公开(公告)号：US20120061565A1

公开(公告)日：2012-03-15

申请号：US13321583

申请日：2010-05-18

Applicant: Momoyo Enyama ,  Hiroya Ohta ,  Taku Ninomiya ,  Mari Nozoe

Inventor： Momoyo Enyama ,  Hiroya Ohta ,  Taku Ninomiya ,  Mari Nozoe

IPC: H01J37/26

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/2446 ,  H01J2237/2817

Abstract: Disclosed is a charged particle beam device, wherein multibeam secondary electron detectors (121a, 121b, 121c) and a single beam detector (140; 640) are provided, and under the control of a system control unit (135), an optical system control circuit (139) controls a lens and a beam selecting diaphragm (141) and switches the electrooptical conditions between those for multibeam mode and those for single beam mode, thereby one charged particle beam device can be operated as a multibeam charged particle device and a single beam charged particle device by switching. Thus, observation conditions are flexibly changed in accordance with an object to be observed, and a sample can be observed with a high accuracy and high efficiency.

Abstract translation: 公开了一种带电粒子束装置，其中提供多波束二次电子检测器（121a，121b，121c）和单光束检测器（140; 640），并且在系统控制单元（135）的控制下，光学系统控制 电路（139）控制透镜和选择光阑（141），并将电光条件切换到用于多光束模式的光学条件和单光束模式之间，从而一个带电粒子束装置可以作为多光束带电粒子装置和单个 光束带电粒子装置通过切换。 因此，观察条件根据待观察的目标灵活地变化，并且可以高精度和高效率地观察样品。

公开(公告)号：US08552373B2

公开(公告)日：2013-10-08

申请号：US13321583

申请日：2010-05-18

Applicant: Momoyo Enyama ,  Hiroya Ohta ,  Taku Ninomiya ,  Mari Nozoe

Inventor： Momoyo Enyama ,  Hiroya Ohta ,  Taku Ninomiya ,  Mari Nozoe

IPC: H01J37/26 ,  H01J37/28 ,  G01N23/22 ,  G01N23/225

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/2446 ,  H01J2237/2817

Abstract: Disclosed is a charged particle beam device, wherein multibeam secondary electron detectors (121a, 121b, 121c) and a single beam detector (140; 640) are provided, and under the control of a system control unit (135), an optical system control circuit (139) controls a lens and a beam selecting diaphragm (141) and switches the electrooptical conditions between those for multibeam mode and those for single beam mode, thereby one charged particle beam device can be operated as a multibeam charged particle device and a single beam charged particle device by switching. Thus, observation conditions are flexibly changed in accordance with an object to be observed, and a sample can be observed with a high accuracy and high efficiency.

Abstract translation: 公开了一种带电粒子束装置，其中提供多波束二次电子检测器（121a，121b，121c）和单光束检测器（140; 640），并且在系统控制单元（135）的控制下，光学系统控制 电路（139）控制透镜和选择光阑（141），并将电光条件切换到用于多光束模式的光学条件和单光束模式之间，从而一个带电粒子束装置可以作为多光束带电粒子装置和单个 光束带电粒子装置通过切换。 因此，观察条件根据待观察的目标灵活地变化，并且可以高精度和高效率地观察样品。

公开(公告)号：US08907278B2

公开(公告)日：2014-12-09

申请号：US13993822

申请日：2011-12-02

Applicant: Momoyo Enyama ,  Hiroya Ota ,  Taku Ninomiya ,  Mari Nozoe

Inventor： Momoyo Enyama ,  Hiroya Ota ,  Taku Ninomiya ,  Mari Nozoe

IPC: G01N23/00 ,  G21K7/00 ,  H01J37/147 ,  H01J37/12 ,  H01J37/28 ,  H01J37/04

CPC classification number: H01J37/045 ,  H01J37/12 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/083 ,  H01J2237/0835 ,  H01J2237/24465 ,  H01J2237/2817

Abstract: Provided is a charged particle beam applied apparatus for observing a sample, provided with: a beam-forming section that forms a plurality of charged particle beams on a sample; an energy control unit that controls the incident energy of the plurality of charged particle beams that are irradiated onto the sample; a beam current control unit that controls the beam current of the plurality of charged particle beams that are irradiated onto the sample; and a beam arrangement control unit that controls the arrangement in which the plurality of charged particle beams is irradiated onto the sample. The beam-forming section includes a beam splitting electrode, a lens array upper electrode, a lens array middle electrode, a lens array lower electrode and a movable stage, and functions as the beam current control unit or the beam arrangement control unit through selection, by the movable stage, of a plurality of aperture pattern sets.

Abstract translation: 提供了一种用于观察样品的带电粒子束施加装置，其具有：在样品上形成多个带电粒子束的束形成部分; 能量控制单元，其控制照射到所述样本上的所述多个带电粒子束的入射能量; 束电流控制单元，其控制照射到样品上的多个带电粒子束的束电流; 以及光束布置控制单元，其控制将多个带电粒子束照射到样本上的布置。 束形成部分包括分束电极，透镜阵列上电极，透镜阵列中间电极，透镜阵列下电极和可移动​​台，并且通过选择用作光束电流控制单元或光束布置控制单元， 通过可动台，具有多个孔径图案组。

公开(公告)号：US20130299697A1

公开(公告)日：2013-11-14

申请号：US13993822

申请日：2011-12-02

Applicant: Momoyo Enyama ,  Hiroya Ota ,  Taku Ninomiya ,  Mari Nozoe

Inventor： Momoyo Enyama ,  Hiroya Ota ,  Taku Ninomiya ,  Mari Nozoe

IPC: H01J37/04

CPC classification number: H01J37/045 ,  H01J37/12 ,  H01J37/147 ,  H01J37/28 ,  H01J2237/083 ,  H01J2237/0835 ,  H01J2237/24465 ,  H01J2237/2817

Abstract: Provided is a charged particle beam applied apparatus for observing a sample, provided with: a beam-forming section that forms a plurality of charged particle beams on a sample; an energy control unit that controls the incident energy of the plurality of charged particle beams that are irradiated onto the sample; a beam current control unit that controls the beam current of the plurality of charged particle beams that are irradiated onto the sample; and a beam arrangement control unit that controls the arrangement in which the plurality of charged particle beams is irradiated onto the sample. The beam-forming section includes a beam splitting electrode, a lens array upper electrode, a lens array middle electrode, a lens array lower electrode and a movable stage, and functions as the beam current control unit or the beam arrangement control unit through selection, by the movable stage, of a plurality of aperture pattern sets.

Abstract translation: 提供了一种用于观察样品的带电粒子束施加装置，其具有：在样品上形成多个带电粒子束的束形成部分; 能量控制单元，其控制照射到所述样本上的所述多个带电粒子束的入射能量; 束电流控制单元，其控制照射到样品上的多个带电粒子束的束电流; 以及光束布置控制单元，其控制将多个带电粒子束照射到样本上的布置。 束形成部分包括分束电极，透镜阵列上电极，透镜阵列中间电极，透镜阵列下电极和可移动​​台，并且通过选择用作光束电流控制单元或光束布置控制单元， 通过可动台，具有多个孔径图案组。

公开(公告)号：US07098455B2

公开(公告)日：2006-08-29

申请号：US10404451

申请日：2003-04-02

Applicant: Hiroyuki Shinada ,  Atsuko Takafuji ,  Takanori Ninomiya ,  Yuko Sasaki ,  Mari Nozoe ,  Hisaya Murakoshi ,  Taku Ninomiya ,  Yuji Kasai ,  Hiroshi Makino ,  Yutaka Kaneko ,  Kenji Tanimoto

Inventor： Hiroyuki Shinada ,  Atsuko Takafuji ,  Takanori Ninomiya ,  Yuko Sasaki ,  Mari Nozoe ,  Hisaya Murakoshi ,  Taku Ninomiya ,  Yuji Kasai ,  Hiroshi Makino ,  Yutaka Kaneko ,  Kenji Tanimoto

IPC: H01J37/28

CPC classification number: G01N23/225 ,  G01R31/307 ,  H01J37/28 ,  H01J2237/2817

Abstract: A circuit pattern inspecting instrument includes an electron-optical system for irradiating an electron beam on a sample, an electron beam deflector, a detector for detecting secondary charged particles from the sample, and a mode setting unit for switching between a first mode and a second mode. An electron beam current is larger in the first mode than in the second mode, and an electron beam scanning speed is higher in the first mode than in the second mode. The circuit pattern inspecting instrument is configured so that first the sample is observed in the first mode, then a particular position on the sample is selected based on image data produced by an output of the detector in the first mode, and then the particular position on the sample is observed in the second mode.

公开(公告)号：US06583413B1

公开(公告)日：2003-06-24

申请号：US09652606

申请日：2000-08-30

Applicant: Hiroyuki Shinada ,  Atsuko Takafuji ,  Takanori Ninomiya ,  Yuko Sasaki ,  Mari Nozoe ,  Hisaya Murakoshi ,  Taku Ninomiya ,  Yuji Kasai ,  Hiroshi Makino ,  Yutaka Kaneko ,  Kenji Tanimoto

Inventor： Hiroyuki Shinada ,  Atsuko Takafuji ,  Takanori Ninomiya ,  Yuko Sasaki ,  Mari Nozoe ,  Hisaya Murakoshi ,  Taku Ninomiya ,  Yuji Kasai ,  Hiroshi Makino ,  Yutaka Kaneko ,  Kenji Tanimoto

IPC: G01N2300

CPC classification number: G01N23/225 ,  G01R31/307 ,  H01J37/28 ,  H01J2237/2817

Abstract: A circuit pattern inspecting instrument includes an electron-optical system for irradiating an electron beam on a sample, an electron beam deflector, a detector for detecting secondary charged particles from the sample, and a mode setting unit for switching between a first mode and a second mode. An electron beam current is larger in the first mode than in the second mode, and an electron beam scanning speed is higher in the first mode than in the second mode. The circuit pattern inspecting instrument is configured so that first the sample is observed in the first mode, then a particular position on the sample is selected based on image data produced by an output of the detector in the first mode, and then the particular position on the sample is observed in the second mode.

Abstract translation: 电路图形检查装置包括用于对样品照射电子束的电子光学系统，电子束偏转器，用于从样品检测二次带电粒子的检测器，以及用于在第一模式和第二模式之间切换的模式设置单元 模式。 在第一模式中电子束电流比第二模式中的电子束电流大，并且在第一模式中电子束扫描速度高于第二模式。 电路图形检查装置被配置为使得首先在第一模式中观察样本，然后基于在第一模式中由检测器的输出产生的图像数据来选择样本上的特定位置，然后选择特定位置 在第二模式下观察样品。

公开(公告)号：US07397031B2

公开(公告)日：2008-07-08

申请号：US11452989

申请日：2006-06-15

Applicant: Hiroyuki Shinada ,  Atsuko Takafuji ,  Takanori Ninomiya ,  Yuko Sasaki ,  Mari Nozoe ,  Hisaya Murakoshi ,  Taku Ninomiya ,  Yuji Kasai ,  Hiroshi Makino ,  Yutaka Kaneko ,  Kenji Tanimoto

Inventor： Hiroyuki Shinada ,  Atsuko Takafuji ,  Takanori Ninomiya ,  Yuko Sasaki ,  Mari Nozoe ,  Hisaya Murakoshi ,  Taku Ninomiya ,  Yuji Kasai ,  Hiroshi Makino ,  Yutaka Kaneko ,  Kenji Tanimoto

IPC: H01J37/28

CPC classification number: G01N23/225 ,  G01R31/307 ,  H01J37/28 ,  H01J2237/2817

Abstract: An apparatus for inspecting a sample using a scanning electron microscope includes a sample stage, a first electron-optical system to scan an electron beam of a first beam current on the sample, a second electron-optical system to scan an electron beam of a second beam current smaller than the first beam current on the sample, a mechanism to move the sample stage, a detector provided in each of the first and second electron-optical systems to detect a secondary electron. The first electron-optical system is operable in a first mode and the second electron-optical system is operable in a second mode with higher resolution than that of the first mode. In the first mode, the sample is observed while the sample stage is moved continuously, and in the second mode, the sample is observed by detecting a secondary electron using the detector while the sample stage is held stationary.

Abstract translation: 使用扫描电子显微镜检查样品的装置包括样品台，用于扫描样品上的第一束电流的电子束的第一电子 - 光学系统，用于扫描第二电子束的电子束的第二电子 - 光学系统 光束电流小于样品上的第一光束电流，移动样品台的机构，设置在每个第一和第二电子光学系统中的检测二次电子的检测器。 第一电子 - 光学系统可在第一模式中操作，并且第二电子 - 光学系统可以以比第一模式更高的分辨率在第二模式中操作。 在第一模式中，在样品台连续移动时观察样品，在第二模式中，通过在样品台保持静止时使用检测器检测二次电子来观察样品。

公开(公告)号：US07271385B2

公开(公告)日：2007-09-18

申请号：US11234313

申请日：2005-09-26

Applicant: Yasuhiro Gunji ,  Taku Ninomiya ,  Ryuichi Funatsu ,  Yoshikazu Inada ,  Kenjirou Yamamoto ,  Mari Nozoe

Inventor： Yasuhiro Gunji ,  Taku Ninomiya ,  Ryuichi Funatsu ,  Yoshikazu Inada ,  Kenjirou Yamamoto ,  Mari Nozoe

IPC: G01R31/302

CPC classification number: G01R31/305 ,  H01J37/222 ,  H01J37/244 ,  H01J37/268 ,  H01J37/28 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594 ,  H01J2237/2817

Abstract: An inspection method and an inspection apparatus using an electron beam enabling more detailed and quantitative evaluation at a high throughput level. The method comprises the steps of irradiating, based on previously prepared information concerning a defect position on the surface of a sample, the defect and its vicinity with an electron beam a plurality of times at predetermined intervals; detecting an electron signal secondarily generated from the sample surface by the electron beam; imaging an electron signal detected by the previously specified n-th or later electron beam irradiation; and measuring the resistance or a leakage amount of the defective portion of the sample surface in accordance with the degree of charge relaxation by monitoring the charge relaxation state of the sample surface based on the electron beam image information.

Abstract translation: 使用电子束的检查方法和检查装置能够在高通量水平下进行更详细和定量的评估。 该方法包括以预定间隔以电子束多次照射预先准备的关于样品表面上的缺陷位置的信息，缺陷及其附近的信息的步骤; 通过电子束检测从样品表面二次产生的电子信号; 对由先前指定的第n或更晚的电子束照射检测的电子信号成像; 并且通过基于电子束图像信息监测样品表面的电荷弛豫状态，根据电荷弛豫程度来测量样品表面的缺陷部分的电阻或泄漏量。

公开(公告)号：US20050040331A1

公开(公告)日：2005-02-24

申请号：US10942941

申请日：2004-09-17

Applicant: Yasuhiro Gunji ,  Taku Ninomiya ,  Ryuichi Funatsu ,  Yoshikazu Inada ,  Kenjirou Yamamoto ,  Mari Nozoe

Inventor： Yasuhiro Gunji ,  Taku Ninomiya ,  Ryuichi Funatsu ,  Yoshikazu Inada ,  Kenjirou Yamamoto ,  Mari Nozoe

IPC: G01R31/302 ,  H01J37/22 ,  H01J37/28 ,  H01L21/66 ,  G01N23/00

CPC classification number: G01R31/305 ,  H01J37/222 ,  H01J37/244 ,  H01J37/268 ,  H01J37/28 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/2594 ,  H01J2237/2817

Abstract: An inspection method and an inspection apparatus using an electron beam enabling more detailed and quantitative evaluation at a high throughput level. The method comprises the steps of irradiating, based on previously prepared information concerning a defect position on the surface of a sample, the defect and its vicinity with an electron beam a plurality of times at predetermined intervals; detecting an electron signal secondarily generated from the sample surface by the electron beam; imaging an electron signal detected by the previously specified n-th or later electron beam irradiation; and measuring the resistance or a leakage amount of the defective portion of the sample surface in accordance with the degree of charge relaxation by monitoring the charge relaxation state of the sample surface based on the electron beam image information.

Abstract translation: 使用电子束的检查方法和检查装置能够在高通量水平下进行更详细和定量的评估。 该方法包括以预定间隔以电子束多次照射预先准备的关于样品表面上的缺陷位置的信息，缺陷及其附近的信息的步骤; 通过电子束检测从样品表面二次产生的电子信号; 对由先前指定的第n或更晚的电子束照射检测的电子信号成像; 并且通过基于电子束图像信息监测样品表面的电荷弛豫状态，根据电荷弛豫程度来测量样品表面的缺陷部分的电阻或泄漏量。

公开(公告)号：US20110133066A1

公开(公告)日：2011-06-09

申请号：US13059540

申请日：2009-09-14

Applicant: Mari Nozoe ,  Taku Ninomiya

Inventor： Mari Nozoe ,  Taku Ninomiya

IPC: H01J37/26 ,  G12B13/00 ,  G01N23/22

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/20292 ,  H01J2237/2817 ,  H01L22/12

Abstract: An inspection apparatus and method are provided capable of suppressing electron beam focus drifts and irradiation-position deviations caused by sample surface charge-up by irradiation of an electron beam during micropattern inspection to thereby avoid false defect detection and also shorten an inspection time. The apparatus captures a plurality of images of alignment marks provided at dies, stores in a storage device deviations between the central coordinates of alignment mark images and the coordinates of the marks as a coordinate correction value, measures heights at a plurality of coordinates on the sample surface, captures images of the measured coordinates to perform focus adjustment, saves the relationship between such adjusted values and the sensor-measured heights in the storage as height correction values, and uses inspection conditions including the image coordinate correction values saved in the storage and the height correction values to correct the image coordinates and height of the sample.

Abstract translation: 提供了一种检查装置和方法，其能够通过微图案检查期间的电子束照射而抑制由样品表面充电引起的电子束聚焦漂移和照射位置偏差，从而避免错误检测，并且缩短检查时间。 该装置捕获在模具处设置的对准标记的多个图像，存储在存储装置中的对准标记图像的中心坐标和标记坐标之间的偏差作为坐标校正值，测量样本上的多个坐标上的高度 表面，捕获测量坐标的图像以执行焦点调整，将这种调整值与存储器中传感器测量的高度之间的关系保存为高度校正值，并使用检查条件，包括保存在存储器中的图像坐标校正值和 高度校正值来校正样品的图像坐标和高度。