公开(公告)号：US20240395504A1

公开(公告)日：2024-11-28

申请号：US18791152

申请日：2024-07-31

Applicant: Lam Research Corporation

Inventor： Felix Leib Kozakevich ,  Alexei Marakhtanov ,  Bing Ji ,  Ranadeep Bhowmick ,  John Holland

IPC: H01J37/32 ,  H03H7/38

Abstract: An impedance match is described. The impedance match includes a housing having a bottom portion and a top portion. The bottom portion has match components and the top portion has an elongated body. A low frequency input is connected through the bottom portion of the housing, and the low frequency input is interconnected to a first set of capacitors and inductors. A high frequency input is connected through the bottom portion of the housing, and the high frequency input is interconnected to a second set of capacitors and inductors. An elongated strap extends between the bottom portion and the top portion of the housing. A lower portion of the elongated strap is coupled to the second set of capacitors and inductors and an upper portion of the elongated strap is connected to an RF rod at an end of the elongated body.

公开(公告)号：US11335539B2

公开(公告)日：2022-05-17

申请号：US17276798

申请日：2018-09-28

Applicant: Lam Research Corporation

Inventor： Ranadeep Bhowmick ,  John Holland ,  Felix Leib Kozakevich ,  Bing Ji ,  Alexei Marakhtanov

IPC: H01J37/32

Abstract: A method for optimizing delivery of power to a plasma chamber is described. The method includes dividing each cycle of a low frequency (LF) radio frequency generator (RFG) into multiple time intervals. During each of the time intervals, a frequency offset of a high frequency (HF) RFG is generated for which the delivery of power is maximized. The frequency offsets provide a substantially inverse relationship compared to a voltage signal of the LF RFG for each cycle of the voltage signal. The frequency offsets for the time intervals are multiples of the low frequency. The substantially inverse relationship facilitates an increase in the delivery of power to the electrode. A total range of the frequency offsets from a reference HF frequency over the LF RF cycle depends on a power ratio of power that is supplied by the LF RFG and power that is supplied by the HF RFG.

公开(公告)号：US11935726B2

公开(公告)日：2024-03-19

申请号：US17480993

申请日：2021-09-21

Applicant: MKS Instruments, Inc. ,  LAM RESEARCH CORPORATION

Inventor： Aaron T. Radomski ,  Benjamin J. Gitlin ,  Larry J. Fisk, II ,  Mariusz Oldziej ,  Aaron M. Burry ,  Jonathan W. Smyka ,  Alexei Marakhtanov ,  Bing Ji ,  Felix Leib Kozakevich ,  John Holland ,  Ranadeep Bhowmick

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J2237/334

Abstract: A radio frequency (RF) generator system includes first and second RF power sources, each RF power source applying a respective RF signal and second RF signal to a load. The first RF signal is applied in accordance with the application of the second RF signal. The application of the first RF signal is synchronized to application of the second RF signal. The first RF signal may be amplitude modulated in synchronization with the second RF signal, and the amplitude modulation can include blanking of the first RF signal. A frequency offset may be applied to the first RF signal in synchronization with the second RF signal. A variable actuator associated with the first RF power source may be controlled in accordance with the second RF signal.

公开(公告)号：US11908660B2

公开(公告)日：2024-02-20

申请号：US17691011

申请日：2022-03-09

Applicant: Lam Research Corporation

Inventor： Ranadeep Bhowmick ,  John Holland ,  Felix Leib Kozakevich ,  Bing Ji ,  Alexei Marakhtanov

IPC: H01J37/32

CPC classification number: H01J37/32174 ,  H01J37/32128 ,  H01J37/32165 ,  H01J37/32926

Abstract: A method for optimizing delivery of power to a plasma chamber is described. The method includes dividing each cycle of a low frequency (LF) radio frequency generator (RFG) into multiple time intervals. During each of the time intervals, a frequency offset of a high frequency (HF) RFG is generated for which the delivery of power is maximized. The frequency offsets provide a substantially inverse relationship compared to a voltage signal of the LF RFG for each cycle of the voltage signal. The frequency offsets for the time intervals are multiples of the low frequency. The substantially inverse relationship facilitates an increase in the delivery of power to the electrode. A total range of the frequency offsets from a reference HF frequency over the LF RF cycle depends on a power ratio of power that is supplied by the LF RFG and power that is supplied by the HF RFG.

公开(公告)号：US20230298857A1

公开(公告)日：2023-09-21

申请号：US18011830

申请日：2021-06-28

Applicant: Lam Research Corporation

Inventor： Ranadeep Bhowmick ,  Alexei Marakhtanov ,  Felix Leib Kozakevich ,  John Holland

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/32091 ,  H01J37/32119 ,  H01J2237/3348

Abstract: A first radiofrequency signal generator is set to generate a low frequency signal. A second radiofrequency signal generator is set to generate a high frequency signal. An impedance matching system has a first input connected to an output of the first radiofrequency signal generator and a second input connected to an output of the second radiofrequency signal generator. The impedance matching system controls impedances at the outputs of the first and second radiofrequency signal generators. An output of the impedance matching system is connected to a radiofrequency supply input of a plasma processing system. A control module monitors reflected voltage at the output of the second radiofrequency signal generator. The control module determines when the reflected voltage indicates a change in impedance along a transmission path of the high frequency signal that is indicative of a particular process condition and/or event within the plasma processing system.

公开(公告)号：US20230054699A1

公开(公告)日：2023-02-23

申请号：US17793372

申请日：2021-01-30

Applicant: Lam Research Corporation

Inventor： Alexei Marakhtanov ,  Felix Kozakevich ,  Bing Ji ,  Ranadeep Bhowmick ,  John Holland

IPC: H01J37/32

Abstract: A tunable edge sheath (TES) system includes a coupling ring configured to couple to a bottom surface of an edge ring that surrounds a wafer support area within a plasma processing chamber. The TES system includes an annular-shaped electrode embedded within the coupling ring. The TES system includes a plurality of radiofrequency signal supply pins coupled to the electrode within the coupling ring. Each of the plurality of radiofrequency signal supply pins extends through a corresponding hole formed through a bottom surface of the coupling ring. The TES system includes a plurality of radiofrequency signal filters respectively connected to the plurality of radiofrequency supply pins. Each of the plurality of radiofrequency signal filters is configured to provide a high impedance to radiofrequency signals used to generate a plasma within the plasma processing chamber.

公开(公告)号：US12080518B2

公开(公告)日：2024-09-03

申请号：US17795225

申请日：2021-01-12

Applicant: Lam Research Corporation

Inventor： Felix Leib Kozakevich ,  Alexei Marakhtanov ,  Bing Ji ,  Ranadeep Bhowmick ,  John Holland

IPC: H03H7/38 ,  H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/32577 ,  H03H7/38

Abstract: An impedance match is described. The impedance match includes a housing having a bottom portion and a top portion. The bottom portion has match components and the top portion has an elongated body. A low frequency input is connected through the bottom portion of the housing, and the low frequency input is interconnected to a first set of capacitors and inductors. A high frequency input is connected through the bottom portion of the housing, and the high frequency input is interconnected to a second set of capacitors and inductors. An elongated strap extends between the bottom portion and the top portion of the housing. A lower portion of the elongated strap is coupled to the second set of capacitors and inductors and an upper portion of the elongated strap is connected to an RF rod at an end of the elongated body.

公开(公告)号：US20230317414A1

公开(公告)日：2023-10-05

申请号：US18010900

申请日：2021-06-23

Applicant: Lam Research Corporation

Inventor： Alexei Marakhtanov ,  Felix Leib Kozakevich ,  Ranadeep Bhowmick ,  John Holland

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J2237/334

Abstract: First, second, third, and fourth radiofrequency (RF) signal generators generate first, second, third, and fourth RF signals, respectively, having first, second, third, and fourth frequencies, respectively. The second and third frequencies are different specified harmonics of the first frequency. The fourth frequency is at least two orders of magnitude larger than the first frequency. An impedance matching system controls impedances for the first, second, third, and fourth RF signal generators. A control module is programmed to control: A) a first phase difference between the first and second RF signals, B) a second phase difference between the first and third RF signals, C) a first voltage difference between the first and second RF signals, D) a second voltage difference between the first and third RF signals. The first and second phase differences and the first and second voltage differences collectively control a plasma sheath voltage as a function of time.

公开(公告)号：US20230059495A1

公开(公告)日：2023-02-23

申请号：US17793366

申请日：2021-01-30

Applicant: Lam Research Corporation

Inventor： Alexei Marakhtanov ,  Felix Kozakevich ,  Bing Ji ,  Ranadeep Bhowmick ,  Kenneth Lucchesi ,  John Holland

IPC: H01J37/32 ,  H01L21/683

Abstract: A fixed outer support flange (flange 1) is formed to circumscribe an electrode within a plasma processing system. Flange 1 has a vertical portion and a horizontal portion extending radially outward from a lower end of the vertical portion. An articulating outer support flange (flange 2) is formed to circumscribe flange 1. Flange 2 has a vertical portion and a horizontal portion extending radially outward from a lower end of the vertical portion. The vertical portion of flange 2 is positioned concentrically outside of the vertical portion of flange 1. Flange 2 is spaced apart from flange 1 and moveable along the vertical portion of flange 1. Each of a plurality of electrically conductive straps has a first end portion connected to flange 2 and a second end portion connected to flange 1.

公开(公告)号：US20220199366A1

公开(公告)日：2022-06-23

申请号：US17691011

申请日：2022-03-09

Applicant: Lam Research Corporation

Inventor： Ranadeep Bhowmick ,  John Holland ,  Felix Leib Kozakevich ,  Bing Ji ,  Alexei Marakhtanov

IPC: H01J37/32

Abstract: A method for optimizing delivery of power to a plasma chamber is described. The method includes dividing each cycle of a low frequency (LF) radio frequency generator (RFG) into multiple time intervals. During each of the time intervals, a frequency offset of a high frequency (HF) RFG is generated for which the delivery of power is maximized. The frequency offsets provide a substantially inverse relationship compared to a voltage signal of the LF RFG for each cycle of the voltage signal. The frequency offsets for the time intervals are multiples of the low frequency. The substantially inverse relationship facilitates an increase in the delivery of power to the electrode. A total range of the frequency offsets from a reference HF frequency over the LF RF cycle depends on a power ratio of power that is supplied by the LF RFG and power that is supplied by the HF RFG.