公开(公告)号：US20170062186A1

公开(公告)日：2017-03-02

申请号：US14837512

申请日：2015-08-27

Applicant: MKS Instruments, Inc.

Inventor： David J. COUMOU ,  Ross REINHARDT ,  Yuiry ELNER ,  Daniel M. GILL ,  Richard PHAM

IPC: H01J37/32

CPC classification number: H01J37/32155 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32165 ,  H01J37/32972 ,  H01J37/3299 ,  H01J2237/334

Abstract: A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.

Abstract translation: 用于控制对诸如等离子体室的负载施加电力的RF电源的系统包括主电源和从电源。 主电源向从电源提供诸如频率和相位信号的控制信号。 从电源接收频率和相位信号，并且还接收从负载检测到的频谱发射特性的信号。 从射频电源改变施加到负载的RF输出信号的相位和功率。 功率变化控制离子分布函数的宽度，改变相位控制离子分布的峰值。 根据RF发生器和负载之间的耦合，检测不同的光谱发射，包括一次谐波，二次谐波，并且在双频驱动系统的情况下，互调失真。

公开(公告)号：US20140062305A1

公开(公告)日：2014-03-06

申请号：US13826571

申请日：2013-03-14

Applicant: MKS INSTRUMENTS, INC.

Inventor： Jesse N. KLEIN ,  Richard PHAM

IPC: G01R31/00 ,  H01J37/32

CPC classification number: G01R31/00 ,  H01J37/32 ,  H01J37/32183 ,  H01J37/32935

Abstract: A system includes a control module, a detection module, and a reaction module. The control module is configured to receive a sensor signal indicating a power characteristic of an output power provided from a power generator to a load. The load is separate from the control module and the power generator. The detection module is configured to (i) detect a shift parameter of the power characteristic based on the sensor signal, (ii) compare the shift parameter to a first threshold, and (iii) indicate whether the shift parameter has exceeded the first threshold and not a second threshold. The reaction module is configured to indicate that a low-level abnormality exists in the load in response to the shift parameter exceeding the first threshold and not the second threshold.

Abstract translation: 系统包括控制模块，检测模块和反应模块。 控制模块被配置为接收指示从发电机提供给负载的输出功率的功率特性的传感器信号。 负载与控制模块和发电机分开。 检测模块被配置为（i）基于传感器信号检测功率特性的移位参数，（ii）将移位参数与第一阈值进行比较，以及（iii）指示移位参数是否超过第一阈值，以及 不是第二个门槛。 反应模块被配置为响应于超过第一阈值而不是第二阈值的移动参数来指示负载中存在低电平异常。

公开(公告)号：US20190333738A1

公开(公告)日：2019-10-31

申请号：US16509088

申请日：2019-07-11

Applicant: MKS Instruments, Inc.

Inventor： David J. COUMOU ,  Ross REINHARDT ,  Yuriy ELNER ,  Daniel M. GILL ,  Richard PHAM

IPC: H01J37/32

Abstract: A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.

公开(公告)号：US20140306754A1

公开(公告)日：2014-10-16

申请号：US14324540

申请日：2014-07-07

Applicant: MKS Instruments, Inc.

Inventor： David J. COUMOU ,  Richard PHAM

IPC: H03G1/00 ,  H03F3/189 ,  H03F3/20 ,  H03F1/56

CPC classification number: H03G1/00 ,  H03F1/0211 ,  H03F1/56 ,  H03F3/189 ,  H03F3/20 ,  H03H7/40

Abstract: A RF power supply system for delivering periodic RF power to a load. A power amplifier outputs a RF signal to the load. A sensor measures the RF signal provided to the load and outputs signals that vary in accordance with the RF signal. A first feedback loop enables control the RF signal based upon power determined in accordance with output from the sensor. A second feedback loop enables control the RF signal based upon energy measured in accordance with signals output from the sensor. Energy amplitude and duration provide control values for varying the RF signal. The control system and techniques are applicable to both pulsed RF power supplies and in various instances to continuous wave power supplies.

Abstract translation: 用于向负载提供周期性RF功率的RF电源系统。 功率放大器将RF信号输出到负载。 传感器测量提供给负载的RF信号，并输出根据RF信号变化的信号。 第一反馈环路使得能够根据根据传感器的输出确定的功率来控制RF信号。 第二反馈回路使得能够根据根据从传感器输出的信号测量的能量来控制RF信号。 能量幅度和持续时间提供用于改变RF信号的控制值。 控制系统和技术适用于脉冲式RF电源以及各种情况下的连续波浪电源。