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    Method for making an island of material confined between electrodes, and application to transistors
    4.
    发明授权
    Method for making an island of material confined between electrodes, and application to transistors 失效
    用于制造限制在电极之间的材料岛的方法，以及应用于晶体管的方法

    公开(公告)号：US07041539B2

    公开(公告)日：2006-05-09

    申请号：US10450966

    申请日：2001-12-17

    申请人： David Fraboulet ,  Denis Mariolle ,  Yves Morand

    发明人： David Fraboulet ,  Denis Mariolle ,  Yves Morand

    IPC分类号： H01L21/336

    CPC分类号： B82Y10/00 ,  H01L29/66439 ,  H01L29/7613 ,  Y10S438/962

    摘要： A method produces a microstructure comprising an island of material confined between two electrodes forming barriers, the island (30) of material having lateral flanks running parallel to and lateral flanks running perpendicular to the barriers, wherein the lateral flanks of the island are defined by etching of at least one layer (16), called the template layer, and the barriers are formed by damascening. The method includes (a) a first etching of the template layer using a first etching mask having at least one filiform part, and (b) a second etching of the template layer, subsequent to the first etching, using a second etching mask also having at least one filiform part, oriented in a direction forming a non-zero angle with a direction of orientation of the filiform part of the first mask, in the vicinity of the site of formation of the island.

    摘要翻译： 一种方法产生一种微结构，该微结构包含限定在形成阻挡层的两个电极之间的材料岛，所述岛状物（30）具有横向平行的横向侧面和垂直于所述阻挡层的横向侧面，其中岛的横向侧面由蚀刻 的至少一层（16），称为模板层，并且屏障通过破坏形成。 该方法包括：（a）使用具有至少一个丝状部分的第一蚀刻掩模对模板层进行第一次蚀刻，以及（b）第一次蚀刻之后，使用第二蚀刻掩模， 至少一个丝状部分，在与岛的形成部位相邻的方向上与第一掩模的丝状部分的取向方向成非零角度的方向取向。

    METHOD FOR CORRECTING ASTIGMATISM IN ELECTRON EMISSION SPECTROMICROSCOPY IMAGING
    5.
    发明申请
    METHOD FOR CORRECTING ASTIGMATISM IN ELECTRON EMISSION SPECTROMICROSCOPY IMAGING 有权
    电子发射光谱成像中校正方法

    公开(公告)号：US20100200747A1

    公开(公告)日：2010-08-12

    申请号：US12638311

    申请日：2009-12-15

    申请人： Olivier RENAULT ,  Maylis Lavayssiere ,  Denis Mariolle

    发明人： Olivier RENAULT ,  Maylis Lavayssiere ,  Denis Mariolle

    IPC分类号： G01N23/225

    CPC分类号： H01J37/153 ,  H01J37/26

    摘要： A method for correcting astigmatism of an electronic optical column of an electron emission spectromicroscope, comprising the steps of: forming a reference structure on a surface of a sample comprising a structure of interest to be imaged, imaging the reference structure by the spectromicroscope with secondary electrons and with core level photoelectrons, eliminating astigmatism defects appearing during the imaging of the reference structure with secondary electrons and with core level photoelectrons, a material of the reference structure being chosen such that, during core level photoelectron imaging, the contrast C between the average intensity Ia of the material of the reference structure and the average intensity Ib of the material of the sample is such that: C = I a - I b I a + I b ≥ 0.2 .

    摘要翻译： 一种用于校正电子发射光谱显微镜的电子光学柱的散光的方法，包括以下步骤：在包含要成像的感兴趣结构的样品的表面上形成参考结构，用二次电子通过显微镜对参考结构进行成像 并且使用核心级光电子，消除在二次电子和核心级光电子参考结构成像期间出现的散光缺陷，参考结构的材料被选择为使得在核心级光电子成像期间，对比度C在平均强度 参考结构的材料1a和样品材料的平均强度Ib为：C = I a -I b I a + I b≥0.2。

    Method for the Collective Fabrication of Carbon Nanofibers on the Surface of Micropatterns Constructed on the Surface of a Substrate and Structure Comprising Nanofibers on the Surface of Micropatterns
    6.
    发明申请
    Method for the Collective Fabrication of Carbon Nanofibers on the Surface of Micropatterns Constructed on the Surface of a Substrate and Structure Comprising Nanofibers on the Surface of Micropatterns 有权
    在基体表面构成的微图案表面上的碳纳米纤维的集体制造方法以及包含微图案表面上的纳米纤维的结构

    公开(公告)号：US20100258525A1

    公开(公告)日：2010-10-14

    申请号：US12747966

    申请日：2008-12-09

    申请人： Louis Gorintin ,  Jean Dijon ,  Hélène Le Poche ,  Denis Mariolle

    发明人： Louis Gorintin ,  Jean Dijon ,  Hélène Le Poche ,  Denis Mariolle

    IPC分类号： C23F1/00 ,  B05D5/00

    CPC分类号： G01Q70/12 ,  B82Y15/00 ,  B82Y30/00 ,  B82Y35/00 ,  D01F9/127

    摘要： The invention relates to a nanofiber fabrication method comprising nanofiber growth from a catalyst zone, furthermore comprising the following steps: producing at least one micropattern (11) on the surface of a substrate (1); producing a catalyst zone (50) on the surface of said micropattern; nanofiber growth from the catalyst zone, characterized in that the micropattern (11) comprises a base, at least partially convergent side walls and an upper face, said base being covered with a so-called “poison” layer (4) where no nanofiber growth catalysis effect can take place, the so-called “poison” layer not being present on said upper face; the base being covered with a catalyst layer (5) on the surface of the so-called “poison” layer; the thickness of the “poison” layer and the thickness of the catalyst layer being such that the nanofibers cannot grow either on the side walls or on the base of the micropatterns constructed beforehand.

    摘要翻译： 本发明涉及一种纳米纤维制造方法，其包括从催化剂区域的纳米纤维生长，此外还包括以下步骤：在基材（1）的表面上制备至少一个微图案（11）; 在所述微图案的表面上产生催化剂区（50）; 其特征在于，所述微图案（11）包括基底，至少部分会聚的侧壁和上表面，所述基底被所谓的“毒物”层（4）覆盖，其中没有纳米纤维生长 可以发生催化作用，所谓的“毒物”层不存在于所述上表面上; 所述基底被所谓的“毒”层的表面上的催化剂层（5）覆盖; “毒”层的厚度和催化剂层的厚度使得纳米纤维不能在预先构成的微图案的侧壁或基底上生长。

    Method for the collective fabrication of carbon nanofibers on the surface of micropatterns constructed on the surface of a substrate
    7.
    发明授权
    Method for the collective fabrication of carbon nanofibers on the surface of micropatterns constructed on the surface of a substrate 有权
    在基板表面上构造的微图案表面上集体制造碳纳米纤维的方法

    公开(公告)号：US09222959B2

    公开(公告)日：2015-12-29

    申请号：US12747966

    申请日：2008-12-09

    申请人： Louis Gorintin ,  Jean Dijon ,  Hélène Le Poche ,  Denis Mariolle

    发明人： Louis Gorintin ,  Jean Dijon ,  Hélène Le Poche ,  Denis Mariolle

    IPC分类号： B44C1/22 ,  G01Q70/12 ,  B82Y15/00 ,  B82Y30/00 ,  B82Y35/00 ,  D01F9/127

    CPC分类号： G01Q70/12 ,  B82Y15/00 ,  B82Y30/00 ,  B82Y35/00 ,  D01F9/127

    摘要： The invention relates to a nanofiber fabrication method comprising nanofiber growth from a catalyst zone, furthermore comprising the following steps: producing at least one micropattern (11) on the surface of a substrate (1); producing a catalyst zone (50) on the surface of said micropattern; nanofiber growth from the catalyst zone, characterized in that the micropattern (11) comprises a base, at least partially convergent side walls and an upper face, said base being covered with a so-called “poison” layer (4) where no nanofiber growth catalysis effect can take place, the so-called “poison” layer not being present on said upper face; the base being covered with a catalyst layer (5) on the surface of the so-called “poison” layer; the thickness of the “poison” layer and the thickness of the catalyst layer being such that the nanofibers cannot grow either on the side walls or on the base of the micropatterns constructed beforehand.

    摘要翻译： 本发明涉及一种纳米纤维制造方法，其包括从催化剂区域的纳米纤维生长，此外还包括以下步骤：在基材（1）的表面上制备至少一个微图案（11）; 在所述微图案的表面上产生催化剂区（50）; 其特征在于，所述微图案（11）包括基底，至少部分会聚的侧壁和上表面，所述基底被所谓的“毒物”层（4）覆盖，其中没有纳米纤维生长 可以发生催化作用，所谓的“毒物”层不存在于所述上表面上; 所述基底被所谓的“毒”层的表面上的催化剂层（5）覆盖; “毒”层的厚度和催化剂层的厚度使得纳米纤维不能在预先构成的微图案的侧壁或基底上生长。

    Method for correcting astigmatism in electron emission spectromicroscopy imaging
    8.
    发明授权
    Method for correcting astigmatism in electron emission spectromicroscopy imaging 有权
    电子发射光谱显微成像校正散光的方法

    公开(公告)号：US08089044B2

    公开(公告)日：2012-01-03

    申请号：US12638311

    申请日：2009-12-15

    申请人： Olivier Renault ,  Maylis Lavayssiere ,  Denis Mariolle

    发明人： Olivier Renault ,  Maylis Lavayssiere ,  Denis Mariolle

    IPC分类号： H01J37/00 ,  H01J37/153

    CPC分类号： H01J37/153 ,  H01J37/26

    摘要： A method for correcting astigmatism of an electronic optical column of an electron emission spectromicroscope, comprising the steps of: forming a reference structure on a surface of a sample comprising a structure of interest to be imaged, imaging the reference structure by the spectromicroscope with secondary electrons and with core level photoelectrons, eliminating astigmatism defects appearing during the imaging of the reference structure with secondary electrons and with core level photoelectrons, a material of the reference structure being chosen such that, during core level photoelectron imaging, the contrast C between the average intensity Ia of the material of the reference structure and the average intensity Ib of the material of the sample is such that: C = I a - I b I a + I b ≥ 0.2 .

    摘要翻译： 一种用于校正电子发射光谱显微镜的电子光学柱的散光的方法，包括以下步骤：在包含要成像的感兴趣结构的样品的表面上形成参考结构，用二次电子通过显微镜对参考结构进行成像 并且使用核心级光电子，消除在二次电子和核心级光电子参考结构成像期间出现的散光缺陷，参考结构的材料被选择为使得在核心级光电子成像期间，对比度C在平均强度 参考结构的材料1a和样品材料的平均强度Ib为：C = I a -I b I a + I b≥0.2。