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    Lithographic apparatus and method of a manufacturing device
    2.
    发明授权
    Lithographic apparatus and method of a manufacturing device 有权
    制造装置的平版印刷装置和方法

    公开(公告)号：US07327438B2

    公开(公告)日：2008-02-05

    申请号：US10840797

    申请日：2004-05-07

    申请人： Koen Jacobus Johannes Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Jan Rein Miedema ,  Joost Jeroen Ottens

    发明人： Koen Jacobus Johannes Maria Zaal ,  Tjarko Adriaan Rudolf Van Empel ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Jan Rein Miedema ,  Joost Jeroen Ottens

    IPC分类号： G03B27/60 ,  G03B27/42 ,  G03B27/58 ,  H01T23/00

    CPC分类号： G03F7/707 ,  G03F7/70783

    摘要： A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder for holding a substrate the substrate holder provided with a device to provide a holding force for pressing the substrate against the substrate holder; a releasing structure constructed and arranged to eject the substrate from the holder against the holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus may include a controller for controlling the releasing structure so as to release the substrate from the holder with a release force that is reduced prior to final release.

    摘要翻译： 一种光刻投影装置，具有用于提供投影射线束的辐射系统; 用于支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望图案对投影光束进行图案化; 用于保持基板的基板保持器，所述基板保持器设置有提供用于将基板压靠在基板保持器上的保持力; 释放结构，其被构造和布置成抵抗所述保持力从所述保持器中弹出所述基板; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。 光刻投影装置可以包括控制器，用于控制释放结构，以便以最终释放之前减小的释放力将基板从保持器释放。

    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    3.
    发明授权
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US07113262B2

    公开(公告)日：2006-09-26

    申请号：US10872774

    申请日：2004-06-22

    申请人： Tjarko Adriaan Rudolf Van Empel ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Koen Jacobus Johannes Maria Zaal ,  Ton Aantjes

    发明人： Tjarko Adriaan Rudolf Van Empel ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Koen Jacobus Johannes Maria Zaal ,  Ton Aantjes

    IPC分类号： G03B27/58 ,  G03B27/42

    CPC分类号： G03F7/707

    摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first protrusions, the distal ends thereof defining a first contact surface for contacting the substrate, and a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting the substrate. The second protrusions are arranged for preventing sticking of the substrate to the first contact surface during release of a clamping pressure so that (1) the substrate contacts the first and second contact surfaces when the substrate is clamped against the substrate holder, and (2) the substrate is supported by the second contact surface and distanced from the first contact surface when the substrate is not clamped.

    摘要翻译： 公开了一种光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑放置在辐射束的光束路径中的衬底的衬底保持器。 衬底保持器包括多个第一突起，其远端限定用于接触衬底的第一接触表面和多个第二突起，其远端限定用于支撑衬底的第二接触表面。 第二突起被布置成用于在释放夹持压力期间防止基板粘附到第一接触表面，使得（1）当基板被夹持在基板保持器上时，基板接触第一和第二接触表面，以及（2） 当基板未被夹紧时，基板由第二接触表面支撑并与第一接触表面分开。

    Lithographic apparatus and device manufacturing method
    8.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07894037B2

    公开(公告)日：2011-02-22

    申请号：US11882081

    申请日：2007-07-30

    申请人： Arno Jan Bleeker ,  Aschwin Lodewijk Hendricus Johannes Van Meer

    发明人： Arno Jan Bleeker ,  Aschwin Lodewijk Hendricus Johannes Van Meer

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70925 ,  G03F7/70866 ,  G03F7/70916

    摘要： A lithographic apparatus includes an illumination system configured to condition a beam of radiation; a pattern support configured to hold a patterning device, the patterning device configured to pattern the beam of radiation to form a patterned beam of radiation; a substrate holder configured to hold a substrate, the substrate holder including a support surface in contact with the substrate; a projection system configured to project the patterned beam of radiation onto the substrate; and a cleaning system including a cleaning unit, the cleaning unit constructed and arranged to generate radicals on the support surface of the substrate holder to remove contamination therefrom.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 配置为保持图案形成装置的图案支撑件，所述图案形成装置被配置成对辐射束进行图案化以形成图案化的辐射束; 衬底保持器，其构造成保持衬底，所述衬底保持器包括与所述衬底接触的支撑表面; 投影系统，被配置为将所述图案化的辐射束投射到所述基板上; 以及包括清洁单元的清洁系统，所述清洁单元构造和布置成在所述基板保持器的所述支撑表面上产生自由基以从其中除去污染物。

    Lithographic apparatus and device manufacturing method
    10.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20090033889A1

    公开(公告)日：2009-02-05

    申请号：US11882081

    申请日：2007-07-30

    申请人： Arno Jan Bleeker ,  Aschwin Lodewijk Hendricus Johannes Van Meer

    发明人： Arno Jan Bleeker ,  Aschwin Lodewijk Hendricus Johannes Van Meer

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70925 ,  G03F7/70866 ,  G03F7/70916

    摘要： A lithographic apparatus includes an illumination system configured to condition a beam of radiation; a pattern support configured to hold a patterning device, the patterning device configured to pattern the beam of radiation to form a patterned beam of radiation; a substrate holder configured to hold a substrate, the substrate holder including a support surface in contact with the substrate; a projection system configured to project the patterned beam of radiation onto the substrate; and a cleaning system including a cleaning unit, the cleaning unit constructed and arranged to generate radicals on the support surface of the substrate holder to remove contamination therefrom.

    摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 配置为保持图案形成装置的图案支撑件，所述图案形成装置被配置成对辐射束进行图案化以形成图案化的辐射束; 衬底保持器，其构造成保持衬底，所述衬底保持器包括与所述衬底接触的支撑表面; 投影系统，被配置为将所述图案化的辐射束投射到所述基板上; 以及包括清洁单元的清洁系统，所述清洁单元构造和布置成在所述基板保持器的所述支撑表面上产生自由基以从其中除去污染物。