POSITION SENSITIVE DETECTION OPTIMIZATION
    2.
    发明申请
    POSITION SENSITIVE DETECTION OPTIMIZATION 有权
    位置敏感检测优化

    公开(公告)号:US20140103188A1

    公开(公告)日:2014-04-17

    申请号:US13982109

    申请日:2012-01-27

    IPC分类号: G01J1/04 G01N21/47

    摘要: An automatically adjustable method for use in opto-acoustic metrology or other types of metrology operations is described. The method includes modifying the operation of a metrology system that uses a PSD style sensor arrangement. The method may be used to quickly adjust the operation of a metrology system to ensure that the data obtained therefrom are of the desired quality. Further, the method is useful in searching for and optimizing data that is or can be correlated to substrate or sample features or characteristics that of interest. Apparatus and computer readable media are also described.

    摘要翻译: 描述了一种用于光声测量或其他类型计量操作的自动调节方法。 该方法包括修改使用PSD风格传感器装置的计量系统的操作。 该方法可以用于快速调整计量系统的操作,以确保从其获得的数据具有期望的质量。 此外,该方法可用于搜索和优化与底物或样品特征或感兴趣的特征相关或可以相关的数据。 还描述了装置和计算机可读介质。

    Combination of ellipsometry and optical stress generation and detection
    4.
    发明申请
    Combination of ellipsometry and optical stress generation and detection 有权
    椭圆偏振光学和光学应力产生与检测的组合

    公开(公告)号:US20090244516A1

    公开(公告)日:2009-10-01

    申请号:US12309166

    申请日:2007-07-09

    IPC分类号: G01B11/16

    摘要: A method includes selecting one of performing ellipsometry or performing optical stress generation and detection. The method also includes, in response to selecting performing ellipsometry, applying at least one first control signal to a controllable retarder that modifies at least polarization of a light beam, and performing ellipsometry using the modified light beam. The method further includes, in response to selecting performing optical stress generation and detection, applying at least one second control signal to the controllable retarder, and performing optical stress generation and detection using the modified light beam. Apparatus and computer readable media are also disclosed.

    摘要翻译: 一种方法包括选择执行椭偏仪或执行光学应力产生和检测之一。 该方法还包括响应于选择执行椭偏仪,将至少一个第一控制信号施加到至少修改光束的偏振的可控延迟器,以及使用修改的光束执行椭偏仪。 该方法还包括响应于选择执行光应力产生和检测,向可控延迟器施加至少一个第二控制信号,并且使用修改的光束进行光应力产生和检测。 还公开了装置和计算机可读介质。

    Combination of ellipsometry and optical stress generation and detection
    5.
    发明授权
    Combination of ellipsometry and optical stress generation and detection 有权
    椭圆偏振光学和光学应力产生与检测的组合

    公开(公告)号:US07903238B2

    公开(公告)日:2011-03-08

    申请号:US12309166

    申请日:2007-07-09

    IPC分类号: G01B11/16 G01J4/00

    摘要: A method includes selecting one of performing ellipsometry or performing optical stress generation and detection. The method also includes, in response to selecting performing ellipsometry, applying at least one first control signal to a controllable retarder that modifies at least polarization of a light beam, and performing ellipsometry using the modified light beam. The method further includes, in response to selecting performing optical stress generation and detection, applying at least one second control signal to the controllable retarder, and performing optical stress generation and detection using the modified light beam. Apparatus and computer readable media are also disclosed.

    摘要翻译: 一种方法包括选择执行椭偏仪或执行光学应力产生和检测之一。 该方法还包括响应于选择执行椭偏仪,将至少一个第一控制信号施加到至少修改光束的偏振的可控延迟器,以及使用修改的光束执行椭偏仪。 该方法还包括响应于选择执行光应力产生和检测,向可控延迟器施加至少一个第二控制信号,并且使用修改的光束进行光应力产生和检测。 还公开了装置和计算机可读介质。

    Methods for creating optical structures in dielectrics using controlled energy deposition
    6.
    发明授权
    Methods for creating optical structures in dielectrics using controlled energy deposition 失效
    使用受控能量沉积在电介质中产生光学结构的方法

    公开(公告)号:US06884960B2

    公开(公告)日:2005-04-26

    申请号:US10362223

    申请日:2001-08-21

    摘要: The present invention relates to a method for writing an optical structure within a workpiece of a dielectric material using FLDM. In a first embodiment system parameters for the FLDM are determined in dependence upon the dielectric material, a predetermined volume element and a predetermined change of the refractive index of the dielectric material within the predetermined volume element. The system parameters are determined such that self-focusing of a pulsed femtosecond laser beam is inhibted by non-linear absorption of the energy of the pulsed femtosecond laser beam within the dielectric material. A pulsed femtosecond laser beam based on the determined system parameters is focused at a predetermined location within the workpiece for inducing a change of the refractive index through dielectric modification within the predetermined volume element, the volume element including the focus. Various embodiments enable writing of various different optical structures into a workpiece.

    摘要翻译: 本发明涉及使用FLDM在介电材料的工件内写入光学结构的方法。 在第一实施例中,用于FLDM的系统参数根据电介质材料,预定体积元素和预定体积元件内介电材料的折射率的预定变化来确定。 确定系统参数,使得脉冲飞秒激光束的自聚焦通过介电材料内的脉冲飞秒激光束的能量的非线性吸收来抑制。 基于所确定的系统参数的脉冲飞秒激光束被聚焦在工件内的预定位置处,以通过预定体积元件(包括焦点)的体积元件中的介电修改来引起折射率的变化。 各种实施例使得可以将各种不同的光学结构写入工件。