公开(公告)号：US5904301A

公开(公告)日：1999-05-18

申请号：US822690

申请日：1997-03-24

申请人： Masaaki Kajiyama ,  Mitsunao Shibasaki

发明人： Masaaki Kajiyama ,  Mitsunao Shibasaki

IPC分类号： B05B1/14 ,  B08B3/02 ,  B08B3/04 ,  H01L21/00 ,  H01L21/304

CPC分类号： H01L21/67051 ,  B08B3/02 ,  B08B3/04

摘要： A spraying device for conveniently spraying a plurality of cleaning liquids, e.g., a chemical solution and pure water, over a workpiece, includes sprayer body defining therein a plurality of fluid passages. The fluid passages are separate from each other, and each of the fluid passages is communicated to a respective nozzle portion having a nozzle outlet at a nozzle surface defined on an outer surface of the sprayer body. The nozzle portions communicating each of the different fluid passages have substantially the same distribution in the nozzle surface.

摘要翻译： 用于在工件上方便地喷射多种清洁液体（例如化学溶液和纯水）的喷涂装置包括在其中限定多个流体通道的喷雾器主体。 流体通道彼此分离，并且每个流体通道连通到在喷嘴表面上限定的喷嘴表面处具有喷嘴出口的相应喷嘴部分。 连通每个不同流体通道的喷嘴部分在喷嘴表面中具有基本相同的分布。

公开(公告)号：US5950646A

公开(公告)日：1999-09-14

申请号：US3947

申请日：1998-01-08

申请人： Kuniaki Horie ,  Hidenao Suzuki ,  Tsutomu Nakada ,  Takeshi Murakami ,  Yukio Fukunaga ,  Masahito Abe ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Yuji Araki ,  Hiroyuki Ueyama

发明人： Kuniaki Horie ,  Hidenao Suzuki ,  Tsutomu Nakada ,  Takeshi Murakami ,  Yukio Fukunaga ,  Masahito Abe ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Yuji Araki ,  Hiroyuki Ueyama

IPC分类号： B08B9/00 ,  C23C16/44 ,  C23C16/448 ,  B08B3/10

CPC分类号： C23C16/448 ,  B08B9/00 ,  C23C16/4407 ,  Y10S134/902

摘要： A vapor feed supply system including a vaporizer device and a method of cleaning a vapor flow region employing such a vaporizer device enables thorough cleaning of the system, without having to degrade the overall system vacuum in the process of cleaning the vaporizer device. The method includes defining a cleaning fluid passage having a predetermined withstand pressure by isolating a cleaning region of the vapor flow region, and flowing a cleaning fluid into the cleaning fluid passage under a pressure so as to enable the cleaning fluid to remain in a liquid state at a cleaning temperature of the cleaning region.

摘要翻译： 包括蒸发器装置和使用这种蒸发器装置的蒸汽流动区域的清洁方法的蒸汽供给系统能够彻底清洁系统，而不必在清洁蒸发器装置的过程中降低整个系统的真空度。 该方法包括通过隔离蒸汽流动区域的清洁区域来限定具有预定耐受压力的清洁流体通道，并且在压力下将清洁流体流入清洁流体通道以使清洁流体保持在液体状态 在清洁区域的清洁温度下。

公开(公告)号：US06387182B1

公开(公告)日：2002-05-14

申请号：US09517699

申请日：2000-03-02

申请人： Kuniaki Horie ,  Yukio Fukunaga ,  Naoaki Ogure ,  Tsutomu Nakada ,  Masahito Abe ,  Mitsunao Shibasaki ,  Hidenao Suzuki ,  Yuji Araki ,  Kiwamu Tsukamoto

发明人： Kuniaki Horie ,  Yukio Fukunaga ,  Naoaki Ogure ,  Tsutomu Nakada ,  Masahito Abe ,  Mitsunao Shibasaki ,  Hidenao Suzuki ,  Yuji Araki ,  Kiwamu Tsukamoto

IPC分类号： B05C2100

CPC分类号： C23C16/45574 ,  C23C16/409 ,  C23C16/45514 ,  C23C16/45561 ,  C23C16/45563 ,  C23C16/4557

摘要： A substrate processing apparatus forms a thin film of high-dielectric or ferroelectric such as barium/strontium titanates, or a copper film for wiring on a substrate, and has a gas ejection head for individually introducing at least two gases including a material gas and ejecting the gases toward a substrate to be processed. The gas ejection head has at least two gas passageways for individually introducing the two gases, and at least two temperature control devices for individually controlling temperatures of the gases flowing through the gas passageways.

摘要翻译： 基板处理装置在基板上形成诸如钡/锶钛酸盐或铜箔的高电介质或铁电薄膜，并且具有气体喷射头，用于分别引入包括材料气体的至少两种气体并喷射 朝向待处理基板的气体。 气体喷射头具有用于分别引入两种气体的至少两个气体通道和用于单独控制流过气体通道的气体的温度的至少两个温度控制装置。

公开(公告)号：US06176929B1

公开(公告)日：2001-01-23

申请号：US09118177

申请日：1998-07-17

申请人： Yukio Fukunaga ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Kuniaki Horie ,  Hiroyuki Ueyama ,  Takeshi Murakami

发明人： Yukio Fukunaga ,  Hiroyuki Shinozaki ,  Kiwamu Tsukamoto ,  Mitsunao Shibasaki ,  Kuniaki Horie ,  Hiroyuki Ueyama ,  Takeshi Murakami

IPC分类号： C23C1600

CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/4557 ,  C23C16/45591 ,  C23C16/46

摘要： A compact thin-film deposition apparatus can promote a stable growth of a high quality thin-film product of uniform quality. The apparatus comprises a vacuum-tight deposition chamber enclosing a substrate holding device for holding a substrate. An elevator device for moving the substrate holding device and a gas showering head for flowing a film forming gas towards the substrate are provided. A transport opening and an exhaust opening are provided on a wall section of the deposition chamber at a height corresponding to the transport position and the deposition position, respectively. The deposition chamber is provided with a flow guiding member, and the flow guiding member comprises a cylindrical member to surround an elevating path of the substrate holding device and a first ring member to vertically divide a chamber space at a height between the exhaust opening and the transport opening.

摘要翻译： 紧凑的薄膜沉积装置可以促进质量均匀的高质量薄膜产品的稳定生长。 该装置包括一个真空密封的沉积室，其包围用于保持基板的基板保持装置。 提供了一种用于移动基板保持装置的电梯装置和用于使成膜气体朝向基板流动的气体淋浴头。 输送开口和排气口分别设置在沉积室的壁部分上，其高度分别对应于输送位置和沉积位置。 沉积室设置有导流构件，并且流动引导构件包括圆筒构件以包围基板保持装置的升降路径和第一环构件，以在排气口和排气口之间的高度垂直分隔腔室空间 运输开放。

公开(公告)号：US5829156A

公开(公告)日：1998-11-03

申请号：US820087

申请日：1997-03-19

申请人： Mitsunao Shibasaki ,  Naoaki Ogure

发明人： Mitsunao Shibasaki ,  Naoaki Ogure

IPC分类号： B08B3/00 ,  B08B3/02 ,  F26B5/08 ,  F26B11/04 ,  F26B11/18 ,  H01L21/00 ,  H01L21/304 ,  F26B17/24

CPC分类号： H01L21/67034 ,  F26B5/08

摘要： A spin dryer apparatus substrate such as a wafer can dry without degrading the cleanliness on both front and back sides of the wafer and without unnecessary cost increases. The spin dryer apparatus includes a holder section for holding a substrate in a substantially horizontal plane and defining a back space located beneath a back surface of the substrate, a driving section for rotating the holder section in the substantially horizontal plane, and a gas supply mechanism for supplying a clean gas into the back space. It is possible to avoid contamination of the back side of the substrate by preventing an ascending gas flow from approaching the substrate. A nozzle device is available for supplying a cleaning fluid on the substrate

摘要翻译： 诸如晶片的旋转干燥器装置基板可以在不降低晶片的前后两侧的清洁度的情况下干燥，并且不会不必要地增加成本。 旋转干燥装置包括：保持部，其将基板保持在大致水平面上，并且限定位于基板的背面下方的后部空间;驱动部，其使保持部在大致水平面上旋转;气体供给机构 用于将净气体供应到后部空间。 通过防止上升气体流入基板，可以避免基板背面的污染。 喷嘴装置可用于在基板上提供清洁流体