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公开(公告)号：US07304715B2
公开(公告)日：2007-12-04
申请号：US10917535
申请日：2004-08-13
申请人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
发明人： Theodorus Petrus Maria Cadee , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens , Frederick Eduard De Jong , Koen Goorman , Boris Menchtchikov , Marco Koert Stavenga , Martin Frans Pierre Smeets , Aschwin Lodewijk Hendricus Johannes Van Meer , Bart Leonard Peter Schoondermark , Patricius Aloysius Jacobus Tinnemans , Stoyan Nihtianov
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.
摘要翻译： 公开了一种光刻设备。 该装置包括配置成调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 所述设备还包括被构造成保持基板的基板台，配置成将图案化的辐射束投影到基板的目标部分上的投影系统，配置成至少部分地填充投影系统和基板之间的空间的液体供应系统 具有液体，被布置成基本上容纳空间内的液体的密封构件以及用于控制和/或补偿浸没液体从基底蒸发的元件。
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2.发明授权Lithographic apparatus and device manufacturing method involving a heater and a temperature sensor 有权涉及加热器和温度传感器的平版印刷设备和设备制造方法公开(公告)号：US09268242B2
公开(公告)日：2016-02-23
申请号：US12869560
申请日：2010-08-26
申请人： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Mana Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Mana Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G03F7/20
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
摘要翻译： 描述了一种光刻设备，其具有液体供应系统，其被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件和加热器。
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公开(公告)号：US20120113402A1
公开(公告)日：2012-05-10
申请号：US13288831
申请日：2011-11-03
申请人： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Comelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Comelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译： 描述了一种光刻设备，其具有液体供应系统，该液体供应系统被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。
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4.发明授权Lithographic apparatus and device manufacturing method having liquid evaporation control 有权具有液体蒸发控制的平版印刷设备和器件制造方法公开(公告)号：US07804575B2
公开(公告)日：2010-09-28
申请号：US11205325
申请日：2005-08-17
申请人： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译： 描述了一种光刻设备，其具有液体供应系统，该液体供应系统被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。
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5.发明授权公开(公告)号：US09188880B2
公开(公告)日：2015-11-17
申请号：US13288831
申请日：2011-11-03
申请人： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G03F7/20
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
摘要翻译： 描述了一种光刻设备，其具有液体供应系统，其配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳空间内的液体的阻挡构件和加热器。
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公开(公告)号：US20100321650A1
公开(公告)日：2010-12-23
申请号：US12869560
申请日：2010-08-26
申请人： THEODORUS PETRUS MARIA CADEE , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Mana Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Comelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： THEODORUS PETRUS MARIA CADEE , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Mana Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Comelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译： 描述了一种光刻设备，其具有液体供应系统，该液体供应系统被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。
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公开(公告)号：US07486384B2
公开(公告)日：2009-02-03
申请号：US10813687
申请日：2004-03-31
申请人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Johannes Van Meer , Patrick Johannes Cornelus Hendrik Smulders , Franciscus Andreas Cornelis Johannes Spanjers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
发明人： Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Johannes Van Meer , Patrick Johannes Cornelus Hendrik Smulders , Franciscus Andreas Cornelis Johannes Spanjers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
CPC分类号： G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要： The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.
摘要翻译： 本发明涉及具有支撑结构以支撑和移动物体（如基底）的光刻投影装置。 支撑结构可以是具有机器人臂的机器人，其具有支撑框架的支撑框架，例如。 底物。 支撑框架包括具有用于在移动期间保持基板的一个或多个夹具的夹持结构。 机器人手臂包括一个或多个柔顺部件。 夹具可以是具有氧化的上表面的Johnson-Raybeck效应型夹具。 为了更好地去夹紧，可以向夹具提供RF AC衰减的去钳位电压。 该装置可以仅用一个单一的衬底清洁。
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公开(公告)号：US20110157570A1
公开(公告)日：2011-06-30
申请号：US12850487
申请日：2010-08-04
申请人： Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
发明人： Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。
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公开(公告)号：US07868998B2
公开(公告)日：2011-01-11
申请号：US12216126
申请日：2008-06-30
申请人： Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
发明人： Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。
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公开(公告)号：US07411653B2
公开(公告)日：2008-08-12
申请号：US10966110
申请日：2004-10-18
申请人： Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
发明人： Christiaan Alexander Hoogendam , Bob Streefkerk , Johannes Catharinus Hubertus Mulkens , Erik Theodorus Maria Bijlaart , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Bernardus Antonius Slaghekke , Patricius Aloysius Jacobus Tinnemans , Helmar Van Santen
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70808
摘要： Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
摘要翻译： 通过入口将液体供给到投影系统和基板之间的空间。 在一个实施例中，溢流区域去除高于给定水平的液体。 溢流区域可以布置在入口的上方，因此液体可以不断刷新，并且液体中的压力可能保持基本恒定。
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