SEMICONDUCTOR APPARATUS, MANUFACTURING METHOD FOR SEMICONDUCTOR APPARATUS, AND POWER CONVERTER

    公开(公告)号:US20220189859A1

    公开(公告)日:2022-06-16

    申请号:US17429946

    申请日:2019-02-26

    IPC分类号: H01L23/495 H01L23/31

    摘要: A semiconductor apparatus that ensures heat dissipation using a heat dissipating member with multiple fins formed by folding a metal plate, a manufacturing method for the semiconductor apparatus, and a power converter are obtained. The semiconductor device is bonded to a lead frame. The lead frame is provided on an insulating layer and a metal base plate is provided on the face opposite to the face of the insulating layer on which the semiconductor device is bonded. The semiconductor device, the lead frame, the insulating layer, and the metal base plate are sealed with a sealing member in such a way that a portion of the lead frame and a portion of the metal base plate are exposed. The exposed portion of the metal base plate exposed from the sealing member is inserted in an opening of a support frame. A heat dissipating member is bonded to both the metal base plate and the support frame.

    SEMICONDUCTOR DEVICE
    2.
    发明申请
    SEMICONDUCTOR DEVICE 审中-公开
    半导体器件

    公开(公告)号:US20170033028A1

    公开(公告)日:2017-02-02

    申请号:US15303987

    申请日:2015-03-17

    摘要: A semiconductor device includes: a semiconductor element which includes semiconductor substrate, an insulating film formed on a front surface of the semiconductor substrate and having an opening, and an electrode formed in the opening on the front surface of the semiconductor substrate; and a first protective film disposed to cover the semiconductor element. The insulating film has a thickness of not less than 1/500 of a thickness of the semiconductor substrate and not more than 4 μm. The insulating film has a compressive stress per film thickness of not less than 100 MPa/μm.

    摘要翻译: 半导体器件包括:半导体元件,其包括半导体衬底,形成在半导体衬底的前表面上并具有开口的绝缘膜,以及形成在半导体衬底的前表面上的开口中的电极; 以及设置成覆盖半导体元件的第一保护膜。 该绝缘膜的厚度为半导体基板的厚度的1/500以上且4μm以下。 绝缘膜具有不小于100MPa /μm的膜厚度的压缩应力。

    SEMICONDUCTOR DEVICE AND POWER CONVERTER

    公开(公告)号:US20230070214A1

    公开(公告)日:2023-03-09

    申请号:US17795536

    申请日:2020-03-13

    摘要: A semiconductor device includes: a semiconductor element, a first lead frame, a second lead frame, and a thermally conductive member; and a sealing member sealing them. The first lead frame includes: a first portion exposed from a first side surface of the sealing member; and a second portion located closer to a lower surface of the sealing member than the first portion in a second direction crossing the lower surface. The semiconductor device further includes an intermediate frame which is located between the second portion and the fifth portion at least in the second direction. A distance, in the first direction, between the second portion and the intermediate frame is shorter than a distance, in the second direction, between an upper surface of the first portion and the upper surface of the second portion.

    SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME, AND POWER CONVERSION DEVICE

    公开(公告)号:US20220020672A1

    公开(公告)日:2022-01-20

    申请号:US17294685

    申请日:2019-02-01

    摘要: A semiconductor device includes a heat sink, an insulating layer, a lead frame, a power semiconductor element, a sealing resin, and fins. The heat sink has a first main surface and a second main surface opposed to each other. A lead frame including a lead terminal is disposed on the first main surface of the heat sink with the insulating layer interposed. The power semiconductor element is mounted on the lead frame. The sealing resin is formed to cover an inside region located inside of an outer peripheral region located around the entire periphery along the outer periphery of the first main surface of the heat sink. A first depression is formed along the sealing resin in the outer peripheral region of the first main surface.