Abstract:
The present invention is related to a process for reducing surface energy of a hole transport layer. The disclosed process comprises providing a hole transport layer; and providing a fluorine-containing layer directly on said hole transport layer. The configuration of said fluorine-containing layer reduces the structural disorder of an active layer and is able to recover a moisture-degraded hole transport layer, and thereby improves the performance of an electric device containing the same.
Abstract:
A single step method of forming a composite of ductile niobium particles within a matrix of brittle niobium aluminum is taught. The method involves completely ablating the end of a rod of a niobium aluminum intermetallic with a laser beam to form a plume of vaporous and particulate material and depositing the ablated material on a receiving surface disposed proximate the rod end being ablated. A surface composite structure is formed in a single step and has ductile particles within a brittle matrix.
Abstract:
A semiconductor material structure includes at least one region capable of generating electrons and holes each having an associated mean kinetic energy during operation. A material layer in proximity to the region provides an associated potential energy larger than the mean kinetic energy associated with the generated electrons and the mean kinetic energy associated with the holes.
Abstract:
A semiconductor material structure includes at least one region capable of generating electrons and holes each having an associated mean kinetic energy during operation. A material layer in proximity to the region provides an associated potential energy larger than the mean kinetic energy associated with the generated electrons and the mean kinetic energy associated with the holes.
Abstract:
A novel material Si.sub.X C.sub.y N.sub.z, having a crystal structure similar to that of a.Si.sub.3 N.sub.4 with carbon atoms substituting most of the Si sites, is synthesized in crystalline form onto crystalline Si substrates by microwave plasma enhanced decomposition of carbon, silicon and nitrogen containing gasses.
Abstract translation:具有类似于具有碳原子取代大部分Si位点的Si 3 N 4的晶体结构的新型材料SiXCyNz通过碳,硅和含氮气体的微波等离子体增强分解以晶体形式合成在晶体Si衬底上。
Abstract:
A method for modifying a surface of a powder is provided. The method includes steps of providing a polar aprotic solvent; and mixing the polar aprotic solvent with the powder so that the polar aprotic solvent adheres to the surface of the powder.
Abstract:
This invention refers to surface modification/functionalization of Nitride nanomaterials and electrochemistry and optical measurement based upon such functionalized Nitride materials. With this invention a variety of bio-molecules such as DNA, protein, and antigens can be immobilized on the surface for measurement to realize ultra-sensitive chemical- and bio-sensing applications.
Abstract:
Doped tungsten powder, or sintered tungsten bodies formed therefrom, having a fine dispersion of oxide particles of at least one metal from the group zirconium, hafnium, lanthanum, yttrium, and rare earth's are formed by the method of this invention. A mixture of a salt solution comprised of a soluble salt of the metal, and a tungsten blue oxide powder is formed. A hydroxide precipitating solution is admixed with the mixture to form a hydroxide precipitate of the metal on the tungsten blue oxide powder. The tungsten blue oxide powder and hydroxide precipitate are heated in a reducing atmosphere to form the tungsten powder having the dispersion of oxide particles. The doped tungsten powder can be consolidated and sintered to form tungsten bodies having a fine dispersion of the metal oxide.
Abstract:
This invention refers to surface modification/functionalization of Nitride nanomaterials and electrochemistry and optical measurement based upon such functionalized Nitride materials. With this invention a variety of bio-molecules such as DNA, protein, and antigens can be immobilized on the surface for measurement to realize ultra-sensitive chemical- and bio-sensing applications.
Abstract:
Nanotip arrays are formed by exposing a substrate to a process gas mixture that simultaneously forms nanomasks on the substrate surface and etches exposed portions of the substrate surface to form the nanotip array. Components of the process gas mixture form nanocrystallites on the surface of the substrate, thereby masking portions of the substrate from other components of the process gas mixture, which etch exposed portions of the substrate. Accordingly, nanotip arrays formed using this technique can have nanocrytallite endpoints.