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公开(公告)号：US09401264B2
公开(公告)日：2016-07-26
申请号：US14043574
申请日：2013-10-01
CPC分类号： H01J37/32183 , H01J37/32174 , H01J37/32449 , H01J37/32532 , H01J2237/3323 , H01J2237/3344
摘要： A plasma system includes an RF generator and a matchbox including an impedance matching circuit, which is coupled to the RF generator via an RF cable. The plasma system includes a chuck and a plasma reactor coupled to the matchbox via an RF line. The RF line forms a portion of an RF supply path, which extends between the RF generator through the matchbox, and to the chuck. The plasma system further includes a phase adjusting circuit coupled to the RF supply path between the impedance matching circuit and the chuck. The phase adjusting circuit has an end coupled to the RF supply path and another end that is grounded. The plasma system includes a controller coupled to the phase adjusting circuit. The controller is used for changing a parameter of the phase adjusting circuit to control an impedance of the RF supply path based on a tune recipe.
摘要翻译： 等离子体系统包括RF发生器和包括阻抗匹配电路的火柴盒，其通过RF电缆耦合到RF发生器。 等离子体系统包括通过RF线耦合到火柴盒的卡盘和等离子体反应器。 RF线形成RF供应路径的一部分，RF供应路径在RF发生器之间通过火柴盒和卡盘延伸。 等离子体系统还包括耦合到阻抗匹配电路和卡盘之间的RF供给路径的相位调整电路。 相位调整电路具有耦合到RF供给路径的一端和接地的另一端。 等离子体系统包括耦合到相位调整电路的控制器。 控制器用于改变相位调整电路的参数，以基于调谐配方控制RF供应路径的阻抗。
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公开(公告)号：US20150091441A1
公开(公告)日：2015-04-02
申请号：US14043574
申请日：2013-10-01
IPC分类号： H01J37/32
CPC分类号： H01J37/32183 , H01J37/32174 , H01J37/32449 , H01J37/32532 , H01J2237/3323 , H01J2237/3344
摘要： A plasma system includes an RF generator and a matchbox including an impedance matching circuit, which is coupled to the RF generator via an RF cable. The plasma system includes a chuck and a plasma reactor coupled to the matchbox via an RF line. The RF line forms a portion of an RF supply path, which extends between the RF generator through the matchbox, and to the chuck. The plasma system further includes a phase adjusting circuit coupled to the RF supply path between the impedance matching circuit and the chuck. The phase adjusting circuit has an end coupled to the RF supply path and another end that is grounded. The plasma system includes a controller coupled to the phase adjusting circuit. The controller is used for changing a parameter of the phase adjusting circuit to control an impedance of the RF supply path based on a tune recipe.
摘要翻译： 等离子体系统包括RF发生器和包括阻抗匹配电路的火柴盒，其通过RF电缆耦合到RF发生器。 等离子体系统包括通过RF线耦合到火柴盒的卡盘和等离子体反应器。 RF线形成RF供应路径的一部分，RF供应路径在RF发生器之间通过火柴盒和卡盘延伸。 等离子体系统还包括耦合到阻抗匹配电路和卡盘之间的RF供给路径的相位调整电路。 相位调整电路具有耦合到RF供给路径的一端和接地的另一端。 等离子体系统包括耦合到相位调整电路的控制器。 控制器用于改变相位调整电路的参数，以基于调谐配方控制RF供应路径的阻抗。
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公开(公告)号：US20230298866A1
公开(公告)日：2023-09-21
申请号：US18010431
申请日：2021-11-02
发明人： Alexei Marakhtanov , Bing Ji , Ken Lucchesi , John Holland
CPC分类号： H01J37/32669 , H01F27/2823 , H01J2237/3343
摘要： A system for performing a plasma process on a wafer is provided, including: a chamber configured to receive a wafer for plasma processing and having an interior defining a plasma processing region in which a plasma is provided for the plasma processing of the wafer; a first magnetic coil disposed above the chamber and centered about an axis perpendicular to a surface plane of the wafer and through an approximate center of the wafer; a first DC power supply configured to apply a first DC current to the first magnetic coil during the plasma processing, the applied first DC current producing a magnetic field in the plasma processing region that reduces non-uniformity of the plasma.
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公开(公告)号：US20230223242A1
公开(公告)日：2023-07-13
申请号：US18010453
申请日：2021-11-02
发明人： Alexei Marakhtanov , Bing Ji , Ken Lucchesi , John Holland
IPC分类号： H01J37/32 , H01L21/3065
CPC分类号： H01J37/3266 , H01J37/32146 , H01L21/3065 , H01J2237/3343
摘要： In some implementations, a method for performing a plasma process in a chamber is provided, including: supplying a process gas to the chamber; applying pulsed RF power to the process gas in the chamber, the pulsed RF power being provided at a predefined frequency, wherein the applying of the pulsed RF power to the process gas generates a plasma in the chamber; during the applying of the RF power, applying a pulsed DC current to a magnetic coil that is disposed over the chamber, wherein the pulsed DC current is provided at the predefined frequency.
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公开(公告)号：US10157730B2
公开(公告)日：2018-12-18
申请号：US15194452
申请日：2016-06-27
IPC分类号： H01J37/32
摘要： A plasma system includes an RF generator and a matchbox including an impedance matching circuit, which is coupled to the RF generator via an RF cable. The plasma system includes a chuck and a plasma reactor coupled to the matchbox via an RF line. The RF line forms a portion of an RF supply path, which extends between the RF generator through the matchbox, and to the chuck. The plasma system further includes a phase adjusting circuit coupled to the RF supply path between the impedance matching circuit and the chuck. The phase adjusting circuit has an end coupled to the RF supply path and another end that is grounded. The plasma system includes a controller coupled to the phase adjusting circuit. The controller is used for changing a parameter of the phase adjusting circuit to control an impedance of the RF supply path based on a tune recipe.
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公开(公告)号：US20150091440A1
公开(公告)日：2015-04-02
申请号：US14043525
申请日：2013-10-01
IPC分类号： H01J37/32
CPC分类号： H01J37/32183
摘要： A system for controlling an impedance of a radio frequency (RF) return path includes a matchbox further including a match circuitry. The system further includes an RF generator coupled to the matchbox to supply an RF supply signal to the matchbox via a first portion of an RF supply path. The RF generator is coupled to the matchbox to receive an RF return signal via a first portion of an RF return path. The system also includes a switch circuit and a plasma reactor coupled to the switch circuit via a second portion of the RF return path. The plasma reactor is coupled to the match circuitry via a second portion of the RF supply path. The system includes a controller coupled to the switch circuit, the controller configured to control the switch circuit based on a tune recipe to change an impedance of the RF return path.
摘要翻译： 用于控制射频（RF）返回路径的阻抗的系统包括还包括匹配电路的火柴盒。 该系统还包括耦合到火柴盒的RF发生器，以经由RF供应路径的第一部分向火柴盒提供RF供应信号。 RF发生器耦合到火柴盒，以经由RF返回路径的第一部分接收RF返回信号。 该系统还包括经由RF返回路径的第二部分耦合到开关电路的开关电路和等离子体电抗器。 等离子体反应器经由RF供应路径的第二部分耦合到匹配电路。 该系统包括耦合到开关电路的控制器，该控制器被配置为基于调谐配方来控制开关电路以改变RF返回路径的阻抗。
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公开(公告)号：US10249476B2
公开(公告)日：2019-04-02
申请号：US15133049
申请日：2016-04-19
IPC分类号： H01J37/32
摘要： A system for controlling an impedance of a radio frequency (RF) return path includes a matchbox further including a match circuitry. The system further includes an RF generator coupled to the matchbox to supply an RF supply signal to the matchbox via a first portion of an RF supply path. The RF generator is coupled to the matchbox to receive an RF return signal via a first portion of an RF return path. The system also includes a switch circuit and a plasma reactor coupled to the switch circuit via a second portion of the RF return path. The plasma reactor is coupled to the match circuitry via a second portion of the RF supply path. The system includes a controller coupled to the switch circuit, the controller configured to control the switch circuit based on a tune recipe to change an impedance of the RF return path.
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公开(公告)号：US20160307738A1
公开(公告)日：2016-10-20
申请号：US15194452
申请日：2016-06-27
IPC分类号： H01J37/32
CPC分类号： H01J37/32183 , H01J37/32174 , H01J37/32449 , H01J37/32532 , H01J2237/3323 , H01J2237/3344
摘要： A plasma system includes an RF generator and a matchbox including an impedance matching circuit, which is coupled to the RF generator via an RF cable. The plasma system includes a chuck and a plasma reactor coupled to the matchbox via an RF line. The RF line forms a portion of an RF supply path, which extends between the RF generator through the matchbox, and to the chuck. The plasma system further includes a phase adjusting circuit coupled to the RF supply path between the impedance matching circuit and the chuck. The phase adjusting circuit has an end coupled to the RF supply path and another end that is grounded. The plasma system includes a controller coupled to the phase adjusting circuit. The controller is used for changing a parameter of the phase adjusting circuit to control an impedance of the RF supply path based on a tune recipe.
摘要翻译： 等离子体系统包括RF发生器和包括阻抗匹配电路的火柴盒，其通过RF电缆耦合到RF发生器。 等离子体系统包括通过RF线耦合到火柴盒的卡盘和等离子体反应器。 RF线形成RF供应路径的一部分，RF供应路径在RF发生器之间通过火柴盒和卡盘延伸。 等离子体系统还包括耦合到阻抗匹配电路和卡盘之间的RF供给路径的相位调整电路。 相位调整电路具有耦合到RF供给路径的一端和接地的另一端。 等离子体系统包括耦合到相位调整电路的控制器。 控制器用于改变相位调整电路的参数，以基于调谐配方控制RF供应路径的阻抗。
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公开(公告)号：US20160233058A1
公开(公告)日：2016-08-11
申请号：US15133049
申请日：2016-04-19
IPC分类号： H01J37/32
CPC分类号： H01J37/32183
摘要： A system for controlling an impedance of a radio frequency (RF) return path includes a matchbox further including a match circuitry. The system further includes an RF generator coupled to the matchbox to supply an RF supply signal to the matchbox via a first portion of an RF supply path. The RF generator is coupled to the matchbox to receive an RF return signal via a first portion of an RF return path. The system also includes a switch circuit and a plasma reactor coupled to the switch circuit via a second portion of the RF return path. The plasma reactor is coupled to the match circuitry via a second portion of the RF supply path. The system includes a controller coupled to the switch circuit, the controller configured to control the switch circuit based on a tune recipe to change an impedance of the RF return path.
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公开(公告)号：US09337000B2
公开(公告)日：2016-05-10
申请号：US14043525
申请日：2013-10-01
CPC分类号： H01J37/32183
摘要： A system for controlling an impedance of a radio frequency (RF) return path includes a matchbox further including a match circuitry. The system further includes an RF generator coupled to the matchbox to supply an RF supply signal to the matchbox via a first portion of an RF supply path. The RF generator is coupled to the matchbox to receive an RF return signal via a first portion of an RF return path. The system also includes a switch circuit and a plasma reactor coupled to the switch circuit via a second portion of the RF return path. The plasma reactor is coupled to the match circuitry via a second portion of the RF supply path. The system includes a controller coupled to the switch circuit, the controller configured to control the switch circuit based on a tune recipe to change an impedance of the RF return path.
摘要翻译： 用于控制射频（RF）返回路径的阻抗的系统包括还包括匹配电路的火柴盒。 该系统还包括耦合到火柴盒的RF发生器，以经由RF供应路径的第一部分向火柴盒提供RF供应信号。 RF发生器耦合到火柴盒，以经由RF返回路径的第一部分接收RF返回信号。 该系统还包括经由RF返回路径的第二部分耦合到开关电路的开关电路和等离子体电抗器。 等离子体反应器经由RF供应路径的第二部分耦合到匹配电路。 该系统包括耦合到开关电路的控制器，该控制器被配置为基于调谐配方来控制开关电路以改变RF返回路径的阻抗。
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