BIOABSORBABLE SUTURE
    1.
    发明申请
    BIOABSORBABLE SUTURE 审中-公开
    生物耐用

    公开(公告)号:US20120197295A1

    公开(公告)日:2012-08-02

    申请号:US13442002

    申请日:2012-04-09

    IPC分类号: A61B17/04

    CPC分类号: A61L17/08 A61L17/10 C08L5/08

    摘要: A bioabsorbable suture according to the present invention is characterized in that the suture is manufactured from monofilaments or multifilaments spun from a spinning raw solution containing one or two or more component(s) selected from the group consisting of chitin, chitosan, and derivatives thereof and a degrading enzyme for the component(s), and the degrading enzyme exists on a surface of the suture and in the suture.

    摘要翻译: 根据本发明的生物可吸收缝合线的特征在于,缝合线由从含有一种或两种以上选自甲壳素,壳聚糖及其衍生物的组分的纺丝原液中纺出的单丝或多丝制成, 用于组分的降解酶,并且降解酶存在于缝合线的表面和缝合线中。

    Method of manufacturing semiconductor device
    5.
    发明授权
    Method of manufacturing semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US08741161B2

    公开(公告)日:2014-06-03

    申请号:US13428535

    申请日:2012-03-23

    IPC分类号: H01L21/302

    摘要: According to one embodiment, a method of manufacturing a semiconductor device, the method includes forming a pillar on a base layer, forming a insulating layer on the base layer to cover the pillar by using GCIB method, where a lowermost portion of an upper surface of the insulating layer is lower than an upper surface of the pillar, and polishing the insulating layer and the pillar to expose a head of the pillar by using CMP method, where an end point of the polishing is the lowermost portion of the upper surface of the insulating layer.

    摘要翻译: 根据一个实施方案,一种制造半导体器件的方法,该方法包括在基底层上形成柱,在基底层上形成绝缘层以通过GCIB法覆盖柱,其中上表面的最下部分 绝缘层低于柱的上表面,并且通过使用CMP方法研磨绝缘层和柱以露出柱的头部,其中抛光的终点是上表面的最下部 绝缘层。

    Magnetoresistive effect element with intermediate oxide layer containing boron and an element selected from Ca, Mg, Sr, Ba, Ti, and Sc
    8.
    发明授权
    Magnetoresistive effect element with intermediate oxide layer containing boron and an element selected from Ca, Mg, Sr, Ba, Ti, and Sc 有权
    具有含有硼和选自Ca,Mg,Sr,Ba,Ti和Sc的元素的中间氧化物层的磁阻效应元件

    公开(公告)号:US07920361B2

    公开(公告)日:2011-04-05

    申请号:US11844069

    申请日:2007-08-23

    IPC分类号: G11B5/39

    摘要: It is made possible to provide a magnetoresistive effect element that can reverse magnetization direction with a low current, having low areal resistance (RA) and a high TMR ratio. A magnetoresistive effect element includes: a film stack that includes a magnetization free layer including a magnetic layer in which magnetization direction is changeable, a magnetization pinned layer including a magnetic layer in which magnetization direction is pinned, and an intermediate layer provided between the magnetization free layer and the magnetization pinned layer, the intermediate layer being an oxide containing boron (B) and an element selected from the group consisting of Ca, Mg, Sr, Ba, Ti, and Sc. Current is applied bidirectionally between the magnetization pinned layer and the magnetization free layer through the intermediate layer, so that the magnetization of the magnetization free layer is reversible.

    摘要翻译: 可以提供具有低电流(RA)和高TMR比的低电流来反向磁化方向的磁阻效应元件。 磁阻效应元件包括:膜堆叠,其包括磁化自由层,其包括其中磁化方向可变的磁性层,包括其中磁化方向被钉扎的磁性层的磁化固定层,以及设置在磁化自由度之间的中间层 层和磁化固定层,中间层是含有硼(B)的氧化物和选自Ca,Mg,Sr,Ba,Ti和Sc的元素。 通过中间层在磁化钉扎层和磁化自由层之间双向施加电流,使得无磁化层的磁化是可逆的。