公开(公告)号：US20030081303A1

公开(公告)日：2003-05-01

申请号：US10238220

申请日：2002-09-10

Applicant: Micronic Laser Systems AB

Inventor： Torbjorn Sandstrom ,  Jarek Luberek

IPC: G02B026/00

CPC classification number: G03F7/70291 ,  G02B26/0841 ,  G02B27/46

Abstract: An aspect of the present invention includes The present invention relates to a method for calibrating elements in a spatial light modulator (SLM) as a function of an applied element control signal. A plurality of elements are calibrated simultaneously. A beam of electromagnetic radiation is projected on to at least a part of the SLM. An image of said part of said SLM is formed on a device for measuring intensity of electromagnetic radiation. Element calibrating data is generated by using the intensity data as a function of the applied element control signal by either driving a sub-matrix comprising at least two elements out of said part of the SLM to a sequence of applied element control signals or by seeking out the control signal for each element which give the same predetermined intensity value on the device for measuring the intensity of electromagnetic radiation and stepping through N different predetermined intensity values. The invention also relates to an apparatus for patterning a workpiece having such a calibration method. Other aspects of the present invention are reflected in the detailed description, figures and claims.

Abstract translation: 本发明的一个方面包括本发明涉及一种根据应用的元件控制信号来校准空间光调制器（SLM）中的元件的方法。 多个元件被同时校准。 一束电磁辐射投射到SLM的至少一部分上。 所述SLM的所述部分的图像形成在用于测量电磁辐射强度的装置上。 通过使用强度数据作为所施加的元素控制信号的函数，通过将包括所述SLM的所述部分中的至少两个元素的子矩阵驱动到所应用的元素控制信号的序列或通过寻找所述元素校准数据来生成元素校准数据 在用于测量电磁辐射的强度并跨过N个不同的预定强度值的装置上给出相同的预定强度值的每个元件的控制信号。 本发明还涉及一种用于使具有这种校准方法的工件图案化的装置。 本发明的其它方面在详细描述，附图和权利要求中被体现。

公开(公告)号：US20040165170A1

公开(公告)日：2004-08-26

申请号：US10776192

申请日：2004-02-12

Applicant: Micronic Laser Systems AB

Inventor： Torbjorn Sandstrom

IPC: G03B027/54 ,  G02B026/00

CPC classification number: G03F7/70725 ,  B23K26/032 ,  B23K26/064 ,  B23K26/0648 ,  B41J2/465 ,  G02B26/0833 ,  G02B26/0841 ,  G02B27/0043 ,  G02B27/4205 ,  G03F7/2022 ,  G03F7/70041 ,  G03F7/70283 ,  G03F7/70291 ,  G03F7/704 ,  G03F7/70475 ,  G09G3/2007 ,  G09G3/346 ,  H04N1/195 ,  H04N5/7458 ,  H04N2201/0414

Abstract: The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus comprises a source for emitting electromagnetic radiation, a spatial modulator having multitude of modulating elements (pixels), adapted to being illuminated by said radiation, and a projection system creating an image of the modulator on the workpiece. It further comprises an electronic data processing and delivery system receiving a digital description of the pattern to be written, extracting from it a sequence of partial patterns, converting said partial patterns to modulator signals, and feeding said signals to the modulator, a precision mechanical system for moving said workpiece and/or projection system relative to each other and an electronic control system coordinating the movement of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is stitched together from the partial images created by the sequence of partial patterns. According to the invention the drive signals can set a modulating element to a number of states larger than two.

Abstract translation: 本发明涉及一种用于在对辐射敏感的工件上形成图案的装置，例如光掩模，显示面板或微光学装置。 该装置包括用于发射电磁辐射的源，具有适于被所述辐射照射的多个调制元件（像素）的空间调制器，以及在工件上产生调制器的图像的投影系统。 它还包括接收要写入的图案的数字描述的电子数据处理和传送系统，从中提取部分模式序列，将所述部分模式转换成调制器信号，并将所述信号馈送到调制器，精密机械系统 用于相对于彼此移动所述工件和/或投影系统以及协调工件的移动的电子控制系统，将信号馈送到调制器和辐射的强度，使得所述图案从部分 由部分图案序列创建的图像。 根据本发明，驱动信号可以将调制元件设置为大于2的多个状态。

公开(公告)号：US20040229169A1

公开(公告)日：2004-11-18

申请号：US10704957

申请日：2003-11-10

Applicant: Micronic Laser Systems AB

Inventor： Torbjorn Sandstrom

IPC: G03F007/36

CPC classification number: G03F7/2053 ,  G03F1/26 ,  G03F1/34 ,  G03F1/78 ,  G03F7/094 ,  Y10S430/143

Abstract: The status of a plurality of service orders is summarized. A first data set that includes a plurality of records corresponding to service orders, such as requests for initiation of telephone or other communications services, is imported into a database application. At least one query or test may be executed on the first data set to generate a second data set that includes at least part of the first data set and one or more labels that have been appended to at least some of the plurality of records in the first data set. This second data may be imported into a spreadsheet application so that the spreadsheet application can automatically generate a summary of at least some of the data contained in the second data set.

Abstract translation: 总结了多个服务订单的状态。 包括与服务订单相对应的多个记录的第一数据集，诸如电话或其他通信服务的启动请求，被导入数据库应用程序。 可以在第一数据集上执行至少一个查询或测试以生成包括第一数据集的至少一部分的第二数据集和已经附加到多个记录中的至少一些记录的一个或多个标签 第一个数据集。 该第二数据可以被导入到电子表格应用程序中，使得电子表格应用程序可以自动生成包含在第二数据集中的至少一些数据的摘要。

公开(公告)号：US20040251430A1

公开(公告)日：2004-12-16

申请号：US10460765

申请日：2003-06-12

Applicant: Micronic Laser Systems AB

Inventor： Torbjorn Sandstrom

IPC: G21K005/04

CPC classification number: G03F7/70283 ,  G03F7/70291

Abstract: An aspect of the present invention includes a method to print pattern with improved edge acuity. In one embodiment a method for printing fine patterns comprising the actions of: providing an SLM and providing a pixel layout pattern with different categories of modulating elements, the categories differing in the phase of the complex amplitude. Other aspects of the present invention are reflected in the detailed description, figures and claims.

Abstract translation: 本发明的一个方面包括一种打印具有改进的边缘锐度的图案的方法。 在一个实施例中，用于打印精细图案的方法包括以下动作：提供SLM并且提供具有不同类别的调制元素的像素布局图案，所述类别在复振幅的相位上不同。 本发明的其它方面在详细描述，附图和权利要求中被体现。

公开(公告)号：US20040130775A1

公开(公告)日：2004-07-08

申请号：US10335981

申请日：2003-01-02

Applicant: Micronic Laser Systems AB

Inventor： Thomas J. Grebinski ,  Ulrike A. Dauderstadt ,  Torbjorn Sandstrom ,  Ulric B. Ljungblad ,  Christian Kunath ,  Eberhard Kurth

IPC: G02B026/00

CPC classification number: G02B1/14 ,  B81B7/0012 ,  B81B2201/042 ,  G02B1/105 ,  G02B26/0833 ,  G03F7/70291 ,  G03F7/70983

Abstract: The present invention includes methods and devices that improve the radiation-resistance of a movable micromechanical optical element. In particular, a radiation-resistant layer is added to a movable micro-mechanical optical element, suitable to reduce the surface and bulk material changes to the element that result from exposure to pulsed laser energy densities less than 100 micro-joules per square centimeter and at wavelengths less than or equal to about 248 nm.

Abstract translation: 本发明包括提高可移动微机械光学元件的耐辐射性的方法和装置。 特别地，耐辐射层被添加到可移动的微机械光学元件中，适于减少暴露于小于100微焦/平方厘米的脉冲激光能量密度而导致的元件的表面和体材料变化，以及 波长小于或等于约248nm。

公开(公告)号：US20040053143A1

公开(公告)日：2004-03-18

申请号：US10462010

申请日：2003-06-12

Applicant: Micronic Laser Systems AB

Inventor： Torbjorn Sandstrom

IPC: G03F009/00

CPC classification number: G03F7/70433 ,  G03F7/70291 ,  G03F7/70441 ,  G03F7/70516 ,  Y10S359/904

Abstract: The present invention relates to methods and systems that define feature boundaries in a radiation sensitive medium on a workpiece using a diffraction-type micromirror array, extending to production of patterns and structures on a semiconductor substrate. Workpieces include lithographic masks, integrated circuits and other electronic and optical devices. Particular aspects of the present invention are described in the claims, specification and drawings.

Abstract translation: 本发明涉及使用衍射型微镜阵列定义工件上的辐射敏感介质中的特征边界的方法和系统，延伸到在半导体衬底上生成图案和结构。 工件包括光刻掩模，集成电路和其他电子和光学设备。 在权利要求书，说明书和附图中描述了本发明的特定方面。

公开(公告)号：US20040047023A1

公开(公告)日：2004-03-11

申请号：US10657526

申请日：2003-09-08

Applicant: Micronic Laser Systems AB

Inventor： Torbjorn Sandstrom

IPC: G02F001/01 ,  G02B026/00

CPC classification number: G03F7/70425 ,  G03F7/70291

Abstract: The present invention relates to a method for compensating the impact of at least one defective pixel with a known position in a spatial light modulator (SLM) when creating a pattern of the SLM on a work piece covered with a layer sensitive to electromagnetic radiation. A source for emitting electromagnetic radiation is provided. Said radiation is illuminating said SLM having a plurality of modulating elements (pixels). In a writing pass an image of said modulator is projected on said work piece. A compensation for defective pixels in at least one other writing pass is performed. The invention also relates to an apparatus for performing said method.

公开(公告)号：US20030202233A1

公开(公告)日：2003-10-30

申请号：US10449661

申请日：2003-05-30

Applicant: Micronic Laser Systems AB

Inventor： Torbjorn Sandstrom

IPC: G02B026/00

CPC classification number: G03F7/70725 ,  B23K26/032 ,  B23K26/064 ,  B23K26/0648 ,  B41J2/465 ,  G02B26/0833 ,  G02B26/0841 ,  G02B27/0043 ,  G02B27/4205 ,  G03F7/2022 ,  G03F7/70041 ,  G03F7/70283 ,  G03F7/70291 ,  G03F7/704 ,  G03F7/70475 ,  G09G3/2007 ,  G09G3/346 ,  H04N1/195 ,  H04N5/7458 ,  H04N2201/0414

Abstract: The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus comprises a source for emitting electromagnetic radiation, a spatial modulator having multitude of modulating elements (pixels), adapted to being illuminated by said radiation, and a projection system creating an image of the modulator on the workpiece. It further comprises an electronic data processing and delivery system receiving a digital description of the pattern to be written, extracting from it a sequence of partial patterns, converting said partial patterns to modulator signals, and feeding said signals to the modulator, a precision mechanical system for moving said workpiece and/or projection system relative to each other and an electronic control system coordinating the movement of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is stitched together from the partial images created by the sequence of partial patterns. According to the invention the drive signals can set a modulating element to a number of states larger than two.

Abstract translation: 本发明涉及一种用于在对辐射敏感的工件上形成图案的装置，例如光掩模，显示面板或微光学装置。 该装置包括用于发射电磁辐射的源，具有适于被所述辐射照射的多个调制元件（像素）的空间调制器，以及在工件上产生调制器的图像的投影系统。 它还包括接收要写入的模式的数字描述的电子数据处理和传送系统，从其中提取部分模式序列，将所述部分模式转换成调制器信号，并将所述信号馈送到调制器，精密机械系统 用于相对于彼此移动所述工件和/或投影系统以及协调工件的移动的电子控制系统，将信号馈送到调制器和辐射的强度，使得所述图案从部分 由部分图案序列创建的图像。 根据本发明，驱动信号可以将调制元件设置为大于2的多个状态。