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    Two-grid ion energy analyzer and methods of manufacturing and operating
    1.
    发明授权
    Two-grid ion energy analyzer and methods of manufacturing and operating 有权
    双栅离子能量分析仪及其制造和运行方法

    公开(公告)号：US07777179B2

    公开(公告)日：2010-08-17

    申请号：US12059983

    申请日：2008-03-31

    Applicant: Lee Chen ,  Lin Xu ,  Ronald Victor Bravenec

    Inventor： Lee Chen ,  Lin Xu ,  Ronald Victor Bravenec

    IPC: H01J37/04 ,  H01J49/00 ,  H01J3/26

    CPC classification number: H01J37/05 ,  H01J37/32422 ,  H01J37/32935 ,  H01J49/443 ,  H01J2237/053

    Abstract: An ion energy analyzer is described for use in diagnosing the ion energy distribution (IED) of ions incident on a radio frequency (RF) biased substrate immersed in plasma. The ion energy analyzer comprises an entrance grid exposed to the plasma, an electron rejection grid disposed proximate to the entrance grid, and an ion current collector disposed proximate to the electron rejection grid. The ion current collector is coupled to an ion selection voltage source configured to positively bias the ion current collector by an ion selection voltage, and the electron rejection grid is coupled to an electron rejection voltage source configured to negatively bias the electron rejection grid by an electron rejection voltage. Furthermore, an ion current meter is coupled to the ion current collector to measure the ion current.

    Abstract translation: 描述了用于诊断入射在等离子体中的射频（RF）偏压衬底上的离子的离子能量分布（IED）的离子能量分析器。 离子能量分析器包括暴露于等离子体的入口网格，靠近入口格栅设置的电子排斥栅极，以及靠近电子排除栅格设置的离子集电器。 离子集电器耦合到离子选择电压源，该离子选择电压源被配置为通过离子选择电压对离子集电器进行正偏置，并且电子抑制栅极耦合到电子抑制电压源，其被配置为通过电子 拒绝电压。 此外，离子电流计耦合到离子集电器以测量离子电流。

    Suppressor of hollow cathode discharge in a shower head fluid distribution system
    2.
    发明授权
    Suppressor of hollow cathode discharge in a shower head fluid distribution system 有权
    喷淋头流体分配系统中的空心阴极放电抑制器

    公开(公告)号：US07744720B2

    公开(公告)日：2010-06-29

    申请号：US11951861

    申请日：2007-12-06

    Applicant: Lee Chen ,  Lin Xu

    Inventor： Lee Chen ,  Lin Xu

    IPC: H01L21/3065 ,  C23C16/455 ,  C23C16/505 ,  B21K21/08

    CPC classification number: H01J37/32623 ,  H01J37/3244 ,  H01J2237/0206 ,  Y10T29/41 ,  Y10T29/49432

    Abstract: A chamber component configured to be coupled to a process chamber and a method of fabricating the chamber component is described. The chamber component comprises a chamber element comprising a first surface on a supply side of the chamber element and a second surface on a process side of the chamber element, wherein the chamber element comprises a reentrant cavity formed in the first surface and a conduit having an inlet coupled to the reentrant cavity and an outlet coupled to the second surface. Furthermore, the chamber component comprises an insertable member configured to couple with the reentrant cavity, the insertable member having one or more passages formed there through and each of the one or more passages are aligned off-axis from the conduit, wherein the one or more passages are configured to receive a process fluid on the supply side and the conduit is configured to distribute the process fluid from the one or more passages on the process side.

    Abstract translation: 描述了被配置为联接到处理室的室部件和制造室部件的方法。 室部件包括室元件，其包括在腔室元件的供给侧上的第一表面和腔室元件的过程侧上的第二表面，其中，腔室元件包括形成在第一表面中的折返腔，以及具有 入口耦合到所述凹陷腔和连接到所述第二表面的出口。 此外，腔室部件包括被配置为与凹陷腔联接的可插入部件，该可插入部件具有一个或多个通道，该通道形成于此处，并且该一个或多个通道中的每个通道与管道离轴对准，其中一个或多个 通道被配置为在供应侧上接收过程流体，并且导管被配置成从处理侧上的一个或多个通道分配过程流体。

    ION ENERGY ANALYZER AND METHODS OF MANUFACTURING AND OPERATING
    3.
    发明申请
    ION ENERGY ANALYZER AND METHODS OF MANUFACTURING AND OPERATING 有权
    离子能量分析仪及其制造和操作方法

    公开(公告)号：US20090242790A1

    公开(公告)日：2009-10-01

    申请号：US12059855

    申请日：2008-03-31

    Applicant: Lee Chen ,  Lin Xu ,  Ronald Victor Bravenec

    Inventor： Lee Chen ,  Lin Xu ,  Ronald Victor Bravenec

    IPC: H01J37/04

    CPC classification number: H01J37/05 ,  H01J37/32422 ,  H01J37/32935 ,  H01J49/443 ,  H01J2237/053

    Abstract: An ion energy analyzer is described for use in diagnosing the ion energy distribution (IED) of ions incident on a radio frequency (RF) biased substrate immersed in plasma. The ion energy analyzer comprises an entrance grid exposed to the plasma, an ion selection grid disposed proximate to the entrance grid, an electron rejection grid disposed proximate to the ion selection grid, and an ion current collector disposed proximate to the electron rejection grid. The ion selection grid is coupled to an ion selection voltage source configured to positively bias the ion selection grid by an ion selection voltage, and the electron rejection grid is coupled to an electron rejection voltage source configured to negatively bias the electron rejection grid by an electron rejection voltage. Furthermore, an ion current meter is coupled to the ion current collector to measure the ion current.

    Abstract translation: 描述了用于诊断入射在等离子体中的射频（RF）偏压衬底上的离子的离子能量分布（IED）的离子能量分析器。 离子能量分析器包括暴露于等离子体的入口栅格，靠近入口栅格设置的离子选择栅格，靠近离子选择栅极设置的电子排斥栅格，以及靠近电子排斥栅极设置的离子集电器。 离子选择网格耦合到离子选择电压源，其被配置为通过离子选择电压对离子选择栅极进行正偏置，并且电子抑制栅极耦合到被配置为通过电子负偏置电子排斥栅极的电子阻挡电压源 拒绝电压。 此外，离子电流计耦合到离子集电器以测量离子电流。

    Hollow cathode device and method for using the device to control the uniformity of a plasma process
    4.
    发明授权
    Hollow cathode device and method for using the device to control the uniformity of a plasma process 有权
    空心阴极器件和使用该器件来控制等离子体工艺的均匀性的方法

    公开(公告)号：US08409459B2

    公开(公告)日：2013-04-02

    申请号：US12039236

    申请日：2008-02-28

    Applicant: Kazuki Denpoh ,  Peter L G Ventzek ,  Lin Xu ,  Lee Chen

    Inventor： Kazuki Denpoh ,  Peter L G Ventzek ,  Lin Xu ,  Lee Chen

    IPC: H01L21/306

    CPC classification number: H01L21/02 ,  C23C16/45563 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/505 ,  C23C16/509 ,  C23C16/5096 ,  H01J31/00 ,  H01J37/3244 ,  H01J37/32596

    Abstract: A chamber component configured to be coupled to a processing chamber is described. The chamber component comprises one or more adjustable gas passages through which a process gas is introduced to the process chamber. The adjustable gas passage may be configured to form a hollow cathode that creates a hollow cathode plasma in a hollow cathode region having one or more plasma surfaces in contact with the hollow cathode plasma. Therein, at least one of the one or more plasma surfaces is movable in order to vary the size of the hollow cathode region and adjust the properties of the hollow cathode plasma. Furthermore, one or more adjustable hollow cathodes may be utilized to adjust a plasma process for treating a substrate.

    Abstract translation: 描述了被配置为联接到处理室的室部件。 腔室部件包括一个或多个可调节的气体通道，工艺气体通过该气体通道被引入到处理室。 可调节气体通道可以被配置成形成空心阴极，该中空阴极在中空阴极区域中形成中空阴极等离子体，其具有与空心阴极等离子体接触的一个或多个等离子体表面。 其中，一个或多个等离子体表面中的至少一个可移动以便改变中空阴极区域的尺寸并调节中空阴极等离子体的性质。 此外，可以使用一个或多个可调整的中空阴极来调节用于处理衬底的等离子体工艺。

    Ion energy analyzer and methods of manufacturing and operating
    5.
    发明授权
    Ion energy analyzer and methods of manufacturing and operating 有权
    离子能量分析仪及其制造和操作方法

    公开(公告)号：US07875859B2

    公开(公告)日：2011-01-25

    申请号：US12059855

    申请日：2008-03-31

    Applicant: Lee Chen ,  Lin Xu ,  Ronald Victor Bravenec

    Inventor： Lee Chen ,  Lin Xu ,  Ronald Victor Bravenec

    IPC: G01K1/08

    CPC classification number: H01J37/05 ,  H01J37/32422 ,  H01J37/32935 ,  H01J49/443 ,  H01J2237/053

    Abstract: An ion energy analyzer is described for use in diagnosing the ion energy distribution (IED) of ions incident on a radio frequency (RF) biased substrate immersed in plasma. The ion energy analyzer comprises an entrance grid exposed to the plasma, an ion selection grid disposed proximate to the entrance grid, an electron rejection grid disposed proximate to the ion selection grid, and an ion current collector disposed proximate to the electron rejection grid. The ion selection grid is coupled to an ion selection voltage source configured to positively bias the ion selection grid by an ion selection voltage, and the electron rejection grid is coupled to an electron rejection voltage source configured to negatively bias the electron rejection grid by an electron rejection voltage. Furthermore, an ion current meter is coupled to the ion current collector to measure the ion current.

    Abstract translation: 描述了用于诊断入射在等离子体中的射频（RF）偏压衬底上的离子的离子能量分布（IED）的离子能量分析器。 离子能量分析器包括暴露于等离子体的入口栅格，靠近入口栅格设置的离子选择栅格，靠近离子选择栅极设置的电子排斥栅格，以及靠近电子排斥栅极设置的离子集电器。 离子选择网格耦合到离子选择电压源，其被配置为通过离子选择电压对离子选择栅极进行正偏置，并且电子抑制栅极耦合到被配置为通过电子负偏置电子排斥栅极的电子阻挡电压源 拒绝电压。 此外，离子电流计耦合到离子集电器以测量离子电流。

    HOLLOW CATHODE DEVICE AND METHOD FOR USING THE DEVICE TO CONTROL THE UNIFORMITY OF A PLASMA PROCESS
    6.
    发明申请
    HOLLOW CATHODE DEVICE AND METHOD FOR USING THE DEVICE TO CONTROL THE UNIFORMITY OF A PLASMA PROCESS 有权
    中空阴极设备和使用设备来控制等离子体过程的均匀性的方法

    公开(公告)号：US20090218212A1

    公开(公告)日：2009-09-03

    申请号：US12039236

    申请日：2008-02-28

    Applicant: Kazuki Denpoh ,  Peter LG Ventzek ,  Lin Xu ,  Lee Chen

    Inventor： Kazuki Denpoh ,  Peter LG Ventzek ,  Lin Xu ,  Lee Chen

    IPC: H01L21/306

    CPC classification number: H01L21/02 ,  C23C16/45563 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/505 ,  C23C16/509 ,  C23C16/5096 ,  H01J31/00 ,  H01J37/3244 ,  H01J37/32596

    Abstract: A chamber component configured to be coupled to a processing chamber is described. The chamber component comprises one or more adjustable gas passages through which a process gas is introduced to the process chamber. The adjustable gas passage may be configured to form a hollow cathode that creates a hollow cathode plasma in a hollow cathode region having one or more plasma surfaces in contact with the hollow cathode plasma. Therein, at least one of the one or more plasma surfaces is movable in order to vary the size of the hollow cathode region and adjust the properties of the hollow cathode plasma. Furthermore, one or more adjustable hollow cathodes may be utilized to adjust a plasma process for treating a substrate.

    Abstract translation: 描述了被配置为联接到处理室的室部件。 腔室部件包括一个或多个可调节的气体通道，工艺气体通过该气体通道被引入到处理室。 可调节气体通道可以被配置成形成空心阴极，该中空阴极在中空阴极区域中形成中空阴极等离子体，其具有与空心阴极等离子体接触的一个或多个等离子体表面。 其中，一个或多个等离子体表面中的至少一个可移动以便改变中空阴极区域的尺寸并调节中空阴极等离子体的性质。 此外，可以使用一个或多个可调整的中空阴极来调节用于处理衬底的等离子体工艺。

    Tracking variable information in optimized code
    10.
    发明授权
    Tracking variable information in optimized code 有权
    跟踪优化代码中的变量信息

    公开(公告)号：US08656377B2

    公开(公告)日：2014-02-18

    申请号：US12813404

    申请日：2010-06-10

    Applicant: Lin Xu ,  Weiping Hu ,  Yongkang Zhu

    Inventor： Lin Xu ,  Weiping Hu ,  Yongkang Zhu

    IPC: G06F9/45

    CPC classification number: G06F8/437

    Abstract: Embodiments are directed to tracking variable location information in optimized code and efficiently collecting and storing reaching definition information. A computer system receives a portion of source code at a compiler, where the compiler is configured to compile and optimize the source code for execution. The computer system tags selected variables in the source code with a tag, where the tag is configured to provide location information for the variable. The computer system optimizes the received portion of source code including changing at least one of the tagged variables. The computer system also tracks the tagged variables as the variables are changed by the compiler during code optimization and persists the variable location information, so that the persisted variable location information is available to other compiler components.

    Abstract translation: 实施例涉及在优化代码中跟踪可变位置信息并有效地收集和存储到达定义信息。 计算机系统在编译器处接收一部分源代码，其中编译器被配置为编译和优化用于执行的源代码。 计算机系统使用标签将源代码中的选定变量标记，其中标签被配置为提供变量的位置信息。 计算机系统优化所接收的源代码部分，包括改变至少一个标记变量。 计算机系统还跟踪标记的变量，因为编码器在代码优化期间改变了变量，并且持续存在变量位置信息，使得持久变量位置信息可用于其他编译器组件。

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