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    Lithographic apparatus and device manufacturing method
    8.
    发明授权
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US07196768B2

    公开(公告)日：2007-03-27

    申请号：US10972754

    申请日：2004-10-26

    申请人： Joost Jeroen Ottens ,  Jeroen Johannes Sophia Maria Mertens ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Edwin Van Gompel

    发明人： Joost Jeroen Ottens ,  Jeroen Johannes Sophia Maria Mertens ,  Frederik Eduard De Jong ,  Koen Goorman ,  Boris Menchtchikov ,  Edwin Van Gompel

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/58

    CPC分类号： H01L21/67109 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70875

    摘要： A lithographic apparatus includes a substrate support that is constructed to support a substrate, and a projection system that is configured to project a patterned radiation beam onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.

    摘要翻译： 光刻设备包括被构造为支撑衬底的衬底支撑件和被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。 衬底支撑件布置成沿着衬底的随后靶向目标部分的预定轨迹移动衬底。 衬底支撑件包括用于向衬底提供热稳定性的管道构造。 导管构造被布置成将支撑体中的热稳定化介质导管，并且基本上通过支撑基板的先前目标部分的基板支撑件的支撑目标部分的基板支撑件的一部分基本上导管介质，以便 以保持随后的目标靶部分热稳定。