SUBSTRATE TREATMENT APPARATUS, METHOD OF TRANSFERRING SUBSTRATE, AND NON-TRANSITORY COMPUTER STORAGE MEDIUM
    1.
    发明申请
    SUBSTRATE TREATMENT APPARATUS, METHOD OF TRANSFERRING SUBSTRATE, AND NON-TRANSITORY COMPUTER STORAGE MEDIUM 有权
    基板处理装置,基板转印方法和非电子计算机存储介质

    公开(公告)号:US20120116567A1

    公开(公告)日:2012-05-10

    申请号:US13281535

    申请日:2011-10-26

    IPC分类号: G06F19/00

    摘要: A coating and developing treatment apparatus includes a substrate transfer mechanism; a defect inspection section; means for controlling transfer of a substrate; means for classifying a defect based on the state of the defect; means for storing a transfer route of the substrate by the substrate transfer mechanism when the substrate has been treated by treatment sections; and means for specifying, based on a kind of the defect classified by the defect classification means and the transfer route of the substrate stored in the storage means, a treatment section which is a cause of occurrence of the classified defect, and judging presence or absence of an abnormality of the specified treatment section, wherein the transfer control means controls the substrate transfer mechanism to transfer a substrate bypassing the treatment section which has been judged to be abnormal by the defective treatment specification means.

    摘要翻译: 涂布显影处理装置包括基板转印机构; 缺陷检查部; 用于控制基板转印的装置; 基于缺陷状态对缺陷进行分类的手段; 用于在基板被处理部处理时通过基板转印机构存储基板的转印路径的装置; 以及用于基于由缺陷分类装置分类的缺陷的种类和存储在存储装置中的基板的传送路线来指定作为分类缺陷的发生原因的处理部分,并且判断是否存在 指定处理部的异常,其中转移控制装置控制基板转移机构,以传递旁路通过缺陷处理指定装置判断为异常的处理部的基板。