公开(公告)号：US5888308A

公开(公告)日：1999-03-30

申请号：US808926

申请日：1997-02-28

申请人： Krishna G. Sachdev ,  John U. Knickerbocker ,  Glenn A. Pomerantz ,  Bruce E. Tripp

发明人： Krishna G. Sachdev ,  John U. Knickerbocker ,  Glenn A. Pomerantz ,  Bruce E. Tripp

IPC分类号： B41F35/00 ,  B41N3/06 ,  C04B41/53 ,  C11D1/22 ,  C11D1/72 ,  C11D1/74 ,  C11D1/831 ,  C11D3/02 ,  C11D3/08 ,  C11D3/10 ,  C11D7/06 ,  C11D11/00 ,  H05K3/12 ,  H05K3/26 ,  B08B3/12 ,  C23G1/14

CPC分类号： C11D3/044 ,  B41N3/06 ,  C04B41/53 ,  C11D1/831 ,  C11D11/0041 ,  C11D3/08 ,  C11D3/10 ,  C11D1/22 ,  C11D1/72 ,  C11D1/74 ,  H05K3/1216 ,  H05K3/26

摘要： This invention relates to the use of water-based cleaning solutions and their use as environmentally safe replacements of chlorinated hydrocarbon solvents to remove metal-polymer composite paste residue from screening masks and ancillary equipment, such as, used for screening a conductive metal pattern on a ceramic green sheet in the manufacture of multi-layer ceramic products.

摘要翻译： 本发明涉及水性清洁溶液的使用及其作为氯化烃溶剂的环境安全替代物的用途，以从筛选掩模和辅助设备中除去金属 - 聚合物复合糊料残余物，例如用于筛选导电金属图案 陶瓷生片在多层陶瓷制品的制造中。

公开(公告)号：US06280527B1

公开(公告)日：2001-08-28

申请号：US09096841

申请日：1998-06-12

申请人： Krishna G. Sachdev ,  John T. Butler ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  James N. Humenik ,  John U. Knickerbocker ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  David E. Speed ,  Candace A. Sullivan ,  Bruce E. Tripp ,  James C. Utter

发明人： Krishna G. Sachdev ,  John T. Butler ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  James N. Humenik ,  John U. Knickerbocker ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  David E. Speed ,  Candace A. Sullivan ,  Bruce E. Tripp ,  James C. Utter

IPC分类号： B08B308

CPC分类号： C23G1/14 ,  C11D7/06 ,  C11D7/3209 ,  C11D7/3218 ,  C11D11/0047 ,  C23G1/24 ,  G03F7/425 ,  H01L21/4864 ,  H05K1/092 ,  H05K3/1233 ,  H05K3/26 ,  H05K2203/0793 ,  H05K2203/122

摘要： This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.

摘要翻译： 本发明涉及清洁与半导体印刷有关的物体，例如掩模掩模。 本发明基本上涉及在半导体封装基板的制造中，从用于印刷导电金属图案的掩模掩模中去除例如有机聚合物 - 金属复合浆料到陶瓷生片上。 更具体地说，本发明涉及使用季铵氢氧化物的碱性水溶液的糊状掩模掩模的自动在线清洗作为生产多层筛选操作中非水有机溶剂基清洗的更环保的替代方法 陶瓷（MLC）基板。

公开(公告)号：US06351871B1

公开(公告)日：2002-03-05

申请号：US09335420

申请日：1999-06-17

申请人： Krishna G. Sachdev ,  John T. Butler ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  James N. Humenik ,  John U. Knickerbocker ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  David E. Speed ,  Candace A. Sullivan ,  Bruce E. Tripp ,  James C. Utter

发明人： Krishna G. Sachdev ,  John T. Butler ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  James N. Humenik ,  John U. Knickerbocker ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  David E. Speed ,  Candace A. Sullivan ,  Bruce E. Tripp ,  James C. Utter

IPC分类号： A47L2500

CPC分类号： C23G1/14 ,  C11D7/06 ,  C11D7/3209 ,  C11D7/3218 ,  C11D11/0047 ,  C23G1/24 ,  G03F7/425 ,  H01L21/4864 ,  H05K1/092 ,  H05K3/1233 ,  H05K3/26 ,  H05K2203/0793 ,  H05K2203/122

摘要： This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.

摘要翻译： 本发明涉及清洁与半导体印刷有关的物体，例如掩模掩模。 本发明基本上涉及在半导体封装基板的制造中，从用于印刷导电金属图案的掩模掩模中去除例如有机聚合物 - 金属复合浆料到陶瓷生片上。 更具体地说，本发明涉及使用季铵氢氧化物的碱性水溶液的糊状掩模掩模的自动在线清洗作为生产多层筛选操作中非水有机溶剂基清洗的更环保的替代方法 陶瓷（MLC）基板。

公开(公告)号：US6032683A

公开(公告)日：2000-03-07

申请号：US258970

申请日：1999-02-26

申请人： Jon A. Casey ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  John U. Knickerbocker ,  David C. Long ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  Krishna G. Sachdev ,  David E. Speed ,  Candace A. Sullivan ,  Robert J. Sullivan ,  Bruce E. Tripp ,  James C. Utter

发明人： Jon A. Casey ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  John U. Knickerbocker ,  David C. Long ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  Krishna G. Sachdev ,  David E. Speed ,  Candace A. Sullivan ,  Robert J. Sullivan ,  Bruce E. Tripp ,  James C. Utter

IPC分类号： B08B3/02 ,  B41F35/00 ,  G03F1/82 ,  G03F7/12 ,  G03F7/42 ,  H01L21/00 ,  H05K3/12 ,  H05K3/26 ,  B08B3/00

CPC分类号： H01L21/67028 ,  B08B3/02 ,  B41F35/005 ,  G03F1/82 ,  G03F7/425 ,  B41P2235/26 ,  B41P2235/50 ,  G03F7/12 ,  H05K3/1216 ,  H05K3/26

摘要： A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.

摘要翻译： 一种清洁方法和相关设备，用于使用在面罩的两侧同时施加的高压下的碱性洗涤剂水溶液来清洗半导体掩模掩模，随后进行干燥步骤，其使用空气刀将掩模表面吹出任何残余的清洁剂溶液。

公开(公告)号：US5916374A

公开(公告)日：1999-06-29

申请号：US21046

申请日：1998-02-09

申请人： Jon A. Casey ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  John U. Knickerbocker ,  David C. Long ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  Krishna G. Sachdev ,  David E. Speed ,  Candace A. Sullivan ,  Robert J. Sullivan ,  Bruce E. Tripp ,  James C. Utter

发明人： Jon A. Casey ,  Michael E. Cropp ,  Donald W. DiAngelo ,  John F. Harmuth ,  John U. Knickerbocker ,  David C. Long ,  Daniel S. Mackin ,  Glenn A. Pomerantz ,  Krishna G. Sachdev ,  David E. Speed ,  Candace A. Sullivan ,  Robert J. Sullivan ,  Bruce E. Tripp ,  James C. Utter

IPC分类号： B08B3/02 ,  B41F35/00 ,  G03F1/82 ,  G03F7/12 ,  G03F7/42 ,  H01L21/00 ,  H05K3/12 ,  H05K3/26 ,  B08B3/04

CPC分类号： H01L21/67028 ,  B08B3/02 ,  B41F35/005 ,  G03F1/82 ,  G03F7/425 ,  B41P2235/26 ,  B41P2235/50 ,  G03F7/12 ,  H05K3/1216 ,  H05K3/26

摘要： A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.

摘要翻译： 一种清洁方法和相关设备，用于使用在面罩的两侧同时施加的高压下的碱性洗涤剂水溶液来清洗半导体掩模掩模，随后进行干燥步骤，其使用空气刀将掩模表面吹出任何残余的清洁剂溶液。