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    Approach to formulating irradiation sensitive positive resists
    2.
    发明授权
    Approach to formulating irradiation sensitive positive resists 失效
    制定辐射敏感阳性抗蚀剂的方法

    公开(公告)号：US6103447A

    公开(公告)日：2000-08-15

    申请号：US30566

    申请日：1998-02-25

    申请人： Kuang-Jung Chen ,  Ronald A. DellaGuardia ,  Wu-Song Huang ,  Ahmad D. Katnani ,  Mahmoud M. Khojasteh ,  Qinghuang Lin

    发明人： Kuang-Jung Chen ,  Ronald A. DellaGuardia ,  Wu-Song Huang ,  Ahmad D. Katnani ,  Mahmoud M. Khojasteh ,  Qinghuang Lin

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/111

    摘要： The present invention is directed to a high-performance irradiation sensitive positive-tone resist and to a method of formulating the same. In one aspect, the polymer resin composition of the present invention comprises a blend of at least two miscible aqueous base soluble polymer resins, wherein one of said aqueous base soluble polymer resins of said blend is partially protected with a high activation energy protecting group and the other aqueous base soluble polymer resin of said blend is partially protected with a low activation energy protecting group. A chemically amplified resist system comprising said polymer resin composition; at least one acid generator; and a solvent is also provided herein.

    摘要翻译： 本发明涉及一种高性能照射敏感正性抗蚀剂及其制备方法。 一方面，本发明的聚合物树脂组合物包含至少两种可混溶的水溶性可溶性聚合物树脂的共混物，其中所述共混物的所述水溶性基础可溶性聚合物树脂之一部分地被高活化能保护基保护，并且 所述共混物的其它水溶性可溶性聚合物树脂部分地被低活化能保护基团保护。 一种包含所述聚合物树脂组合物的化学放大抗蚀剂体系; 至少一种酸发生剂; 并且还提供了溶剂。

    Approach to formulating irradiation sensitive positive resists
    3.
    发明授权
    Approach to formulating irradiation sensitive positive resists 失效
    制定辐射敏感阳性抗蚀剂的方法

    公开(公告)号：US06268436B1

    公开(公告)日：2001-07-31

    申请号：US09473225

    申请日：1999-12-27

    申请人： Kuang-Jung Chen ,  Ronald A. DellaGuardia ,  Wu-Song Huang ,  Ahmad D. Katnani ,  Mahmoud M. Khojasteh ,  Quighuang Lin

    发明人： Kuang-Jung Chen ,  Ronald A. DellaGuardia ,  Wu-Song Huang ,  Ahmad D. Katnani ,  Mahmoud M. Khojasteh ,  Quighuang Lin

    IPC分类号： C08L6500

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/107 ,  Y10S430/111

    摘要： The present invention is directed to a high-performance irradiation sensitive positive-tone resist and to a method of formulating the same. In one aspect, the polymer resin composition of the present invention comprises a blend of at least two miscible aqueous base soluble polymer resins, wherein one of said aqueous base soluble polymer resins of said blend is partially protected with a high activation energy protecting group and the other aqueous base soluble polymer resin of said blend is partially protected with a low activation energy protecting group. A chemically amplified resist system comprising said polymer resin composition; at least one acid generator; and a solvent is also provided herein.

    摘要翻译： 本发明涉及一种高性能照射敏感正性抗蚀剂及其制备方法。 一方面，本发明的聚合物树脂组合物包含至少两种可混溶的水溶性可溶性聚合物树脂的共混物，其中所述共混物的所述水溶性基础可溶性聚合物树脂之一部分地被高活化能保护基团保护，并且 所述共混物的其它水溶性可溶性聚合物树脂部分地被低活化能保护基团保护。 一种包含所述聚合物树脂组合物的化学放大抗蚀剂体系; 至少一种酸发生剂; 并且还提供了溶剂。

    Acid scavengers for use in chemically amplified photoresists
    5.
    发明授权
    Acid scavengers for use in chemically amplified photoresists 失效
    用于化学放大光致抗蚀剂的酸清除剂

    公开(公告)号：US5667938A

    公开(公告)日：1997-09-16

    申请号：US731224

    申请日：1996-10-11

    申请人： Nageshwer Rao Bantu ,  William Ross Brunsvold ,  George Joseph Hefferon ,  Wu-Song Huang ,  Ahmad D. Katnani ,  Mahmoud M. Khojasteh ,  Ratnam Sooriyakumaran ,  Dominic Changwon Yang

    发明人： Nageshwer Rao Bantu ,  William Ross Brunsvold ,  George Joseph Hefferon ,  Wu-Song Huang ,  Ahmad D. Katnani ,  Mahmoud M. Khojasteh ,  Ratnam Sooriyakumaran ,  Dominic Changwon Yang

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  G03F7/0045

    摘要： Proton sponge, berberine, and cetyltrimethyl ammonium hydroxide base compounds are used as additives to chemically amplified photoresists based on modified polyhydroxystyrene (PHS). The base additives scavenge free acids from the photoresist in order to preserve the acid labile moieties on the modified PHS polymer. The base additives are well suited to industrial processing conditions, do not react with the photoacid compounds in the photoresist composition to form byproducts which would hinder photoresist performance, and extend the shelf-life of the photoresist composition. In addition, the proton sponge and berberine base additives have a different absorption spectra than the modified PHS polymer, therefore, the quantity of base additive within the photoresist can be easily assayed and controlled.

    摘要翻译： 质子海绵，小檗碱和十六烷基三甲基氢氧化铵碱化合物用作基于改性聚羟基苯乙烯（PHS）的化学放大光致抗蚀剂的添加剂。 基础添加剂清除光致抗蚀剂中的游离酸，以保持改性PHS聚合物上的酸不稳定部分。 碱添加剂非常适合于工业加工条件，不与光致抗蚀剂组合物中的光酸化合物反应以形成将阻碍光致抗蚀剂性能的副产物，并延长光致抗蚀剂组合物的保质期。 此外，质子海绵和小檗碱碱添加剂具有与改性PHS聚合物不同的吸收光谱，因此可以容易地测定和控制光致抗蚀剂内基础添加剂的量。

    Optimization of space width for hybrid photoresist
    7.
    发明授权
    Optimization of space width for hybrid photoresist 失效
    混合光刻胶的空间宽度优化

    公开(公告)号：US06200726B1

    公开(公告)日：2001-03-13

    申请号：US09170756

    申请日：1998-10-13

    申请人： Kuang-Jung Chen ,  Steven J. Holmes ,  Wu-Song Huang ,  Ahmad D. Katnani ,  Paul A. Rabidoux

    发明人： Kuang-Jung Chen ,  Steven J. Holmes ,  Wu-Song Huang ,  Ahmad D. Katnani ,  Paul A. Rabidoux

    IPC分类号： G03C173

    CPC分类号： G03F7/038 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/095 ,  H01L21/0274 ,  H01L21/3085 ,  H01L28/82 ,  Y10S430/106 ,  Y10S430/115 ,  Y10S430/128

    摘要： A photo resist composition contains at least one photoacid generator (PAG), wherein at least two photoacids are produced upon exposure of the photo resist to actinic energy and wherein the photo resist is capable of producing a hybrid response. The function of providing generation of two photoacids in a hybrid resist is to optimize the use of hybrid resist by varying the hybrid space width. The at least two photoacids may differ in their effectiveness at catalyzing at least one mechanism of the hybrid response. In particular, one photoacid may be a weaker acid and another may be a stronger acid, wherein there exists a difference of at least four orders of magnitude between the acid dissociation constant (Ka) of the weaker acid and the stronger acid. A method for optimizing space width in a hybrid photo resist includes the steps of: 1) selecting a desired space width; 2) selecting at least one photoacid generator (PAG), wherein at least two photoacids will be produced upon exposure to actinic energy in relative proportions sufficient to produce the desired space width in the hybrid photo resist; and 3) forming a hybrid photo resist composition comprising the at least one PAG. The step of selecting at least one PAG may include first determining the space width produced alone by each photoacid in a group of candidate photoacids and then selecting the photoacids and corresponding at least one PAG that will produce the desired space width.

    摘要翻译： 光致抗蚀剂组合物含有至少一种光致酸发生剂（PAG），其中当光致抗蚀剂暴露于光化能时，产生至少两种光酸，并且其中光致抗蚀剂能产生杂化响应。 在混合抗蚀剂中提供两种光酸的产生的功能是通过改变混合空间宽度来优化混合抗蚀剂的使用。 至少两种光酸在催化至少一种混合反应机制方面的有效性可能不同。 特别地，一种光致酸可以是较弱的酸，而另一种可能是较强的酸，其中在较弱酸的酸解离常数（Ka）和较强酸之间存在至少四个数量级的差异。 一种用于优化混合光刻胶中的空间宽度的方法包括以下步骤：1）选择期望的空间宽度; 2）选择至少一种光致酸产生剂（PAG），其中当以相对比例暴露于足以产生混合光致抗蚀剂中所需空间宽度的光化能时，将产生至少两种光酸; 和3）形成包含所述至少一种PAG的混合光刻胶组合物。 选择至少一个PAG的步骤可以包括首先确定由一组候选光酸中的每个光酸酸单独产生的空间宽度，然后选择将产生所需空间宽度的光酸和相应的至少一个PAG。

    Acid Scavengers for use in chemically amplified photoresists
    9.
    发明授权
    Acid Scavengers for use in chemically amplified photoresists 失效
    用于化学放大光致抗蚀剂的酸清除剂

    公开(公告)号：US5733705A

    公开(公告)日：1998-03-31

    申请号：US730687

    申请日：1996-10-11

    申请人： Nageshwer Rao Bantu ,  William Ross Brunsvold ,  George Joseph Hefferon ,  Wu-Song Huang ,  Ahmad D. Katnani ,  Mahmoud M. Khofasteh ,  Ratnam Sooriyakumaran ,  Dominic Changwon Yang

    发明人： Nageshwer Rao Bantu ,  William Ross Brunsvold ,  George Joseph Hefferon ,  Wu-Song Huang ,  Ahmad D. Katnani ,  Mahmoud M. Khofasteh ,  Ratnam Sooriyakumaran ,  Dominic Changwon Yang

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/039 ,  G03F7/0045

    摘要： Proton sponge, berberine, and cetyltrimethyl ammonium hydroxide base compounds are used as additives to chemically amplified photoresists based on modified polyhydroxystyrene (PHS). The base additives scavenge free acids from the photoresist in order to preserve the acid labile moieties on the modified PHS polymer. The base additives are well suited to industrial processing conditions, do not react with the photoacid compounds in the photoresist composition to form byproducts which would hinder photoresist performance, and extend the shelf-life of the photoresist composition. In addition, the proton sponge and berberine base additives have a different absorption spectra than the modified PHS polymer, therefore, the quantity of base additive within the photoresist can be easily assayed and controlled.

    摘要翻译： 质子海绵，小檗碱和十六烷基三甲基氢氧化铵碱化合物用作基于改性聚羟基苯乙烯（PHS）的化学放大光致抗蚀剂的添加剂。 基础添加剂清除光致抗蚀剂中的游离酸，以保持改性PHS聚合物上的酸不稳定部分。 碱添加剂非常适合于工业加工条件，不与光致抗蚀剂组合物中的光酸化合物反应以形成将阻碍光致抗蚀剂性能的副产物，并延长光致抗蚀剂组合物的保质期。 此外，质子海绵和小檗碱碱添加剂具有与改性PHS聚合物不同的吸收光谱，因此可以容易地测定和控制光致抗蚀剂内基础添加剂的量。