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1.发明授权Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements 有权光刻设备被配置为补偿由于光学元件的加热引起的投影特征的临界尺寸的变化公开(公告)号：US08068212B2
公开(公告)日：2011-11-29
申请号：US12892733
申请日：2010-09-28
CPC分类号： G03B27/42 , G03F7/70558 , G03F7/70891
摘要： A lithographic apparatus configured to apply corrections to the dose, within and/or between fields, to compensate for critical dimension variations due to heating of elements of the projection system is disclosed.
摘要翻译： 公开了一种光刻设备，其被配置为在场内和/或场之间对剂量进行校正，以补偿由于投影系统的元件的加热引起的临界尺寸变化。
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2.发明授权公开(公告)号：US07829249B2
公开(公告)日：2010-11-09
申请号：US11713787
申请日：2007-03-05
IPC分类号： G03F9/00
CPC分类号： G03B27/42 , G03F7/70558 , G03F7/70891
摘要： In a device manufacturing method using a lithographic apparatus, corrections to the dose are applied, within and/or between fields, to compensate for CD variations due to heating of elements of the projection system of the lithographic apparatus.
摘要翻译： 在使用光刻设备的器件制造方法中，在场内和/或场之间施加对剂量的校正，以补偿由于光刻设备的投影系统的元件的加热引起的CD变化。
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3.发明申请公开(公告)号：US20080220345A1
公开(公告)日：2008-09-11
申请号：US11713787
申请日：2007-03-05
CPC分类号： G03B27/42 , G03F7/70558 , G03F7/70891
摘要： In a device manufacturing method using a lithographic apparatus, corrections to the dose are applied, within and/or between fields, to compensate for CD variations due to heating of elements of the projection system of the lithographic apparatus.
摘要翻译： 在使用光刻设备的器件制造方法中，在场内和/或场之间施加对剂量的校正，以补偿由于光刻设备的投影系统的元件的加热引起的CD变化。
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公开(公告)号：US09482967B2
公开(公告)日：2016-11-01
申请号：US13238861
申请日：2011-09-21
申请人： Marcus Adrianus Van De Kerkhof , Johannes Henricus Wilhelmus Jacobs , Tammo Uitterdijk , Nicolas Alban Lallemant
发明人： Marcus Adrianus Van De Kerkhof , Johannes Henricus Wilhelmus Jacobs , Tammo Uitterdijk , Nicolas Alban Lallemant
CPC分类号： G03F7/70858 , G03F7/70258 , G03F7/70341 , G03F7/705 , G03F7/70575 , G03F7/706
摘要： An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.
摘要翻译： 公开了一种浸没式光刻设备，其具有用于分别测量和/或预测与浸没液体的温度波动相关的影响的测量系统或预测系统，以及用于控制与温度相关的或另一效应的控制系统 基于由测量系统和/或预测系统获得的测量和/或预测的浸没液体。 还公开了一种相关的控制系统和设备制造方法。
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5.发明授权公开(公告)号：US09229338B2
公开(公告)日：2016-01-05
申请号：US13059405
申请日：2009-07-27
IPC分类号： G01B11/00 , G03B27/32 , G03B27/54 , G03B27/74 , H01L23/28 , G03F7/20 , G03F9/00 , H01L23/544
CPC分类号： G01N21/9501 , G01N21/4738 , G01N2201/06113 , G01N2201/10 , G02B5/1823 , G02B5/1861 , G03F7/70058 , G03F7/70633 , G03F7/70683 , G03F9/70 , G03F9/7046 , G03F9/7076 , H01L23/544 , H01L2924/0002 , Y10T428/24612 , H01L2924/00
摘要： Scatterometry for measuring overlay. A second set of superimposed gratings are superposed over a first set of superimposed gratings. The second set of gratings have a different periodicity from the first set of gratings or a different orientation. Consequently the first order diffraction pattern from the second set of superimposed gratings can be distinguished from the first order diffraction pattern from the first set of superimposed gratings.
摘要翻译： 用于测量覆盖层的散射法。 第二组叠加的光栅叠加在第一组叠加的光栅上。 第二组光栅具有与第一组光栅不同的周期性或不同的取向。 因此，来自第二组叠加光栅的一阶衍射图可以与来自第一组叠加光栅的一阶衍射图案区分开。
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6.发明授权Lithographic apparatus, distortion determining method, and patterning device 有权平版印刷装置，变形确定方法和图案形成装置公开(公告)号：US08988653B2
公开(公告)日：2015-03-24
申请号：US12727054
申请日：2010-03-18
CPC分类号： G03B27/68 , G03F7/70783 , G03F7/7085
摘要： The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, wherein apparatus is operable to measure higher-order distortions and/or image plane deviations of the patterning device, apparatus comprising: a device for transmission image detection; and a processor configured and arranged to model higher-order distortions of the patterning device using signals received from the device for transmission image detection; wherein patterning device has a main imaging field, and a perimeter and apparatus is operable to model higher-order distortions using signals resultant from alignment structures comprised in perimeter and/or in the imaging field.
摘要翻译： 本发明涉及一种布置成将图案从图案形成装置转移到基板上的光刻设备，其中装置可操作以测量图案形成装置的高阶失真和/或图像平面偏差，该装置包括：用于透射图像检测的装置 ; 以及处理器，其被配置和布置成使用从所述设备接收的信号来模拟所述图案形成装置的高阶失真用于透射图像检测; 其中图案形成装置具有主成像区域，并且周边和装置可操作以使用由周边和/或成像区域中的对准结构产生的信号来建模高阶失真。
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公开(公告)号：US08786825B2
公开(公告)日：2014-07-22
申请号：US12936327
申请日：2009-04-20
CPC分类号： G03F7/7065 , G01N21/47 , G01N21/4788 , G01N21/9501 , G01N21/956 , G03F7/70633 , G03F9/7049 , G03F9/7088
摘要： The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.
摘要翻译： 本发明使用在图像平面内或附近测量衍射光谱，以便确定曝光的基底的性质。 特别地，正和负的第一衍射级被分离或发散，被检测并且测量它们的强度以确定衬底上的暴露层的覆盖层（或其它性质）。
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公开(公告)号：US08724087B2
公开(公告)日：2014-05-13
申请号：US12933481
申请日：2009-04-08
申请人： Marcus Adrianus Van De Kerkhof , Antoine Gaston Marie Kiers , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Scott Anderson Middlebrooks , Andreas Fuchs
发明人： Marcus Adrianus Van De Kerkhof , Antoine Gaston Marie Kiers , Maurits Van Der Schaar , Leonardus Henricus Marie Verstappen , Scott Anderson Middlebrooks , Andreas Fuchs
IPC分类号： G03B27/54
CPC分类号： G03F7/70616 , G01N21/47 , G01N21/9501
摘要： A scatterometer configured to measure a property of a substrate, includes a radiation source configured to provide a radiation beam; and a detector configured to detect a spectrum of the radiation beam reflected from a target (30) on the surface of the substrate (W) and to produce a measurement signal representative of the spectrum. The apparatus includes a beam shaper (51, 53) interposed in the radiation path between the radiation source and the detector, the beam shaper being configured to adjust the cross section of the beam dependent on the shape and/or size of the target.
摘要翻译： 配置成测量衬底性质的散射仪包括被配置为提供辐射束的辐射源; 以及检测器，其被配置为检测从所述基板（W）的表面上的目标（30）反射的所述辐射束的光谱，并产生表示所述光谱的测量信号。 该装置包括插入在辐射源和检测器之间的辐射路径中的光束整形器（51,53），光束整形器被配置为根据目标的形状和/或尺寸来调节光束的横截面。
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9.发明申请LITHOGRAPHIC APPARATUS, COMPUTER PROGRAM PRODUCT AND DEVICE MANUFACTURING METHOD 有权计算机设备，计算机程序产品和设备制造方法公开(公告)号：US20120019795A1
公开(公告)日：2012-01-26
申请号：US13174013
申请日：2011-06-30
IPC分类号： G03B27/54
CPC分类号： G03F9/7088 , G03F9/7046
摘要： Disclosed is a device manufacturing method and associated apparatus, the method comprising transferring a pattern from a patterning device onto a substrate. The method relates to the alignment of said patterning device and said substrate, and comprises imparting a radiation beam onto an alignment structure on said patterning device so as to obtain a resultant aerial image; scanning an image sensor in accordance with a scanning scheme, through a target volume containing said resultant aerial image, the relative positions of said image sensor and said substrate being known or subsequently determined; and measuring features of said image and thereby determining of the location of the alignment structure relative to the image sensor; wherein an alternative scanning scheme is used in which, for example two or more scans through the whole target volume are performed, having a total duration the same as a conventional single continuous scan.
摘要翻译： 公开了一种器件制造方法和相关设备，该方法包括将图案从图案形成装置转移到衬底上。 该方法涉及所述图案形成装置和所述基板的对准，并且包括将辐射束施加到所述图案形成装置上的对准结构上，以获得所得到的空间图像; 通过包含所述得到的空间图像的目标体积根据扫描方案扫描图像传感器，所述图像传感器和所述基板的相对位置是已知的或随后确定的; 并且测量所述图像的特征，从而确定所述对准结构相对于所述图像传感器的位置; 其中使用替代扫描方案，其中例如执行通过整个目标体积的两次或多次扫描，其具有与常规单次连续扫描相同的总持续时间。
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公开(公告)号：US08035798B2
公开(公告)日：2011-10-11
申请号：US11482119
申请日：2006-07-07
CPC分类号： G03F7/70775 , G03F7/70058 , G03F7/70191 , G03F7/70341 , G03F7/7055 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
摘要翻译： 提供了一种光刻设备，其具有在基底水平的传感器，所述传感器包括辐射接收器，支撑辐射接收器的透射板和辐射探测器，其中所述传感器布置成避免辐射接收器与最终的辐射之间的辐射损失 辐射探测器的元件。
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