摘要:
The present invention relates to apparatus and method for automatically computing a gamma correction curve. The apparatus according to the present invention comprises an image obtaining unit for receiving an input image data of a color chart through an image interface; a coordinate calculating unit for measuring input brightness values of a plurality of ROIs (Regions of Interest) of the input image and comparing an input brightness value of each ROI with a preset target brightness value of each ROI to calculate gamma correction coordinates for a plurality of points of a gamma correction curve; and a curve computing unit for applying interpolation to a plurality of the calculated gamma correction coordinates to compute a gamma correction curve.
摘要:
The present invention relates to apparatus and method for generating a panorama image, and a computer readable medium stored thereon computer executable instructions for performing the method.The apparatus for generating a panorama image according to the present invention comprises an input unit for receiving a plurality of input object images for panorama image generation; an edge detecting unit for outputting edge data of the input object images; a matching area output unit for outputting a matching area, namely, a standard area for pattern matching, within the edge data; a pattern matching unit for matching patterns of a plurality of the object images based on the matching area; and a stitching unit for generating a plurality of the object images into a panorama image based on the matched patterns.
摘要:
In the method and a device for detecting the phase of a moving object using a heterodyne interferometer, a heterogeneous mode helium-neon laser is used as a direct light source to increase a measuring speed, a measuring resolution, and minimize the loss of the light source. Signals, which have only a frequency difference between reference signals or measured signals and arbitrary signals, are extracted from signals which are obtained by multiplying the arbitrary frequency signals by the reference or measured signals. After frequencies of the reference and measured signals are converted, a phase difference of the extracted signals and displacement of the moving object is measured. The system includes a laser light source, an optical interferometer, a frequency converter, and a phase measurer. The light source uses output light, emitted from the laser generator, which is stabilized in frequency, and has two frequencies which are at right angles to each other and linearly polarized.
摘要:
In a method of merging blocks in a semiconductor memory device according to example embodiments, a plurality of data are written into one or more first blocks using a first program method. One or more merge target blocks that are required to be merged are selected among the one or more first blocks. A merge-performing block for a block merge operation is selected among the one or more first blocks and one or more second blocks. A plurality of merge target data are written from the merge target blocks into the merge-performing block using a second program method that is different from the first program method.
摘要:
In a method of merging blocks in a semiconductor memory device according to example embodiments, a plurality of data are written into one or more first blocks using a first program method. One or more merge target blocks that are required to be merged are selected among the one or more first blocks. A merge-performing block for a block merge operation is selected among the one or more first blocks and one or more second blocks. A plurality of merge target data are written from the merge target blocks into the merge-performing block using a second program method that is different from the first program method.
摘要:
A method for manufacturing a CMOS transistor includes preparing a silicon substrate provided with a first buried layer, a second buried layer and a body, vertically forming device-isolation films inside the body, forming a first-type well inside the body arranged on the first buried layer, and vertically forming a first source and drain region inside the first-type well, forming a second-type well inside the body arranged on the second buried layer, and vertically forming a second source and drain region inside the second-type well, and vertically forming a recessed gate between the first-type well and the second-type well.
摘要:
An optical recording/reproducing apparatus includes an optical pickup unit configured to scan an optical disk with an optical signal to record and reproduce data. A power tuning unit is configured to scan a first track with the optical signal to record a first test data to the first track, while changing a power level of the optical signal within a predetermined range in sequence. A scanning time tuning unit is configured to scan a second track with an optical signal to record a second test data to the second track, while changing a scanning time within a predetermined range in sequence. A state detection unit is configured to detect a reproduction state of the first test data and second test data. A controller is configured to check the reproductions state of the first test data and second test data and determine an optimal power level and optimal scanning time. Accordingly, a write strategy is rapidly and optically tuned.
摘要:
A method includes forming a buffer lower metal line over a semiconductor substrate for absorbing an external impact, forming a pre-metal-dielectric layer which covers the buffer lower metal line, the pre-metal-dielectric layer having a via hole formed therein to expose a portion of the buffer lower metal line, forming a seed layer over a surface of the pre-metal-dielectric layer having the via hole formed therein, forming polyimide which exposes the via hole and the seed layer formed over the pre-metal-dielectric layer in the vicinity of the via hole, growing an upper metal line over the exposed seed layer, subjecting the semiconductor substrate having the upper metal line formed thereon to a thermal process, removing the polyimide by dry etching, and bonding a bonding portion onto the upper metal line.
摘要:
A semiconductor device includes a deep N-type well region which may be formed by applying an ion-implantation process, using a mask, to a predetermined pattern over a portion of a semiconductor substrate over which an oxide film is formed, a dwell region which may be formed by applying an ion-implantation process, using a mask, to a predetermined pattern over a portion of the N-type well region, a shallow N-type well region and a drain region which may be respectively formed by applying an ion-implantation process, using a mask, to a predetermined pattern over a portion of the deep N-type well region, a source region which may be formed by applying an ion-implantation process, using a mask, to a predetermined pattern over a portion of the dwell region, a contact hole which may be formed by being filled with a metal after forming an inter-metal dielectric layer over a portion of the semiconductor substrate over which the source region is formed, and a metal line formed over a portion of the contact hole.