MULTILAYER DEVICE AND METHOD OF MAKING
    1.
    发明申请
    MULTILAYER DEVICE AND METHOD OF MAKING 有权
    多层设备及其制造方法

    公开(公告)号:US20070069233A1

    公开(公告)日:2007-03-29

    申请号:US11420366

    申请日:2006-05-25

    IPC分类号: H01L33/00

    摘要: The invention relates to composite articles comprising a substrate and additional layers on the substrate. According to one example, the layers are selected so that the difference in the coefficient of thermal expansion (CTE) between the substrate and a first layer on one side of the substrate is substantially equal to the CTE difference between the substrate and a second layer on the other side of the substrate. The stress caused by the CTE difference and/or shrinkage on one side of the substrate during heating or cooling is balanced by the stress caused by the CTE difference on the other side of the substrate during heating or cooling. Such stress balancing can reduce or minimize curling of the substrate.

    摘要翻译: 本发明涉及包含基底和在基底上的附加层的复合制品。 根据一个示例,选择这些层,使得衬底与衬底的一侧上的第一层之间的热膨胀系数(CTE)的差异基本上等于衬底和第二层之间的CTE差 衬底的另一面。 在加热或冷却期间由基板的一侧的CTE差异和/或收缩引起的应力由加热或冷却期间基板另一侧的CTE差异引起的应力平衡。 这种应力平衡可以减少或最小化衬底的卷曲。

    Multilayer device and method of making
    2.
    发明申请
    Multilayer device and method of making 有权
    多层设备及其制作方法

    公开(公告)号:US20050133781A1

    公开(公告)日:2005-06-23

    申请号:US10739298

    申请日:2003-12-19

    摘要: The invention relates to composite articles comprising a substrate and additional layers on the substrate. According to one example, the layers are selected so that the difference in the coefficient of thermal expansion (CTE) between the substrate and a first layer on one side of the substrate is substantially equal to the CTE difference between the substrate and a second layer on the other side of the substrate. The stress caused by the CTE difference and/or shrinkage on one side of the substrate during heating or cooling is balanced by the stress caused by the CTE difference on the other side of the substrate during heating or cooling. Such stress balancing can reduce or minimize curling of the substrate.

    摘要翻译: 本发明涉及包含基底和在基底上的附加层的复合制品。 根据一个示例,选择这些层,使得衬底与衬底的一侧上的第一层之间的热膨胀系数(CTE)的差异基本上等于衬底和第二层之间的CTE差 衬底的另一面。 在加热或冷却期间由基板的一侧的CTE差异和/或收缩引起的应力由加热或冷却期间基板另一侧的CTE差异引起的应力平衡。 这种应力平衡可以减少或最小化衬底的卷曲。

    Methods and fixtures for facilitating handling of thin films
    3.
    发明申请
    Methods and fixtures for facilitating handling of thin films 审中-公开
    用于促进薄膜处理的方法和装置

    公开(公告)号:US20050016464A1

    公开(公告)日:2005-01-27

    申请号:US10625171

    申请日:2003-07-24

    摘要: An apparatus comprises a fixture comprising at least one inner member and at least one outer member. The fixture is configured to secure a film between the at least one inner member and the at least one outer member. The secured film can be further processed to give a processed film. Further, the processed film, secured in the fixture, can undergo additional manufacturing steps to produce processed articles. The apparatus and methods described herein are useful for producing a variety of articles, such as micro-electronic and opto-electronic devices.

    摘要翻译: 一种装置包括一种固定装置,其包括至少一个内部构件和至少一个外部构件。 夹具被构造成将膜固定在至少一个内部构件和至少一个外部构件之间。 可以进一步处理固定膜以得到加工膜。 此外,固定在固定装置中的经处理的薄膜可以经受附加的制造步骤以产生加工制品。 本文描述的装置和方法可用于生产各种物品,例如微电子和光电器件。