公开(公告)号：US20060160342A1

公开(公告)日：2006-07-20

申请号：US11037860

申请日：2005-01-18

申请人： Mark Doczy ,  Lawrence Wong ,  Valery Dubin ,  Justin Brask ,  Jack Kavalieros ,  Suman Datta ,  Matthew Metz ,  Robert Chau

发明人： Mark Doczy ,  Lawrence Wong ,  Valery Dubin ,  Justin Brask ,  Jack Kavalieros ,  Suman Datta ,  Matthew Metz ,  Robert Chau

IPC分类号： H01L21/3205

CPC分类号： H01L21/28194 ,  H01L21/28079 ,  H01L21/823842 ,  H01L29/495 ,  H01L29/517 ,  H01L29/66545 ,  H01L29/6659 ,  H01L29/7833

摘要： Complementary metal oxide semiconductor metal gate transistors may be formed by depositing a metal layer in trenches formerly inhabited by patterned gate structures. The patterned gate structures may have been formed of polysilicon in one embodiment. The trenches may be filled with metal by surface activating using a catalytic metal, followed by electroless deposition of a seed layer followed by superconformal filling bottom up.

摘要翻译： 互补金属氧化物半导体金属栅极晶体管可以通过在先前由图案化栅极结构居住的沟槽中沉积金属层来形成。 在一个实施例中，图案化栅极结构可以由多晶硅形成。 可以使用催化金属通过表面活化来填充沟槽，然后通过化学沉积种子层，然后从下向上超超融合填充来填充沟槽。

公开(公告)号：US20150193866A1

公开(公告)日：2015-07-09

申请号：US14585069

申请日：2014-12-29

申请人： Lauren Van Heerden ,  Lawrence Wong ,  Tim Thompson ,  Mike Stephenson ,  Nigel Lall ,  Orin Del Vecchio ,  Gunalan Nadarajah

发明人： Lauren Van Heerden ,  Lawrence Wong ,  Tim Thompson ,  Mike Stephenson ,  Nigel Lall ,  Orin Del Vecchio ,  Gunalan Nadarajah

IPC分类号： G06Q40/02 ,  H04L29/08

CPC分类号： G06Q40/02 ,  H04L67/18 ,  H04L67/306

摘要： The disclosed embodiments include methods and systems for providing account status notifications. The disclosed embodiments include, for example, a device for providing account status notifications including a memory storing software instructions and one or more processors configured to execute the software instructions to perform operations. In one aspect, the operations may include receiving account status notification information for a first account associated with a user. The account status notification information may be generated based on one or more notification rules and account information associated with the first account. The operations may also include generating, based on the received account status notification information, a first account status indicator that provides a status of a first account parameter associated with the first account that is presented via a device component without a user request to receive the status of the first account parameter.

摘要翻译： 所公开的实施例包括用于提供帐户状态通知的方法和系统。 所公开的实施例包括例如用于提供帐户状态通知的设备，包括存储软件指令的存储器和被配置为执行软件指令以执行操作的一个或多个处理器。 在一个方面，操作可以包括接收与用户相关联的第一帐户的帐户状态通知信息。 可以基于与第一帐户相关联的一个或多个通知规则和帐户信息来生成帐户状态通知信息。 所述操作还可以包括基于所接收的帐户状态通知信息生成第一帐户状态指示符，其提供与经由设备组件呈现的第一帐户相关联的第一帐户参数的状态，而没有用户请求以接收状态 的第一个帐户参数。

公开(公告)号：US08080479B2

公开(公告)日：2011-12-20

申请号：US11733858

申请日：2007-04-11

申请人： Kenneth S. Collins ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger, Jr. ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

发明人： Kenneth S. Collins ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger, Jr. ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

IPC分类号： H01L21/302

CPC分类号： C23C16/45574 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32174 ,  H01L21/67069 ,  H01L21/6831

摘要： A method of processing a workpiece in a plasma reactor chamber includes coupling RF power via an electrode to plasma in the chamber, the RF power being of a variable frequency in a frequency range that includes a fundamental frequency f. The method also includes coupling the electrode to a resonator having a resonant VHF frequency F which is a harmonic of the fundamental frequency f, so as to produce VHF power at the harmonic. The method controls the ratio of power near the fundamental f to power at harmonic F, by controlling the proportion of power from the generator that is up-converted from f to F, so as to control plasma ion density distribution.

摘要翻译： 在等离子体反应器室中处理工件的方法包括经由电极将RF功率耦合到腔室中的等离子体，RF功率在包括基频f的频率范围内是可变频率的。 该方法还包括将电极耦合到具有作为基频f的谐波的谐振VHF频率F的谐振器，以便在谐波处产生VHF功率。 该方法通过控制从f向F转换为F的发电机的功率比例来控制基波f附近的功率与谐波F功率的比值，以便控制等离子体离子密度分布。

公开(公告)号：US20080182418A1

公开(公告)日：2008-07-31

申请号：US11733858

申请日：2007-04-11

申请人： Kenneth S. Collins ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

发明人： Kenneth S. Collins ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： C23C16/45574 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32174 ,  H01L21/67069 ,  H01L21/6831

摘要： A method of processing a workpiece in a plasma reactor chamber includes coupling RF power via an electrode to plasma in the chamber, the RF power being of a variable frequency in a frequency range that includes a fundamental frequency f. The method also includes coupling the electrode to a resonator having a resonant VHF frequency F which is a harmonic of the fundamental frequency f, so as to produce VHF power at the harmonic. The method controls the ratio of power near the fundamental f to power at harmonic F, by controlling the proportion of power from the generator that is up-converted from f to F, so as to control plasma ion density distribution.

摘要翻译： 在等离子体反应器室中处理工件的方法包括经由电极将RF功率耦合到腔室中的等离子体，RF功率在包括基频f的频率范围内是可变频率的。 该方法还包括将电极耦合到具有作为基频f的谐波的谐振VHF频率F的谐振器，以便在谐波处产生VHF功率。 该方法通过控制从f向F转换为F的发电机的功率比例来控制基波f附近的功率与谐波F功率的比值，以便控制等离子体离子密度分布。

公开(公告)号：US20080182417A1

公开(公告)日：2008-07-31

申请号：US11733767

申请日：2007-04-11

申请人： Kenneth S. Collins ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

发明人： Kenneth S. Collins ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： C23C16/45574 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32174 ,  H01L21/67069 ,  H01L21/6831

摘要： In a plasma reactor chamber a ceiling electrode and a workpiece support electrode, respective RF power sources of respective VHF frequencies f1 and f2 are coupled to either respective ones of the electrodes or to a common one of the electrodes, where f1 is sufficiently high to produce a center-high non-uniform plasma ion distribution and f2 is sufficiently low to produce a center-low non-uniform plasma ion distribution. Respective center ground return paths are provided for RF current passing directly between the ceiling electrode and the workpiece support electrode for the frequencies f1 and f2, and an edge ground return path is provided for each of the frequencies f1 and f2. The impedance of at least one of the ground return paths is adjusted so as to control the uniformity of the plasma ion density distribution.

摘要翻译： 在等离子体反应器室中，天花板电极和工件支撑电极，各个VHF频率f1和f2的相应RF功率源耦合到电极中的相应电极或共同的一个电极，其中f1足够高以产生 中心高的不均匀等离子体离子分布和f2足够低以产生中心 - 低不均匀的等离子体离子分布。 提供各自的中心接地返回路径用于频率f1和f2直接通过天花板电极和工件支撑电极之间的RF电流，并为每个频率f1和f2提供边缘接地返回路径。 调整至少一个接地返回路径的阻抗，以便控制等离子体离子密度分布的均匀性。

公开(公告)号：US08076247B2

公开(公告)日：2011-12-13

申请号：US11733770

申请日：2007-04-11

申请人： Kenneth S. Collins ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger, Jr. ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

发明人： Kenneth S. Collins ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger, Jr. ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

IPC分类号： H01L21/302

CPC分类号： C23C16/45574 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32174 ,  H01L21/67069 ,  H01L21/6831

摘要： A method is provided for processing a workpiece in a plasma reactor chamber. The method includes coupling, to a plasma in the chamber, power of an RF frequency via a ceiling electrode and coupling, to the plasma, power of at least approximately the same RF frequency via a workpiece support electrode. The method also includes providing an edge ground return path. The method further includes adjusting the proportion between (a) current flow between said electrodes and (b) current flow to the edge ground return path from said electrodes, to control plasma ion density distribution uniformity over the workpiece.

摘要翻译： 提供了一种用于在等离子体反应器室中处理工件的方法。 该方法包括通过天线电极将等离子体耦合到腔室中的等离子体，并通过工件支撑电极将等离子体的功率耦合到至少近似相同的RF频率。 该方法还包括提供边缘接地返回路径。 该方法还包括调节（a）所述电极之间的电流之间的比例和（b）从所述电极到达边缘接地返回路径的电流，以控制工件上的等离子体离子密度分布均匀性。

公开(公告)号：US20100015357A1

公开(公告)日：2010-01-21

申请号：US12175745

申请日：2008-07-18

申请人： Hiroji Hanawa ,  Saturo Kobayashi ,  Lawrence Wong

发明人： Hiroji Hanawa ,  Saturo Kobayashi ,  Lawrence Wong

IPC分类号： H05H1/02 ,  C23C16/00

CPC分类号： H01J37/32174 ,  H01J37/32091

摘要： A capacitive plasma discharge system employing multiple feeds of RF source power across an area of an electrode. Multiple RF feed locations across the electrode allow for control of the axial electric field across a radius at various azimuth angles of a plasma processing chamber. In an embodiment, a first RF power feed is coupled to a center of an electrode of the capacitively coupled chamber. The first RF power feed is further coupled to a first RF match network. A second RF power feed is coupled to the electrode at a first radius from the first RF power feed and at a first azimuth angle. The second RF power feed is further coupled to a second RF match network.

摘要翻译： 一种电容等离子体放电系统，其在电极的一个区域上采用RF源功率的多个馈电。 跨过电极的多个RF馈送位置允许跨等离子体处理室的各个方位角的半径处的轴向电场的控制。 在一个实施例中，第一RF馈电耦合到电容耦合室的电极的中心。 第一RF馈电进一步耦合到第一RF匹配网络。 第二RF馈电在距离第一RF馈电和第一方位角的第一半径处耦合到电极。 第二RF馈电进一步耦合到第二RF匹配网络。

公开(公告)号：US20080179011A1

公开(公告)日：2008-07-31

申请号：US11734040

申请日：2007-04-11

申请人： KENNETH S. COLLINS ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

发明人： KENNETH S. COLLINS ,  Hiroji Hanawa ,  Kartik Ramaswamy ,  Douglas A. Buchberger ,  Shahid Rauf ,  Kallol Bera ,  Lawrence Wong ,  Walter R. Merry ,  Matthew L. Miller ,  Steven C. Shannon ,  Andrew Nguyen ,  James P. Cruse ,  James Carducci ,  Troy S. Detrick ,  Subhash Deshmukh ,  Jennifer Y. Sun

IPC分类号： C23F1/00 ,  C23C16/00

CPC分类号： C23C16/45574 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32174 ,  H01L21/67069 ,  H01L21/6831

摘要： A plasma reactor includes an electrostatic chuck in the chamber for supporting the workpiece, a ceiling electrode facing the electrostatic chuck and an ESC electrode in the electrostatic chuck with an electrostatic clamping voltage supply coupled to the ESC electrode. The reactor further includes at least a first RF bias source of an LF or HF frequency coupled to the pedestal electrode, and first and second VHF power sources of different frequencies coupled to the same or to different ones of the electrodes. The first and second VHF power sources are of sufficiently high and sufficiently low frequencies, respectively, to produce center-high and center-low plasma distribution non-uniformities, respectively, in the chamber.

摘要翻译： 等离子体反应器包括用于支撑工件的室中的静电卡盘，面向静电卡盘的天花板电极和静电卡盘中的ESC电极，其具有耦合到ESC电极的静电钳位电压源。 反应器还包括耦合到基座电极的LF或HF频率的至少第一RF偏置源，以及耦合到相同或不同电极的不同频率的第一和第二VHF电源。 第一和第二VHF电源分别具有足够高和足够低的频率，以分别在腔室中产生中心高和中心低等离子体分布不均匀性。

公开(公告)号：US07046980B1

公开(公告)日：2006-05-16

申请号：US10070280

申请日：2000-09-01

申请人： Tajinder Manku ,  Chris Snyder ,  Gareth Weale ,  Lawrence Wong

发明人： Tajinder Manku ,  Chris Snyder ,  Gareth Weale ,  Lawrence Wong

IPC分类号： H04B1/26

CPC分类号： H04B1/30 ,  H03D3/008 ,  H03D7/163 ,  H03D7/166 ,  H04B1/00 ,  H04B1/0475 ,  H04B2001/0491

摘要： This patent describes a method and system which overcomes the LO-leakage problem of direct conversion and similar RF transmitters and receivers. To solve this problem a virtual LO™ signal is generated which emulates mixing with a local oscillator (LO) signal. However, the virtual local oscillator (VLO) signal is constructed using signals that do not contain a significant amount of power (or no power at all) at the wanted output RF frequency, so there is no LO component to leak to the output. The invention also does not require sophisticated filters or large capacitors as other designs in the art, so it is fully integratable.

摘要翻译： 该专利描述了克服直接转换和类似RF发射器和接收器的LO泄漏问题的方法和系统。 为了解决这个问题，产生模拟与本地振荡器（LO）信号的混合的虚拟LO（TM）信号。 然而，虚拟本地振荡器（VLO）信号使用在所需输出RF频率下不包含大量功率（或根本无功率）的信号来构造，因此没有LO分量泄漏到输出端。 本发明也不需要复杂的滤波器或大电容器作为本领域的其他设计，因此它是完全可整合的。

公开(公告)号：US06973297B1

公开(公告)日：2005-12-06

申请号：US10070012

申请日：2000-09-01

申请人： Tajinder Manku ,  Lawrence Wong ,  Yang Ling

发明人： Tajinder Manku ,  Lawrence Wong ,  Yang Ling

IPC分类号： H03D3/00 ,  H03D7/16 ,  H04B1/00 ,  H04B1/04 ,  H04B1/30 ,  H04B1/26

CPC分类号： H04B1/30 ,  H03D3/008 ,  H03D7/163 ,  H03D7/166 ,  H04B1/00 ,  H04B1/0475 ,  H04B2001/0491

摘要： This patent describes a method of removing the LO-leakage and 1/f noise problems associated with direct conversion RF receivers and other demodulators. In order to solve this problem a virtual LO™ signal is generated within the RF signal path which is tuned to the incoming RF signal. The virtual local oscillator (VLO) signal is constructed using signals that do not contain a significant amount of power (or no power at all) at the LO frequency. Any errors in generating the virtual LO signal are minimized using a closed loop correction scheme.

摘要翻译： 该专利描述了一种去除与直接转换RF接收机和其他解调器相关的LO泄漏和1 / f噪声问题的方法。 为了解决这个问题，在被调谐到输入RF信号的RF信号路径内产生虚拟LO（TM）信号。 虚拟本地振荡器（VLO）信号使用在LO频率下不包含大量功率（或完全没有功率）的信号构成。 使用闭环校正方案来最小化产生虚拟LO信号的任何错误。