Automated focusing of electron image
    1.
    发明授权
    Automated focusing of electron image 失效
    电子图像自动聚焦

    公开(公告)号:US07041976B1

    公开(公告)日:2006-05-09

    申请号:US10700144

    申请日:2003-11-03

    IPC分类号: G01R31/305

    摘要: One embodiment disclosed relates to a method for automated focusing of an electron image. An EF cut-off voltage is determined. In compensation for a change in the EF cut-off voltage, a focusing condition is adjusted. Adjusting the focusing condition may comprise, for example, adjusting a wafer bias voltage in correspondence to the change in cut-off voltage. Another embodiment disclosed relates to a method for automated focusing of an electron image in a scanning electron imaging apparatus. A focusing condition of a primary electron beam in a first image plane is varied so as to maximize an intensity of a secondary electron beam through an aperture in a second image plane.

    摘要翻译: 所公开的一个实施例涉及一种用于电子图像的自动聚焦的方法。 确定EF截止电压。 为了补偿EF截止电压的变化,调整聚焦条件。 调整聚焦条件可以包括例如根据截止电压的变化来调整晶片偏置电压。 所公开的另一实施例涉及一种用于扫描电子成像设备中的电子图像的自动聚焦的方法。 改变第一图像平面中的一次电子束的聚焦条件,从而使通过第二图像平面中的孔的二次电子束的强度最大化。

    Automated focusing of electron image
    2.
    发明授权
    Automated focusing of electron image 有权
    电子图像自动聚焦

    公开(公告)号:US07247849B1

    公开(公告)日:2007-07-24

    申请号:US11366306

    申请日:2006-03-01

    IPC分类号: H01J49/00

    摘要: One embodiment disclosed relates to a method for automated focusing of an electron image. An EF cut-off voltage is determined. In compensation for a change in the EF cut-off voltage, a focusing condition is adjusted. Adjusting the focusing condition may comprise, for example, adjusting a wafer bias voltage in correspondence to the change in cut-off voltage. Another embodiment disclosed relates to a method for automated focusing of an electron image in a scanning electron imaging apparatus. A focusing condition of a primary electron beam in a first image plane is varied so as to maximize an intensity of a secondary electron beam through an aperture in a second image plane.

    摘要翻译: 所公开的一个实施例涉及一种用于电子图像的自动聚焦的方法。 确定EF截止电压。 为了补偿EF截止电压的变化,调整聚焦条件。 调整聚焦条件可以包括例如根据截止电压的变化来调整晶片偏置电压。 所公开的另一实施例涉及一种用于扫描电子成像设备中的电子图像的自动聚焦的方法。 改变第一图像平面中的一次电子束的聚焦条件,从而使通过第二图像平面中的孔的二次电子束的强度最大化。

    Apparatus and method for E-beam dark field imaging
    3.
    发明授权
    Apparatus and method for E-beam dark field imaging 有权
    电子束暗场成像的装置和方法

    公开(公告)号:US07141791B2

    公开(公告)日:2006-11-28

    申请号:US10935834

    申请日:2004-09-07

    IPC分类号: G01N23/00

    摘要: One embodiment disclosed relates to a scanning electron beam apparatus including an objective lens, scan deflectors, de-scan deflectors, an energy-filter drift tube, and a segmented detector. The objective lens may be an immersion lens configured with a high extraction field so as to preserve azimuthal angle discrimination of the electrons scattered from the specimen surface. The de-scan deflectors may be used to compensate for the scanning of the incident electron beam. The energy-filter drift tube is configured to align the scattered electrons according to polar angles of trajectory from the specimen surface.

    摘要翻译: 公开的一个实施例涉及包括物镜,扫描偏转器,去扫描偏转器,能量滤波器漂移管和分段检测器的扫描电子束装置。 物镜可以是配置有高提取场的浸没透镜,以便保留从样本表面散射的电子的方位角鉴别。 去扫描偏转器可以用于补偿入射电子束的扫描。 能量滤波器漂移管被配置为根据来自样品表面的极化轨迹角对准散射电子。

    Wien filter with reduced chromatic aberration
    4.
    发明授权
    Wien filter with reduced chromatic aberration 有权
    维恩滤镜具有降低的色差

    公开(公告)号:US07164139B1

    公开(公告)日:2007-01-16

    申请号:US11048378

    申请日:2005-02-01

    IPC分类号: H01J1/50

    CPC分类号: H01J37/05 H01J2237/057

    摘要: One embodiment disclosed relates to a Wien filter for a charged-particle beam apparatus. The charged-particle beam is transmitted through the Wien filter in a first direction. A magnetic field generation mechanism is configured to generate a magnetic field in a second direction which is perpendicular to the first direction, and an electrostatic field generation mechanism is configured to generate an electrostatic field in a third direction which is perpendicular to the first and second directions. The field generation mechanisms are further configured so as to have an offset between the positions of the magnetic and electrostatic fields along the first direction. Another embodiment disclosed relates to a Wien filter type device wherein the magnetic force is approximately twice in strength compared to the electrostatic force. Other embodiments are also disclosed.

    摘要翻译: 公开的一个实施例涉及一种用于带电粒子束装置的维恩滤波器。 带电粒子束在第一方向通过维恩滤波器传输。 磁场产生机构被配置为在与第一方向垂直的第二方向上产生磁场,并且静电场产生机构被配置为在与第一和第二方向垂直的第三方向上产生静电场 。 场产生机构被进一步配置为具有沿着第一方向的磁场和静电场的位置之间的偏移。 所公开的另一实施例涉及一种Wien过滤器型装置,其中与静电力相比,磁力的强度大约是两倍。 还公开了其他实施例。

    Defect review using image segmentation
    5.
    发明授权
    Defect review using image segmentation 有权
    使用图像分割的缺陷审查

    公开(公告)号:US07792351B1

    公开(公告)日:2010-09-07

    申请号:US12710076

    申请日:2010-02-22

    IPC分类号: G06K9/00

    摘要: One embodiment pertains to a method for reviewing a potential defect on a substrate from one electron image. An image of an area containing the potential defect is obtained using a charged-particle apparatus. At least three image segments within the image are determined. The three segments are transformably identical to each other, and one of said three segments includes the potential defect. Another embodiment pertains to a method for reviewing a potential defect on a substrate by obtaining an electron-beam image of a relatively large field of view containing a first image segment. The first image segment is substantially smaller than the field of view and includes a location of the potential defect. A comparison image segment within the field of view is determined. The comparison image segment is transformably identical to the first image segment. Other embodiments and features are also disclosed.

    摘要翻译: 一个实施例涉及从一个电子图像检查衬底上的潜在缺陷的方法。 使用带电粒子装置获得含有潜在缺陷的区域的图像。 确定图像内至少三个图像片段。 这三个段可变地彼此相同,并且所述三个段之一包括潜在的缺陷。 另一个实施例涉及通过获得包含第一图像片段的相对较大的视场的电子束图像来检查衬底上的潜在缺陷的方法。 第一图像段显着小于视场,并且包括潜在缺陷的位置。 确定视野内的比较图像段。 比较图像段可变地与第一图像段相同。 还公开了其它实施例和特征。

    Defect review using image segmentation

    公开(公告)号:US07684609B1

    公开(公告)日:2010-03-23

    申请号:US11441962

    申请日:2006-05-25

    IPC分类号: G06K9/00

    摘要: One embodiment pertains to a method for reviewing a potential defect on a substrate from one electron image. An image of an area containing the potential defect is obtained using a charged-particle apparatus. At least three image segments within the image are determined. The three segments are transformably identical to each other, and one of said three segments includes the potential defect. Another embodiment pertains to a method for reviewing a potential defect on a substrate by obtaining an electron-beam image of a relatively large field of view containing a first image segment. The first image segment is substantially smaller than the field of view and includes a location of the potential defect. A comparison image segment within the field of view is determined. The comparison image segment is transformably identical to the first image segment. Other embodiments and features are also disclosed.

    CHARGED-PARTICLE ENERGY ANALYZER
    7.
    发明申请
    CHARGED-PARTICLE ENERGY ANALYZER 失效
    充电颗粒能量分析仪

    公开(公告)号:US20110168886A1

    公开(公告)日:2011-07-14

    申请号:US13119689

    申请日:2010-07-16

    IPC分类号: H01J37/28 H01J37/244

    摘要: One embodiment relates to a charged-particle energy analyzer apparatus. A first mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a first electrode is arranged such that a first cavity is formed between the second side of the first mesh and the first electrode. A second mesh is arranged to receive the charged particles on a second side and pass the charged particles to a first side, and a second electrode is arranged such that a second cavity is formed between the first side of the second mesh and the second electrode. Finally, a third mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a position-sensitive charged-particle detector is arranged to receive the charged particles after the charged particles pass through the third mesh.

    摘要翻译: 一个实施例涉及一种带电粒子能量分析装置。 布置第一网格以接收第一侧上的带电粒子并将带电粒子传递到第二侧,并且第一电极被布置成使得第一空腔形成在第一网格的第二侧和第一电极之间。 布置第二网以接收第二侧上的带电粒子并将带电粒子传递到第一侧,并且第二电极被布置成使得在第二网格的第一侧和第二电极之间形成第二腔。 最后,设置第三网格以接收第一侧上的带电粒子并将带电粒子传递到第二侧,并且位置敏感带电粒子检测器布置成在带电粒子通过第三侧之后接收带电粒子 网格。

    Single tool defect classification solution
    8.
    发明授权
    Single tool defect classification solution 有权
    单刀缺陷分类解决方案

    公开(公告)号:US06952653B2

    公开(公告)日:2005-10-04

    申请号:US10705059

    申请日:2003-11-10

    摘要: Methods and apparatus for efficiently analyzing defects in-line on a wafer by wafer basis are provided. In general terms, embodiments of the present invention provide a simple interface for setting up the entire inspection and defect analysis process in a single set up procedure. The apparatus includes an inspection station for inspecting a specimen for potential defects and a review station for analyzing a sample of the potential defects to determine a classification of such potential defects. The apparatus further includes a computer system having an application interface operable to allow a user to set up the inspection station and the review station during a same setup phase so as to allow the inspection station and the review station to then operate automatically to provide defect information for one or more specimens based on the user set up.

    摘要翻译: 提供了通过晶片来有效地分析晶片上的在线缺陷的方法和装置。 一般来说,本发明的实施例提供了用于在单个设置过程中建立整个检查和缺陷分析过程的简单界面。 该装置包括用于检查潜在缺陷的样本的检查站和用于分析潜在缺陷的样本的检查站,以确定这种潜在缺陷的分类。 该装置还包括具有应用接口的计算机系统,其可操作以允许用户在相同的建立阶段期间建立检查站和审查站,以便允许检查站和审查站自动地进行操作以提供缺陷信息 基于用户设置的一个或多个标本。

    Dual electron beam instrument for multi-perspective
    9.
    发明授权
    Dual electron beam instrument for multi-perspective 有权
    双电子束仪多视角

    公开(公告)号:US06812462B1

    公开(公告)日:2004-11-02

    申请号:US10435011

    申请日:2003-05-09

    IPC分类号: H01J3728

    摘要: Method and apparatus for imaging at multiple perspectives of a specimen are disclosed. In one embodiment, an apparatus for generating a multi-perspective image using multiple charged particle beams (e.g., electron beams) is disclosed. In one embodiment, the apparatus generally includes a charged particle beam generator system arranged to generate and control a first charged particle beam directed substantially at a first angle towards the specimen and a second charged particle beam directed substantially at a second angle towards the specimen. The apparatus also includes an image generator arranged to generate one or more images based on charged particles emitted from the specimen in response to the first and second charged particle beams and a controller arranged to cause the charged particle beam generator to direct both the first charged particle beam and the second charged particle beam at a first area of the specimen. In a specific implementation, the charged particles are in the form of electrons and the apparatus is a dual electron beam scanning electron microscope (SEM).

    摘要翻译: 公开了用于在样本的多个观点进行成像的方法和装置。 在一个实施例中,公开了一种使用多个带电粒子束(例如电子束)产生多视角图像的装置。 在一个实施例中,装置通常包括带电粒子束发生器系统,其被布置成产生并控制基本上以第一角度朝向试样的第一带电粒子束和基本上以第二角度朝向试样的第二带电粒子束。 该装置还包括图像发生器,其被布置为响应于第一和第二带电粒子束而基于从样本发射的带电粒子产生一个或多个图像;以及控制器,布置成使带电粒子束发生器引导第一带电粒子 光束和第二带电粒子束在样品的第一区域。 在具体实施方案中,带电粒子是电子的形式,并且该装置是双电子束扫描电子显微镜(SEM)。

    Charged-particle energy analyzer
    10.
    发明授权
    Charged-particle energy analyzer 失效
    带电粒子能量分析仪

    公开(公告)号:US08421030B2

    公开(公告)日:2013-04-16

    申请号:US13119689

    申请日:2010-07-16

    IPC分类号: G01K1/08

    摘要: One embodiment relates to a charged-particle energy analyzer apparatus. A first mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a first electrode is arranged such that a first cavity is formed between the second side of the first mesh and the first electrode. A second mesh is arranged to receive the charged particles on a second side and pass the charged particles to a first side, and a second electrode is arranged such that a second cavity is formed between the first side of the second mesh and the second electrode. Finally, a third mesh is arranged to receive the charged particles on a first side and pass the charged particles to a second side, and a position-sensitive charged-particle detector is arranged to receive the charged particles after the charged particles pass through the third mesh.

    摘要翻译: 一个实施例涉及一种带电粒子能量分析装置。 布置第一网格以接收第一侧上的带电粒子并将带电粒子传递到第二侧,并且第一电极被布置成使得第一空腔形成在第一网格的第二侧和第一电极之间。 布置第二网以接收第二侧上的带电粒子并将带电粒子传递到第一侧,并且第二电极被布置成使得在第二网格的第一侧和第二电极之间形成第二腔。 最后,设置第三网格以接收第一侧上的带电粒子并将带电粒子传递到第二侧,并且位置敏感带电粒子检测器布置成在带电粒子通过第三侧之后接收带电粒子 网格。