SOLAR CELL AND METHOD FOR MANUFACTURING THE SAME
    1.
    发明申请
    SOLAR CELL AND METHOD FOR MANUFACTURING THE SAME 审中-公开
    太阳能电池及其制造方法

    公开(公告)号:US20120234387A1

    公开(公告)日:2012-09-20

    申请号:US13364839

    申请日:2012-02-02

    IPC分类号: H01L31/0203 H01L31/18

    摘要: According to one embodiment, a solar cell includes a first substrate, a second substrate, a first electrode, a second electrode, a support unit, a sealing unit, a permeation suppression unit, and an electrolyte fluid. The first electrode is provided on a major surface of the first substrate. The second electrode is provided on a major surface of the second substrate. The support unit is provided on the second electrode. The support unit is configured to support a sensitizing dye. The sealing unit is configured to seal a circumferential edge portion of the first substrate and a circumferential edge portion of the second substrate. The permeation suppression unit is provided around the support unit on an inner side of the sealing unit. The electrolyte fluid is provided on an inner side of the permeation suppression unit.

    摘要翻译: 根据一个实施例,太阳能电池包括第一基板,第二基板,第一电极,第二电极,支撑单元,密封单元,渗透抑制单元和电解液。 第一电极设置在第一基板的主表面上。 第二电极设置在第二基板的主表面上。 支撑单元设置在第二电极上。 支撑单元构造成支撑敏化染料。 密封单元构造成密封第一基板的周向边缘部分和第二基板的周边边缘部分。 渗透抑制单元设置在密封单元内侧的支撑单元周围。 电解质流体设置在渗透抑制单元的内侧。

    ORGANIC LIGHT EMITTING DEVICE, LIGHTING APPARATUS, DISPLAY APPARATUS AND METHOD FOR MANUFACTURING THE ORGANIC LIGHT EMITTING DEVICE
    2.
    发明申请
    ORGANIC LIGHT EMITTING DEVICE, LIGHTING APPARATUS, DISPLAY APPARATUS AND METHOD FOR MANUFACTURING THE ORGANIC LIGHT EMITTING DEVICE 审中-公开
    有机发光装置,照明装置,显示装置及制造有机发光装置的方法

    公开(公告)号:US20110234477A1

    公开(公告)日:2011-09-29

    申请号:US13004323

    申请日:2011-01-11

    IPC分类号: G09G3/30 H01J1/62

    摘要: According to one embodiment, an organic light emitting device includes: a base material having flexibility; an organic light emitting element provided on the base material; and a protection film that covers the organic light emitting element. The protection film includes: a first inorganic layer that is provided on the organic light emitting element, and covers the organic light emitting element; a flexible layer that is provided on the first inorganic layer, contains an organic polymer, and has flexibility; and a second inorganic layer that is provided on the flexible layer, and covers the flexible layer.

    摘要翻译: 根据一个实施例,有机发光器件包括:具有柔性的基材; 设置在基材上的有机发光元件; 以及覆盖有机发光元件的保护膜。 保护膜包括:设置在有机发光元件上并覆盖有机发光元件的第一无机层; 设置在第一无机层上的柔性层含有有机聚合物,具有柔软性; 以及设置在柔性层上并覆盖柔性层的第二无机层。

    Substrate processing system and substrate processing program
    4.
    发明授权
    Substrate processing system and substrate processing program 有权
    基板加工系统和基板加工程序

    公开(公告)号:US09303976B2

    公开(公告)日:2016-04-05

    申请号:US13456458

    申请日:2012-04-26

    摘要: According to one embodiment, a substrate processing system includes a measuring unit, a data processing unit, and a processing unit. The measuring unit is configured to measure information relating to a thickness dimension of a substrate. The substrate includes a light emitting unit and a wavelength conversion unit. The wavelength conversion unit includes a phosphor. The data processing unit is configured to determine processing information relating to a thickness direction of the wavelength conversion unit based on the measured information relating to the thickness dimension of the substrate and based on information relating to a characteristic of light emitted from the light emitting unit. The processing unit is configured to perform processing of the wavelength conversion unit based on the determined processing information.

    摘要翻译: 根据一个实施例,基板处理系统包括测量单元,数据处理单元和处理单元。 测量单元被配置为测量与衬底的厚度尺寸有关的信息。 基板包括发光单元和波长转换单元。 波长转换单元包括荧光体。 数据处理单元被配置为基于与基板的厚度尺寸相关的测量信息,并且基于与从发光单元发射的光的特性相关的信息来确定与波长转换单元的厚度方向有关的处理信息。 处理单元被配置为基于所确定的处理信息来执行波长转换单元的处理。

    SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING PROGRAM
    6.
    发明申请
    SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING PROGRAM 有权
    基板处理系统和基板处理程序

    公开(公告)号:US20120277896A1

    公开(公告)日:2012-11-01

    申请号:US13456458

    申请日:2012-04-26

    IPC分类号: G06F19/00 G06F15/00 G01B11/06

    摘要: According to one embodiment, a substrate processing system includes a measuring unit, a data processing unit, and a processing unit. The measuring unit is configured to measure information relating to a thickness dimension of a substrate. The substrate includes a light emitting unit and a wavelength conversion unit. The wavelength conversion unit includes a phosphor. The data processing unit is configured to determine processing information relating to a thickness direction of the wavelength conversion unit based on the measured information relating to the thickness dimension of the substrate and based on information relating to a characteristic of light emitted from the light emitting unit. The processing unit is configured to perform processing of the wavelength conversion unit based on the determined processing information.

    摘要翻译: 根据一个实施例,基板处理系统包括测量单元,数据处理单元和处理单元。 测量单元被配置为测量与衬底的厚度尺寸有关的信息。 基板包括发光单元和波长转换单元。 波长转换单元包括荧光体。 数据处理单元被配置为基于与基板的厚度尺寸相关的测量信息,并且基于与从发光单元发射的光的特性相关的信息来确定与波长转换单元的厚度方向有关的处理信息。 处理单元被配置为基于所确定的处理信息来执行波长转换单元的处理。

    Film forming apparatus, film forming method, and semiconductor device
    7.
    发明授权
    Film forming apparatus, film forming method, and semiconductor device 有权
    成膜装置,成膜方法和半导体装置

    公开(公告)号:US08614500B2

    公开(公告)日:2013-12-24

    申请号:US13048612

    申请日:2011-03-15

    IPC分类号: H01L23/58

    摘要: According one embodiment, a film forming apparatus includes a stage, a coating section, a vapor supply section, a blower section, and a controller. On the stage, an coating target is placed. The coating section applies a material to a predetermined region on the coating target placed on the stage to form a coating film. The vapor supply section generates solvent vapor capable of dissolving the coating film. The blower section blows the solvent vapor generated by the vapor supply section onto the coating film on the coating target placed on the stage. The controller controls an amount of the solvent vapor to be blown by the blower section so that: the coating film is dissolved; viscosity in a part of the coating film on a surface layer side is lower than that in a part thereof on the coating target side; and the viscosity in the part on the surface layer side and the viscosity of the coating target side take such values that prevent the coating film on the coating target from spreading.

    摘要翻译: 根据一个实施例,一种成膜装置包括载物台,涂布部分,蒸气供应部分,鼓风机部分和控制器。 在舞台上放置涂层目标。 涂布部分将材料施加到放置在载物台上的涂布靶上的预定区域上以形成涂膜。 蒸气供给部产生能够溶解涂膜的溶剂蒸气。 鼓风机部分将由蒸汽供应部分产生的溶剂蒸气吹到放置在载物台上的涂覆靶上的涂膜上。 控制器控制由鼓风机部分吹送的溶剂蒸气的量,使得涂膜溶解; 表面层侧的一部分涂膜的粘度比涂布目标侧的一部分的粘度低; 并且表面层侧的部分中的粘度和涂布目标侧的粘度取得防止涂布靶上的涂膜扩散的值。

    APPARATUS AND METHOD OF PROCESSING SUBSTRATE
    8.
    发明申请
    APPARATUS AND METHOD OF PROCESSING SUBSTRATE 审中-公开
    装置和处理基板的方法

    公开(公告)号:US20120067847A1

    公开(公告)日:2012-03-22

    申请号:US13223555

    申请日:2011-09-01

    IPC分类号: C23F1/00 C23F1/08

    摘要: According to one embodiment, an apparatus of processing a substrate includes a treatment chamber, a holder, a feed device, and a temperature control device. The holder is provided in the treatment chamber and is configured to rotatably hold the substrate. The feed device includes a nozzle configured to eject an etching solution to a surface of the substrate held by the holder. The temperature control device includes first and second devices, and a controller. The first device is configured to heat and/or cool an atmosphere inside the treatment chamber. The second device is configured to heat and/or cool the etching solution. The controller is configured to control operation of the first and second devices such that a temperature of the atmosphere is higher than that of the etching solution in the nozzle and that difference between the temperature of the atmosphere and that of the etching solution is maintained constant.

    摘要翻译: 根据一个实施例,处理基板的装置包括处理室,保持器,进给装置和温度控制装置。 保持器设置在处理室中并且构造成可旋转地保持基板。 进料装置包括喷嘴,该喷嘴构造成将蚀刻溶液喷射到由保持器保持的基板的表面上。 温度控制装置包括第一和第二装置以及控制器。 第一装置被配置为加热和/或冷却处理室内的气氛。 第二装置被配置为加热和/或冷却蚀刻溶液。 控制器被配置为控制第一和第二装置的操作,使得气氛的温度高于喷嘴中的蚀刻溶液的温度,并且气氛的温度与蚀刻溶液的温度之间的差保持恒定。

    INK JET SYSTEM AND METHOD FOR REMOVING AIR BUBBLES INSIDE OF AN INK JET NOZZLE
    9.
    发明申请
    INK JET SYSTEM AND METHOD FOR REMOVING AIR BUBBLES INSIDE OF AN INK JET NOZZLE 有权
    喷墨喷嘴系统和移除喷墨喷嘴内的空气泡沫的方法

    公开(公告)号:US20090201352A1

    公开(公告)日:2009-08-13

    申请号:US12365400

    申请日:2009-02-04

    IPC分类号: B41J2/19

    CPC分类号: B41J2/19 B41J2/1707

    摘要: An ink jet system according to the present invention is provided with an air bubble removing unit including: an ink jet body having a plurality of ink supply path; a nozzle plate connected to an end of the ink jet body and having a plurality of spaced nozzle holes therein; and a cap configured to cover the nozzle holes formed in the nozzle plate wherein a first ink channel space is formed continuous to the nozzle holes and the plurality of ink supply path, and a second ink channel space is formed between a recess of the cap and a surface of the nozzle plate, so that the second ink channel space and the first ink channel space are continuous through the nozzle holes.

    摘要翻译: 根据本发明的喷墨系统设置有气泡去除单元,其包括:具有多个供墨路径的喷墨体; 喷嘴板,其连接到喷墨体的端部并且在其中具有多个间隔开的喷嘴孔; 以及帽,其构造成覆盖形成在喷嘴板中的喷嘴孔,其中形成与喷嘴孔和多个供墨路径连续的第一墨水通道空间,并且在盖的凹部和 喷嘴板的表面,使得第二墨水通道空间和第一墨水通道空间通过喷嘴孔连续。