Device for transferring a pattern to an object
    1.
    发明授权
    Device for transferring a pattern to an object 有权
    用于将模式传输到对象的设备

    公开(公告)号:US07165957B2

    公开(公告)日:2007-01-23

    申请号:US10221331

    申请日:2001-03-14

    CPC classification number: G03F7/0002 B82Y10/00 B82Y40/00 G03F7/0017

    Abstract: A device is provided for transferring a pattern to an object. The device may be used for transferring a pattern, such as micro- or nanostructures, from a stamp to an object. In accordance with one embodiment, the device comprises a first contacting means with a receiving surface for the stamp and a second contacting means with a receiving surface for the object. The device may further include a pressing means that is adapted to operate at least one of the contacting means for contacting the stamp with the object. One of the contacting means may include a base and a holder. The holder has a first end which defines one of the receiving surfaces and a second opposite end which is pivotally connected to the base in such a manner that the stamp and the object are automatically placed in a parallel position when contacting each other.

    Abstract translation: 提供了用于将图案转印到对象的装置。 该装置可以用于将图案(例如微结构或纳米结构)从印模转移到物体。 根据一个实施例,该装置包括具有用于印模的接收表面的第一接触装置和具有用于该物体的接收表面的第二接触装置。 该装置还可以包括压紧装置,其适于操作接触装置中的至少一个,用于使印模与物体接触。 接触装置中的一个可以包括基座和支架。 保持器具有限定其中一个接收表面的第一端和以这样的方式可枢转地连接到基座的第二相对端,使得当彼此接触时,印模和物体被自动地放置在平行位置。

    Mold for nano imprinting
    2.
    发明授权
    Mold for nano imprinting 有权
    纳米压印模具

    公开(公告)号:US06923930B2

    公开(公告)日:2005-08-02

    申请号:US10181487

    申请日:2001-01-19

    CPC classification number: B82Y10/00 B82Y40/00 G03F7/0002 Y10S977/887

    Abstract: A metal mold for use in a nano-imprinting process comprises a firmly adhering monomolecular non-sticking layer. The layer was obtained by subjecting the mold to a reaction with a fluoroalkyl compound having a mercapto group. As a result of said reaction, the layer comprises an organic sulfide of said metal.

    Abstract translation: 用于纳米压印方法的金属模具包括牢固粘附的单分子不粘层。 通过使模具与具有巯基的氟烷基化合物反应来获得该层。 作为所述反应的结果,该层包含所述金属的有机硫化物。

    Device for homogeneous heating of an object
    3.
    发明申请
    Device for homogeneous heating of an object 审中-公开
    物体均质加热装置

    公开(公告)号:US20050077285A1

    公开(公告)日:2005-04-14

    申请号:US10958588

    申请日:2004-10-06

    Abstract: A device for homogeneous heating of an object comprises a supporting surface for supporting the object, and a heating layer arranged on the supporting surface. The heating layer absorbs at least partly energy received from a radiation source and emits at least partly the thus-absorbed energy to the object supported on the supporting surface. The layer is made of a material such that the energy absorbed by the layer is in a self-regulating manner distributed uniformly along the surface of the layer. The heating device forms a simple and compact unit which can be used to rapidly heat the object to a homogeneous temperature.

    Abstract translation: 用于物体均匀加热的装置包括用于支撑物体的支撑表面和布置在支撑表面上的加热层。 加热层吸收至少部分从辐射源接收的能量,并且至少部分地将如此吸收的能量发射到支撑在支撑表面上的物体。 该层由材料制成,使得被层吸收的能量处于沿层的表面均匀分布的自调节方式。 加热装置形成一个简单紧凑的单元,可用于将物体快速加热到均匀的温度。

    Arrangement for Detecting Resonance Frequency Shifts
    4.
    发明申请
    Arrangement for Detecting Resonance Frequency Shifts 失效
    检测共振频率的布置

    公开(公告)号:US20100013456A1

    公开(公告)日:2010-01-21

    申请号:US12226658

    申请日:2007-04-25

    CPC classification number: G01G3/16

    Abstract: The present invention relates to an arrangement (1) for detection of a first resonance frequency (F1), related to a mass (1b′) loaded carrier means (1b), and to compare said first resonance frequency (F1) with a second, as a reference used, resonance frequency (F2), related to said carrier means (1b), by using frequency comparing and/or calculating means (3, 4) to evaluate, by a noted frequency shift (F2-F1), a mass weight (1b′). An array of individual carrier means (1a, 1b . . . 1i) are arranged adjacent to each other, that one or more of said carrier means are allotted different second resonance frequencies, that received resonance frequencies (F1) from said loaded carrier means are received and/or evaluated simultaneously, or at least essentially simultaneously, in a signal receiving and/or processing unit (3) and that said first resonance frequencies (F1) are compared and/or calculated within said calculating means (3, 4) with corresponding resonance frequencies (F2) stored in said unit (3, 4) in a memory (4b) thereof.

    Abstract translation: 本发明涉及一种用于检测与质量(1b')加载的载体装置(1b)相关的第一共振频率(F1)的装置(1),并将所述第一共振频率(F1)与第二共振频率 作为参考,通过使用频率比较和/或计算装置(3,4)来与所述载体装置(1b)相关的共振频率(F2),以通过所述频移(F2-F1)来评估质量 重量(1b')。 各个载体装置(1a,1b,...,1i)的阵列彼此相邻布置,所述载体装置中的一个或多个被分配有不同的第二共振频率,从所述加载的载体装置接收的共振频率(F1) 在信号接收和/或处理单元(3)中同时或至少基本上同时接收和/或评估所述第一共振频率(F1),并且在所述计算装置(3,4)内与 在其存储器(4b)中存储在所述单元(3,4)中的对应的共振频率(F2)。

    NANO PLASMONIC PARALLEL LITHOGRAPHY
    5.
    发明申请

    公开(公告)号:US20110305994A1

    公开(公告)日:2011-12-15

    申请号:US13202099

    申请日:2010-02-17

    Applicant: Lars Montelius

    Inventor: Lars Montelius

    CPC classification number: G03F7/70325 G03F1/50 G03F1/54

    Abstract: A method for replicate a pattern from a pre-patterned surface to a final substrate with in parallel approach lithography, the pre-patterned surface comprises a transparent substrate having a pre-patterned suitable metal; the method comprising the steps of: covering the final substrate with a chemical composition (resist) that is sensitive to Plasmon emitted light or waves; bringing the pre-patterned surface and the final substrate together to a proximity distance in the nanometer range, preferably 0 to 30 nm or more preferably 0 to 10 nm from the surface; illuminating the pre-patterned surface with plasmonic emitted light or waves, and exposing the final substrate to the plasmonic emitted light or waves to make a replica from the said pre-patterned surface.

    Abstract translation: 一种用于以平行进近光刻将图案从预图案化表面复制到最终基底的方法,预图案化表面包括具有预图案化合适金属的透明基底; 该方法包括以对等离子体发射光或波浪敏感的化学成分(抗蚀剂)覆盖最终基板的步骤; 将预先图案化的表面和最终的基板一起放置在距离表面的纳米范围内,优选0至30nm或更优选0至10nm的接近距离处; 用等离子体发射的光或波照射预图案化的表面,并将最终的基底暴露于等离激元发射的光或波,以从所述预图案化的表面制造复制品。

    Mold for nano imprinting
    6.
    发明授权
    Mold for nano imprinting 有权
    使用该模具制造模具和存储介质的模具制造方法

    公开(公告)号:US07687007B2

    公开(公告)日:2010-03-30

    申请号:US10518475

    申请日:2003-06-16

    Abstract: Method for manufacturing a mold tool (1), devised for forming a structured nanoscale pattern on an object (24) and having a layer (16) which is anti-adhesive with regard to the object (24). A stamp blank (2) is provided with a structured pattern (4) on a surface (8). The patterned surface (8) is coated with a layer (6) of a metal, which has a stable oxidation number and can form a mechanically stable oxide film. The metal layer (6) is oxidized for forming of an oxide film (10). The oxide film (10) is exposed to a reagent comprising molecule chains (18), each of which has a linkage group (20) which bonds to the oxide film (10) by chemical bonding, wherein the molecule chains (18) either at the outset comprise at least a group (22) comprising fluorine, or in a subsequent step is provided with at least one such group (22).

    Abstract translation: 一种用于制造模具(1)的方法,其用于在物体(24)上形成结构化的纳米级图案,并且具有关于所述物体(24)是防粘合的层(16)。 印模坯料(2)在表面(8)上设置有结构图案(4)。 图案化表面(8)涂覆有金属层(6),其具有稳定的氧化数,并且可以形成机械稳定的氧化物膜。 金属层(6)被氧化以形成氧化膜(10)。 氧化膜(10)暴露于包含分子链(18)的试剂,每个分子链具有通过化学键合与氧化膜(10)键合的连接基团(20),其中分子链(18) 一开始包括至少一个包含氟的基团(22),或者在随后的步骤中设置有至少一个这样的基团(22)。

    Apparatus for imaging using an array of lenses
    7.
    发明授权
    Apparatus for imaging using an array of lenses 有权
    使用透镜阵列进行成像的装置

    公开(公告)号:US08077245B2

    公开(公告)日:2011-12-13

    申请号:US10591215

    申请日:2005-03-16

    Abstract: An imaging system/camera consisting of multiple nano-sized optical elements arranged in an array format with more than one pixel per optical element will have a higher resolution than each element would be capable of individually, since each element being at a different point gathers slightly different overlapping information. Hence by processing such information one can obtain a clear image. Furthermore multiple information from sectors of an array of sensors can be processed to obtain 3-D, stereotypic and panoramic imaging and may be connected to each other allowing seeing around obstacles as well as enabling full 3-D tracking and/or metric determination of an unknown object. Color/spectroscopic imaging can be achieved by utilizing equally sized lenses and multi-wavelength sensing layers below the lenses. However, color/spectroscopic imaging and/or spectroscopy can be achieved by taking advantage of unique optical properties of nano-scaled lenses accepting various wavelengths below their diffraction limits.

    Abstract translation: 由具有每个光学元件多于一个像素的阵列格式布置的多个纳米尺寸光学元件组成的成像系统/照相机将具有比每个元件能够单独地更高的分辨率,因为每个元件在不同点聚集在一起 不同的重叠信息。 因此,通过处理这样的信息,可以获得清晰的图像。 此外,可以处理来自传感器阵列的多个信息以获得3-D,定型和全景成像,并且可以彼此连接,从而可以看到障碍物周围以及启用完整的3-D跟踪和/或度量确定 未知物体 彩色/分光成像可以通过利用透镜下方的相同尺寸的透镜和多波长感测层来实现。 然而,可以通过利用纳米级透镜的独特的光学性能来实现颜色/光谱成像和/或光谱学,该纳米尺度的透镜接受低于其衍射极限的各种波长。

    Apparatus and method for aligning surfaces
    8.
    发明申请
    Apparatus and method for aligning surfaces 审中-公开
    用于对齐表面的装置和方法

    公开(公告)号:US20120032377A1

    公开(公告)日:2012-02-09

    申请号:US10576499

    申请日:2004-10-25

    Abstract: Method, apparatus and stamp for aligning a first surface (11) of a first object (10) with a second surface (22) of a second object (20), facing said first surface, wherein light of a predetermined wavelength is introduced into one (10) of said objects and caused to propagate by internal reflection therein. The first and second surfaces carry correlating structures (13,25) which, when arranged at close distance from each other, couple light from said one object to the other of said objects by near-field tunneling, to a degree dependent on the overlap of said structures. A light detector (26) is devised to detect a signal which is dependent on the amount of light coupled between said objects, for producing an alignment control signal. The invention is suitable for use in nanoimprint lithography.

    Abstract translation: 将第一物体(10)的第一表面(11)与面向所述第一表面的第二物体(20)的第二表面(22)对准的方法,装置和印模,其中预定波长的光被引入一个 (10)并且通过其中的内部反射而传播。 第一表面和第二表面携带相关结构(13,25),当相邻结构彼此靠近地布置时,通过近场隧道将光从所述一个物体耦合到另一个物体,其程度取决于 说结构。 设计光检测器(26)以检测取决于耦合在所述物体之间的光量的信号,以产生对准控制信号。 本发明适用于纳米压印光刻。

    Arrangement for detecting resonance frequency shifts
    9.
    发明授权
    Arrangement for detecting resonance frequency shifts 失效
    用于检测共振频率偏移的装置

    公开(公告)号:US07966881B2

    公开(公告)日:2011-06-28

    申请号:US12226658

    申请日:2007-04-25

    CPC classification number: G01G3/16

    Abstract: The present invention relates to an arrangement (1) for detection of a first resonance frequency (F1), related to a mass (1b′) loaded carrier means (1b), and to compare said first resonance frequency (F1) with a second, as a reference used, resonance frequency (F2), related to said carrier means (1b), by using frequency comparing and/or calculating means (3, 4) to evaluate, by a noted frequency shift (F2-F1), a mass weight (1b′). An array of individual carrier means (1a, 1b . . . 1n) are arranged adjacent to each other, that one or more of said carrier means are allotted different second resonance frequencies, that received resonance frequencies (F1) from said loaded carrier means are received and/or evaluated simultaneously, or at least essentially simultaneously, in a signal receiving and/or processing unit (3) and that said first resonance frequencies (F1) are compared and/or calculated within said calculating means (3, 4) with corresponding resonance frequencies (F2) stored in said unit (3, 4) in a memory (4b) thereof.

    Abstract translation: 本发明涉及一种用于检测与质量(1b')加载的载体装置(1b)相关的第一共振频率(F1)的装置(1),并将所述第一共振频率(F1)与第二共振频率 作为参考,通过使用频率比较和/或计算装置(3,4)来与所述载体装置(1b)相关的共振频率(F2),以通过所述频移(F2-F1)来评估质量 重量(1b')。 各个载体装置(1a,1b,...,1i)的阵列彼此相邻布置,所述载体装置中的一个或多个被分配有不同的第二共振频率,从所述加载的载体装置接收的共振频率(F1) 在信号接收和/或处理单元(3)中同时或至少基本上同时接收和/或评估所述第一共振频率(F1),并且在所述计算装置(3,4)内与 在其存储器(4b)中存储在所述单元(3,4)中的对应的共振频率(F2)。

    Arrangement Adapted to Evaluate the Intensity of or a Changing in the Intensity of an Electro-Magnetic Beam or a Bundle of Beams
    10.
    发明申请
    Arrangement Adapted to Evaluate the Intensity of or a Changing in the Intensity of an Electro-Magnetic Beam or a Bundle of Beams 审中-公开
    适用于评估电磁束或束束强度的强度或变化的布置

    公开(公告)号:US20090310125A1

    公开(公告)日:2009-12-17

    申请号:US12066981

    申请日:2006-09-14

    Abstract: The present invention refers to an arrangement adapted to evaluate the spectral intensity of and/or a changing in the spectral intensity of an electro-magnetic beam or a bundle of beams, whereby said bundle of beams is directed towards and received by a lens element and where said lens element is adapted to direct said bundle of beams towards a multitude of electro-magnetic beam to an electric signal transforming means, named as an opto-electric transforming means, said means adapted to generate an electric signal representative to said spectral intensity of or said changing in said spectral intensity of said beam. The invention suggests that a multitude of lens elements shall expose dimensions adapted within a sub-micron scale (10−6 m) and that at least one of said opto-electric transforming means, preferably a multitude of said means, is arranged adjacent to said lens element.

    Abstract translation: 本发明涉及一种适于评估电磁束或束束的光谱强度的光谱强度和/或改变光束强度的装置,由此所述光束束被引导并由透镜元件接收, 其中所述透镜元件适于将所述束束朝向大量电磁束引导到被称为光电变换装置的电信号变换装置,所述装置适于产生代表所述光电强度的所述光强度的电信号 或所述光束的所述光谱强度的所述改变。 本发明提出,多个透镜元件应暴露适应于亚微米尺度(10-6μm)内的尺寸,并且所述光电转换装置中的至少一个,优选地多个所述装置,被布置为与所述 透镜元件

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