公开(公告)号：US20120274912A1

公开(公告)日：2012-11-01

申请号：US13543613

申请日：2012-07-06

申请人： Marcus Adrianus VAN DE KERKHOF ,  Siebe Landheer ,  Marcel Beckers ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Franciscus Johannes Joseph Janssen

发明人： Marcus Adrianus VAN DE KERKHOF ,  Siebe Landheer ,  Marcel Beckers ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Franciscus Johannes Joseph Janssen

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03B27/52

摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

摘要翻译： 光刻设备包括被配置为将图案化的辐射束投影到基板的目标部分上的投影系统。 投影系统具有最终元素。 该装置还包括围绕投影系统之间的空间的屏障构件，并且在使用中包括基底，以部分地限定最终元件用于液体的储存器。 阻挡构件与最终元件间隔开，以在它们之间形成间隙。 该装置还包括在最终元件的径向外表面和阻挡构件的径向外表面之间的可变形密封件。 可变形密封件被构造成基本上防止气体流过密封件朝向或远离液体容器流动。

公开(公告)号：US08233134B2

公开(公告)日：2012-07-31

申请号：US12237583

申请日：2008-09-25

申请人： Marcus Adrianus Van De Kerkhof ,  Siebe Landheer ,  Marcel Beckers ,  Jeroen Peter Johannes Bruijstens ,  Franciscus Johannes Joseph Janssen ,  Ivo Adam Johannes Thomas

发明人： Marcus Adrianus Van De Kerkhof ,  Siebe Landheer ,  Marcel Beckers ,  Jeroen Peter Johannes Bruijstens ,  Franciscus Johannes Joseph Janssen ,  Ivo Adam Johannes Thomas

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03B27/52

摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

摘要翻译： 光刻设备包括被配置为将图案化的辐射束投影到基板的目标部分上的投影系统。 投影系统具有最终元素。 该装置还包括围绕投影系统之间的空间的屏障构件，并且在使用中包括基底，以部分地限定最终元件用于液体的储存器。 阻挡构件与最终元件间隔开，以在它们之间形成间隙。 该装置还包括在最终元件的径向外表面和阻挡构件的径向外表面之间的可变形密封件。 可变形密封件被构造成基本上防止气体流过密封件朝向或远离液体容器流动。

公开(公告)号：US09182678B2

公开(公告)日：2015-11-10

申请号：US13543613

申请日：2012-07-06

申请人： Marcus Adrianus Van De Kerkhof ,  Siebe Landheer ,  Marcel Beckers ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Franciscus Johannes Joseph Janssen

发明人： Marcus Adrianus Van De Kerkhof ,  Siebe Landheer ,  Marcel Beckers ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Franciscus Johannes Joseph Janssen

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03B27/52

摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

摘要翻译： 光刻设备包括被配置为将图案化的辐射束投影到基板的目标部分上的投影系统。 投影系统具有最终元素。 该装置还包括围绕投影系统之间的空间的屏障构件，并且在使用中包括基底，以部分地限定最终元件用于液体的储存器。 阻挡构件与最终元件间隔开，以在它们之间形成间隙。 该装置还包括在最终元件的径向外表面和阻挡构件的径向外表面之间的可变形密封件。 可变形密封件被构造成基本上防止气体流过密封件朝向或远离液体容器流动。

公开(公告)号：US08462314B2

公开(公告)日：2013-06-11

申请号：US12222123

申请日：2008-08-01

申请人： Marcel Beckers ,  Marcus Adrianus Van De Kerkhof ,  Siebe Landheer ,  Wouterus Johannes Petrus Maria Maas ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Franciscus Johannes Joseph Janssen ,  Bartholomeus Mathias Van Oerle

发明人： Marcel Beckers ,  Marcus Adrianus Van De Kerkhof ,  Siebe Landheer ,  Wouterus Johannes Petrus Maria Maas ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Franciscus Johannes Joseph Janssen ,  Bartholomeus Mathias Van Oerle

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70808 ,  G03F7/70958

摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.

公开(公告)号：US20090059192A1

公开(公告)日：2009-03-05

申请号：US12222123

申请日：2008-08-01

申请人： Marcel Beckers ,  Marcus Adrianus Van De Kerkhof ,  Siebe Landheer ,  Wouterus Johannes Petrus Maas ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Franciscus Johannes Joseph Janssen ,  Bartholomeus Mathias Van Oerle

发明人： Marcel Beckers ,  Marcus Adrianus Van De Kerkhof ,  Siebe Landheer ,  Wouterus Johannes Petrus Maas ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Franciscus Johannes Joseph Janssen ,  Bartholomeus Mathias Van Oerle

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70808 ,  G03F7/70958

摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The apparatus also includes a barrier member, surrounding a space between the projection system and, in use, the substrate, to define in part with the projection system a reservoir for liquid. A radially outer surface of the barrier member facing a portion of projection system and a radially outer surface of the portion of the projection system facing the barrier member each have a liquidphobic outer surface. The liquidphobic outer surface of the barrier member and/or the liquidphobic outer surface of the portion of the projection system has an inner edge that defines in part the reservoir.

摘要翻译： 光刻设备包括被配置为将图案化的辐射束投影到基板的目标部分上的投影系统。 该装置还包括阻挡构件，围绕投影系统之间的空间，并且在使用中围绕基板，以部分地与投影系统限定用于液体的储存器。 面向突出系统的一部分的阻挡构件的径向外表面和面向阻挡构件的突出系统的部分的径向外表面各自具有液面外表面。 屏障部件和/或投影系统部分的液面外表面的液面外表面具有限定部分储存器的内边缘。

公开(公告)号：US20090103062A1

公开(公告)日：2009-04-23

申请号：US12237583

申请日：2008-09-25

申请人： Marcus Adrianus VAN DE KERKHOF ,  Siebe Landheer ,  Marcel Beckers ,  Jeroen Peter Johannes Bruijstens ,  Franciscus Johannes Joseph Janseen ,  Ivo Adam Johannes Thomas

发明人： Marcus Adrianus VAN DE KERKHOF ,  Siebe Landheer ,  Marcel Beckers ,  Jeroen Peter Johannes Bruijstens ,  Franciscus Johannes Joseph Janseen ,  Ivo Adam Johannes Thomas

IPC分类号： G03B27/52 ,  G03B27/32

CPC分类号： G03F7/70341 ,  G03B27/52

摘要： A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid.

摘要翻译： 光刻设备包括被配置为将图案化的辐射束投影到基板的目标部分上的投影系统。 投影系统具有最终元素。 该装置还包括围绕投影系统之间的空间的屏障构件，并且在使用中包括基底，以部分地限定最终元件用于液体的储存器。 阻挡构件与最终元件间隔开，以在它们之间形成间隙。 该装置还包括在最终元件的径向外表面和阻挡构件的径向外表面之间的可变形密封件。 可变形密封件被构造成基本上防止气体流过密封件朝向或远离液体容器流动。

公开(公告)号：US09176371B2

公开(公告)日：2015-11-03

申请号：US12559664

申请日：2009-09-15

申请人： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Laurentius Catrinus Jorritsma ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Maurice Martinus Johannes Van Der Lee ,  Gheorghe Tanasa ,  Lambertus Dominicus Noordam

发明人： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Laurentius Catrinus Jorritsma ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Maurice Martinus Johannes Van Der Lee ,  Gheorghe Tanasa ,  Lambertus Dominicus Noordam

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03B27/52

摘要： A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

摘要翻译： 公开了一种光刻设备，其包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和基板和/或基板台所限定的浸没空间中。 例如，在光刻设备中采取措施来减少液滴对投影系统的最终元件的影响或基本避免这种液滴的形成。

公开(公告)号：US08730447B2

公开(公告)日：2014-05-20

申请号：US12559813

申请日：2009-09-15

申请人： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

发明人： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03B27/52

摘要： A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.

摘要翻译： 一种光刻设备，包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中，其中湿气体空间 被限定在投影系统，液体限制结构和浸没空间中的浸没液体之间，湿气空间被配置为容纳湿气。

公开(公告)号：US20100066988A1

公开(公告)日：2010-03-18

申请号：US12559813

申请日：2009-09-15

申请人： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

发明人： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03B27/52

摘要： A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.

摘要翻译： 一种光刻设备，包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和衬底和/或衬底台限定的浸没空间中，其中湿气体空间 被限定在投影系统，液体限制结构和浸没空间中的浸没液体之间，湿气空间被配置为容纳湿气。

公开(公告)号：US08462313B2

公开(公告)日：2013-06-11

申请号：US12818724

申请日：2010-06-18

申请人： Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Gerardus Adrianus Antonius Maria Kusters ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

发明人： Johannes Henricus Wilhelmus Jacobs ,  Hans Jansen ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Gerardus Adrianus Antonius Maria Kusters ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

IPC分类号： G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.

摘要翻译： 一种浸没式光刻设备，其包括弯曲的表面，使得表面张力引流力沿表面上的浸没液体的膜上的方向作用。