System for uniform structuring of substrates
    3.
    发明授权
    System for uniform structuring of substrates 有权
    衬底均匀结构的系统

    公开(公告)号:US08763239B2

    公开(公告)日:2014-07-01

    申请号:US12266630

    申请日:2008-11-07

    摘要: A system for transferring a nanostructure from a die to a flat side of a large-area substrate. The system has a substrate holder that receives the substrate on a substrate receiving surface. A structural surface of the die is oriented parallel to and opposite the substrate receiving surface. An adjusting means receives the substrate holder and adjusts the position of the substrate relative to the die in an x-direction, y-direction and a rotational direction. An actuator device includes at least two separately controllable actuators that each independently imposes a force in a direction orthogonal to the substrate receiving surface. A force measuring cell is in each actuator for measuring the force applied on the die or substrate. The forces, in combination, produce a single, controllable resultant force at a predetermined location. The single, resultant force is orientated in a direction orthogonal to the substrate receiving surface of the substrate holder.

    摘要翻译: 用于将纳米结构从模具转移到大面积基板的平坦侧的系统。 该系统具有在衬底接收表面上接收衬底的衬底保持器。 模具的结构表面平行于衬底接收表面并与衬底接收表面相对。 调节装置接收衬底保持器并且在x方向,y方向和旋转方向上调整衬底相对于管芯的位置。 致动器装置包括至少两个单独可控制的致动器,每个致动器在与基板接收表面正交的方向上独立地施加力。 力测量单元位于每个致动器中,用于测量施加在模具或基板上的力。 这些力组合在一个预定的位置产生一个可控的合力。 单个合成力在与基板保持器的基板接收表面正交的方向上取向。

    DEVICE FOR EMBOSSING OF SUBSTRATES
    4.
    发明申请
    DEVICE FOR EMBOSSING OF SUBSTRATES 有权
    基片破裂装置

    公开(公告)号:US20110045185A1

    公开(公告)日:2011-02-24

    申请号:US12858509

    申请日:2010-08-18

    IPC分类号: B05D3/12 B05C11/00 B28B11/08

    摘要: The invention relates to a device for embossing of substrates, especially semiconductor substrates or wafers, comprised of: at least one receiving means for holding the substrate in a working space, a calibration means located at least partially in the working space for calibration of the substrate, an embossing means which is located at least partially in the working space for embossing of the structure material onto the substrate in an embossing process, the working space being exposed to a defined atmosphere before and during the embossing process without interruption, and a method for embossing of substrates.

    摘要翻译: 本发明涉及一种用于压花衬底,特别是半导体衬底或晶片的装置,包括:用于将衬底保持在工作空间中的至少一个接收装置,至少部分地位于工作空间中用于校准衬底的校准装置 至少部分地位于所述工作空间中的压花装置,用于在压花过程中将所述结构材料压花到所述基材上,所述工作空间在压花过程之前和期间暴露于限定的气氛下,而不中断;以及一种方法, 基材压花。

    Transport system for accommodating and transporting flexible substrates
    5.
    发明授权
    Transport system for accommodating and transporting flexible substrates 有权
    用于容纳和运输柔性基板的运输系统

    公开(公告)号:US08931624B2

    公开(公告)日:2015-01-13

    申请号:US12944867

    申请日:2010-11-12

    IPC分类号: B65G47/00 B65H37/00

    CPC分类号: B65H37/002

    摘要: This invention relates to a transport foil/film as well as a transport system for holding and transport of at least one thin flexible substrate and a corresponding method and a use of a flexible transport foil/film for holding and for transport of at least one thin, flexible substrate, the substrates being able to be fixed or being fixed at least temporarily on the transport foil/film and the transport foil/film being drivable by driving means for transport of the substrates.

    摘要翻译: 本发明涉及一种输送箔/膜以及用于保持和输送至少一个薄柔性基板的输送系统,以及相应的方法以及用于保持和运输至少一个薄的柔性输送箔/膜的使用 柔性基板,基板能够固定或至少暂时固定在输送箔/膜上,并且运输箔/薄膜可通过用于输送基板的驱动装置驱动。

    Device for embossing of substrates
    6.
    发明授权
    Device for embossing of substrates 有权
    衬底压花装置

    公开(公告)号:US09116424B2

    公开(公告)日:2015-08-25

    申请号:US12858509

    申请日:2010-08-18

    摘要: The invention relates to a device for embossing of substrates, especially semiconductor substrates or wafers, comprised of: at least one receiving means for holding the substrate in a working space, a calibration means located at least partially in the working space for calibration of the substrate, an embossing means which is located at least partially in the working space for embossing of the structure material onto the substrate in an embossing process, the working space being exposed to a defined atmosphere before and during the embossing process without interruption, and a method for embossing of substrates.

    摘要翻译: 本发明涉及一种用于压花衬底,特别是半导体衬底或晶片的装置,包括:用于将衬底保持在工作空间中的至少一个接收装置,至少部分地位于工作空间中用于校准衬底的校准装置 至少部分地位于所述工作空间中的压花装置,用于在压花过程中将所述结构材料压花到所述基材上,所述工作空间在压花过程之前和期间暴露于限定的气氛下,而不中断;以及一种方法, 基材压花。

    SYSTEM FOR UNIFORM STRUCTURING OF SUBSTRATES
    7.
    发明申请
    SYSTEM FOR UNIFORM STRUCTURING OF SUBSTRATES 有权
    基板均匀结构的系统

    公开(公告)号:US20090151154A1

    公开(公告)日:2009-06-18

    申请号:US12266630

    申请日:2008-11-07

    IPC分类号: H05K3/00

    摘要: The invention relates to a system for transferring a nanostructure from a die to a flat side of a large-area substrate with a substrate holder that receives the substrate on a substrate receiving surface, and an actuator device that can be oriented parallel to the substrate receiving surface and opposite to this movable structural surface of the die and that acts orthogonally to the substrate receiving surface. To be able to use reasonably priced dies and in this case to achieve the highest possible throughput, a good edge yield, and a homogeneous structure with the substrate as much as possible without scrapping, a system is proposed with which the resultant force that acts through the die on the substrate surface can be shifted along the die surface.

    摘要翻译: 本发明涉及一种用于将纳米结构从模具转移到大面积基板的平坦侧的系统,该基板保持器在基板接收表面上容纳基板,并且致动器装置可以平行于基板接收 表面并与模具的该可移动结构表面相对并且与基板接收表面正交地作用。 为了能够使用价格合理的模具,并且在这种情况下,尽可能实现最高的吞吐量,良好的边缘屈服度,以及尽可能不消除基底的均匀的结构,提出了一种系统, 衬底表面上的管芯可以沿模具表面移动。

    DEVICE AND METHOD FOR TREATING SUBSTRATE SURFACES
    9.
    发明申请
    DEVICE AND METHOD FOR TREATING SUBSTRATE SURFACES 有权
    用于处理基板表面的装置和方法

    公开(公告)号:US20140332036A1

    公开(公告)日:2014-11-13

    申请号:US14346109

    申请日:2011-09-22

    摘要: A device and method for treatment of a substrate treatment surface of a substrate with a fluid by immersion of the substrate treatment surface into the fluid, The device includes: receiving means for receiving the fluid with an immersion opening and immersion means for immersion of the substrate treatment surfaces through the immersion opening into the receiving means, Rotation means are provided for rotation of the receiving means for at least predominant discharge of the fluid from the receiving means.

    摘要翻译: 一种用于通过将基板处理表面浸入流体中来处理基板处理表面的装置和方法。该装置包括:接收装置,用于接收具有浸入口的流体和用于浸没基板的浸渍装置 处理表面通过浸入开口进入接收装置,旋转装置被设置用于接收装置的旋转,用于至少主要从接收装置排出流体。

    METHOD AND DEVICE FOR PRODUCING INDIVIDUALLY CODED READ PATTERNS
    10.
    发明申请
    METHOD AND DEVICE FOR PRODUCING INDIVIDUALLY CODED READ PATTERNS 有权
    用于生产个性化编码阅读模式的方法和装置

    公开(公告)号:US20130306742A1

    公开(公告)日:2013-11-21

    申请号:US13981616

    申请日:2011-12-12

    IPC分类号: G06K19/077

    CPC分类号: G06K19/07749 G06K19/0672

    摘要: A device for producing individually coded read patterns, especially resonators for use in RFID chips. The device includes a structuring apparatus for producing a basic pattern with at least one group of individual patters on a carrier substrate, and a processing apparatus for forming at least one individually coded read pattern at a time with read elements from a subset of a total set of the individual patters of each group. The invention also relates to a corresponding method and a read structure, produced according to the described method and/or the described device.

    摘要翻译: 用于产生单独编码的读取模式的装置,特别是用于RFID芯片的谐振器。 该装置包括用于在载体基板上产生具有至少一组单独图案的基本图案的结构设备,以及用于一次形成至少一个单独编码的读取图案的处理装置, 的每个组的个人模式。 本发明还涉及根据所描述的方法和/或所描述的装置产生的相应的方法和读取结构。