公开(公告)号：US07061965B2

公开(公告)日：2006-06-13

申请号：US09999388

申请日：2001-10-31

申请人： Mayumi Kodani ,  Shoichi Miyamoto ,  Ayanori Matsuda ,  Takuya Mori

发明人： Mayumi Kodani ,  Shoichi Miyamoto ,  Ayanori Matsuda ,  Takuya Mori

IPC分类号： H04B1/69

CPC分类号： H04J13/18 ,  H04B2201/70703 ,  H04J13/0048

摘要： A Walsh code assigning apparatus includes a retaining unit retaining assignment order information about an order of assignment of the plural Walsh codes such that one Walsh code having a smaller bit length becomes unable to he orthogonally separated as being precedent over another Walsh code having a larger bit length and a controller including a retrieving unit retrieving an idle Walsh code having an assignment request bit length in accordance with the assignment order information retained in the retaining unit, and assigning unit assigning the idle Walsh code, which has been obtained by the retrieving unit, to the spreading code of a last-named communication channel for which the assignment request is issued.

摘要翻译： 沃尔什码分配装置包括保持单元，其保留关于多个沃尔什码的分配顺序的分配顺序信息，使得具有较小比特长度的一个沃尔什码不能正确地与另一个具有较大比特的沃尔什码进行正交分离 长度的控制器和包括检索单元的控制器，所述检索单元根据保留在保留单元中的分配顺序信息来检索具有分配请求位长度的空闲沃尔什码，以及分配单元，其分配由检索单元获得的空闲沃尔什码， 涉及发布分配请求的最后命名的通信信道的扩展码。

公开(公告)号：US10129433B2

公开(公告)日：2018-11-13

申请号：US15064723

申请日：2016-03-09

申请人： Takuya Mori ,  Junki Aoki ,  Yukinori Ishii ,  Atsushi Okazato ,  Fumiyoshi Kittaka ,  Tomohiro Kuroyanagi ,  Hiroyuki Sakuyama ,  Tohru Sasaki ,  Makoto Sasaki ,  Koichiro Maemura

发明人： Takuya Mori ,  Junki Aoki ,  Yukinori Ishii ,  Atsushi Okazato ,  Fumiyoshi Kittaka ,  Tomohiro Kuroyanagi ,  Hiroyuki Sakuyama ,  Tohru Sasaki ,  Makoto Sasaki ,  Koichiro Maemura

IPC分类号： H04N1/34 ,  H04N1/00 ,  H04N1/32

摘要： An information processing apparatus includes a provider identification information acquiring unit that acquires a piece of provider identification information for each of a plurality of devices that cooperatively execute a plurality of functions, based on device identification information of the device, the piece of provider identification information allowing identification of whether a provider of the device is a predetermined provider as a provider of a cooperating function; a determining unit that determines whether a non predetermined-provider device provided by a provider other than the predetermined provider exists among the devices based on pieces of the provider identification information; a charge processing unit that performs charge processing to profit the predetermined provider when the non predetermined-provider device exists; and a cooperation controlling unit that controls the devices to cooperatively execute the functions based on the cooperating function.

公开(公告)号：US20130118671A1

公开(公告)日：2013-05-16

申请号：US13695516

申请日：2011-04-28

申请人： Kentarou Takeda ,  Miki Okamoto ,  Takuya Mori ,  Tatsuki Nagatsuka

发明人： Kentarou Takeda ,  Miki Okamoto ,  Takuya Mori ,  Tatsuki Nagatsuka

IPC分类号： C09J4/00

CPC分类号： C09J4/00 ,  B32B38/0008 ,  B32B38/10 ,  C09J5/00 ,  C09J133/02 ,  C09J133/14 ,  C09J133/20 ,  C09J133/24 ,  C09J133/26 ,  C09J137/00 ,  C09J139/04 ,  G02F1/133528

摘要： Adhesive composition according to the present invention includes an adhesive base agent consisting of a monomer and a polymerization initiator. Adhesion of the adhesive composition changes to take local maximum value, minimum value and a value greater than the local maximum value along with increase of irradiation amount of the electromagnetic wave or particle beam irradiated to the adhesive composition under a predetermined temperature environment. In a method for manufacturing a laminate according to the present invention allows for easy peeling of adherends and a layer of the adhesive composition when adhesion of the adhesive composition takes the minimum value.

摘要翻译： 根据本发明的粘合剂组合物包括由单体和聚合引发剂组成的粘合剂基剂。 粘合剂组合物的粘合力随着在预定温度环境下照射到粘合剂组合物的电磁波或粒子束的照射量的增加而变化以获得局部最大值，最小值和大于局部最大值的值。 在根据本发明的层叠体的制造方法中，当粘合剂组合物的粘合力达到最小值时，容易剥离被粘物和粘合剂组合物层。

公开(公告)号：US07803230B2

公开(公告)日：2010-09-28

申请号：US10593560

申请日：2005-04-05

申请人： Masaru Amai ,  Kenji Sekiguchi ,  Takehiko Orii ,  Hiroki Ohno ,  Satoru Tanaka ,  Takuya Mori

发明人： Masaru Amai ,  Kenji Sekiguchi ,  Takehiko Orii ,  Hiroki Ohno ,  Satoru Tanaka ,  Takuya Mori

IPC分类号： B08B7/00

CPC分类号： H01L21/67051 ,  B08B1/04 ,  H01L21/67046

摘要： In a substrate cleaning method and a substrate cleaning method according to the present invention, a brush 3 is brought into contact with a substrate W while rotating the same, and a cleaning position Sb of the brush 3 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. A process fluid formed of liquid droplets and a gas is sprayed by a two-fluid nozzle 5 onto the substrate W, and a cleaning position Sn of the two-fluid nozzle 5 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. During the movement of the cleaning position Sb of the brush 3 from the center part of the substrate W toward the peripheral part thereof, the cleaning position Sb of the two-fluid nozzle is positioned nearer to a center P0 than the cleaning position Sb of the brush 3. Since contaminations of the brush are prevented from adhering again to the wafer, it can be avoided that the wafer W is contaminated.

摘要翻译： 在根据本发明的基板清洗方法和基板清洗方法中，刷子3在旋转基板W的同时与基板W接触，并且刷子3的清洁位置Sb相对于基板W从 衬底W的中心部分朝向其周边部分。 由液滴和气体形成的工艺流体由双流体喷嘴5喷射到基板W上，并且双流体喷嘴5的清洁位置Sn相对于基板W从基板的中心部分移动 W朝向其周边部分。 在将刷子3的清扫位置Sb从基板W的中央部朝向其周边部移动的过程中，双流体喷嘴的清洗位置Sb位于比清洗位置Sb更靠近中心P0的位置 由于刷子的污染被防止再次粘附到晶片，因此可以避免晶片W被污染。

公开(公告)号：US07612845B2

公开(公告)日：2009-11-03

申请号：US11995402

申请日：2006-07-05

申请人： Takuya Mori ,  Yoshitsugu Kitamura ,  Mariko Hirai ,  Naoki Takahashi

发明人： Takuya Mori ,  Yoshitsugu Kitamura ,  Mariko Hirai ,  Naoki Takahashi

IPC分类号： G02F1/1335 ,  G02B5/30

CPC分类号： G02B5/305 ,  G02F1/133528 ,  G02F1/13363 ,  G02F2001/133635 ,  G02F2202/40 ,  G02F2413/04 ,  G02F2413/07 ,  G02F2413/10 ,  G02F2413/11 ,  G02F2413/13

摘要： There is provided a polarizing plate with optical compensation layers that contributes to reduction in thickness and has excellent heat resistance and moisture resistance. A polarizing plate with optical compensation layers according to an embodiment of the present invention includes: a polarizer; a first optical compensation layer;a second optical compensation layer; and a third optical compensation layer, in this order. The first optical compensation layer has a refractive index profile of nx>ny=nz, and an in-plane retardation Re1 of 200 to 300 nm; the second optical compensation layer has a refractive index profile of nx>ny=nz, and an in-plane retardation Re2 of 80 to 170 nm; and the third optical compensation layer is formed of a material exhibiting an optical negative uniaxial property, and the material is aligned so as to be inclined.

摘要翻译： 提供了具有光学补偿层的偏光板，其有助于减小厚度并且具有优异的耐热性和耐湿性。 根据本发明实施例的具有光学补偿层的偏振片包括：偏振器; 第一光学补偿层; 第二光学补偿层; 和第三光学补偿层。 第一光学补偿层具有nx> ny = nz的折射率分布，并且面内延迟Re1为200〜300nm; 第二光学补偿层具有nx> ny = nz的折射率分布，并且面内延迟Re2为80〜170nm; 并且第三光学补偿层由表现出光学负单轴性质的材料形成，并且材料被对准以倾斜。

公开(公告)号：US20090246965A1

公开(公告)日：2009-10-01

申请号：US12410504

申请日：2009-03-25

申请人： Takuya Mori ,  Masahiko Takahashi

发明人： Takuya Mori ,  Masahiko Takahashi

IPC分类号： H01L21/3065

CPC分类号： H01L21/32137 ,  H01J37/3222 ,  H01J37/32238

摘要： Provided is an etching method capable of increasing a selectivity of a polysilicon film with respect to a silicon oxide film and suppressing the formation of recesses in a silicon base material. A wafer includes a gate oxide film, a polysilicon film and a hard mask film having an opening sequentially formed on a silicon base material, and has a native oxide film in a trench of the polysilicon film corresponding to the opening formed thereon. The native oxide film is etched, so that the polysilicon film is exposed at a bottom portion of the trench. An ambient pressure is set to be 13.3 Pa, and O2 gas, HBr gas and Ar gas are supplied to a processing space, and a frequency of bias voltage is set to be 13.56 MHz, so that the polysilicon film is etched by the plasma generated from the HBr gas to be completely removed.

摘要翻译： 提供了能够提高多晶硅膜相对于氧化硅膜的选择性并抑制硅基材料中的凹部的形成的蚀刻方法。 晶片包括栅极氧化膜，多晶硅膜和具有依次形成在硅基材料上的开口的硬掩模膜，并且在与其上形成的开口对应的多晶硅膜的沟槽中具有自然氧化膜。 蚀刻自然氧化膜，使得多晶硅膜暴露在沟槽的底部。 将环境压力设定为13.3Pa，向加工空间供给O 2气体，HBr气体和Ar气体，将偏置电压的频率设定为13.56MHz，由此产生多晶硅膜 从HBr气体中完全去除。

公开(公告)号：US20090157214A1

公开(公告)日：2009-06-18

申请号：US12372347

申请日：2009-02-17

申请人： Takuya Mori

发明人： Takuya Mori

IPC分类号： G06F19/00 ,  B05C11/00 ,  C23F1/08

CPC分类号： H01L21/67276 ,  G03F7/70525 ,  G03F7/708 ,  G03F7/70975

摘要： An object of the present invention is to maintain a coating and developing system by remotely operating it more safely.The present invention is a maintenance system of a substrate processing apparatus, including a remote operation unit for operating the substrate processing apparatus from a remote place by transmitting a remote operation information to a side of the substrate processing apparatus through a communication network and providing the remote operation information to the substrate processing apparatus, and a communication control unit for receiving the remote operation information transmitted to the side of the substrate processing apparatus and providing the remote operation information to the substrate processing apparatus. The communication control unit provides the remote operation information to the substrate processing apparatus only when there is an allow setting for the remote operation by a worker in the side of the substrate processing apparatus.

摘要翻译： 本发明的目的是通过更安全地远程操作来保持涂层和显影系统。 本发明是一种基板处理装置的维护系统，其包括：远程操作单元，用于通过通信网络将远程操作信息发送到基板处理设备的一侧，并从远程操作基板处理装置提供远程 操作信息提供给基板处理装置，以及通信控制单元，用于接收发送到基板处理装置一侧的远程操作信息，并将该远程操作信息提供给基板处理装置。 通信控制单元仅在基板处理装置侧的工作人员进行远程操作的允许设定时，向基板处理装置提供远程操作信息。

公开(公告)号：US09985948B2

公开(公告)日：2018-05-29

申请号：US14990878

申请日：2016-01-08

申请人： Tomohiro Kuroyanagi ,  Makoto Sasaki ,  Junki Aoki ,  Takuya Mori ,  Itaru Kodaira ,  Yukinori Ishii ,  Hiroaki Ikkanzaka ,  Fumiyoshi Kittaka ,  Masaki Tasaka ,  Koichiro Maemura ,  Hiroyuki Sakuyama ,  Tohru Sasaki ,  Atsushi Okazato

发明人： Tomohiro Kuroyanagi ,  Makoto Sasaki ,  Junki Aoki ,  Takuya Mori ,  Itaru Kodaira ,  Yukinori Ishii ,  Hiroaki Ikkanzaka ,  Fumiyoshi Kittaka ,  Masaki Tasaka ,  Koichiro Maemura ,  Hiroyuki Sakuyama ,  Tohru Sasaki ,  Atsushi Okazato

IPC分类号： G06F11/30 ,  H04W12/08 ,  G06F17/30 ,  H04L29/06 ,  H04N1/00 ,  G06F13/00 ,  G06F3/12 ,  H04W76/02

CPC分类号： H04L63/08 ,  G06F13/00 ,  G06F21/35 ,  G06F21/608 ,  G06F2221/2113 ,  G06F2221/2117 ,  G06F2221/2141 ,  H04N1/00108 ,  H04N1/00838 ,  H04W12/08 ,  H04W76/14

摘要： An image forming apparatus includes: a communicating unit which communicates with a portable terminal device and an external device; a storage control unit which controls to store transfer destination information of the external device to which information from the portable terminal device is allowed to be transferred in a storage unit; a determining unit which determines whether a request from the portable terminal device is the request to the external device indicated by the transfer destination information stored in the storage unit; and a communication control unit which controls the communicating unit to transfer the request from the portable terminal device to the external device indicated by the transfer destination information when the determining unit determines that the request is the request to the external device indicated by the transfer destination information.

公开(公告)号：US09501250B2

公开(公告)日：2016-11-22

申请号：US14679168

申请日：2015-04-06

申请人： Tatsuo Nishimura ,  Tohru Sasaki ,  Tomohiro Kuroyanagi ,  Atsushi Okazato ,  Makoto Sasaki ,  Junki Aoki ,  Takuya Mori ,  Hirohisa Saitoh ,  Mie Watanabe ,  Yukinori Ishii

发明人： Tatsuo Nishimura ,  Tohru Sasaki ,  Tomohiro Kuroyanagi ,  Atsushi Okazato ,  Makoto Sasaki ,  Junki Aoki ,  Takuya Mori ,  Hirohisa Saitoh ,  Mie Watanabe ,  Yukinori Ishii

IPC分类号： G06F3/12

CPC分类号： G06F3/1229 ,  G06F3/1213 ,  G06F3/1221 ,  G06F3/1285 ,  Y02D10/1592

摘要： An information processing apparatus stores function information that identifies, for each one of a plurality of functions, one or more devices capable of performing the function, receives a user instruction for executing a job from a first device of the plurality of devices, the user instruction instructing execution of at least one function that cannot be performed by the first device, identifies a second device of the plurality of devices that is capable of performing the at least one function of the user instruction using the function information, and controls the second device to transition from a power save mode to a normal operating mode, while keeping devices other than the second device to be in the power save mode.

摘要翻译： 信息处理装置存储对于多个功能中的每一个识别能够执行该功能的一个或多个装置的功能信息，从多个装置的第一装置接收用于执行作业的用户指令，用户指令 指示执行第一设备不能执行的至少一个功能，识别能够使用功能信息执行用户指令的至少一个功能的多个设备中的第二设备，并且将第二设备控制为 同时保持除第二设备之外的设备处于省电模式，从省电模式转换到正常操作模式。

公开(公告)号：US08885140B2

公开(公告)日：2014-11-11

申请号：US13598924

申请日：2012-08-30

申请人： Tomohiro Nakashima ,  Shin Inoue ,  Yoshitaka Hara ,  Izumi Hasegawa ,  Kunie Ogata ,  Takuya Mori

发明人： Tomohiro Nakashima ,  Shin Inoue ,  Yoshitaka Hara ,  Izumi Hasegawa ,  Kunie Ogata ,  Takuya Mori

IPC分类号： G03B27/32 ,  H01L21/67

CPC分类号： H01L21/67288

摘要： The present invention is a substrate treatment apparatus for performing solution treatment on a substrate, performing post-treatment in a treatment module subsequent to the solution treatment, including: a solution treatment section including a plurality of nozzles prepared for respective kinds of treatment solutions corresponding to lots of substrates; a transfer mechanism for transferring the substrate; a monitoring section monitoring whether there is a failure in discharge of the treatment solution in the nozzle; and a control unit outputting a control signal to prohibit the solution treatment in the solution treatment section for a substrate scheduled to be treated using a nozzle determined to have a failure by the monitoring section and to perform the solution treatment in the solution treatment section for a substrate scheduled to be treated using a nozzle other than the nozzle determined to have a failure.

摘要翻译： 本发明是一种在基板上进行固溶处理的基板处理装置，在固溶处理后的处理模块中进行后处理，其特征在于，包括：固溶处理部，其具有为各种对应于 大量的底物; 用于转移衬底的转移机构; 监视部，监视喷嘴中处理液的排出是否失败; 以及控制单元，其输出控制信号，以禁止在待处理的基板的固溶处理部中进行固溶处理，所述基板通过由所述监视部确定为具有故障的喷嘴进行处理，并且在所述固溶处理部中执行所述固溶处理 预定使用被确定为失效的喷嘴以外的喷嘴进行处理的基板。