公开(公告)号：USD742304S1

公开(公告)日：2015-11-03

申请号：US29466214

申请日：2013-09-05

Applicant: Masafumi Ito

Designer： Masafumi Ito

公开(公告)号：USD730324S1

公开(公告)日：2015-05-26

申请号：US29415737

申请日：2012-03-14

Applicant: Masafumi Ito

Designer： Masafumi Ito

公开(公告)号：US09041937B2

公开(公告)日：2015-05-26

申请号：US13577044

申请日：2011-02-02

Applicant: Masaru Hori ,  Masafumi Ito ,  Yasuhiro Higashijima ,  Takayuki Ohta

Inventor： Masaru Hori ,  Masafumi Ito ,  Yasuhiro Higashijima ,  Takayuki Ohta

IPC: G01B11/02 ,  G01B9/02 ,  G01K11/00

CPC classification number: G01B9/02023 ,  G01B9/02058 ,  G01B9/0209 ,  G01K11/00

Abstract: [Problem to be Solved] To improve the measurement accuracy of an interference measurement device which utilizes interference of light.[Means for Solution] An interference measurement device includes a light source 10 for emitting supercontinuum light (SC light), an optical fiber coupler 11 for splitting the SC light into measurement light and reference light, a dispersion compensation element 12, a drive unit 13 for moving the dispersion compensation element 12, and light-receiving means 14 for measuring an interference waveform produced as a result of interference between the measurement light and the reference light. A measurement object 15 to be measured is an Si substrate having a thickness of 800 μm. The dispersion compensation element 12 is an Si substrate having a thickness of 780 μm. Namely, the dispersion compensation element 12 is formed of the same material as that of the measurement object 15 and is 20 μm thinner than the measurement object 15. The interference caused by reflection on the back surface of the measurement object 15 and reflection on the back surface of the dispersion compensation element 12 has a narrow peak width because wavelength dispersion is cancelled almost completely. Thus, the accuracy in measuring the peak position improves. As a result, the accuracy in measuring temperature, etc., improves.

Abstract translation: [待解决的问题]提高利用干扰的干涉测量装置的测量精度。 解决方案干扰测量装置包括用于发射超连续光（SC灯）的光源10，用于将SC光分解为测量光和参考光的光纤耦合器11，色散补偿元件12，驱动单元13 用于移动色散补偿元件12和用于测量作为测量光和参考光之间的干涉的结果而产生的干涉波形的光接收装置14。 待测量的测量对象15是厚度为800μm的Si衬底。 色散补偿元件12是厚度为780μm的Si衬底。 也就是说，色散补偿元件12由与测量对象15相同的材料形成，并且比测量对象15薄20μm。由测量对象15的背面上的反射引起的干涉和背面的反射 由于波长色散几乎完全消除，所以色散补偿元件12的表面具有窄的峰宽。 因此，测量峰值位置的精度提高。 结果，测量温度等的精度提高。

公开(公告)号：US20120300218A1

公开(公告)日：2012-11-29

申请号：US13577044

申请日：2011-02-02

Applicant: Masaru Hori ,  Masafumi Ito ,  Yasuhiro Higashijima ,  Takayuki Ohta

Inventor： Masaru Hori ,  Masafumi Ito ,  Yasuhiro Higashijima ,  Takayuki Ohta

IPC: G01B9/02 ,  G01B11/06

CPC classification number: G01B9/02023 ,  G01B9/02058 ,  G01B9/0209 ,  G01K11/00

Abstract: [Problem to be Solved]To improve the measurement accuracy of an interference measurement device which utilizes interference of light.[Means for Solution]An interference measurement device includes a light source 10 for emitting supercontinuum light (SC light), an optical fiber coupler 11 for splitting the SC light into measurement light and reference light, a dispersion compensation element 12, a drive unit 13 for moving the dispersion compensation element 12, and light-receiving means 14 for measuring an interference waveform produced as a result of interference between the measurement light and the reference light. A measurement object 15 to be measured is an Si substrate having a thickness of 800 μm. The dispersion compensation element 12 is an Si substrate having a thickness of 780 μm. Namely, the dispersion compensation element 12 is formed of the same material as that of the measurement object 15 and is 20 μm thinner than the measurement object 15. The interference caused by reflection on the back surface of the measurement object 15 and reflection on the back surface of the dispersion compensation element 12 has a narrow peak width because wavelength dispersion is cancelled almost completely. Thus, the accuracy in measuring the peak position improves. As a result, the accuracy in measuring temperature, etc., improves.

Abstract translation: [待解决的问题]提高利用干扰的干涉测量装置的测量精度。 解决方案干扰测量装置包括用于发射超连续光（SC灯）的光源10，用于将SC光分解为测量光和参考光的光纤耦合器11，色散补偿元件12，驱动单元13 用于移动色散补偿元件12和用于测量作为测量光和参考光之间的干涉的结果而产生的干涉波形的光接收装置14。 待测量的测量对象15是厚度为800μm的Si衬底。 色散补偿元件12是厚度为780μm的Si衬底。 也就是说，色散补偿元件12由与测量对象15相同的材料形成，并且比测量对象15薄20μm。由测量对象15的背面上的反射引起的干涉和背面的反射 由于波长色散几乎完全消除，所以色散补偿元件12的表面具有窄的峰宽。 因此，测量峰值位置的精度提高。 结果，测量温度等的精度提高。

公开(公告)号：USD609220S1

公开(公告)日：2010-02-02

申请号：US29335694

申请日：2009-04-20

Applicant: Masafumi Ito

Designer： Masafumi Ito

公开(公告)号：US20090122317A1

公开(公告)日：2009-05-14

申请号：US11991542

申请日：2006-09-06

Applicant: Masafumi Ito ,  Norihiko Nishizawa ,  Masaru Hori ,  Toshio Goto ,  Hiroyuki Kano

Inventor： Masafumi Ito ,  Norihiko Nishizawa ,  Masaru Hori ,  Toshio Goto ,  Hiroyuki Kano

IPC: G01N21/31 ,  G02B6/26

CPC classification number: G01N21/39 ,  G01J3/02 ,  G01J3/0218 ,  G01J3/0224 ,  G01J3/10 ,  G01J3/42 ,  G01J2001/4242 ,  G01N2201/0697 ,  G02B6/2861

Abstract: To achieve an apparatus capable of measuring a light absorption coefficient f a sample with high sensitivity. A ring down spectroscope uses a wavelength-variable femtosecond soliton pulse light source 1. Pulse light is input to a loop optical fiber 6 through a first light waveguide 4 and a wavelength selective switch 5. Ring down pulse light is input to a homodyne detector through the wavelength selective switch 5. On the other hand, pulse light propagating in the first light waveguide 4 is split and input to light waveguides constituting a second light waveguide 20 through an optical directional coupler 8 and a first optical switching element 12. The pulse light propagating in the second light waveguide 20 is input to the homodyne detector as reference light and used for synchronous detection. The plural light waveguides constituting the second light waveguide 20 differ in optical length in accordance with the length of the optical fiber 6, and can slightly change the optical length.

Abstract translation: 实现能够以高灵敏度测量样品的光吸收系数f的装置。 环形光谱仪使用波长可变飞秒激光脉冲光源1.脉冲光通过第一光波导4和波长选择开关5输入到环形光纤6中。环形脉冲光通过 波长选择开关5.另一方面，在第一光波导4中传播的脉冲光通过光学定向耦合器8和第一光开关元件12被分离并输入到构成第二光波导20的光波导上。脉冲光 在第二光波导20中传播的信号被输入到零差检测器作为参考光，并用于同步检测。 构成第二光波导路20的多个光波导根据光纤6的长度的光学长度不同，并且可以稍微改变光学长度。

公开(公告)号：US20070212536A1

公开(公告)日：2007-09-13

申请号：US11569544

申请日：2005-05-19

Applicant: Atsushi Okada ,  Akio Kiyohara ,  Hideki Tanaka ,  Toshiyuki Honda ,  Masafumi Ito ,  Junichi Kato ,  Noboru Toshima ,  Yasuhisa Nakao

Inventor： Atsushi Okada ,  Akio Kiyohara ,  Hideki Tanaka ,  Toshiyuki Honda ,  Masafumi Ito ,  Junichi Kato ,  Noboru Toshima ,  Yasuhisa Nakao

IPC: H01J11/02 ,  B32B3/24 ,  B32B9/00 ,  H05K9/00 ,  G02B1/10 ,  G09F9/00

CPC classification number: C09D5/24 ,  C09D5/32 ,  C09D11/52 ,  H01J2211/446 ,  H05K9/0096 ,  Y10T428/2809

Abstract: The present invention provides an electromagnetic wave shielding material that has high electromagnetic wave shielding effects, excellent transparency, and excellent see-through property, and a simple and inexpensive production process for the electromagnetic wave shielding material. Specifically, the present invention provides a process for producing an electromagnetic wave shielding material, the process comprising screen-printing in a geometric pattern a conductive paste containing a particulate silver oxide, a tertiary fatty acid silver salt, and a solvent, onto a transparent porous layer surface of a transparent resin substrate having a transparent porous layer containing as a main component at least one member selected from the group consisting of oxide ceramics, non-oxide ceramics, and metals; and performing heat treatment to form a conductive region with a geometric pattern on the transparent porous layer surface; and an electromagnetic wave shielding material produced by the production process.

Abstract translation: 本发明提供一种电磁波屏蔽材料具有高电磁波屏蔽效果，优异的透明性，透明性优异的电磁波屏蔽材料以及电磁波屏蔽材料的简单且廉价的制造方法。 具体地说，本发明提供了一种电磁波屏蔽材料的制造方法，该方法包括以几何图案将含有颗粒状氧化银，叔脂肪酸银盐和溶剂的导电糊剂丝网印刷到透明多孔 具有透明多孔层的透明树脂基板的层表面含有选自氧化物陶瓷，非氧化物陶瓷和金属中的至少一种元素作为主要成分; 并进行热处理以在透明多孔层表面上形成具有几何图案的导电区域; 以及通过该制造方法制造的电磁波屏蔽材料。

公开(公告)号：US20060267769A1

公开(公告)日：2006-11-30

申请号：US11432348

申请日：2006-05-12

Applicant: Masafumi Ito ,  Konami Izumi

Inventor： Masafumi Ito ,  Konami Izumi

IPC: G08B13/14

CPC classification number: G08B3/1008

Abstract: One of the objects of the present invention is to provide a communication system in which a user in a specific area can obtain information immediately without operating a device. The communication system has an RFID card, a reader/writer for communication, a host computer, and an information communication means. The RFID card transmits and receives information wirelessly to and from the reader/writer for communication. Thus a user can carry the RFID card freely. The memory portion in the RFID card has a rewritable memory portion and a non-writable memory portion. Electric power required for operation of the RFID card is supplied wirelessly, which contributes to reduction is size and weight of the RFID card. By providing a display portion in the RFID card, information transmitted wirelessly can be displayed on the display portion and the user can recognize information immediately.

Abstract translation: 本发明的目的之一是提供一种通信系统，其中特定区域中的用户可以在不操作设备的情况下立即获得信息。 通信系统具有RFID卡，用于通信的读写器，主计算机和信息通信装置。 RFID卡以无线方式从读取器/写入器发送和接收信息以进行通信。 因此，用户可以自由地携带RFID卡。 RFID卡中的存储器部分具有可重写存储器部分和不可写入存储器部分。 无线地提供操作RFID​​卡所需的电力，这有助于减小RFID卡的尺寸和重量。 通过在RFID卡中提供显示部分，可以在显示部分上显示无线传输的信息，用户可以立即识别信息。

公开(公告)号：US20050259716A1

公开(公告)日：2005-11-24

申请号：US10964647

申请日：2004-10-15

Applicant: Masafumi Ito ,  Yasuyuki Okamura ,  Tatsuo Shiina ,  Nobuo Ishii

Inventor： Masafumi Ito ,  Yasuyuki Okamura ,  Tatsuo Shiina ,  Nobuo Ishii

IPC: G01J5/00 ,  G01K11/12 ,  H01L21/324 ,  G01K11/00 ,  G01K1/16

CPC classification number: G01J5/0003 ,  G01K11/12

Abstract: The temperature of the surface and/or inside of a substrate is measured by irradiating the front surface or rear surface of the substrate, whose temperature is to be measured, with light and measuring the interference of a reflected light from the substrate and a reference light. A method and apparatus for measuring temperature or thickness which is suitable for directly measuring the temperature of the outermost surface layer of a substrate, and an apparatus for treating a substrate for an electronic device, which uses such method, are provided.

Abstract translation: 基板的表面和/或内部的温度通过用光照射待测温度的基板的前表面或后表面并测量来自基板的反射光的干涉和参考光来测量 。 提供了一种用于测量温度或厚度的方法和装置，其适用于直接测量基板的最外表面层的温度，以及使用这种方法的用于处理电子设备的基板的设备。

公开(公告)号：US06501082B1

公开(公告)日：2002-12-31

申请号：US09527562

申请日：2000-03-16

Applicant: Toshio Goto ,  Masaru Hori ,  Masafumi Ito ,  Nobuo Ishii ,  Satoru Kawakami

Inventor： Toshio Goto ,  Masaru Hori ,  Masafumi Ito ,  Nobuo Ishii ,  Satoru Kawakami

IPC: G21K510

CPC classification number: H01J37/32192 ,  H01J37/3233 ,  H01J37/32623

Abstract: A controlled plasma deposition system and method are provided including a vacuum vessel. An electron adding mass spectrometer is connected to a vacuum vessel for carrying out a gas treatment for a semi-conductor wafer. In the mass spectrometer, a gas in the vacuum vessel is incorporated, and electrons are added to the particles in the gas. Then the value of negative ions obtained by ionizing the particles, for example specific radicals, is measured. Once measured, the information is forwarded to a controller that may optimize the plasma deposition method.

Abstract translation: 提供了包括真空容器的受控等离子体沉积系统和方法。 将电子加入质谱仪连接到用于对半导体晶片进行气体处理的真空容器。 在质谱仪中，并入真空容器中的气体，并将电子加到气体中的颗粒中。 然后测量通过电离粒子，例如特定基团获得的负离子的值。 一旦测量，信息被转发到可优化等离子体沉积方法的控制器。