Semiconductor light emitting device and method for manufacturing the same
    1.
    发明授权
    Semiconductor light emitting device and method for manufacturing the same 有权
    半导体发光器件及其制造方法

    公开(公告)号:US08927961B2

    公开(公告)日:2015-01-06

    申请号:US14454581

    申请日:2014-08-07

    Inventor: Kyong Jun Kim

    CPC classification number: H01L33/06 B82Y99/00 H01L33/04 H01L33/12 H01L33/32

    Abstract: Disclosed is a semiconductor light emitting device including a first conductive semiconductor layer including an n-type dopant, an active layer, and a second to sixth conductive semiconductor layers including a p-type dopant. The third to sixth conductive semiconductor layers includes an AlGaN-based semiconductor on the active layer, and the second conductive semiconductor layer includes a GaN-based semiconductor layer on the sixth conductive semiconductor layer. The active layer includes plurality of quantum barrier layers and plurality of quantum well layers and includes a cycle of 2 to 10. The plurality of quantum well layers include an InGaN semiconductor and at least one of the plurality of quantum barrier layers includes a GaN-based semiconductor. The sixth conductive semiconductor layer has a thickness of about 5 nm to about 100 nm.

    Abstract translation: 公开了一种半导体发光器件,其包括包括n型掺杂剂的第一导电半导体层,有源层和包括p型掺杂剂的第二至第六导电半导体层。 第三至第六导电半导体层包括有源层上的AlGaN基半导体,第二导​​电半导体层在第六导电半导体层上包括GaN基半导体层。 有源层包括多个量子势垒层和多个量子阱层,并且包括2到10的周期。多个量子阱层包括InGaN半导体,并且多个量子势垒层中的至少一个包括GaN基 半导体。 第六导电半导体层具有约5nm至约100nm的厚度。

    Semiconductor light emitting device and method for manufacturing the same
    3.
    发明授权
    Semiconductor light emitting device and method for manufacturing the same 有权
    半导体发光器件及其制造方法

    公开(公告)号:US08829490B2

    公开(公告)日:2014-09-09

    申请号:US14218829

    申请日:2014-03-18

    Inventor: Kyong Jun Kim

    CPC classification number: H01L33/06 B82Y99/00 H01L33/04 H01L33/12 H01L33/32

    Abstract: Disclosed is a semiconductor light emitting device including a first to third conductive semiconductor layers which have an n-type dopant, an active layer, and a fourth and fifth conductive semiconductor layers which have a p-type dopant. The first and third conductive semiconductor layers are a GaN semiconductor, and the second conductive semiconductor layer is an InGaN-based semiconductor layer. The fourth conductive semiconductor layer is formed of an AlGaN semiconductor and the fifth conductive semiconductor layer is formed of a GaN-based semiconductor layer. The active layer includes plurality of quantum barrier layers and plurality of quantum well layers and includes a cycle of 2 to 10. The plurality of quantum well layers include an InGaN semiconductor and at least one of the plurality of quantum barrier layers includes a GaN-based semiconductor, and at least two of the plurality barrier layers has a thickness of about 50 Å to about 300 Å.

    Abstract translation: 公开了一种半导体发光器件,其包括具有n型掺杂剂的第一至第三导电半导体层,有源层以及具有p型掺杂剂的第四和第五导电半导体层。 第一和第三导电半导体层是GaN半导体,并且第二导电半导体层是InGaN基半导体层。 第四导电半导体层由AlGaN半导体形成,第五导电半导体层由GaN基半导体层形成。 有源层包括多个量子势垒层和多个量子阱层,并且包括2到10的周期。多个量子阱层包括InGaN半导体,并且多个量子势垒层中的至少一个包括GaN基 半导体,并且多个阻挡层中的至少两个具有大约至大约的厚度。

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