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公开(公告)号:US20200058733A1
公开(公告)日:2020-02-20
申请号:US16092409
申请日:2017-04-24
发明人: Tetsu NEGISHI , Shoichi KUGA
IPC分类号: H01L29/06 , H01L23/29 , H01L23/31 , H01L29/739
摘要: A semiconductor apparatus includes a power semiconductor device, a resin film and a sealing insulating material. The power semiconductor device includes: a first electrode covering a first region on one main surface of the semiconductor substrate; a second electrode formed on the other main surface of the semiconductor substrate; a guard ring formed in a second region outer than the first region; and a non-conductive inorganic film located in the second region and covering the guard ring. The resin film overlaps the guard ring in a plan view, and the resin film on the non-conductive inorganic film has a thickness of 35 μm or more. The resin film is a film of a single layer, and the resin film has an outermost edge in the form of a downwardly spreading fillet. The outermost edge of the resin film is inner than an outermost edge of the semiconductor substrate.
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公开(公告)号:US20200185359A1
公开(公告)日:2020-06-11
申请号:US16632029
申请日:2018-08-27
发明人: Junichi NAKASHIMA , Shota MORISAKI , Yoshiko TAMADA , Yasushi NAKAYAMA , Tetsu NEGISHI , Ryo TSUDA , Yukimasa HAYASHIDA , Ryutaro DATE
摘要: Gates of a plurality of semiconductor switching elements are electrically connected to a common gate control pattern by gate wires. Sources of the plurality of semiconductor switching elements are electrically connected to a common source control pattern by source wires. The gate control pattern is disposed to interpose the source control pattern between the gate control pattern and each of the plurality of semiconductor switching elements that are connected in parallel and that operate in parallel. Hence, each of the gate wires becomes longer than each of the source wires, and has an inductance larger than the source wire. Accordingly, gate oscillation is reduced or suppressed in the plurality of semiconductor switching elements that are connected in parallel and that operate in parallel.
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公开(公告)号:US20220415747A1
公开(公告)日:2022-12-29
申请号:US17780519
申请日:2019-12-26
发明人: Yoshinori YOKOYAMA , Tetsu NEGISHI , Koji YAMAZAKI
IPC分类号: H01L23/367 , H01L23/053 , H05K3/32
摘要: A power module is obtained in which the thermal resistance in the range from a semiconductor device to a base plate is reduced and the stress in the joining portion is relieved. The power module includes at least one semiconductor device, an insulating substrate having an insulating layer, a circuit layer provided on an upper surface of the insulating layer and a metal layer provided on a lower surface of the insulating layer, and a sintering joining member with an upper surface larger in outer circumference than a back surface of the at least one semiconductor device, to join together the back surface of the at least one semiconductor device and an upper surface of the circuit layer on an upper-surface side of the insulating layer.
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公开(公告)号:US20170352629A1
公开(公告)日:2017-12-07
申请号:US15537466
申请日:2015-09-29
IPC分类号: H01L23/00 , H01L23/373 , H01L23/29 , H01L23/31
CPC分类号: H01L23/562 , H01L23/051 , H01L23/293 , H01L23/3107 , H01L23/3114 , H01L23/3735 , H01L23/48 , H01L24/29 , H01L24/32 , H01L24/37 , H01L24/40 , H01L24/73 , H01L25/072 , H01L2224/29111 , H01L2224/29139 , H01L2224/29147 , H01L2224/29565 , H01L2224/29655 , H01L2224/32225 , H01L2224/32245 , H01L2224/33181 , H01L2224/3754 , H01L2224/40095 , H01L2224/40137 , H01L2224/40155 , H01L2224/73213 , H01L2224/73263 , H01L2224/84801 , H01L2924/00014 , H01L2924/0002 , H01L2924/014 , H01L2924/181 , H01L2924/18301 , H01L2924/351 , H01L2924/00012 , H01L2924/00 , H01L2224/37099
摘要: A power module includes a power semiconductor element, an interconnection material, a circuit board, an external terminal, a joining material, and a sealing resin. A clearance portion is continuously formed between the sealing resin and each of an end surface of the joining material and a surface of the interconnection material so as to extend from the end surface of the joining material to the surface of the interconnection material, the end surface of the joining material being located between the power semiconductor element and the interconnection material, the surface of the interconnection material being located between the end surface and a predetermined position of the interconnection material separated by a distance from the end surface.
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公开(公告)号:US20200343226A1
公开(公告)日:2020-10-29
申请号:US16630822
申请日:2017-09-28
发明人: Shigeru HASEGAWA , Tetsu NEGISHI
IPC分类号: H01L25/07 , H01L23/498 , H01L29/872 , H01L29/739 , H02M7/537
摘要: An object of the present invention is to suppress reduction in a temperature cycle life of a wiring in a two-in-one type chopper module. A two-in-one type chopper module according to the present invention includes: a switching transistor; a first diode inverse-parallelly connected to the switching transistor; a second diode serially connected to the switching transistor and the first diode; a first wiring pattern mounting the switching transistor and the first diode; and a second wiring pattern mounting the second diode, wherein each of the switching transistor and the first diode has a power loss substantially identical with each other at a time of a forward direction current conduction, and an effective area of the second diode is larger than an effective area of the first diode.
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公开(公告)号:US20170033028A1
公开(公告)日:2017-02-02
申请号:US15303987
申请日:2015-03-17
发明人: Tetsu NEGISHI , Mamoru TERAI , Kei YAMAMOTO
IPC分类号: H01L23/31 , H01L23/373 , H01L21/02 , H01L23/29 , H01L29/16
CPC分类号: H01L23/3171 , H01L21/02164 , H01L21/02271 , H01L23/29 , H01L23/291 , H01L23/293 , H01L23/3121 , H01L23/3135 , H01L23/3192 , H01L23/373 , H01L23/562 , H01L29/1608 , H01L2224/73265
摘要: A semiconductor device includes: a semiconductor element which includes semiconductor substrate, an insulating film formed on a front surface of the semiconductor substrate and having an opening, and an electrode formed in the opening on the front surface of the semiconductor substrate; and a first protective film disposed to cover the semiconductor element. The insulating film has a thickness of not less than 1/500 of a thickness of the semiconductor substrate and not more than 4 μm. The insulating film has a compressive stress per film thickness of not less than 100 MPa/μm.
摘要翻译: 半导体器件包括:半导体元件,其包括半导体衬底,形成在半导体衬底的前表面上并具有开口的绝缘膜,以及形成在半导体衬底的前表面上的开口中的电极; 以及设置成覆盖半导体元件的第一保护膜。 该绝缘膜的厚度为半导体基板的厚度的1/500以上且4μm以下。 绝缘膜具有不小于100MPa /μm的膜厚度的压缩应力。
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