公开(公告)号：US20070002474A1

公开(公告)日：2007-01-04

申请号：US11082404

申请日：2005-03-17

申请人： Mitsuaki Amemiya ,  Akira Miyake

发明人： Mitsuaki Amemiya ,  Akira Miyake

IPC分类号： G02B5/08

CPC分类号： G02B17/0631 ,  B82Y10/00 ,  G02B5/22 ,  G02B17/0642 ,  G02B17/0663 ,  G21K2201/061

摘要： Disclosed is a measuring apparatus for measuring the position, size and/or shape of a light convergent point of an EUV light source. In one preferred form, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, an optical system for directing the EUV light toward the light receiving device, a light blocking member disposed in a portion of light path for the EUV light and having a plurality of openings, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of reception of EUV light by the light receiving device. In another preferred from, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, a gas filter disposed in a portion of a light path of the EUV light and being filled with a predetermined gas, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of the reception of EUV light by the light receiving device.

摘要翻译： 公开了一种用于测量EUV光源的聚光点的位置，大小和/或形状的测量装置。 在一个优选形式中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，用于将EUV光引向光接收装置的光学系统，设置在光路的一部分中的遮光构件，用于 EUV光并且具有多个开口，以及用于基于光接收装置的EUV光的接收来检测在聚光点处的EUV光的空间分布的系统。 在另一个优选的实施例中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，设置在EUV光的光路部分中并被预定气体填充的气体过滤器的系统， 基于由光接收装置接收到的EUV光，在光会聚点检测EUV光的空间分布。

公开(公告)号：US07312459B2

公开(公告)日：2007-12-25

申请号：US11082404

申请日：2005-03-17

申请人： Mitsuaki Amemiya ,  Akira Miyake

发明人： Mitsuaki Amemiya ,  Akira Miyake

IPC分类号： G01J1/42 ,  G21K5/00

CPC分类号： G02B17/0631 ,  B82Y10/00 ,  G02B5/22 ,  G02B17/0642 ,  G02B17/0663 ,  G21K2201/061

摘要： Disclosed is a measuring apparatus for measuring the position, size and/or shape of a light convergent point of an EUV light source. In one preferred form, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, an optical system for directing the EUV light toward the light receiving device, a light blocking member disposed in a portion of light path for the EUV light and having a plurality of openings, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of reception of EUV light by the light receiving device. In another preferred from, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, a gas filter disposed in a portion of a light path of the EUV light and being filled with a predetermined gas, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of the reception of EUV light by the light receiving device.

摘要翻译： 公开了一种用于测量EUV光源的聚光点的位置，大小和/或形状的测量装置。 在一个优选形式中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，用于将EUV光引向光接收装置的光学系统，设置在光路的一部分中的遮光构件，用于 EUV光并且具有多个开口，以及用于基于光接收装置的EUV光的接收来检测在聚光点处的EUV光的空间分布的系统。 在另一个优选的实施例中，该装置包括用于接收从光会聚点发散的EUV光的光接收装置，设置在EUV光的光路部分中并被预定气体填充的气体过滤器的系统， 基于由光接收装置接收到的EUV光，在光会聚点检测EUV光的空间分布。

公开(公告)号：US5606586A

公开(公告)日：1997-02-25

申请号：US678784

申请日：1996-07-11

申请人： Mitsuaki Amemiya ,  Yasuaki Fukuda ,  Yutaka Watanabe ,  Akira Miyake

发明人： Mitsuaki Amemiya ,  Yasuaki Fukuda ,  Yutaka Watanabe ,  Akira Miyake

IPC分类号： B29C35/08 ,  G03F7/20 ,  G21K5/00

CPC分类号： G03F7/70075 ,  G03F7/2039 ,  G03F7/702 ,  B29C2035/0844

摘要： An exposure method using X-rays from a synchrotron radiation source includes determining a relationship between an X-ray intensity distribution and an exposure amount distribution in an exposure area; and effecting exposure operation while controlling a dose amount for respective positions in the exposure area using the relationship, wherein the dose amount is controlled by changing a driving profile of a movable shutter for controlling the exposure operation, and wherein the relationship is in the form of a proportional coefficient between an X-ray intensity and the exposure amount as a function of position information in the exposure area.

摘要翻译： 使用来自同步加速器辐射源的X射线的曝光方法包括确定曝光区域中的X射线强度分布与曝光量分布之间的关系; 以及通过使用关系控制曝光区域中的各个位置的剂量量来进行曝光操作，其中通过改变用于控制曝光操作的活动快门的驱动轮廓来控制剂量，并且其中的关系为 作为曝光区域中的位置信息的函数的X射线强度与曝光量之间的比例系数。

公开(公告)号：US5400386A

公开(公告)日：1995-03-21

申请号：US277352

申请日：1994-07-19

申请人： Mitsuaki Amemiya ,  Akira Miyake

发明人： Mitsuaki Amemiya ,  Akira Miyake

IPC分类号： G01B11/27 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  A61B6/08

CPC分类号： G03F7/70058 ,  G03F7/70808

摘要： Disclosed is a device for determining an angle of incident light or a shift in incident light based on the output value of a detector. In a predetermined angle detection range, a beam of light incident on a detector for detecting the intensity of light incident thereon is restricted such that the amount of light continuously increases or decreases in accordance with the angle between an optical axis of the incident light and a referential axis of an exposure apparatus. Outside of the predetermined angle detection range, the amount of light is restricted depending on the direction in which the optical axis of the light is shifted from the angle detection range. The amount of light incident on the detector continuously increases or decreases in accordance with the angle between the optical axis of the incident light and the referential axis when the light is made incident within the angle detection range by means of the light restriction means. It is therefore possible to determine the angle of the incident light from the output value of the detector. When the light is made incident outside of the angle detection range, and since the amount of incident light is restricted in accordance with the direction in which the light is shifted, it is possible to determine the direction in which the light is shifted.

摘要翻译： 公开了一种用于基于检测器的输出值确定入射光的角度或入射光的偏移的装置。 在预定的角度检测范围内，限制入射到检测器上的入射光的光束，使得光的量根据入射光的光轴和 曝光装置的参考轴。 在预定角度检测范围之外，根据光的光轴从角度检测范围偏移的方向来限制光的量。 当光通过光限制装置入射到角度检测范围内时，入射到检测器上的光量随着入射光的光轴与参考轴之间的夹角而连续地增加或减小。 因此，可以根据检测器的输出值确定入射光的角度。 当光入射到角度检测范围之外时，并且由于入射光的量根据光的移动方向而受到限制，因此可以确定光的移动方向。

公开(公告)号：US5444758A

公开(公告)日：1995-08-22

申请号：US257522

申请日：1994-06-09

申请人： Akira Miyake ,  Mitsuaki Amemiya

发明人： Akira Miyake ,  Mitsuaki Amemiya

IPC分类号： G01B15/00 ,  G01B11/00 ,  G01T1/29 ,  H05H13/04 ,  G21K5/00

CPC分类号： G01B11/00 ,  G01T1/29

摘要： A beam position detecting device wherein the intensity of a radiation beam from a synchrotron ring is measured on the basis of electric currents flowing through two wires, while accumulated electric current in the synchrotron ring is measured by using a current transformer. The beam position can be determined accurately on the basis of these measured values.

摘要翻译： 一种光束位置检测装置，其中，基于流过两条导线的电流来测量来自同步加速器环的辐射束的强度，同时使用电流互感器测量同步加速器环中的累积电流。 可以基于这些测量值精确地确定光束位置。

公开(公告)号：US07465936B2

公开(公告)日：2008-12-16

申请号：US11359303

申请日：2006-02-21

申请人： Mitsuaki Amemiya

发明人： Mitsuaki Amemiya

IPC分类号： G01T1/16

CPC分类号： G03F7/7085 ,  G01J1/26 ,  G01J1/429 ,  G03F7/70558

摘要： A measuring method that utilizes a bandpass filter and a measurement apparatus to measure an intensity of light having a predetermined wavelength among lights emitted from a light source, the bandpass filter transmitting the light having the predetermined wavelength, the measurement apparatus measuring an absolute intensity of an incident light includes the steps of measuring an output of the measurement apparatus continuously, stopping or starting an emission of the light source in the measuring step, calculating a first extreme value t→t0−0 and a second extreme value t→t0+0 in the output of the measurement apparatus at time t0 where t is time in the measuring step, and t0 is time when the emission of the light source stops; and calculating a difference between the first extreme value t→t0−0 and the second extreme value t→t0+0.

摘要翻译： 一种利用带通滤波器和测量装置测量从光源发出的光中的具有预定波长的光的强度的测量方法，所述带通滤光器透射具有预定波长的光，所述测量装置测量绝对强度 入射光包括在测量步骤中连续地测量测量设备的输出，停止或开始光源的发射的步骤，计算第一极值t-> t0-0和第二极值t-> t0 + 0在测量装置的时间t0，其中t是测量步骤中的时间，t0是光源的发射停止的时间; 并计算第一极值t→t0-0与第二极值t→t0 + 0之差。

公开(公告)号：US20060044538A1

公开(公告)日：2006-03-02

申请号：US11214252

申请日：2005-08-29

申请人： Mitsuaki Amemiya ,  Masahito Shinohara

发明人： Mitsuaki Amemiya ,  Masahito Shinohara

IPC分类号： G03B27/52

CPC分类号： G03F9/7088 ,  G03F9/7065 ,  G03F9/7096

摘要： An alignment apparatus for aligning with each other a mask stage that supports a mask that has an exposure pattern and a wafer stage that supports an object by using a light with wavelength of 1 nm to 50 nm, said alignment apparatus including a substrate for forming a first reference pattern similar to a second reference pattern formed on the mask or the mask stage, and a detection part for detecting a light from the substrate, wherein said substrate and detection part form a hollow housing, in which a gas is filled.

摘要翻译： 一种对准装置，用于将通过使用波长为1nm至50nm的光来支撑具有曝光图案的掩模的掩模台和支撑物体的对准装置，所述对准装置包括用于形成 与掩模或掩模台上形成的第二参考图案相似的第一参考图案，以及用于检测来自基板的光的检测部分，其中所述基板和检测部分形成填充有气体的中空壳体。

公开(公告)号：US06647087B2

公开(公告)日：2003-11-11

申请号：US09981080

申请日：2001-10-18

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa

IPC分类号： G21K500

CPC分类号： G03F7/7035 ,  G03F1/70 ,  G03F7/001 ,  G03F7/2022 ,  G03F7/70466

摘要： An exposure method for exposing a workpiece in a proximity exposure system, includes a first exposure step for printing, by exposure, an image of a first mask pattern on a predetermined portion of the workpiece, and a second exposure step for printing, by exposure, an image of a second mask pattern, different from the first mask pattern, on the predetermined portion of the workpiece, wherein exposures in the first and second exposure steps are performed superposedly, prior to a development process.

公开(公告)号：US06327332B1

公开(公告)日：2001-12-04

申请号：US09425223

申请日：1999-10-22

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa

IPC分类号： H01L2130

CPC分类号： G03F7/7035 ,  G03F1/70 ,  G03F7/001 ,  G03F7/2022 ,  G03F7/70466

摘要： An exposure method for posing a workpiece in a proximity exposure system, includes a first exposure step for printing, by exposure, an image of a first mask pattern on a predetermined portion of the workpiece, and a second exposure step for printing, by exposure, an image of a second mask pattern, different from the first mask pattern, on the predetermined portion of the workpiece, wherein exposures in the first and second exposure steps are performed superposedly, prior to a development process.

摘要翻译： 一种用于在接近曝光系统中曝光工件的曝光方法包括：第一曝光步骤，用于通过曝光打印在工件的预定部分上的第一掩模图案的图像;以及第二曝光步骤，用于通过曝光打印， 在工件的预定部分上的与第一掩模图案不同的第二掩模图案的图像，其中在显影处理之前，重叠地执行第一和第二曝光步骤中的曝光。

公开(公告)号：US5680428A

公开(公告)日：1997-10-21

申请号：US519755

申请日：1995-08-28

申请人： Mitsuaki Amemiya ,  Shunichi Uzawa

发明人： Mitsuaki Amemiya ,  Shunichi Uzawa

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  B32B31/04

CPC分类号： G03F7/70716 ,  G03F7/70783 ,  G03F7/70866 ,  G03F7/70875 ,  Y10T279/11

摘要： Disclosed are an object holding process and and an apparatus therefor in which a process strain of the object can be accurately compensated for. When the exposure operation is started, the bottom surface of the object is held by a holding unit. If the object has a strain, the process strain is calculated. Here, if the process strain is larger than a tolerance, the temperature of the object is set to an object setting temperature in a position other than an exposure position in order to contract or expand the object by a predetermined amount for a magnification correction. The bottom surface of the object is then held by the holding unit again, and the exposure of the object is performed in the exposure position.

摘要翻译： 公开了一种物体保持过程及其装置，其中可以精确地补偿物体的过程应变。 当曝光操作开始时，物体的底面由保持单元保持。 如果物体有应变，则计算过程应变。 这里，如果过程应变大于公差，则将物体的温度设定为除曝光位置以外的位置的物体设定温度，以使物体收缩或扩大预定量用于倍率校正。 然后，物体的底面再次被保持单元保持，并且在曝光位置进行物体的曝光。