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公开(公告)号:US20120050374A1
公开(公告)日:2012-03-01
申请号:US12862086
申请日:2010-08-24
申请人: Michael Cudzinovic , Thomas Pass , Rob Rogers , Ray-Hon Sun , Sheng Sun , Ben Wahlstrom , Dennis Jason Fuhrman , Kyle David Altendorf
发明人: Michael Cudzinovic , Thomas Pass , Rob Rogers , Ray-Hon Sun , Sheng Sun , Ben Wahlstrom , Dennis Jason Fuhrman , Kyle David Altendorf
CPC分类号: B41J2/17593 , B41J2/1721
摘要: Embodiments of apparatuses and methods for removal of ink buildup are generally described herein. Other embodiments may be described and claimed. In an embodiment, a chuck assembly to support a semiconductor substrate is provided. The chuck assembly includes a chuck, a trough disposed below the chuck, and a heater proximate to the trough. The chuck supports the semiconductor substrate while the trough collects an overspray of excess ink sprayed past an edge of the semiconductor substrate. The heater heats the trough.
摘要翻译: 用于去除油墨积聚的装置和方法的实施例一般在此描述。 可以描述和要求保护其他实施例。 在一个实施例中,提供了一种用于支撑半导体衬底的卡盘组件。 卡盘组件包括卡盘,设置在卡盘下方的槽和靠近槽的加热器。 卡盘支撑半导体衬底,而槽收集喷射过半导体衬底边缘的过量墨水的超喷射。 加热器加热槽。
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公开(公告)号:US08393707B2
公开(公告)日:2013-03-12
申请号:US12862086
申请日:2010-08-24
申请人: Michael Cudzinovic , Thomas Pass , Rob Rogers , Ray-Hon Sun , Sheng Sun , Ben Wahlstrom , Dennis Jason Fuhrman , Kyle David Altendorf
发明人: Michael Cudzinovic , Thomas Pass , Rob Rogers , Ray-Hon Sun , Sheng Sun , Ben Wahlstrom , Dennis Jason Fuhrman , Kyle David Altendorf
IPC分类号: B41J29/38
CPC分类号: B41J2/17593 , B41J2/1721
摘要: A substrate patterning method including the steps of spraying ink on a surface of a substrate, the spraying of the ink resulting in an overspray of excess ink past an edge of the substrate; changing a temperature of the excess ink to cause a change in a viscosity of the excess ink; and removing the excess ink having the changed viscosity.
摘要翻译: 一种基板图案化方法,包括以下步骤:在基板的表面上喷涂油墨,喷射墨水,导致过量的墨水超过基板的边缘; 改变过量油墨的温度导致多余油墨的粘度变化; 并除去具有变化的粘度的多余的油墨。
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3.
公开(公告)号:US08557093B2
公开(公告)日:2013-10-15
申请号:US11726894
申请日:2007-03-22
申请人: Peter Cousins , Hsin-Chiao Luan , Thomas Pass , John Ferrer , Rex Gallardo , Stephen F. Meyer
发明人: Peter Cousins , Hsin-Chiao Luan , Thomas Pass , John Ferrer , Rex Gallardo , Stephen F. Meyer
IPC分类号: C23C14/00
CPC分类号: C23C14/345 , C23C14/50 , C23C16/4583 , H01J37/32752 , H01J37/34 , H01L21/67706 , H01L21/6776 , H01L21/68771
摘要: A system for substrate deposition. The system includes a wafer pallet and an anode. The wafer pallet has a bottom and a top. The top of the wafer pallet is configured to hold a substrate wafer. The anode has a substantially fixed position relative to the wafer pallet and is configured to move with the wafer pallet through the deposition chamber. The anode is electrically isolated from the substrate wafer.
摘要翻译: 一种衬底沉积系统。 该系统包括晶片托盘和阳极。 晶片托盘具有底部和顶部。 晶片托盘的顶部被配置为保持基板晶片。 阳极相对于晶片托盘具有基本上固定的位置,并且被配置为与晶片托盘一起移动通过沉积室。 阳极与衬底晶片电绝缘。
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公开(公告)号:US08449238B2
公开(公告)日:2013-05-28
申请号:US11545906
申请日:2006-10-11
申请人: William P. Mulligan , Thomas Pass
发明人: William P. Mulligan , Thomas Pass
IPC分类号: B66C17/08
CPC分类号: H01L21/67739 , H01L21/67706 , H01L21/6776
摘要: In one embodiment, an in-line furnace includes a continuous conveyor configured to hold wafers at an angle relative to ground. The conveyor may have fixedly integrated wafer retainers configured to hold the wafers in slots. The conveyor may be formed by several segments that are joined together. Each of the segments may include a base and a set of wafer retainers formed thereon. The conveyor may be driven to move the wafers through a chamber of the furnace, where the wafers are thermally processed.
摘要翻译: 在一个实施例中,在线炉包括连续输送机,其构造成以相对于地面成一定角度保持晶片。 输送机可以具有固定集成的晶片保持器,其被配置为将晶片保持在槽中。 输送机可以由几个连接在一起的部分形成。 每个段可以包括形成在其上的基座和一组晶片保持器。 可以驱动输送机以将晶片移动通过炉的腔室,其中晶片被热处理。
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公开(公告)号:US07883343B1
公开(公告)日:2011-02-08
申请号:US11692657
申请日:2007-03-28
申请人: William P. Mulligan , Michael J. Cudzinovic , Thomas Pass , David Smith , Neil Kaminar , Keith McIntosh , Richard M. Swanson
发明人: William P. Mulligan , Michael J. Cudzinovic , Thomas Pass , David Smith , Neil Kaminar , Keith McIntosh , Richard M. Swanson
IPC分类号: H01L21/00
CPC分类号: H01L31/022441 , H01L31/0682 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要: A solar cell that is readily manufactured using processing techniques which are less expensive than microelectronic circuit processing. In preferred embodiments, printing techniques are utilized in selectively forming masks for use in etching of silicon oxide and diffusing dopants and in forming metal contacts to diffused regions. In a preferred embodiment, p-doped regions and n-doped regions are alternately formed in a surface of the wafer through use of masking and etching techniques. Metal contacts are made to the p-regions and n-regions by first forming a seed layer stack that comprises a first layer such as aluminum that contacts silicon and functions as an infrared reflector, second layer such titanium tungsten that acts as diffusion barrier, and a third layer functions as a plating base. A thick conductive layer such as copper is then plated over the seed layer, and the seed layer between plated lines is removed. A front surface of the wafer is preferably textured by etching or mechanical abrasion with an IR reflection layer provided over the textured surface. A field layer can be provided in the textured surface with the combined effect being a very low surface recombination velocity.
摘要翻译: 使用比微电子电路处理便宜的处理技术容易地制造的太阳能电池。 在优选实施例中,打印技术用于选择性地形成用于蚀刻氧化硅和扩散掺杂剂以及形成向扩散区域的金属接触的掩模。 在优选实施例中,通过使用掩模和蚀刻技术,在晶片的表面中交替地形成p掺杂区域和n掺杂区域。 通过首先形成包含与硅接触的第一层(例如铝)并用作红外反射器的第二层,作为扩散阻挡的第二层这样的钛钨,首先形成种子层堆叠,从而对p区和n区进行金属接触,以及 第三层起镀层的作用。 然后将诸如铜的厚导电层电镀在种子层上,并且移除电镀线之间的种子层。 晶片的前表面优选通过蚀刻或机械磨蚀而被纹理化,其中IR反射层设置在纹理表面上。 可以在纹理化表面中提供场层,其组合效果是非常低的表面复合速度。
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6.
公开(公告)号:US20080230372A1
公开(公告)日:2008-09-25
申请号:US11726894
申请日:2007-03-22
申请人: Peter Cousins , Hsin-Chiao Luan , Thomas Pass , John Ferrer , Rex Gallardo , Stephen F. Meyer
发明人: Peter Cousins , Hsin-Chiao Luan , Thomas Pass , John Ferrer , Rex Gallardo , Stephen F. Meyer
IPC分类号: C23C14/00
CPC分类号: C23C14/345 , C23C14/50 , C23C16/4583 , H01J37/32752 , H01J37/34 , H01L21/67706 , H01L21/6776 , H01L21/68771
摘要: A system for substrate deposition. The system includes a wafer pallet and an anode. The wafer pallet has a bottom and a top. The top of the wafer pallet is configured to hold a substrate wafer. The anode has a substantially fixed position relative to the wafer pallet and is configured to move with the wafer pallet through the deposition chamber. The anode is electrically isolated from the substrate wafer.
摘要翻译: 一种衬底沉积系统。 该系统包括晶片托盘和阳极。 晶片托盘具有底部和顶部。 晶片托盘的顶部被配置为保持基板晶片。 阳极相对于晶片托盘具有基本上固定的位置,并且被配置为与晶片托盘一起移动通过沉积室。 阳极与衬底晶片电绝缘。
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公开(公告)号:US20050061665A1
公开(公告)日:2005-03-24
申请号:US10912348
申请日:2004-08-04
申请人: Luca Pavani , Neil Kaminar , Pongsthorn Uralwong , Thomas Phu , Douglas Rose , Thomas Pass
发明人: Luca Pavani , Neil Kaminar , Pongsthorn Uralwong , Thomas Phu , Douglas Rose , Thomas Pass
IPC分类号: C25D17/06 , C25D17/08 , H01L20060101 , H01L21/288
CPC分类号: C25D17/08 , H01L21/2885 , Y10S269/90
摘要: A carrier for use in processing of a plurality of wafers or other substrates includes a support frame on which the wafers are mounted and in one embodiment at least one auxiliary frame for holding the substrates on the support frame. A plurality of clips extend from the auxiliary frame and engage the substrates in pressure engagement, and fasteners retain the auxiliary frame in position with respect to the support frame. In one embodiment two auxiliary frames can be employed for holding wafers on opposing surfaces of the support frame. The support frame has electrically non-conducting surfaces whereby the processing does not affect the support frame, and the auxiliary frame is made of electrically non- conductive material. The clips are electrically conductive and bridge current from the support frame to the wafers during plating operations. In another embodiment, auxiliary frame are not used and the wafer retention clips are mounted on the support frame. In use, the carrier can support a high number of units for processing with no significant mechanical stress being transferred to the wafers during loading and unloading from the carrier. The carriers and wafers can be transferred easily for different chemical baths and can be handled safely during rinsing and drying steps.
摘要翻译: 用于处理多个晶片或其它基板的载体包括其上安装晶片的支撑框架,并且在一个实施例中,至少一个用于将基板保持在支撑框架上的辅助框架。 多个夹子从辅助框架延伸并且以压力接合方式接合基板,并且紧固件将辅助框架相对于支撑框架保持在适当的位置。 在一个实施例中,可以使用两个辅助框架来将晶片保持在支撑框架的相对表面上。 支撑框架具有非导电表面,由此处理不影响支撑框架,辅助框架由非导电材料制成。 在电镀操作期间,夹子是导电的并且桥接电流从支撑框架到晶片。 在另一个实施例中,不使用辅助框架,并且将晶片固定夹安装在支撑框架上。 在使用中,载体可以支撑大量用于加工的单元,在从载体装载和卸载期间,没有明显的机械应力转移到晶片。 载体和晶片可以容易地转移到不同的化学浴中,并且可以在漂洗和干燥步骤期间安全地处理。
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公开(公告)号:US5840161A
公开(公告)日:1998-11-24
申请号:US743418
申请日:1996-11-01
申请人: F. Eugene Woodard , Thomas Pass , Ted L. Larsen
发明人: F. Eugene Woodard , Thomas Pass , Ted L. Larsen
CPC分类号: G02B5/0858 , C23C14/022 , C23C14/205 , C23C14/562 , Y10T428/12542 , Y10T428/12569 , Y10T428/12889 , Y10T428/12896 , Y10T428/24355 , Y10T428/31678 , Y10T428/31681 , Y10T428/31786
摘要: Durable--long lived plastic films carrying sputter-deposited metal layers such as reflective metal layers on both sides are disclosed. The slip side of the plastic film is not preglowed. The nonslip side is preglowed. This combination of glowing and not preglowing leads to the desired long life.
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公开(公告)号:US5763063A
公开(公告)日:1998-06-09
申请号:US635467
申请日:1996-04-22
申请人: Thomas Pass , Floyd E. Woodard
发明人: Thomas Pass , Floyd E. Woodard
CPC分类号: G02B1/105 , C23C14/086 , Y10T428/24975 , Y10T428/31507 , Y10T428/31942
摘要: The durability of thin metal coatings and particularly substantially transparent copper and silver plus noble metal coatings and their ability to withstand corrosive environments is improved by overcoating the metal layers with a double coating of dielectric. The first coating is made up of dielectric based on indium and/or zinc. The second coating is made up of dielectric based on indium and tin. These overcoatings are more effective than a single coating based on one metal or a single coating based upon the two metals.
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公开(公告)号:US09559228B2
公开(公告)日:2017-01-31
申请号:US13250988
申请日:2011-09-30
申请人: Steven Edward Molesa , Thomas Pass , Steve Kraft
发明人: Steven Edward Molesa , Thomas Pass , Steve Kraft
IPC分类号: H01L31/00 , H01L31/0236 , H01L31/0224 , H01L31/0352 , H01L31/068 , H01L31/18
CPC分类号: H01L31/02363 , H01L31/022441 , H01L31/0352 , H01L31/0682 , H01L31/1804 , Y02E10/50 , Y02E10/547 , Y02P70/521
摘要: Solar cells with doped groove regions separated by ridges and methods of fabricating solar cells are described. In an example, a solar cell includes a substrate having a surface with a plurality of grooves and ridges. A first doped region of a first conductivity type is disposed in a first of the grooves. A second doped region of a second conductivity type, opposite the first conductivity type, is disposed in a second of the grooves. The first and second grooves are separated by one of the ridges.
摘要翻译: 描述了由脊分离的掺杂沟槽区域的太阳能电池和制造太阳能电池的方法。 在一个示例中,太阳能电池包括具有多个槽和脊的表面的基板。 第一导电类型的第一掺杂区域设置在第一沟槽中。 与第一导电类型相反的第二导电类型的第二掺杂区域设置在第二沟槽中。 第一和第二槽由脊中的一个分开。
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