摘要:
An image forming apparatus includes an image forming unit configured to start image formation in accordance with a second job while performing the image formation in accordance with a first job, each of the first job and the second job including information indicating one of paper feeding units; a detecting unit configured to detect whether a recording medium is stored in a paper feeding unit indicated by the first job; and an image formation control unit configured to cause the image forming unit to continue the image formation in accordance with the second job when the detecting unit detects that a recording medium is stored in the paper feeding unit, and cause the image forming unit to suspend the image formation in accordance with the second job when the detecting unit detects that no recording medium is stored in the paper feeding unit.
摘要:
An image forming apparatus includes an image forming unit configured to start image formation in accordance with a second job while performing the image formation in accordance with a first job, each of the first job and the second job including information indicating one of paper feeding units; a detecting unit configured to detect whether a recording medium is stored in a paper feeding unit indicated by the first job; and an image formation control unit configured to cause the image forming unit to continue the image formation in accordance with the second job when the detecting unit detects that a recording medium is stored in the paper feeding unit, and cause the image forming unit to suspend the image formation in accordance with the second job when the detecting unit detects that no recording medium is stored in the paper feeding unit.
摘要:
(Object) To miniaturize a field-effect transistor. (Means of Achieving the Object) A field-effect transistor includes a semiconductor film formed on a base, a gate insulating film formed on a part of the semiconductor film, a gate electrode formed on the gate insulating film, and a source electrode and a drain electrode formed in contact with the semiconductor film, wherein a thickness of the source electrode and the drain electrode is smaller than a thickness of the gate insulating film, and the gate insulating film includes a region that is not in contact with the source electrode or the drain electrode.
摘要:
A method for manufacturing a field-effect transistor includes forming an active layer of an oxide semiconductor, forming a conducting film to cover the active layer, patterning the conducting film through an etching process using an etchant to form a source electrode and a drain electrode, and performing, at least before the patterning the conducting film, a treatment on the active layer so that an etching rate of the active layer is less than an etching rate of the conducting film.
摘要:
A field-effect transistor includes a substrate; a source electrode, a drain electrode, and a gate electrode that are formed on the substrate; a semiconductor layer by which a channel is formed between the source electrode and the drain electrode when a predetermined voltage is applied to the gate electrode; and a gate insulating layer provided between the gate electrode and the semiconductor layer. The gate insulating layer is formed of an amorphous composite metal oxide insulating film including one or two or more alkaline-earth metal elements and one or two or more elements selected from a group consisting of Ga, Sc, Y, and lanthanoid except Ce.
摘要:
A field-effect transistor including: a gate electrode, which is configured to apply gate voltage; a source electrode and a drain electrode, which are configured to take electric current out; a semiconductor layer, which is disposed to be adjacent to the source electrode and the drain electrode; and a gate insulating layer, which is disposed between the gate electrode and the semiconductor layer, wherein the gate insulating layer includes a first gate insulating layer containing a first oxide containing Si and an alkaline earth metal and a second gate insulating layer disposed to be in contact with the first gate insulating layer and containing a paraelectric amorphous oxide containing a Group A element which is an alkaline earth metal and a Group B element which is at least one selected from the group consisting of Ga, Sc, Y, and lanthanoid.
摘要:
To provide is a p-type oxide, including an oxide, wherein the oxide includes: Cu; and an element M, which is selected from p-block elements, and which can be in an equilibrium state, as being present as an ion, wherein the equilibrium state is a state in which there are both a state where all of electrons of p-orbital of an outermost shell are lost, and a state where all of electrons of an outermost shell are lost, and wherein the p-type oxide is amorphous.
摘要:
A field effect transistor includes a gate electrode to which a gate voltage is applied; a source electrode and a drain electrode for obtaining a current in response to the gate voltage; an active layer provided adjacent to the source electrode and the drain electrode and formed of an oxide semiconductor including magnesium and indium as major components; and a gate insulating layer provided between the gate electrode and the active layer.
摘要:
A power discontinuity occurring in any one of a plurality of I/O units connected to a numerical controller is detected. When the power discontinuity occurs in any one of the I/O units, the I/O unit detects the power discontinuity, and transmits the detection of the power discontinuity to an I/O unit in front of the I/O unit, at a timing different from a timing of an ordinary communication, in the form of a communication packet having a data pattern different from an ordinary data pattern. When the front I/O unit receives the communication packet, the communication packet is stored in a memory as power discontinuity detection information.
摘要:
A method for fabricating a field-effect transistor having a gate electrode, a source electrode, a drain electrode, and an active layer forming a channel region, the active layer having an oxide semiconductor mainly containing magnesium and indium is disclosed. The method includes a deposition step of depositing an oxide film, a patterning step of patterning the oxide film by processes including etching to obtain the active layer, and a heat-treatment step of heat-treating the obtained active layer subsequent to the patterning step.