Chemical Coating of Microwell for Electrochemical Detection Device
    3.
    发明申请
    Chemical Coating of Microwell for Electrochemical Detection Device 有权
    电化学检测装置的微孔化学涂层

    公开(公告)号:US20130089466A1

    公开(公告)日:2013-04-11

    申请号:US13648663

    申请日:2012-10-10

    Abstract: The described embodiments may provide a method of fabricating a chemical detection device. The method may comprise forming a microwell above a CMOS device. The microwell may comprise a bottom surface and sidewalls. The method may further comprise applying a first chemical to be selectively attached to the bottom surface of the microwell, forming a metal oxide layer on the sidewalls of the microwell, and applying a second chemical to be selectively attached to the sidewalls of the microwell. The second chemical may lack an affinity to the first chemical.

    Abstract translation: 所描述的实施例可以提供一种制造化学检测装置的方法。 该方法可以包括在CMOS器件上形成微孔。 微孔可以包括底表面和侧壁。 该方法可以进一步包括施加第一化学物质以选择性地连接到微孔的底表面,在微孔的侧壁上形成金属氧化物层,以及施加第二化学物质以选择性地连接到微孔的侧壁。 第二种化学物质可能与第一种化学物质不具有亲和力。

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