利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

46 条记录 (耗时 0.038 秒)

    Method and apparatus for angular-resolved spectroscopic lithography characterization
    7.
    发明申请
    Method and apparatus for angular-resolved spectroscopic lithography characterization 有权
    用于角分辨光谱光刻特征的方法和装置

    公开(公告)号：US20080043239A1

    公开(公告)日：2008-02-21

    申请号：US11504106

    申请日：2006-08-15

    申请人： Arie Jeffrey Den Boef ,  Mircea Dusa ,  Everhardus Cornelis Mos ,  Maurits Van Der Schaar ,  Stefan Carolus Jacobus Antonius Keij

    发明人： Arie Jeffrey Den Boef ,  Mircea Dusa ,  Everhardus Cornelis Mos ,  Maurits Van Der Schaar ,  Stefan Carolus Jacobus Antonius Keij

    IPC分类号： G01B11/00

    CPC分类号： G03F7/70633

    摘要： An inspection system is arranged to measure an overlay error by projecting a plurality of radiation beams, differing in wavelength and/or polarization, onto two targets. A first radiation beam is projected onto a first target and the reflected radiation A1+ is detected. The first target comprises two gratings having a bias +d with respect to each other. The first radiation beam is also projected on to a second target, which comprises two gratings having a bias −d with respect to each other, and the reflected radiation A1− is detected. A second radiation beam, having a different wavelength and/or polarization from the first radiation beam, is projected onto the first target and reflected radiation A2+ is detected and projected onto the second target and reflected radiation A2− is detected. Detected radiations A1+, A1−, A2+, and A2− is used to determine the overlay error.

    摘要翻译： 检查系统被布置成通过将不同波长和/或极化的多个辐射束投影到两个目标上来测量覆盖误差。 第一辐射束被投影到第一目标上，并且检测到反射辐射A 1 +。 第一个目标包括两个相对于彼此具有偏压+ d的光栅。 第一辐射束也被投影到第二靶上，第二靶被包括相对于彼此具有偏压-d的两个光栅，并且检测到反射的辐射A 1 - 。 具有与第一辐射束不同的波长和/或极化的第二辐射束被投影到第一目标上，并且检测并反射辐射A 2 + 2并将其投影到第二目标和反射辐射A 检测到<2> 。 检测到的辐射使用1 ，1 ，2 和A 2 - 来确定 重叠错误。