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    Lithographic apparatus, article support member, and method
    3.
    发明申请
    Lithographic apparatus, article support member, and method 有权
    平版印刷设备，文章支持成员和方法

    公开(公告)号：US20050248746A1

    公开(公告)日：2005-11-10

    申请号：US10837914

    申请日：2004-05-04

    申请人： Koen Jacobus Zaal ,  Aschwin Lodewijk Van Meer ,  Joost Ottens

    发明人： Koen Jacobus Zaal ,  Aschwin Lodewijk Van Meer ,  Joost Ottens

    IPC分类号： H01L21/683 ,  G03B27/62 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

    CPC分类号： G03F7/707

    摘要： A lithographic apparatus having an illumination system for providing a projection beam of radiation; an article support member for supporting an article to be placed in a beam path of the projection beam of radiation on the article support; and a clamp for providing a clamping pressure for clamping the article against the article support during projection. The article support member includes a section that is trimmed for locally adjusting a clamping pressure.

    摘要翻译： 一种具有用于提供投影射线束的照明系统的光刻设备; 物品支撑构件，用于支撑将物品放置在所述物品支撑件上的所述投影射束的光束路径中; 以及用于在投影期间提供用于将物品夹紧在物品支撑件上的夹紧压力的夹具。 物品支撑构件包括用于局部调整夹紧压力的部分。

    Lithographic apparatus, device manufacturing method, and device manufactured thereby
    4.
    发明申请
    Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
    平版印刷设备，器件制造方法和由此制造的器件

    公开(公告)号：US20050024620A1

    公开(公告)日：2005-02-03

    申请号：US10872774

    申请日：2004-06-22

    申请人： Tjarko Van Empel ,  Aschwin Lodewijk Van Meer ,  Koen Jacobus Zaal ,  Ton Aantjes

    发明人： Tjarko Van Empel ,  Aschwin Lodewijk Van Meer ,  Koen Jacobus Zaal ,  Ton Aantjes

    IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/58

    CPC分类号： G03F7/707

    摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation and a substrate holder for supporting a substrate to be placed in a beam path of the beam of radiation. The substrate holder includes a plurality of first protrusions, the distal ends thereof defining a first contact surface for contacting the substrate, and a plurality of second protrusions, the distal ends thereof defining a second contact surface for supporting the substrate. The second protrusions are arranged for preventing sticking of the substrate to the first contact surface during release of a clamping pressure so that (1) the substrate contacts the first and second contact surfaces when the substrate is clamped against the substrate holder, and (2) the substrate is supported by the second contact surface and distanced from the first contact surface when the substrate is not clamped.

    摘要翻译： 公开了一种光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑放置在辐射束的光束路径中的衬底的衬底保持器。 衬底保持器包括多个第一突起，其远端限定用于接触衬底的第一接触表面和多个第二突起，其远端限定用于支撑衬底的第二接触表面。 第二突起被布置成用于在释放夹持压力期间防止基板粘附到第一接触表面，使得（1）当基板被夹持在基板保持器上时，基板接触第一和第二接触表面，以及（2） 当基板未被夹紧时，基板由第二接触表面支撑并与第一接触表面分开。

    Lithographic apparatus and method of a manufacturing device
    6.
    发明申请
    Lithographic apparatus and method of a manufacturing device 有权
    制造装置的平版印刷装置和方法

    公开(公告)号：US20050002010A1

    公开(公告)日：2005-01-06

    申请号：US10840797

    申请日：2004-05-07

    申请人： Koen Jacobus Zaal ,  Tjarko Adriaan Van Empel ,  Aschwin Lodewijk Hendricus Van Meer ,  Jan Miedema ,  Joost Ottens

    发明人： Koen Jacobus Zaal ,  Tjarko Adriaan Van Empel ,  Aschwin Lodewijk Hendricus Van Meer ,  Jan Miedema ,  Joost Ottens

    IPC分类号： H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  G03B27/58

    CPC分类号： G03F7/707 ,  G03F7/70783

    摘要： A lithographic projection apparatus having a radiation system for providing a projection beam of radiation; a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern; a substrate holder for holding a substrate the substrate holder provided with a device to provide a holding force for pressing the substrate against the substrate holder; a releasing structure constructed and arranged to eject the substrate from the holder against the holding force; and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic projection apparatus may include a controller for controlling the releasing structure so as to release the substrate from the holder with a release force that is reduced prior to final release.

    摘要翻译： 一种光刻投影装置，具有用于提供投影射线束的辐射系统; 用于支撑图案形成装置的支撑结构，所述图案形成装置用于根据期望图案对投影光束进行图案化; 用于保持基板的基板保持器，所述基板保持器设置有提供用于将基板压靠在基板保持器上的保持力; 释放结构，其被构造和布置成抵抗所述保持力从所述保持器中弹出所述基板; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。 光刻投影装置可以包括控制器，用于控制释放结构，以便以最终释放之前减小的释放力将基板从保持器释放。

    Lithographic apparatus and device manufacturing method
    8.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20050117141A1

    公开(公告)日：2005-06-02

    申请号：US10926402

    申请日：2004-08-26

    申请人： Joost Ottens ,  Tjarko Van Empel ,  Aschwin Lodewijk Hendricus Van Meer ,  Jan Miedema ,  Koen Jacobus Zaal

    发明人： Joost Ottens ,  Tjarko Van Empel ,  Aschwin Lodewijk Hendricus Van Meer ,  Jan Miedema ,  Koen Jacobus Zaal

    IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/62

    CPC分类号： G03F7/707 ,  G03F7/70825

    摘要： A lithographic apparatus is disclosed. The apparatus includes an illumination system for conditioning a beam of radiation, and an article support for supporting a substantially flat article to be placed in the beam of radiation. The article support includes a plurality of supporting protrusions for supporting the article, and at least one protective member located near a boundary of the supporting protrusions for protecting at least a boundary portion of the supporting protrusions during release of the article. The apparatus also includes a releasing device for releasing said article from said article support.

    摘要翻译： 公开了一种光刻设备。 该装置包括用于调节辐射束的照明系统和用于支撑待放置在辐射束中的基本平坦的制品的物品支撑件。 物品支撑件包括用于支撑物品的多个支撑突起和位于支撑突起的边界附近的至少一个保护构件，用于在物品释放期间至少保护支撑突起的边界部分。 该装置还包括用于从所述物品支撑件释放所述物品的释放装置。

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    10.
    发明申请
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：US20050128463A1

    公开(公告)日：2005-06-16

    申请号：US10734641

    申请日：2003-12-15

    申请人： Joost Ottens ,  Hendrik Neerhof ,  Koen Jacobus Zaal ,  Marco Le Kluse

    发明人： Joost Ottens ,  Hendrik Neerhof ,  Koen Jacobus Zaal ,  Marco Le Kluse

    IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/683 ,  G03B27/62

    CPC分类号： H01L21/6831 ,  G03F7/707 ,  G03F7/70708

    摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, an article support for supporting a flat article to be placed in a beam path of the beam of radiation on the article support, a backfill gas feed arranged in the article support for feeding backfill gas to a backside of the article when supported by the article support, and a clamp for clamping the article against the article support during projection. According to one aspect of the invention, the apparatus includes a controller for controlling the clamp and/or the backfill gas feed pressure so as to release the clamp prior to reducing the backfill gas feed pressure.

    摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑待放置在物品支架上的辐射束的光束路径中的平坦物品的物品支撑件，布置在物品支撑件中用于进给的回填气体供给 当由物品支撑件支撑时，将气体回填到物品的背面，以及用于在投影期间将物品夹紧在物品支撑件上的夹具。 根据本发明的一个方面，该装置包括用于控制夹紧和/或回填气体进料压力的控制器，以便在减少回填气体进料压力之前释放夹具。