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    Method and Apparatus for Determining an Overlay Error
    5.
    发明申请
    Method and Apparatus for Determining an Overlay Error 有权
    确定叠加误差的方法和装置

    公开(公告)号：US20120013881A1

    公开(公告)日：2012-01-19

    申请号：US13181932

    申请日：2011-07-13

    申请人： Arie Jeffrey Den Boef ,  Maurits VAN DER SCHAAR ,  Andreas Fuchs ,  Martyn John Coogans ,  Kaustuve Bhattacharyya ,  Stephen Peter Morgan ,  Michael Kubis

    发明人： Arie Jeffrey Den Boef ,  Maurits VAN DER SCHAAR ,  Andreas Fuchs ,  Martyn John Coogans ,  Kaustuve Bhattacharyya ,  Stephen Peter Morgan ,  Michael Kubis

    IPC分类号： G03B27/54 ,  G06F19/00 ,  G01N21/47

    CPC分类号： A01H1/06 ,  A01G22/00 ,  C12N15/8201 ,  G03B27/52 ,  G03B27/53 ,  G03F7/705 ,  G03F7/70633

    摘要： A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p(n′), p(n″) and the calculating an asymmetry-induced overlay error is repeated for a plurality of scatterometer measurement recipes and the step of determining an overlay error in a production target uses the calculated asymmetry-induced overlay errors to select an optimum scatterometer measurement recipe used to measure the production target.

    摘要翻译： 确定重叠错误的方法。 测量具有过程引起的不对称性的覆盖目标。 构建目标模型。 修改模型，例如通过移动结构之一来补偿不对称性。 使用修改的模型计算不对称引起的覆盖误差。 通过从测量的重叠错误中减去不对称引起的覆盖误差来确定生产目标中的重叠错误。 在一个示例中，通过改变不对称p（n'），p（n“）来修改模型，并且针对多个散射仪测量配方重复计算不对称引起的重叠误差，并且确定在 生产目标使用计算的不对称引起的重叠误差来选择用于测量生产目标的最佳散射仪测量配方。

    Inspection apparatus and method for measuring a property of a substrate
    6.
    发明授权
    Inspection apparatus and method for measuring a property of a substrate 有权
    用于测量基板的性质的检查装置和方法

    公开(公告)号：US09235141B2

    公开(公告)日：2016-01-12

    申请号：US13186895

    申请日：2011-07-20

    申请人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

    发明人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

    IPC分类号： G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G03F9/00 ,  G01N21/47

    CPC分类号： G03F7/70633 ,  G01B2210/56 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95607 ,  G03F7/70616 ,  G03F9/70

    摘要： An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions. Furthermore, the plurality of illuminated portions are arranged such that first order diffracted radiation arising from the one or more of the illuminated portions are overlapped by at least one of the higher orders of diffracted radiation arising from any other of the illuminated portions.

    摘要翻译： 检查装置测量包括周期性结构的基板的性质。 照明系统提供具有包括多个照明部分的照明轮廓的辐射束。 辐射投影仪将辐射束投影到基板上。 检测器检测从周期性结构散射的辐射，并分别检测每个照明部分的一级衍射辐射和衍射辐射的至少一个高阶。 处理器根据检测到的辐射来确定衬底的性质。 多个照明部分被布置成使得从一个或多个被照射部分产生的一级衍射辐射不会被任何其他照明部分产生的零级或一级衍射辐射重叠。 此外，多个照明部分被布置成使得由一个或多个被照射部分产生的一阶衍射辐射与从任何其他照明部分产生的衍射辐射的较高阶数中的至少一个重叠。

    Inspection Apparatus and Method, Lithographic Apparatus and Lithographic Processing Cell
    8.
    发明申请
    Inspection Apparatus and Method, Lithographic Apparatus and Lithographic Processing Cell 有权
    检验设备和方法，平版印刷设备和平版印刷加工单元

    公开(公告)号：US20120033193A1

    公开(公告)日：2012-02-09

    申请号：US13186895

    申请日：2011-07-20

    申请人： Maurits VAN DER SCHAAR ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

    发明人： Maurits VAN DER SCHAAR ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

    IPC分类号： G03B27/54 ,  G01J3/36

    CPC分类号： G03F7/70633 ,  G01B2210/56 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95607 ,  G03F7/70616 ,  G03F9/70

    摘要： An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions. Furthermore, the plurality of illuminated portions are arranged such that first order diffracted radiation arising from the one or more of the illuminated portions are overlapped by at least one of the higher orders of diffracted radiation arising from any other of the illuminated portions.

    摘要翻译： 检查装置测量包括周期性结构的基板的性质。 照明系统提供具有包括多个照明部分的照明轮廓的辐射束。 辐射投影仪将辐射束投影到基板上。 检测器检测从周期性结构散射的辐射，并分别检测每个照明部分的一级衍射辐射和衍射辐射的至少一个高阶。 处理器根据检测到的辐射来确定衬底的性质。 多个照明部分被布置成使得从一个或多个被照射部分产生的一级衍射辐射不会被任何其他照明部分产生的零级或一级衍射辐射重叠。 此外，多个照明部分被布置成使得由一个或多个被照射部分产生的一阶衍射辐射与从任何其他照明部分产生的衍射辐射的较高阶数中的至少一个重叠。

    Apparatus and Method for Inspecting a Substrate
    9.
    发明申请
    Apparatus and Method for Inspecting a Substrate 有权
    用于检查基板的装置和方法

    公开(公告)号：US20110255066A1

    公开(公告)日：2011-10-20

    申请号：US12996211

    申请日：2009-06-04

    申请人： Andreas Fuchs ,  Maurits Van Der Schaar

    发明人： Andreas Fuchs ,  Maurits Van Der Schaar

    IPC分类号： G03B27/74 ,  G03B27/32 ,  G01B11/14

    CPC分类号： G03F7/70633

    摘要： An apparatus measures properties, such as overlay error, of a substrate divided into a plurality of fields. The apparatus includes a radiation source configured to direct radiation onto a first target of each field of the substrate. Each first target (T4G) has at least a first grating and a second grating having respective predetermined offsets, the predetermined offset (+d) of the first grating being in a direction opposite the predetermined offset (−d) of the second grating. A detector is configured to detect the radiation reflected from each first target and to obtain an asymmetry value for each first target from the detected radiation. Further, a module is configured to determine an overlay value for each first target based on at least the obtained asymmetry value and the predetermined offsets and determine a polynomial fit across a plurality of first targets of a corresponding plurality of fields of the substrate for a relationship between the obtained asymmetry value and determined overlay value of each first target.

    摘要翻译： 一种装置测量分成多个场的衬底的性质，例如覆盖误差。 该装置包括被配置为将辐射引导到衬底的每个场的第一靶上的辐射源。 每个第一目标（T4G）具有至少第一光栅和具有相应预定偏移的第二光栅，第一光栅的预定偏移（+ d）在与第二光栅的预定偏移（-d）相反的方向上。 检测器被配置为检测从每个第一目标反射的辐射，并且从检测到的辐射获得每个第一目标的不对称值。 此外，模块被配置为基于至少所获得的不对称值和预定偏移来确定每个第一目标的覆盖值，并且确定跨越衬底的相应多个场的多个第一目标的多项式拟合，以获得关系 在获得的不对称值和确定的每个第一目标的覆盖值之间。

    Inspection method and apparatus, and corresponding lithographic apparatus
    10.
    发明授权
    Inspection method and apparatus, and corresponding lithographic apparatus 有权
    检验方法和装置，以及相应的光刻设备

    公开(公告)号：US08749786B2

    公开(公告)日：2014-06-10

    申请号：US12902341

    申请日：2010-10-12

    申请人： Andreas Fuchs ,  Maurits Van Der Schaar ,  Scott Anderson Middlebrooks ,  Panagiotis Pieter Bintevinos

    发明人： Andreas Fuchs ,  Maurits Van Der Schaar ,  Scott Anderson Middlebrooks ,  Panagiotis Pieter Bintevinos

    IPC分类号： G01B11/00

    CPC分类号： G03F7/70633 ,  G01N21/956

    摘要： A method and associated apparatus determine an overlay error on a substrate. A beam is projected onto three or more targets. Each target includes first and second overlapping patterns with predetermined overlay offsets on the substrate. The asymmetry of the radiation reflected from each target on the substrate is measured. The overlay error not resultant from the predetermined overlay offsets is determined. The function that enables calculation of overlay from asymmetry for other points on the wafer is determined by limiting the effect of linearity error when determining the overlay error from the function.

    摘要翻译： 方法和相关设备确定衬底上的覆盖误差。 光束投影到三个或更多个目标上。 每个目标包括在衬底上具有预定覆盖偏移的第一和第二重叠图案。 测量从基板上的每个目标反射的辐射的不对称性。 确定不是从预定的覆盖偏移产生的覆盖误差。 通过限制从功能确定覆盖误差时线性误差的影响，可以确定能够计算晶片上其他点不对称的叠加的功能。