摘要:
An under thread supply apparatus for a sewing machine comprises a bobbin case, a bobbin exchange device, a thread removal device and a winding device. The bobbin case is removably set to a shuttle of the sewing machine and accommodates a bobbin with the thread wound thereon. The bobbin exchange device takes the bobbin case out of the shuttle, and sets the bobbin case accommodating the bobbin with the thread wound anew therearound to the shuttle. The thread removal device removes the thread from the bobbin accommodated in the bobbin case which is taken out. The winding device winds a preset amount of thread around the bobbin after the thread is removed therefrom.
摘要:
An under thread supply apparatus for a sewing machine comprises a bobbin case, a bobbin exchange device, a thread removal device and a winding device. The bobbin case is removably set to a shuttle of the sewing machine and accommodates a bobbin with the thread wound thereon. The bobbin exchange device takes the bobbin case out of the shuttle, and set the bobbin case accommodating the bobbin with the thread wound anew therearound to the shuttle. The thread removal device removes the thread from the bobbin accommodated in the bobbin case which is taken out. The winding device winds a preset amount of thread around the bobbin after the thread is removed therefrom.
摘要:
An under thread supply apparatus for a sewing machine comprises a bobbin case, a bobbin exchange device, a thread removal device and a winding device. The bobbin case is removably set to a shuttle of the sewing machine and accommodates a bobbin with the thread wound thereon. The bobbin exchange device takes the bobbin case out of the shuttle, and sets the bobbin case accommodating the bobbin with the thread wound anew therearound to the shuttle. The thread removal device removes the thread from the bobbin accommodated in the bobbin case which is taken out. The winding device winds a preset amount of thread around the bobbin after the thread is removed therefrom.
摘要:
An under thread supply apparatus for a sewing machine comprises a bobbin case, a bobbin exchange device, a thread removal device and a winding device. The bobbin case is removably set to a shuttle of the sewing machine and accommodates a bobbin with the thread wound thereon. The bobbin exchange device takes the bobbin case out of the shuttle, and sets the bobbin case accommodating the bobbin with the thread wound anew therearound to the shuttle. The thread removal device removes the thread from the bobbin accommodated in the bobbin case which is taken out. The winding device winds a preset amount of thread around the bobbin after the thread is removed therefrom.
摘要:
There is provided a positive resist composition including a resin component (A) which displays increased solubility in an alkali developing solution under action of acid, and an acid generator component (B) which generates an acid upon exposure, wherein the resin component (A) includes a polymer compound (A1) containing a structural unit (a0) represented by a general formula (a0-1) shown below, and a structural unit (a1) derived from an acrylate ester which has an acid dissociable, dissolution inhibiting group: (in the formula (a0-1), R represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; two of R′ each independently represents a hydrogen atom, a lower alkyl group, or an alkoxy group of 1 to 5 carbon atoms; X represents an alkylene group of 1 to 5 carbon atoms, an oxygen atom, or a sulfur atom.).
摘要:
The invention provides a black and white photothermographic material including, on at least one surface of a support, at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder, wherein 50% or more of the total projected area of the photosensitive silver halide grains is occupied by tabular grains having an aspect ratio of 2 or more, and at least one apex portion of each tabular grain has an epitaxial junction. An image forming method is also provided, the method including bringing the photothermographic material into close contact with a fluorescent intensifying screen containing a fluorescent substance, wherein 50% or more of emission light of the fluorescent substance has a wavelength of 350 nm to 420 nm, and applying X-ray exposure. The black and white photothermographic material has high sensitivity and is superior in image storability and raw stock storability.
摘要:
A silver halide photographic emulsion comprising grains, wherein 70% or more of the total projected area of the grains is occupied by silver halide grains each meeting requirements (a) to (d) below (a) the grain is composed of a tabular silver halide host grain having two mutually parallel main planes and aspect ratio of 2 or more, and a silver halide protrusion portion epitaxially junctioned on the surface of the host grain; (b) the silver bromide contents of both the host grain and the protrusion portion are 70 mol % or more; (c) the percentage of the silver amount in the protrusion is 12% or less of the silver amount in the host grain; and (d) the grain has a shallow electron-trapping zone.
摘要:
A resist composition for immersion exposure, including a base component that exhibits changed solubility in an alkali developing solution under action of acid, an acid generator component that generates acid upon exposure, and a fluorine-containing compound represented by a general formula (c-1) that is decomposable in an alkali developing solution: wherein R1 represents an organic group which may contain a polymerizable group, with the proviso that said polymerizable group has a carbon-carbon multiple bond, and the carbon atoms forming the multiple bond are not directly bonded to the carbon atom within the —C(═O)— group in general formula (c-1); and R2 represents an organic group having a fluorine atom.
摘要:
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of an acid, and an acid generator component (B), wherein the base component (A) includes a polymeric compound (A0) containing a structural unit (a0) represented by the general formula (a0-1) shown below: (wherein, R1 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R2 represents a bivalent linking group containing at least one kind of polar groups selected from the group consisting of —O—, —C(═O)—, —C(═O)—O—, a carbonate linkage (—O—C(═O)—O—), —S—, —S(═O)2—, —S(═O)2—O—, —NH—, —NR04— (wherein, R04 represents an alkyl group or an acyl group), and —NH—C(═O)—; and R3 represents a cyclic group containing a sulfonyl group within the ring skeleton).
摘要:
A fluorine-containing compound represented by a general formula (c-1) shown below: [Chemical Formula 1] RX-AN-(OR2)a (c-1) [wherein, RX represents an organic group, AN represents a naphthalene ring that may have a substituent, R2 represents a base dissociable group, and a represents 1 or 2, provided that at least one among AN and said a R2 groups contains a fluorine atom].