公开(公告)号：US4592625A

公开(公告)日：1986-06-03

申请号：US469015

申请日：1983-02-23

申请人： Makoto Uehara ,  Satoru Anzai ,  Kyoichi Suwa

发明人： Makoto Uehara ,  Satoru Anzai ,  Kyoichi Suwa

IPC分类号： G02B13/22 ,  G02B19/00 ,  G02B21/08 ,  G02B27/00 ,  G03F7/20 ,  G01B11/00

CPC分类号： G03F7/70241 ,  G02B13/22

摘要： A double-conjugate maintaining optical system for maintaining the conjugate relation between an object and its image even if the distance between the object and the image varies and also maintaining another set of conjugate relation in a predetermined condition includes an afocal system comprising a plurality of lens units, a first positive lens unit disposed on the object side of the afocal system, and a second positive lens unit disposed on the image side of the afocal system. The first positive lens unit is movable relative to the second positive lens unit so that the object is positioned on the focal plane of the first positive lens unit opposite to the afocal system. The afocal system is movable along the optical axis thereof in a predetermined relation with the first positive lens unit.

摘要翻译： 即使物体与图像之间的距离发生变化并且在预定条件下也保持另一组共轭关系的双重共轭维持光学系统，用于保持物体与其图像之间的共轭关系，包括包括多个透镜的无焦点系统 设置在无焦点系统的物体侧的第一正透镜单元和设置在无焦系统的像侧上的第二正透镜单元。 第一正透镜单元可相对于第二正透镜单元移动，使得物体位于与无焦系统相对的第一正透镜单元的焦平面上。 无焦点系统可以沿其光轴以与第一正透镜单元预定的关系移动。

公开(公告)号：US4498762A

公开(公告)日：1985-02-12

申请号：US451394

申请日：1982-12-20

申请人： Makoto Uehara ,  Satoru Anzai

发明人： Makoto Uehara ,  Satoru Anzai

IPC分类号： H01L21/30 ,  G01B11/00 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F9/7049

摘要： A projection type exposure apparatus has a projection objective lens, a projection negative having a predetermined shape pattern and an alignment mark, and a photosensitive plate having an alignment mark. The shape pattern of the projection negative is projected upon the photosensitive plate by the projection objective lens. Main illuminating optical means illuminates the projection negative with a first wavelength light to which the photosensitive plate is sensitive, and alignment optical means illuminates the projection negative with a second wavelength light to which the photosensitive plate is insensitive. The positional relation between the projection negative and the photosensitive plate is detected using the second wavelength light through the projection objective lens. One of the alignment mark on the projection negative and the alignment mark on the photosensitive plate has a zone pattern which forms a light-condensing point at a position spaced apart by a predetermined amount from the surface on which said one mark is formed, and said predetermined amount corresponds to the amount of chromatic aberration of the projection objective lens, at the side thereof adjacent to said zone pattern, for the second wavelength light relative to the first wavelength light.

摘要翻译： 投影型曝光装置具有投影物镜，具有预定形状图案的投影阴极和对准标记，以及具有对准标记的感光板。 投影阴影的形状图案通过投影物镜投影在感光板上。 主照明光学装置用感光板敏感的第一波长光照亮投影阴极，并且对准光学装置用感光板不敏感的第二波长光照射投影负片。 使用通过投影物镜的第二波长光来检测投影负片和感光片之间的位置关系。 投影负极上的对准标记和感光板上的对准标记之一具有区域图案，该区域图案在与形成有所述一个标记的表面间隔开预定量的位置处形成聚光点，并且所述区域图案 预定量对应于相对于第一波长光的第二波长光的投影物镜的与所述区域图案相邻的一侧的色差量。

公开(公告)号：US4798962A

公开(公告)日：1989-01-17

申请号：US16120

申请日：1987-02-18

申请人： Koichi Matsumoto ,  Yutaka Suenaga ,  Makoto Uehara ,  Kiyoyuki Muramatsu

发明人： Koichi Matsumoto ,  Yutaka Suenaga ,  Makoto Uehara ,  Kiyoyuki Muramatsu

IPC分类号： G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/67 ,  H01L21/68 ,  G01B11/00

CPC分类号： G03F9/70

摘要： A projection exposure apparatus has a pattern lighting optical system including an exposure light source for lighting a pattern on a photomask, a projection optical system for forming an image of the pattern lighted by the exposure light source on the surface of a wafer, an alignment lighting optical system including an alignment light source for lighting alignment marks on the photomask and the wafer, and an alignment optical system for detecting relative positional relationship between the mask pattern and the wafer through the projection optical system, and further the projection optical system includes an image-forming system which exhibits two extremums of axial aberration as a function of wavelength.

摘要翻译： 投影曝光装置具有图案照明光学系统，其包括用于点亮光掩模上的图案的曝光光源，用于在晶片表面上形成由曝光光源照射的图案的图像的投影光学系统，对准照明 光学系统，包括用于照明光掩模和晶片上的对准标记的对准光源，以及用于通过投影光学系统检测掩模图案和晶片之间的相对位置关系的对准光学系统，此外，投影光学系统包括图像 表现出作为波长的函数的两个轴向像差极值的系统。

公开(公告)号：US4789242A

公开(公告)日：1988-12-06

申请号：US894840

申请日：1986-08-08

申请人： Shuhei Takagi ,  Makoto Uehara ,  Koichi Matsumoto

发明人： Shuhei Takagi ,  Makoto Uehara ,  Koichi Matsumoto

IPC分类号： G02B27/46 ,  G01B11/00 ,  G01S17/02 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/70 ,  G01S17/02

摘要： An optical apparatus comprising a laser light source, an optical system for focusing a beam of light from the laser light source onto an object surface through an objective lens and a spatial filter disposed at the entrance pupil of the objective lens or at a position conjugated with the entrance pupil, wherein the origin of the divergence of the laser beam having an angle of divergence emitted from the laser light source is projected on the entrance pupil of the objective lens by the optical system.

摘要翻译： 一种光学装置，包括激光光源，用于通过物镜将来自激光光源的光束聚焦到物体表面上的光学系统，以及设置在物镜的入射光瞳上的空间滤光器或与物镜共轭的位置 入射光瞳，其中具有从激光源发射的发散角的激光束的发散的原点通过光学系统投影在物镜的入射光瞳上。

公开(公告)号：US4769750A

公开(公告)日：1988-09-06

申请号：US918131

申请日：1986-10-14

申请人： Koichi Matsumoto ,  Makoto Uehara ,  Tetsuo Kikuchi

发明人： Koichi Matsumoto ,  Makoto Uehara ,  Tetsuo Kikuchi

IPC分类号： G02B3/00 ,  G02B19/00 ,  G02B27/09 ,  G03F7/20 ,  F21V7/04 ,  G03B21/14

CPC分类号： G02B27/0961 ,  G02B19/0014 ,  G02B19/0047 ,  G02B27/09 ,  G02B3/0043 ,  G02B3/0056 ,  G02B3/0062 ,  G03F7/70058

摘要： An illumination optical system comprises a multi-beam generator which includes a plurality of each of two kinds of lens elements different in optical characteristics and which is interposed between a source for generating a collimated light beam and a light condenser. The multi-beam generator generates a large number of secondary light sources from the collimated light beam. The illumination optical system is capable of supplying illuminating light rays having an extremely uniform illumination distribution.

摘要翻译： 照明光学系统包括多光束发生器，其包括光学特性不同的两种透镜元件中的每一种，并且被插入在用于产生准直光束的光源和光聚光器之间。 多光束发生器从准直光束产生大量次级光源。 照明光学系统能够提供具有非常均匀的照明分布的照明光线。

公开(公告)号：US4637691A

公开(公告)日：1987-01-20

申请号：US576477

申请日：1984-02-02

申请人： Makoto Uehara ,  Sumio Hashimoto

发明人： Makoto Uehara ,  Sumio Hashimoto

IPC分类号： G03B27/54 ,  G02B5/00 ,  G02B17/08 ,  G02B19/00 ,  G02B21/06 ,  G02B27/09 ,  G02F1/19 ,  G03F7/20

CPC分类号： G03F7/70058 ,  G02B19/0028 ,  G02B19/0047 ,  G02B21/06 ,  G02B5/001

摘要： A mirror converging-type illumination optical system for converging light rays from a light source into substantially parallel light rays using a concave reflecting mirror having a secondary curved surface comprises a conical refraction member having a convex conical refraction surface at an input or incident side thereof and another convex conical refraction surface at an output side thereof. The refraction member is arranged in a path of the parallel light rays with a vertex of the conical refraction member being substantially aligned with the optical axis of the illumination optical system. The refraction member inverts the inner and outer portions of the incident parallel light rays. The absence of incident parallel light around the optical axis thereof is corrected to achieve a uniform intensity of light rays.

摘要翻译： 使用具有次级曲面的凹面反射镜将来自光源的光线会聚到基本上平行的光线的镜面会聚式照明光学系统包括在输入或入射侧具有凸锥形折射面的锥形折射构件， 在其输出侧的另一个凸锥形折射表面。 折射构件布置在平行光线的路径中，其中锥形折射构件的顶点基本上与照明光学系统的光轴对准。 折射构件使入射的平行光线的内部和外部反转。 校正光轴周围没有入射平行光，以实现均匀的光线强度。

公开(公告)号：US07699919B2

公开(公告)日：2010-04-20

申请号：US10665088

申请日：2003-09-22

申请人： Takanori Kamoto ,  Kiyobumi Morimoto ,  Makoto Uehara ,  Hiromi Nakatsu ,  Masanori Kinomoto

发明人： Takanori Kamoto ,  Kiyobumi Morimoto ,  Makoto Uehara ,  Hiromi Nakatsu ,  Masanori Kinomoto

IPC分类号： C09D11/02

CPC分类号： C09D11/40

摘要： An ink composition is prepared in such a manner that a difference between a dynamic surface tension (mN/m) measured by a maximum bubble pressure method at a temperature of 24 to 26° C. and a static surface tension (mN/m) is within a range from 0 to 7 (mN/m). The ink composition is stored in an ink tank of an ink head, and is supplied from the ink tank to an ink chamber having a discharge port, and a voltage is applied to partitions formed by a piezoelectric material to apply a pressure by the partitions to the ink composition stored in the ink chamber, whereby a liquid droplet of the ink composition is discharged from the discharge port and the liquid droplet is deposited on a recording material to record an image.

摘要翻译： 制备油墨组合物，使得在24至26℃的温度下通过最大气泡压力法测量的动态表面张力（mN / m）和静态表面张力（mN / m）之间的差为 在0至7（mN / m）的范围内。 油墨组合物储存在墨头的墨盒中，并从墨盒供给到具有排出口的墨室，并且将电压施加到由压电材料形成的隔板上以通过隔板施加压力 存储在墨水室中的墨水组合物，由此墨水组合物的液滴从排出口排出，液滴沉积在记录材料上以记录图像。

公开(公告)号：US06353716B1

公开(公告)日：2002-03-05

申请号：US09667591

申请日：2000-09-22

申请人： Makoto Uehara ,  Yasutaka Maeda ,  Ken Yamagishi ,  Masayasu Narimatsu ,  Hiroji Kawamoto ,  Yuka Sakagami ,  Tomoe Matsuoka

发明人： Makoto Uehara ,  Yasutaka Maeda ,  Ken Yamagishi ,  Masayasu Narimatsu ,  Hiroji Kawamoto ,  Yuka Sakagami ,  Tomoe Matsuoka

IPC分类号： G03G1500

CPC分类号： G03G15/0849 ,  G03G15/0853 ,  G03G15/0887 ,  G03G15/5058

摘要： An image forming apparatus including a developing unit for stocking a developing agent containing toner and forming a toner image on a photosensitive medium with the developing agent, a toner supply unit for supplying the toner to the developing unit, a toner specific concentration detecting unit for detecting the toner specific concentration of the developing agent stocked in the developing unit, a humidity detecting unit for detecting humidity in the neighborhood of the developing unit, a storage unit for storing the humidity information detected by the humidity detecting unit, and a toner specific concentration correcting unit for controlling the toner supply amount of the toner supply unit on the basis of the humidity information stored to correct the toner specific concentration, wherein the toner specific concentration correcting unit compares newly-detected humidity with reference humidity corresponding to the humidity which is detected at the time when the developing agent is stocked into the developing unit or exchanged by new developing agent and which is stored in the storage unit, and corrects the toner specific concentration in accordance with the comparison result.

摘要翻译： 一种图像形成装置，包括用于将含有调色剂的显影剂放置在显影剂上并在感光介质上形成调色剂图像的显影单元，用于向显影单元供应调色剂的调色剂供应单元，用于检测调色剂的浓度检测单元 存储在显影单元中的显影剂的调色剂比浓度，用于检测显影单元附近的湿度的湿度检测单元，用于存储由湿度检测单元检测的湿度信息的存储单元和调色剂特定浓度校正 单元，用于基于存储的用于校正调色剂特定浓度的湿度信息来控制调色剂供给单元的调色剂供应量，其中调色剂特异性浓度校正单元将新检测到的湿度与对应于湿度的参考湿度进行比较， 显影剂的时间 插入显影单元或由新显影剂交换并存储在存储单元中，并根据比较结果校正调色剂特定浓度。

公开(公告)号：US4859832A

公开(公告)日：1989-08-22

申请号：US92125

申请日：1987-09-02

申请人： Makoto Uehara ,  Hajime Ichikawa ,  Masahiko Yomoto ,  Shigeru Kato

发明人： Makoto Uehara ,  Hajime Ichikawa ,  Masahiko Yomoto ,  Shigeru Kato

IPC分类号： H01L21/00 ,  H05B3/00

CPC分类号： H01L21/67115 ,  H05B3/0047

摘要： An apparatus for annealing a substrate includes a plurality of annular light sources concentric about a predetermined axis, a holder for placing the substrate such that the substrate receives radiation from the plurality of annular light sources and is substantially perpendicular to the predetermined axis, and a measuring device having a measuring optical system with an optical axis substantially aligned with the predetermined axis. The measuring device is adapted to receive radiation through the measuring optical system from the substrate placed on the holder and to detect a temperature distribution of the substrate.

摘要翻译： 用于退火衬底的装置包括围绕预定轴线同心的多个环形光源，用于放置衬底的保持器，使得衬底接收来自多个环形光源的辐射并且基本上垂直于预定轴线，并且测量 具有测量光学系统的装置，其光轴基本上与预定轴线对准。 测量装置适于通过测量光学系统从放置在支架上的基板接收辐射并检测基板的温度分布。

公开(公告)号：US4780616A

公开(公告)日：1988-10-25

申请号：US099913

申请日：1987-09-22

申请人： Kenji Nishi ,  Hidemi Kawai ,  Kazuaki Suzuki ,  Makoto Uehara

发明人： Kenji Nishi ,  Hidemi Kawai ,  Kazuaki Suzuki ,  Makoto Uehara

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01N21/86

CPC分类号： G03F7/70058 ,  G03F7/706 ,  G03F9/70

摘要： The projection optical apparatus includes light-emitting means which are disposed on a stage movable along the image plane in the projection optical apparatus and which define a light-emitting plane having a predetermined shape; photoelectric detection means which is disposed at a position substantially in conjugate relationship with a pupil of said projection optical apparatus and which receives the light emitted from the light-emitting plane of the light-emitting means through the projection optical system and a mask in which a pattern is defined at a predetermined position; and position detection means which controls the stage in such a way that the image projected on the light-emitting plane is shifted in relation to the mask pattern and which detects the superposed position between the image and the pattern in response to the light signal derived from the photoelectric detection means while the projected image is shifted and to the position of the stage.

摘要翻译： 投影光学装置包括发光装置，其设置在能够沿着投影光学装置中的像面移动并且限定具有预定形状的发光面的台上; 光电检测装置，其设置在与所述投影光学装置的光瞳大致共轭关系的位置处，并且通过投影光学系统接收从发光装置的发光平面发射的光;以及掩模， 图案被限定在预定位置; 以及位置检测装置，其以这样的方式控制舞台，使得投影在发光平面上的图像相对于掩模图案移位，并且响应于从源图像发出的光信号检测图像和图案之间的叠加位置 光电检测装置，同时投影图像移动到舞台的位置。