlxC layer and/or Ti1-xAlxCN layer.
摘要翻译:本发明涉及一种涂有硬质材料并具有通过CVD施加的多个层的主体,其中在Ti1-xAlxN层和/或Ti1-xAlxC层和/或Ti1-xAlxC层上排列有Al 2 O 3层作为外层 Ti1-xAlxCN层。