公开(公告)号：US07165957B2

公开(公告)日：2007-01-23

申请号：US10221331

申请日：2001-03-14

Applicant: Lars Montelius ,  Babak Heidari ,  Thord Stjernholm

Inventor： Lars Montelius ,  Babak Heidari ,  Thord Stjernholm

IPC: B30B15/24

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0017

Abstract: A device is provided for transferring a pattern to an object. The device may be used for transferring a pattern, such as micro- or nanostructures, from a stamp to an object. In accordance with one embodiment, the device comprises a first contacting means with a receiving surface for the stamp and a second contacting means with a receiving surface for the object. The device may further include a pressing means that is adapted to operate at least one of the contacting means for contacting the stamp with the object. One of the contacting means may include a base and a holder. The holder has a first end which defines one of the receiving surfaces and a second opposite end which is pivotally connected to the base in such a manner that the stamp and the object are automatically placed in a parallel position when contacting each other.

Abstract translation: 提供了用于将图案转印到对象的装置。 该装置可以用于将图案（例如微结构或纳米结构）从印模转移到物体。 根据一个实施例，该装置包括具有用于印模的接收表面的第一接触装置和具有用于该物体的接收表面的第二接触装置。 该装置还可以包括压紧装置，其适于操作接触装置中的至少一个，用于使印模与物体接触。 接触装置中的一个可以包括基座和支架。 保持器具有限定其中一个接收表面的第一端和以这样的方式可枢转地连接到基座的第二相对端，使得当彼此接触时，印模和物体被自动地放置在平行位置。

公开(公告)号：US06923930B2

公开(公告)日：2005-08-02

申请号：US10181487

申请日：2001-01-19

Applicant: Torbjörn Ling ,  Lars Montelius ,  Babak Heidari

Inventor： Torbjörn Ling ,  Lars Montelius ,  Babak Heidari

IPC: G03F7/00 ,  B29C33/66 ,  B81C1/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S977/887

Abstract: A metal mold for use in a nano-imprinting process comprises a firmly adhering monomolecular non-sticking layer. The layer was obtained by subjecting the mold to a reaction with a fluoroalkyl compound having a mercapto group. As a result of said reaction, the layer comprises an organic sulfide of said metal.

Abstract translation: 用于纳米压印方法的金属模具包括牢固粘附的单分子不粘层。 通过使模具与具有巯基的氟烷基化合物反应来获得该层。 作为所述反应的结果，该层包含所述金属的有机硫化物。

公开(公告)号：US20050077285A1

公开(公告)日：2005-04-14

申请号：US10958588

申请日：2004-10-06

Applicant: Babak Heidari ,  Lars Montelius

Inventor： Babak Heidari ,  Lars Montelius

IPC: H05B3/20 ,  B29C43/02 ,  B29C43/52 ,  B81B7/00 ,  G03F7/16 ,  G03F7/38 ,  H01L21/027 ,  H05B3/00 ,  H01L29/792

CPC classification number: G03F7/0002 ,  B29C43/021 ,  B29C43/52 ,  B29C2043/025 ,  B29K2105/256 ,  B81B7/0096 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/168 ,  G03F7/38

Abstract: A device for homogeneous heating of an object comprises a supporting surface for supporting the object, and a heating layer arranged on the supporting surface. The heating layer absorbs at least partly energy received from a radiation source and emits at least partly the thus-absorbed energy to the object supported on the supporting surface. The layer is made of a material such that the energy absorbed by the layer is in a self-regulating manner distributed uniformly along the surface of the layer. The heating device forms a simple and compact unit which can be used to rapidly heat the object to a homogeneous temperature.

Abstract translation: 用于物体均匀加热的装置包括用于支撑物体的支撑表面和布置在支撑表面上的加热层。 加热层吸收至少部分从辐射源接收的能量，并且至少部分地将如此吸收的能量发射到支撑在支撑表面上的物体。 该层由材料制成，使得被层吸收的能量处于沿层的表面均匀分布的自调节方式。 加热装置形成一个简单紧凑的单元，可用于将物体快速加热到均匀的温度。

公开(公告)号：US07997890B2

公开(公告)日：2011-08-16

申请号：US11905036

申请日：2007-09-27

Applicant: Babak Heidari ,  Marc Beck

Inventor： Babak Heidari ,  Marc Beck

IPC: B29C59/00 ,  B28B17/00 ,  B29B13/08

CPC classification number: G03F7/0002 ,  B29C35/0888 ,  B29C43/003 ,  B29C43/021 ,  B29C43/10 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2043/025 ,  B29C2043/3647 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00

Abstract: Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104;105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114;116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template. The apparatus further includes a heater device having a surface facing said spacing, for heating either fluid layer (14).

Abstract translation: 用于将图案从具有结构化表面的模板（10）传送到承载可辐射聚合流体（14）的表面层的基底（12）的装置和方法。 该设备包括具有相对表面（104; 105）的第一主要部分（101）和第二主要部分（102），用于调节所述主要部分之间的间距（115），用于支撑所述模板的支撑装置（106） 在与所述结构化表面相对于所述表面层的所述间隔中相互平行接合的衬底，设计成将辐射发射到所述间隔中的辐射源（110）。 空腔（115）具有第一壁，该第一壁包括被设计为接合所述模板或基底的柔性膜（113），并且提供装置（114; 116），用于将可调节的超压施加到存在于所述空腔中的介质，由此均匀分布 在基板和模板之间的整个接触表面上获得力。 该装置还包括具有面向所述间隔的表面的加热器装置，用于加热流体层（14）。

公开(公告)号：US20080229941A1

公开(公告)日：2008-09-25

申请号：US11808890

申请日：2007-06-13

Applicant: Babak Heidari

Inventor： Babak Heidari

IPC: B31F1/20

CPC classification number: G03F7/0002 ,  B29C59/04 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00

Abstract: An apparatus and a method in connection with the lithography of structures on a micro or nanometer scale. A nano-imprinting apparatus according to an embodiment of the invention comprises two rotatably mounted rollers for transferring a pattern of micro or nanometer size to the substrate to be patterned. A first rotatably mounted roller has a patterned circumferential surface for transferring a pattern from the first rotatably mounted roller to a deformable substrate by contacting the patterned surface with the substrate. A second rotatably mounted roller has a principally smooth circumferential surface which faces the patterned surface of the first rotatably mounted roller. Furthermore, the second rotatably mounted roller is rotatably coupled with the first rotatably mounted roller for synchronized rotation of the first and second rollers. The substrate is movable between the first and second rollers such that, when these rollers rotate with respect to each other, the patterned surface of the first rotatably mounted roller comes into contact with the substrate whereby this pattern is transferred from the patterned surface to the substrate.

Abstract translation: 与微观或纳米尺度的结构光刻相关的装置和方法。 根据本发明的实施例的纳米压印装置包括两个可旋转地安装的辊，用于将微米或纳米尺寸的图案转印到待图案化的基底上。 第一可旋转地安装的辊具有图案化的圆周表面，用于通过使图案化表面与基底接触将图案从第一可旋转地安装的辊转移到可变形基底。 第二可旋转地安装的辊具有面向第一可旋转地安装的辊的图案化表面的主要平滑的圆周表面。 此外，第二可旋转地安装的辊与第一可旋转地安装的辊可旋转地联接，用于第一和第二辊的同步旋转。 衬底可以在第一和第二辊之间移动，使得当这些辊相对于彼此旋转时，第一可旋转地安装的辊的图案化表面与衬底接触，由此该图案从图案化表面转移到衬底 。

公开(公告)号：US07195734B2

公开(公告)日：2007-03-27

申请号：US10149072

申请日：2000-12-04

Applicant: Babak Heidari

Inventor： Babak Heidari

IPC: B28B1/10

CPC classification number: B82Y10/00 ,  B41M1/06 ,  B82Y40/00 ,  G03F7/0002

Abstract: Device in connection with the lithography of structures of nanometer size, which device comprises a first main part (1) with a first principally plane surface (2a) and a second main part (3) with a second principally plane surface (9a), said first surface and second surface being opposite to one another and being arranged in principle parallel in relation to one another, with an adjustable interval between them, and said first and second surface being arranged to form a support for a substrate (5) and a template (10) respectively, or vice-versa. According to the invention, said second main part (3) also comprises a cavity (6) for a medium, and means for adjusting a pressure of said medium, a wall of said cavity consisting of a flexible membrane (9), of which one side, which side faces away from the cavity (6), forms said second surface (9a). The invention also relates to a method that utilizes the device.

Abstract translation: 与纳米尺寸结构的平版印刷有关的装置，该装置包括具有第一主要平面表面（2a）的第一主要部分（1）和具有第二主要平面（9a）的第二主要部分（3） ，所述第一表面和第二表面彼此相对并且原则上彼此平行地布置，在它们之间具有可调节的间隔，并且所述第一和第二表面被布置成形成用于基底（5）和 一个模板（10），反之亦然。 根据本发明，所述第二主要部分（3）还包括用于介质的空腔（6）和用于调节所述介质的压力的装置，所述空腔的壁由柔性膜（9）组成，其中一个 所述侧面远离所述空腔（6），形成所述第二表面（9a）。 本发明还涉及利用该装置的方法。

公开(公告)号：US20070018362A1

公开(公告)日：2007-01-25

申请号：US10581497

申请日：2004-11-03

Applicant: Babak Heidari ,  Marc Beck

Inventor： Babak Heidari ,  Marc Beck

IPC: B29C35/08 ,  B29C45/12 ,  B29C43/10

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/2012 ,  H05K3/0014 ,  H05K3/0023 ,  H05K3/107 ,  H05K2201/0108 ,  H05K2203/0108

Abstract: Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104; 105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114; 116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template.

Abstract translation: 用于将图案从具有结构化表面的模板（10）传送到承载可辐射聚合流体（14）的表面层的基底（12）的装置和方法。 该设备包括具有相对表面（104; 105）的第一主要部分（101）和第二主要部分（102），用于调节所述主要部分之间的间距（115），用于支撑所述模板的支撑装置（106） 在与所述结构化表面相对于所述表面层的所述间隔中相互平行接合的衬底，设计成将辐射发射到所述间隔中的辐射源（110）。 空腔（115）具有第一壁，该第一壁包括被设计为接合所述模板或基底的柔性膜（113），并且提供装置（114; 116），用于将可调节的超压施加到存在于所述空腔中的介质，由此均匀分布 在基板和模板之间的整个接触表面上获得力。

公开(公告)号：US20060279025A1

公开(公告)日：2006-12-14

申请号：US11268574

申请日：2005-11-08

Applicant: Babak Heidari ,  Anette Lofstrand ,  Erik Bolmsjo ,  Erik Theander ,  Marc Beck

Inventor： Babak Heidari ,  Anette Lofstrand ,  Erik Bolmsjo ,  Erik Theander ,  Marc Beck

IPC: B29C59/02 ,  B29C35/08

CPC classification number: B29C33/3857 ,  B29C35/0888 ,  B29C59/022 ,  B29C59/026 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: The invention relates to a two-step process for transferring a pattern from a template (1) to a target surface of a substrate, by creating an intermediate flexible polymer stamp (5) from the template in a primary step, and then using the polymer stamp to make an imprint in a radiation-sensitive moldable layer on the target surface in a secondary step. In the secondary step, the process steps of pressing the polymer stamp and the substrate against each other, UV exposure of the moldable layer through the polymer stamp, and postbaking of the radiated moldable layer, are all performed at a control constant temperature, in order to eliminate damages to the pattern created in the moldable layer caused by thermal expansion effects.

Abstract translation: 本发明涉及通过在初级步骤中从模板中生成中间柔性聚合物印模（5），然后使用聚合物（2），将图案从模板（1）转移到基材的目标表面的两步法 在第二步骤中对目标表面上的辐射敏感的可成型层进行印记。 在第二步骤中，将聚合物印模和基板彼此挤压，通过聚合物印模的可模制层的UV曝光和辐射的可模塑层的后烘烤的工艺步骤全部按照控制恒温进行 以消除由热膨胀效应引起的在可模塑层中产生的图案的损坏。

公开(公告)号：US07972553B2

公开(公告)日：2011-07-05

申请号：US11579540

申请日：2004-11-25

Applicant: Marc Beck ,  Babak Heidari ,  Erik Bolmsjö ,  Erik Theander

Inventor： Marc Beck ,  Babak Heidari ,  Erik Bolmsjö ,  Erik Theander

IPC: B29C35/02 ,  B29C35/08

CPC classification number: G03F7/0002 ,  B29C35/0888 ,  B29C43/003 ,  B29C43/021 ,  B29C43/10 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2043/025 ,  B29C2043/3647 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00

Abstract: Method for transferring a pattern from a template (10) having a structured surface (11) to a substrate (12) carrying a surface layer (14) of a material devised to 5 solidify upon exposure to radiation, comprising: arranging said template and substrate mutually parallel in an imprint apparatus, with said structured surface facing said surface layer; heating the template and the substrate to a temperature Tp by means of a heater device (20); and while maintaining said temperature Tp, performing the steps of: pressing the template towards the substrate for imprinting said pattern into said layer; exposing said layer to radiation (19) for solidifying the layer, and—postbaking the layer.

Abstract translation: 用于将图案从具有结构化表面（11）的模板（10）转移到承载设计为5的材料的表面层（14）的基底（12）的方法，其在暴露于辐射时固化，包括：布置所述模板和基底 在压印装置中相互平行，所述结构化表面面向所述表面层; 通过加热器装置（20）将模板和衬底加热至温度Tp; 并且在保持所述温度Tp的同时，执行以下步骤：将模板压向基板以将所述图案压印到所述层中; 将所述层暴露于辐射（19）以固化该层，并且对该层进行后烘烤。

公开(公告)号：US20080138460A1

公开(公告)日：2008-06-12

申请号：US12007750

申请日：2008-01-15

Applicant: Babak Heidari ,  Marc Beck

Inventor： Babak Heidari ,  Marc Beck

IPC: B28B1/00

CPC classification number: B81C1/0046 ,  B29C33/60 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: An improved method for nanoimprint lithography and more specifically for providing a nano-scale pattern on a substrate is disclosed. According to the improvement, a mould (100) and a substrate (115) are provided wherein the substrate (115) is provided with a plurality of coating layers (120, 125, 130) before pressing the mould (100) and substrate (115) together for transferring a pattern from the mould (100) to the substrate (115). According to the invention, the substrate is provided with an uppermost layer (130) having a pure anti-adhesive function.

Abstract translation: 公开了一种用于纳米压印光刻的改进方法，并且更具体地用于在衬底上提供纳米级图案。 根据改进，提供了一种模具（100）和基板（115），其中在压制模具（100）和基板（115）之前，基板（115）设置有多个涂层（120,125,130） ）一起用于将图案从模具（100）传送到基板（115）。 根据本发明，衬底设置有具有纯粹的抗粘附功能的最上层（130）。