-
1.发明授权Analog interferometric modulator device with electrostatic actuation and release 失效具有静电驱动和释放的模拟干涉式调制器装置公开(公告)号：US07649671B2
公开(公告)日：2010-01-19
申请号：US11444567
申请日：2006-06-01
申请人： Manish Kothari , Lior Kogut , Jeffrey B. Sampsell
发明人： Manish Kothari , Lior Kogut , Jeffrey B. Sampsell
CPC分类号： G02B26/001
摘要： A microelectromechanical system (MEMS) device includes a first electrode, a second electrode electrically insulated from the first electrode, and a third electrode electrically insulated from the first electrode and the second electrode. The MEMS device also includes a support structure which separates the first electrode from the second electrode and a reflective element located and movable between a first position and a second position. The reflective element is in contact with a portion of the device when in the first position and is not in contact with the portion of the device when in the second position. An adhesive force is generated between the reflective element and the portion when the reflective element is in the first position. Voltages applied to the first electrode, the second electrode, and the third electrode at least partially reduce or counteract the adhesive force.
摘要翻译： 微机电系统（MEMS）装置包括第一电极，与第一电极电绝缘的第二电极和与第一电极和第二电极电绝缘的第三电极。 MEMS器件还包括将第一电极与第二电极分开的支撑结构和位于第一位置和第二位置之间并可移动的反射元件。 反射元件在处于第一位置时与装置的一部分接触，并且当处于第二位置时不与装置的部分接触。 当反射元件处于第一位置时，在反射元件和部分之间产生粘合力。 施加到第一电极，第二电极和第三电极的电压至少部分地减小或抵消粘附力。
-
2.发明申请ANALOG INTERFEROMETRIC MODULATOR DEVICE WITH ELECTROSTATIC ACTUATION AND RELEASE 失效具有静电驱动和释放功能的模拟干涉仪调制器公开(公告)号：US20100118382A1
公开(公告)日：2010-05-13
申请号：US12687850
申请日：2010-01-14
申请人： Manish Kothari , Lior Kogut , Jeffrey B. Sampsell
发明人： Manish Kothari , Lior Kogut , Jeffrey B. Sampsell
IPC分类号： G02B26/00
CPC分类号： G02B26/001
摘要： A microelectromechanical system (MEMS) device includes a first electrode, a second electrode electrically insulated from the first electrode, and a third electrode electrically insulated from the first electrode and the second electrode. The MEMS device also includes a support structure which separates the first electrode from the second electrode and a reflective element located and movable between a first position and a second position. The reflective element is in contact with a portion of the device when in the first position and is not in contact with the portion of the device when in the second position. An adhesive force is generated between the reflective element and the portion when the reflective element is in the first position. Voltages applied to the first electrode, the second electrode, and the third electrode at least partially reduce or counteract the adhesive force.
摘要翻译： 微机电系统（MEMS）装置包括第一电极，与第一电极电绝缘的第二电极和与第一电极和第二电极电绝缘的第三电极。 MEMS器件还包括将第一电极与第二电极分开的支撑结构和位于第一位置和第二位置之间并可移动的反射元件。 反射元件在处于第一位置时与装置的一部分接触，并且当处于第二位置时不与装置的部分接触。 当反射元件处于第一位置时，在反射元件和部分之间产生粘合力。 施加到第一电极，第二电极和第三电极的电压至少部分地减小或抵消粘附力。
-
3.发明申请ANALOG INTERFEROMETRIC MODULATOR DEVICE WITH ELECTROSTATIC ACTUATION AND RELEASE 审中-公开具有静电驱动和释放功能的模拟干涉仪调制器公开(公告)号：US20120088027A1
公开(公告)日：2012-04-12
申请号：US13327675
申请日：2011-12-15
申请人： Manish Kothari , Lior Kogut , Jeffrey B. Sampsell
发明人： Manish Kothari , Lior Kogut , Jeffrey B. Sampsell
IPC分类号： B05D5/12
CPC分类号： G02B26/001
摘要： Examples of methods of manufacturing a microelectromechanical system (MEMS) device can include forming a first reflective layer on a substrate, forming a sacrificial layer over the first reflective layer, removing a portion of the sacrificial layer to form an opening, and filling the opening with a dielectric material to form a post. Some methods further include forming a second reflective layer over the sacrificial layer, removing a portion of the second reflective layer and a portion of the post to form a hole, filling the hole with a conductive material to form an electrode, and removing the sacrificial layer.
摘要翻译： 制造微机电系统（MEMS）器件的方法的实例可以包括在衬底上形成第一反射层，在第一反射层上形成牺牲层，去除牺牲层的一部分以形成开口，并且用 形成柱的电介质材料。 一些方法还包括在牺牲层上形成第二反射层，去除第二反射层的一部分和柱的一部分以形成孔，用导电材料填充孔以形成电极，以及去除牺牲层 。
-
4.发明授权Analog interferometric modulator device with electrostatic actuation and release 失效具有静电驱动和释放的模拟干涉式调制器装置公开(公告)号：US08098416B2
公开(公告)日：2012-01-17
申请号：US12687850
申请日：2010-01-14
申请人： Manish Kothari , Lior Kogut , Jeffrey B Sampsell
发明人： Manish Kothari , Lior Kogut , Jeffrey B Sampsell
CPC分类号： G02B26/001
摘要： A microelectromechanical system (MEMS) device includes a first electrode, a second electrode electrically insulated from the first electrode, and a third electrode electrically insulated from the first electrode and the second electrode. The MEMS device also includes a support structure which separates the first electrode from the second electrode and a reflective element located and movable between a first position and a second position. The reflective element is in contact with a portion of the device when in the first position and is not in contact with the portion of the device when in the second position. An adhesive force is generated between the reflective element and the portion when the reflective element is in the first position. Voltages applied to the first electrode, the second electrode, and the third electrode at least partially reduce or counteract the adhesive force.
摘要翻译： 微机电系统（MEMS）装置包括第一电极，与第一电极电绝缘的第二电极和与第一电极和第二电极电绝缘的第三电极。 MEMS器件还包括将第一电极与第二电极分开的支撑结构和位于第一位置和第二位置之间并可移动的反射元件。 反射元件在处于第一位置时与装置的一部分接触，并且当处于第二位置时不与装置的部分接触。 当反射元件处于第一位置时，在反射元件和部分之间产生粘合力。 施加到第一电极，第二电极和第三电极的电压至少部分地减小或抵消粘附力。
-
5.发明申请Analog interferometric modulator device with electrostatic actuation and release 失效具有静电驱动和释放的模拟干涉式调制器装置公开(公告)号：US20070279729A1
公开(公告)日：2007-12-06
申请号：US11444567
申请日：2006-06-01
申请人： Manish Kothari , Lior Kogut , Jeffrey B. Sampsell
发明人： Manish Kothari , Lior Kogut , Jeffrey B. Sampsell
IPC分类号： G02B26/00
CPC分类号： G02B26/001
摘要： A microelectromechanical system (MEMS) device includes a first electrode, a second electrode electrically insulated from the first electrode, and a third electrode electrically insulated from the first electrode and the second electrode. The MEMS device also includes a support structure which separates the first electrode from the second electrode and a reflective element located and movable between a first position and a second position. The reflective element is in contact with a portion of the device when in the first position and is not in contact with the portion of the device when in the second position. An adhesive force is generated between the reflective element and the portion when the reflective element is in the first position. Voltages applied to the first electrode, the second electrode, and the third electrode at least partially reduce or counteract the adhesive force.
摘要翻译： 微机电系统（MEMS）装置包括第一电极，与第一电极电绝缘的第二电极和与第一电极和第二电极电绝缘的第三电极。 MEMS器件还包括将第一电极与第二电极分开的支撑结构和位于第一位置和第二位置之间并可移动的反射元件。 反射元件在处于第一位置时与装置的一部分接触，并且当处于第二位置时不与装置的部分接触。 当反射元件处于第一位置时，在反射元件和部分之间产生粘合力。 施加到第一电极，第二电极和第三电极的电压至少部分地减小或抵消粘附力。
-
公开(公告)号：US20070177129A1
公开(公告)日：2007-08-02
申请号：US11453633
申请日：2006-06-15
申请人： Manish Kothari , Lior Kogut , Clarence Chui
发明人： Manish Kothari , Lior Kogut , Clarence Chui
CPC分类号： G01L5/0047 , G02B26/001
摘要： The invention comprises systems and methods determining residual stress such as that found in interferometric modulators. In one example, a test unit can be configured to indicate residual stress in a film by interferometrically modulating light indicative of an average residual stress in two orthogonal directions of the substrate. The test unit can include a reflective membrane attached to the substrate where membrane is configured as a parallelogram with at least a portion of each side attached to the substrate, and an interferometric cavity formed between a portion of the membrane and a portion of the substrate, and where the membrane is configured to deform based on the residual stress of in the film and modulate light indicative of the amount of membrane deformation.
摘要翻译： 本发明包括确定残余应力的系统和方法，例如在干涉式调制器中发现的。 在一个示例中，测试单元可以被配置为通过对指示基板的两个正交方向上的平均残余应力的光进行干涉测量来指示膜中的残余应力。 测试单元可以包括附接到基底的反射膜，其中膜被构造为平行四边形，其中每侧的至少一部分附着到基底，以及形成在膜的一部分和基底的一部分之间的干涉腔， 并且其中膜被配置为基于膜的残余应力而变形并且调制指示膜变形量的光。
-
公开(公告)号：US07636151B2
公开(公告)日：2009-12-22
申请号：US11453633
申请日：2006-06-15
申请人： Manish Kothari , Lior Kogut , Clarence Chui
发明人： Manish Kothari , Lior Kogut , Clarence Chui
CPC分类号： G01L5/0047 , G02B26/001
摘要： The invention comprises systems and methods determining residual stress such as that found in interferometric modulators. In one example, a test unit can be configured to indicate residual stress in a film by interferometrically modulating light indicative of an average residual stress in two orthogonal directions of the substrate. The test unit can include a reflective membrane attached to the substrate where membrane is configured as a parallelogram with at least a portion of each side attached to the substrate, and an interferometric cavity formed between a portion of the membrane and a portion of the substrate, and where the membrane is configured to deform based on the residual stress of in the film and modulate light indicative of the amount of membrane deformation.
摘要翻译： 本发明包括确定残余应力的系统和方法，例如在干涉式调制器中发现的。 在一个示例中，测试单元可以被配置为通过对指示基板的两个正交方向上的平均残余应力的光进行干涉测量来指示膜中的残余应力。 测试单元可以包括附接到基底的反射膜，其中膜被构造为平行四边形，其中每侧的至少一部分附着到基底，以及形成在膜的一部分和基底的一部分之间的干涉腔， 并且其中膜被配置为基于膜的残余应力而变形并且调制指示膜变形量的光。
-
公开(公告)号：US20100149627A1
公开(公告)日：2010-06-17
申请号：US12711594
申请日：2010-02-24
申请人： Teruo Sasagawa , Clarence Chui , Manish Kothari , SuryaPrakash Ganti , Jeffrey B. Sampsell , Chun-Ming Wang
发明人： Teruo Sasagawa , Clarence Chui , Manish Kothari , SuryaPrakash Ganti , Jeffrey B. Sampsell , Chun-Ming Wang
CPC分类号： G02B26/0841 , B81B2201/042 , B81B2203/0307 , B81C1/00595 , B81C2201/014 , G02B26/001
摘要： A microelectromechanical systems device having support structures formed of sacrificial material surrounded by a protective material. The microelectromechanical systems device includes a substrate having an electrode formed thereon. Another electrode is separated from the first electrode by a cavity and forms a movable layer, which is supported by support structures formed of a sacrificial material.
摘要翻译： 具有由保护材料包围的牺牲材料形成的支撑结构的微机电系统装置。 微机电系统装置包括其上形成有电极的基板。 另一电极通过空腔与第一电极分离，并形成可移动层，该可移动层由牺牲材料形成的支撑结构支撑。
-
公开(公告)号：US07424198B2
公开(公告)日：2008-09-09
申请号：US11045738
申请日：2005-01-28
申请人： Lauren Palmateer , William J. Cummings , Brian Gally , Mark Miles , Jeffrey B. Sampsell , Clarence Chui , Manish Kothari
发明人： Lauren Palmateer , William J. Cummings , Brian Gally , Mark Miles , Jeffrey B. Sampsell , Clarence Chui , Manish Kothari
IPC分类号： G02B6/00
CPC分类号： G02B26/007 , B81B2201/047 , B81C1/00285 , B81C1/00333 , B81C2203/0136 , B81C2203/0145 , G02B26/001 , G02B26/0825 , G02B26/0833
摘要： A package structure and method of packaging for an interferometric modulator. A thin film material is deposited over an interferometric modulator and transparent substrate to encapsulate the interferometric modulator. A gap or cavity between the interferometric modulator and the thin film provides a space in which mechanical parts of the interferometric modulator may move. The gap is created by removal of a sacrificial layer that is deposited over the interferometric modulator.
摘要翻译： 用于干涉式调制器的封装结构和封装方法。 在干涉式调制器和透明衬底上沉积薄膜材料以封装干涉式调制器。 干涉式调制器和薄膜之间的间隙或腔提供干涉式调制器的机械部分可以移动的空间。 通过去除沉积在干涉式调制器上的牺牲层产生间隙。
-
10.发明申请公开(公告)号：US20080029481A1
公开(公告)日：2008-02-07
申请号：US11462026
申请日：2006-08-02
CPC分类号： B81C1/00579 , B81C2201/0109 , B81C2201/0132
摘要： Provided herein are methods for preventing the formation and accumulation of surface-associated charges, and deleterious effects associated therewith, during the manufacture of a MEMS device. In some embodiments, methods provided herein comprise etching a sacrificial material in the presence of an ionized gas, wherein the ionized gas neutralizes charged species produced during the etching process and allows for their removal along with other etching byproducts. Also disclosed are microelectromechanical devices formed by methods of the invention, and visual display devices incorporating such devices.
摘要翻译： 本文提供了在制造MEMS器件期间防止表面相关电荷的形成和累积以及与其相关的有害影响的方法。 在一些实施例中，本文提供的方法包括在存在电离气体的情况下蚀刻牺牲材料，其中电离气体中和在蚀刻工艺期间产生的带电物质，并允许其与其它蚀刻副产物一起去除。 还公开了通过本发明的方法形成的微机电装置以及包括这种装置的视觉显示装置。
-
-
-
-
-
-
-
-
-
搜索结果
294 条记录 (耗时 0.032 秒)
