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公开(公告)号:US11777037B2
公开(公告)日:2023-10-03
申请号:US17510066
申请日:2021-10-25
Applicant: LG DISPLAY CO., LTD.
Inventor: InTak Cho , JungSeok Seo , SeHee Park , Jaeyoon Park , SangYun Sung
IPC: H01L29/786 , H01L27/12 , H01L29/10
CPC classification number: H01L29/78642 , H01L27/1225 , H01L29/1037 , H01L29/78663
Abstract: A transistor having a vertical structure can include a substrate, a first electrode disposed on the substrate, a second electrode disposed on the substrate, an insulation pattern disposed between the first electrode and the second electrode, an active layer connected between the first electrode and the second electrode, a channel area of the active layer disposed along a side surface of the insulation pattern and around an upper edge of the insulation pattern, a gate electrode disposed on the active layer, and a gate insulating film disposed between the gate electrode and the active layer.
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2.
公开(公告)号:US11171246B2
公开(公告)日:2021-11-09
申请号:US16705767
申请日:2019-12-06
Applicant: LG Display Co., Ltd.
Inventor: SeHee Park , JungSeok Seo , PilSang Yun , Jeyong Jeon , Jaeyoon Park , ChanYong Jeong
IPC: H01L29/78 , H01L29/49 , H01L29/786 , H01L29/66 , H01L29/24
Abstract: A thin-film transistor, a display device including a thin-film transistor, and a method of manufacturing a thin-film transistor are provided. A thin-film transistor includes: a base substrate, a semiconductor layer on the base substrate, the semiconductor layer including: a first oxide semiconductor layer, and a second oxide semiconductor layer on the first oxide semiconductor layer, the second oxide semiconductor layer having a Hall mobility smaller than a Hall mobility of the first oxide semiconductor layer, and a gate electrode spaced apart from the semiconductor layer and partially overlapping the semiconductor layer, wherein a concentration of gallium (Ga) in the second oxide semiconductor layer is higher than a concentration of gallium (Ga) in the first oxide semiconductor layer.
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公开(公告)号:US10943546B2
公开(公告)日:2021-03-09
申请号:US16694674
申请日:2019-11-25
Applicant: LG DISPLAY CO., LTD.
Inventor: InTak Cho , PilSang Yun , Jeyong Jeon , Jiyong Noh , SeHee Park
IPC: G09G3/3291 , G09G3/3266 , H01L27/32
Abstract: An electronic device includes a panel including first and second transistors and a driver circuit driving the panel. The first transistor includes a first electrode disposed on a substrate, a first insulating film disposed on the substrate and having an open area, a second electrode disposed on the first insulating film and overlapping the first electrode, and a first active layer disposed on the first and second electrodes. The second transistor includes third and fourth electrodes which are disposed to space apart from, and on a same layer as, the second electrode, and between which the open area is disposed, and a second active layer disposed on the third and fourth electrodes and across the open area.
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公开(公告)号:US20180175077A1
公开(公告)日:2018-06-21
申请号:US15828207
申请日:2017-11-30
Applicant: LG Display Co., Ltd.
Inventor: HyungJoon Koo , SeHee Park , Kwanghwan Ji , PilSang Yun , Jaeyoon Park , HongRak Choi
IPC: H01L27/12
CPC classification number: H01L27/1255 , H01L27/1225 , H01L27/124 , H01L27/1251 , H01L27/3262 , H01L27/3265 , H01L27/3272 , H01L29/78633 , H01L29/78648 , H01L29/7869
Abstract: Disclosed is a thin film transistor substrate which facilitates to realize a bottom gate structure where a gate electrode is disposed below an active layer, and to increase an area for a storage capacitor, and a display device including the same, wherein the thin film transistor substrate may include a light shielding layer, a buffer layer for covering the light shielding layer, and a driving transistor prepared on the buffer layer while being overlapped with the light shielding layer, and provided to supply a driving current to an organic light emitting device.
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公开(公告)号:US12178090B2
公开(公告)日:2024-12-24
申请号:US16923444
申请日:2020-07-08
Applicant: LG Display Co., Ltd.
Inventor: SeHee Park , InTak Cho , PilSang Yun
IPC: H10K59/131 , G09G3/3291 , H10K59/124
Abstract: Provided is an electronic device. The electronic device includes at least one first transistor to which a data voltage is applied. The first transistor includes a first conductive layer disposed on a substrate and a first active layer, which is disposed on the first conductive layer, has one end and the other end which are made conductive, and includes a first channel region disposed between the one end and the other end. A second conductive layer overlapping the first conductive layer with a first insulating layer interposed between the second conductive layer and the first conductive layer is included in a storage capacitor in a panel, and the storage capacitor is disposed under the first channel region of the first active layer. In this way, an ultra-high definition panel is fabricated.
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公开(公告)号:US11678518B2
公开(公告)日:2023-06-13
申请号:US17344903
申请日:2021-06-10
Applicant: LG Display Co., Ltd.
Inventor: JungSeok Seo , PilSang Yun , SeHee Park , Jiyong Noh
IPC: H10K59/121 , H10K59/131 , H01L27/12 , H10K59/12 , H01L27/32
CPC classification number: H01L27/3262 , H01L27/124 , H01L27/127 , H01L27/1262 , H01L27/3276 , H01L2227/323
Abstract: A display device includes a substrate, a pixel driver on the substrate, and a display element connected to the pixel driver. The pixel driver includes a conductive layer on the substrate, a buffer layer on the conductive layer, a semiconductor layer on the buffer layer, a gate electrode, the gate electrode overlapping the semiconductor layer, and a source electrode and a drain electrode connected to the semiconductor layer. The buffer layer includes a flattened portion overlapping the conductive layer, and a stepped portion overlapping the periphery of the conductive layer. The semiconductor layer includes a first oxide semiconductor layer on the buffer layer, and a second oxide semiconductor layer on the first oxide semiconductor layer. A width of the first oxide semiconductor layer is larger than a width of the second oxide semiconductor layer, and the first oxide semiconductor layer is on the stepped portion of the buffer layer.
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7.
公开(公告)号:US11621356B2
公开(公告)日:2023-04-04
申请号:US17406994
申请日:2021-08-19
Applicant: LG Display Co., Ltd.
Inventor: SeHee Park , JungSeok Seo , PilSang Yun , Jeyong Jeon , Jaeyoon Park , ChanYong Jeong
IPC: H01L29/78 , H01L29/49 , H01L29/786 , H01L29/66 , H01L29/24
Abstract: A thin-film transistor, a display device including a thin-film transistor, and a method of manufacturing a thin-film transistor are provided. A thin-film transistor includes: a base substrate, a semiconductor layer on the base substrate, the semiconductor layer including: a first oxide semiconductor layer, and a second oxide semiconductor layer on the first oxide semiconductor layer, the second oxide semiconductor layer having a Hall mobility smaller than a Hall mobility of the first oxide semiconductor layer, and a gate electrode spaced apart from the semiconductor layer and partially overlapping the semiconductor layer, wherein a concentration of gallium (Ga) in the second oxide semiconductor layer is higher than a concentration of gallium (Ga) in the first oxide semiconductor layer.
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公开(公告)号:US10978499B2
公开(公告)日:2021-04-13
申请号:US16525482
申请日:2019-07-29
Applicant: LG Display Co., Ltd.
Inventor: Jaeman Jang , SeHee Park , DaeHwan Kim , PilSang Yun
Abstract: A display apparatus includes a substrate; a pixel driving circuit on the substrate; and a display unit connected with the pixel driving circuit, wherein the pixel driving circuit includes a first thin film transistor and a second thin film transistor, wherein the first thin film transistor includes, a first gate electrode on the substrate, a first active layer spaced apart from the first gate electrode and overlapping at least a part of the first gate electrode, a first source electrode connected with the first active layer; and a first drain electrode spaced apart from the first source electrode and connected with the first active layer, and wherein the second thin film transistor includes, a second active layer on the substrate, and a second gate electrode spaced apart from the second active layer and partially overlapping at least a part of the second active layer, wherein the first gate electrode is disposed between the substrate and the first active layer, the second active layer is disposed between the substrate and the second gate electrode, and the first gate electrode and the second gate electrode are disposed at an opposite side with respect to the second active layer.
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9.
公开(公告)号:US20180151114A1
公开(公告)日:2018-05-31
申请号:US15828194
申请日:2017-11-30
Applicant: LG Display Co., Ltd.
Inventor: HongRak Choi , SeHee Park , PilSang Yun , HyungJoon Koo , Kwanghwan Ji , Jaeyoon Park
Abstract: Disclosed are a transistor assembly, an organic light emitting display panel including the same, and an organic light emitting display device including the organic light emitting display panel, in which a first electrode of a switching transistor is used as a gate of a driving transistor.
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10.
公开(公告)号:US11984509B2
公开(公告)日:2024-05-14
申请号:US18117416
申请日:2023-03-04
Applicant: LG Display Co., Ltd.
Inventor: SeHee Park , JungSeok Seo , PilSang Yun , Jeyong Jeon , Jaeyoon Park , ChanYong Jeong
IPC: H01L29/78 , H01L29/24 , H01L29/49 , H01L29/66 , H01L29/786
CPC classification number: H01L29/7869 , H01L29/24 , H01L29/4908 , H01L29/66742
Abstract: A thin-film transistor, a display device including a thin-film transistor, and a method of manufacturing a thin-film transistor are provided. A thin-film transistor includes: a base substrate, a semiconductor layer on the base substrate, the semiconductor layer including: a first oxide semiconductor layer, and a second oxide semiconductor layer on the first oxide semiconductor layer, the second oxide semiconductor layer having a Hall mobility smaller than a Hall mobility of the first oxide semiconductor layer, and a gate electrode spaced apart from the semiconductor layer and partially overlapping the semiconductor layer, wherein a concentration of gallium (Ga) in the second oxide semiconductor layer is higher than a concentration of gallium (Ga) in the first oxide semiconductor layer.
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